Integrated circuit structure, comprising: an
SRAM cell (10) (SRAM:
static random access memory), comprising: a first pull-up MOS device (PU-1) (MOS:
metal oxide semiconductor) and a second pull-up MOS device (PU-2), and a first pull-down MOS device (PD-1) and a second pull-down MOS device (PD-2), forming inverters cross-locked to the first pull-up MOS device (PU-1) and the second pull-up MOS device (PD-2); an elongated contact (54) located over and electrically connected to a source of the first pull-down MOS device (PD-1); a first
metal layer (M1) containing a
bit line and a CVdd line; a first CVss contact island (52B) overlapping the elongated contact (54) and is electrically connected to this, wherein the first CVss contact island (52B) has a part in the
SRAM cell (10) which has a first length and a first width,which are smaller than a second length and a second width of the
SRAM cell (10), wherein the SRAM
cell (10) has a first boundary (10A) and a second boundary (10B) that are parallel to each other, and a third boundary (10C) and a fourth boundary (10D) that are parallel to each other, and the first CVss contact island (52B) overlaps the first boundary (10A) and the fourth boundary (10D) but does not extend beyond the second boundary (10B) and the third boundary (10C); a first word line (50) having a first longitudinal direction, wherein the first word line (50) extends from the third boundary (10C) to the fourth boundary (10D), wherein the first word line (50) and the first CVss contact island (52B) are located in a second
metal layer (M2) above the first metal layer (M1), and wherein the first word line (50) forms a strip portion (50A) and has a protruding part (50B),which is connected to a part of a first side wall of the strip section (50A) in the first longitudinal direction and extends in a direction perpendicular to the first longitudinal direction, wherein the projecting part (50B) extends in the direction of the first boundary (10A) and is spaced from the first boundary (10A) and further extends from the third boundary (10C) in the direction of the fourth boundary (10D) and is spaced from the fourth boundary (10D), wherein the CVss contact island (52B) and the projecting part (50B) are spaced apart by a distance S1 so that they do not
electrically short-circuit, wherein the word line has a width W1 and the projecting part (50B) has a width W2 and wherein 0.1 <= W2 / W1 <= 0.5,wherein the width of the first word line (50) is increased by the projecting part (50B) and thereby the resistance of the first word line (50) is reduced; and a first CVss line (58) in a third metal layer (M3) above the second metal layer (M2), wherein the first CVss line (58) is electrically connected to the first CVss contact island (52B) and has a second longitudinal direction that is perpendicular to the direction of the first longitudinal direction.