The invention provides a junction-free
transistor, which comprises a substrate, and a
buried oxide layer, a core layer and a shell layer which are sequentially stacked on the substrate, the
doping concentration of the shell layer is smaller than that of the core layer, the shell layer is provided with a grid
electrode, and the size of the shell layer in a first direction along the surface of the substrate is larger than that of the grid
electrode in the first direction, that is, the size of the shell layer in the first direction is smaller than that of the grid
electrode. Compared with the condition that the size of the shell layer in the first direction is equal to the size of the grid electrode in the first direction, the size of the shell layer in the first direction is increased in the scheme, so that carriers in a channel are less acted by a source leakage field and are almost only controlled by a grid electrode
electric field, and when the device starts, due to the fact that the
doping concentration of the shell layer is low or the shell layer is not doped, the performance of the device is improved. Therefore, the carrier mobility is high, the device can have lower off-state current and higher on-state current, and the performance of the device is improved.