The invention discloses a
nanosecond-order
delay transistor reliability test
system and method, and belongs to the technical field of
transistor test. The test
system is divided into three parts, namely a
voltage stress value and stress duration control module, a current control module and a hard switch transient and on-
resistance test module. The drain
voltage stresses are respectively used for controlling the drain
voltage stress value and the drain voltage stress duration of the
transistor to be tested; the current during hard switch testing is determined; and the
conduction time is long. The test
system processes signals through a hardware circuit, can convert an input single-path pulse
signal into two paths of inverted pulse signals with
dead time, and improves the safety of the test system. The voltage stress duration, the current and the conduction duration of the drain
electrode of the transistor to be tested can be flexibly regulated and controlled only by inputting a pulse
signal to each of the three modules.
Simulation and experiments prove that the
measurement delay of switching to the test state after the drain
electrode voltage stress is ended is
nanosecond magnitude, and the method has important significance for monitoring performance degradation after the transistor drain
electrode voltage stress is monitored in real time.