The invention discloses a p-type two-dimensional
semiconductor top gate
field effect transistor and a preparation method thereof, and the preparation method comprises the steps: preparing a source
electrode and a drain
electrode on the surface of a two-dimensional
semiconductor material, then defining a two-dimensional
semiconductor channel region,
etching to remove the two-dimensional semiconductor material outside the channel region, and then preparing a p-type seed layer, a
gate dielectric layer and a gate
electrode, the p-type seed layer covers the substrate, the surface of the two-dimensional semiconductor material, the upper surface of the source electrode, the upper surface of the drain electrode and the side wall exposed in the range of the
transistor. According to the preparation method provided by the invention, before the
dielectric layer is prepared, the p-type seed layer is prepared firstly, and the
Fermi level of the two-dimensional semiconductor material is fixed near a
valence band, so that p
doping is realized, the process stability is good, and the obtained p-type two-dimensional semiconductor top gate
field effect transistor has relatively large on-state current and switch ratio, relatively small source leakage current and
hysteresis, and relatively high reliability. The
power consumption is reduced, an advanced process is adapted, and the method has a wide application prospect in the manufacturing of a large-scale
integrated circuit.