The utility model relates to the technical field of power
semiconductor devices, and discloses a super-junction VDMOS device resistant to static breakdown, which comprises a drain
electrode and a grid
electrode, an N + substrate is deposited on the upper surface of the drain
electrode, a buffer layer is arranged above the N + substrate, a first N-epitaxial layer grows on the upper surface of the buffer layer, and a second N-epitaxial layer grows on the lower surface of the buffer layer. A first N-epitaxial layer is grown on the substrate, a P-region is formed in the first N-epitaxial layer through
ion implantation
diffusion, a second N-epitaxial layer grows on the first N-epitaxial layer, highly-doped P columns are arranged on the two sides in the second N-epitaxial layer, a heavily-doped region hole potential barrier region is arranged on one side of each P column, and a lightly-doped region hole
potential well region is arranged on the lower side of one side of each P column. According to the VDMOS device, the thickness of the
gate dielectric layer is increased, the
total thickness of the
gate dielectric layer is 100 nm, the single-particle shrinkage-through effect of the VDMOS device can be effectively improved, the
gate dielectric layer is composed of 20 nm
silicon dioxide and 80 nm trisilicon
nitride, the single-particle shrinkage-through resistance characteristic of the device is further improved, and under the same
gate voltage, gate-source electric leakage is reduced.