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3499 results about "Transparent conducting film" patented technology

Transparent conducting films (TCFs) are thin films of optically transparent and electrically conductive material. They are an important component in a number of electronic devices including liquid-crystal displays, OLEDs, touchscreens and photovoltaics. While indium tin oxide (ITO) is the most widely used, alternatives include wider-spectrum transparent conductive oxides (TCOs), conductive polymers, metal grids and random metallic networks, carbon nanotubes (CNT), graphene, nanowire meshes and ultra thin metal films.

Transparent Planar Body and Transparent Touch Switch

The present invention provides a transparent planar body and a transparent touch switch that can improve visibility. Specifically, the transparent planar body (1) has a patterned transparent conductive film (12) on at least one surface of a transparent substrate (11). This transparent planar body (1) comprises a transmittance-adjusting layer for equalizing the transmission spectrum of light transmitted through a patterned region wherein the transparent conductive film (12) is provided via the transparent substrate (11) with that transmitted through a non-patterned region wherein the transparent conductive film (12) is not provided via the transparent substrate (11).
Owner:GUNZE LTD

Method for producing display device

In a liquid crystal display device, a first substrate includes electrical wirings and a semiconductor integrated circuit which has TFTs and is connected electrically to the electrical wirings, and a second substrate includes a transparent conductive film on a surface thereof. A surface of the first substrate on which the electrical wirings are formed is opposite to the transparent conductive film on the second substrate. The semiconductor integrated circuit has substantially the same length as one side of a display screen (i.e., a matrix circuit) of the display device and is obtained by peeling it from another substrate and then forming it on the first substrate. Also, in a liquid crystal display device, a first substrate includes a matrix circuit and a peripheral driver circuit, and a second substrate is opposite to the first substrate, includes a matrix circuit and a peripheral driver circuit and has at least a size corresponding to the matrix circuit and the peripheral driver circuit. Spacers are provided between the first and second substrates. A seal material is formed outside the matrix circuits and the peripheral driver circuits in the first and second substrates. A liquid crystal material is filled inside a region enclosed by the seal material. A protective film is formed on the peripheral driver circuit that has a thickness substantially equivalent to an interval between the substrates which is formed by the spacers.
Owner:SEMICON ENERGY LAB CO LTD

Process For Producing Zno Transparent Conductive Film By Mocvd (Metal-Organic Chemical Vapor Deposition) Method

The triethylaluminum contained as an impurity in low-purity raw-material diethylzinc, which is inexpensive, is utilized as an additive to reduce the cost of film formation. Diethylzinc having a low purity (99.99-98% or 99.99-90%) is used as a raw material to produce a ZnO transparent conductive film by the MOCVD (metal-organic chemical vapor deposition) method. Water vapor (H2O) is used as an oxidizing agent and the triethylaluminum contained as an impurity in the raw material is utilized as an additive (diborane is further added as an additive) to cause the diethylzinc, the water vapor (H2O), and the triethylaluminum (and the diborane) to undergo a vapor-phase reaction to produce a ZnO transparent conductive film.
Owner:SHOWA SHELL SEKIYU KK

Transparent conductive film, transparent conductive laminate, touch panel, and method for producing transparent conductive film

The transparent conductive film of the present invention is a transparent conductive film, comprising a transparent film substrate, and a first transparent dielectric layer, a second transparent dielectric layer and a transparent conductive layer that are formed on one or both sides of the transparent film substrate in this order from the transparent film substrate side, wherein the transparent conductive layer is patterned, the relation n2<n3<n1 is satisfied, wherein n1 is the refractive index of the first transparent dielectric layer, n2 is the refractive index of the second transparent dielectric layer, and n3 is the refractive index of the transparent conductive layer, the first transparent dielectric layer has a thickness of from 2 nm to less than 10 nm, the second transparent dielectric layer has a thickness of from 20 nm to 55 nm, and the transparent conductive layer has a thickness of from 15 nm to 30 nm.
Owner:NITTO DENKO CORP
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