The application provides a
neuron-like
transistor device, which comprises a substrate, a buried
oxygen layer and a channel layer which are sequentially stacked on the substrate, a
gate oxide layer and a gate
electrode on the channel layer, and a source
electrode and a drain
electrode which are respectively located on both sides of the channel layer. The gate electrode is used for applying a front
gate voltage as an input
signal, the drain electrode is used for applying a constant input current, the
voltage of the drain electrode is used as an output
signal, and the input
signal is changed in a step-by-step manner from small to large. The
neuron nonlinear activation of a single device is realized, and it is possible to build a complete and programmable
artificial neuron by using a single or few transistors. The
neuron-like
transistor device has a simple structure, and a manufacturing process which is suitable for a
CMOS manufacturing process. The measurement method of the neuron-like
transistor device is simple, and an electrode does not need to be additionally introduced, so that the
simulation of the neuron characteristics can be realized without additional device design, the integration density of the transistors in a
chip is improved, and the neuron-like transistor device is suitable for the integration of a large-scale circuit.