The invention provides a high-
transmittance ITO conductive glass preparation process, and belongs to the technical field of conductive glass preparation, and the high-
transmittance ITO conductive glass preparation process comprises the following steps: S1, cleaning a substrate: carrying out ultra-clean cleaning on a glass substrate to remove oil stains and impurities on the surface, and blow-
drying by adopting a high-pressure
air knife; s2,
coating pretreatment: feeding the cleaned glass substrate into a
coating chamber, and carrying out pretreatment before
coating; s3, forming a SiO2 film: adopting a medium-frequency coating process, obtaining the SiO2 film through medium-frequency reactive
sputtering of a Si target, reducing the quantity of electric charges accumulated on the surface of the SiO2 film, and reducing the probability of
abnormal discharge; s4, forming an ITO film: continuously coating the SiO2 film to form an ITO conductive film; and S5, post-treatment: carrying out annealing and cleaning post-treatment on the coated glass so as to improve the stability and
adhesive force of the film layer. According to the invention, a traditional
radio frequency sputtering SiO2 film forming process is replaced by an
intermediate frequency coating process, so that the quantity of electric charges accumulated on the surface of the SiO2 film is reduced, the probability of
abnormal discharge is reduced, and the product quality is effectively ensured.