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145 results about "Flat band" patented technology

The flat band voltage still corresponds to the voltage which when applied to the gate electrode yields a flat energy band in the semiconductor. The charge in the oxide or at the interface changes this flatband voltage.

Exercise resistance system

The present invention provides for an improved exercise resistance system to conduct numerous total body exercises. An adjustable elastic resistance cord or flat band may be combined with weights, or each type of resistance may be used alone, in order to vary the means of creating resistance during exercise. The length of the elastic resistance cord or flat band may be adjusted by means of a slip free, length quick adjustment device. The elastic resistance cord or flat band may be passed through the length quick adjustment device which may be secured at various points along the length of the elastic resistance cord or flat band, to change its effective usable length and thus change the level of strength, and range of motion. The length quick adjustment device may be secured by pulling an elastic resistance cord or flat band in one direction, and released by pulling the elastic resistance cord or flat band in the opposite direction.One end of the elastic resistance cord or flat band is attached to any hand engagement structure, preferably a cord handle / grip, a dumbbell handle / grip, a bar, or a glove. The other end of the elastic resistance cord or flat band is secured to any anchor structure, preferably a movable structure, such as a flat board, pad, aerobic step, workout bench, or TV interactive exercise structure.
Owner:WILKINSON WILLIAM T +3

Method for extracting flat-band voltage and threshold voltage of MOSFET (metal-oxide-semiconductor field effect transistor) based on current generation of grid-control drain electrode

A method for extracting flat-band voltage and threshold voltage of an MOSFET (metal-oxide-semiconductor field effect transistor) based on current generation of a grid-control drain electrode belongs to the filed of micro electronic technique, is used for extracting VFB and VTH through the variation of grid-control generated current caused by the fact that a channel of the MOSFET changes from an accumulation region, an exhaustion region to a transoid region, and includes the following steps: an electrode at the source end of the MOSFET is hung in the air, a small drain voltage VD is exerted on the drain electrode, and the absolute valve of the VD is smaller than or equals to 0.2 V; the gate voltage VG is scanned, the channel changes from the accumulation region to the transoid region, and the grid-control generated current is measured under the drain bias VD; secondary partial differentiation operation for the obtained grid-control generated current curve IGD is performed to obtain the relation curve of the secondary derivative and the VG; the curve forms three peak value points, so as to obtain the peak value point corresponding to the rise edge and the peak value corresponding to the decline edge; the flat-band voltage VFB can be obtained through forming a vertical at the peak value point corresponding to the rise edge and enabling the vertical to be intersected with a grid voltage shaft; and the threshold voltage VTH can be obtained through forming a vertical at the peak value point corresponding to the decline edge and enabling the vertical to be intersected with the grid voltage shaft.
Owner:陕西光电子先导院科技有限公司

Linear actuator with releasably interlocking bands

The linear actuator comprises an elongated first band wound in helical form about a central axis and capable of taking a retracted position and an extended position with its turns spaced from one another in the direction of the central axis, and first fasteners carried by the first band and longitudinally disposed therealong. The linear actuator also comprises an elongated second substantially flat band wound on itself, with its turns substantially transversely parallel to the central axis, and capable of taking a retracted, spiral position with its turns nested within one another and an extended position with its turns forming a helix around the central axis and generally equally radially spaced therefrom to form a telescopic column, the first and second bands, when in retracted position, in respective locations so as to clear each other. Second fasteners are carried by the second band and longitudinally disposed therealong, the second fasteners capable of cooperating with the first fasteners to releasably interlock the first and second bands. A spacer successively spaces the turns of the first band. A powered drive causes relative rotation on one hand of the first and second bands and on the other hand of the spacer about the central axis. Guide means guide the turns of the second band towards the turns of the first band to releasably interlock the first and second fasteners. A retaining member retains the first and second fasteners in interlocked fashion in the telescopic column.
Owner:TION LAFOREST

Optical wavelength division multiplexer

InactiveUS20060222296A1Reducing excessive lossReducing the excessive lossCoupling light guidesGratingMultiplexer
In an optical wavelength division multiplexer, flattening of band characteristic can be realized while reducing excessive loss due to the flattening of band characteristic in an arrayed waveguide grating. Further, the flat band of the band characteristic can be made broader.
The optical wavelength division multiplexer according to the invention includes: a first coupler optical waveguide 104 and a second coupler optical waveguide 106; one or more input side connecting part waveguide(s) 103 with one end connected to an input optical waveguide 101 and the other end connected to an optical input end face of the first coupler optical waveguide 104; one or more output side connecting part waveguide(s) 103′ with one end connected to an output optical waveguide 107 and the other end connected to an optical output end face of the second coupler optical waveguide 106; and an arrayed optical waveguide 105 connected between the first coupler optical waveguide 104 and the second coupler optical waveguide 106 and having plural channel waveguides with different lengths from one another, and further includes an optical interferometer connected to at least two optical waveguides between the input side connecting part waveguide 103 and the input optical waveguide 101. The optical interferometer includes a ring structure 202 that feeds back an input light, and is provided so that an interference period of the optical interferometer may become equal to a difference between frequencies of light output from adjacent optical waveguides of the output side connecting part waveguide 107.
Owner:NEC CORP

CMOSFETs structure for controlling threshold voltage of device and manufacturing method thereof

The invention discloses a CMOSFETs structure for controlling the threshold voltage of a device by using a gate stack structure and a manufacturing method thereof. The structure comprises a silicon substrate, a SiO2 boundary layer growing on the silicon substrate, a high k gate dielectric layer deposited on the SiO2 boundary layer, an ultra thin metal layer deposited on the high k gate dielectric layer, a high k gate dielectric layer deposited on the ultra thin metal layer structure and a metal gate layer deposited on the high k gate dielectric stack structure. The manufacturing method comprises the following steps: respectively depositing the ultra thin metal layers in the high k gate dielectric layers in the regions of NMOS and PMOS devices, and regulating the flat band voltage of the devices by using positive or negative charges formed by the ultra thin metal layers in the high k gate dielectric layers, thereby controlling the threshold voltage of the devices. The invention not only can enhance the interface dipole between the high k gate dielectric layer and the SiO2 boundary layer in the CMOS device, but also can well control the type and the number of permanent charges in the high k gate dielectric layer, thereby effectively controlling the threshold voltage of the device.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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