The invention relates to the technical field of
semiconductor photoelectricity, in particular to a
blue light LED growing method for improving carrier recombination efficiency, which comprises the following steps of: S1, respectively extending a Buffer layer, a 3D layer, a GR layer and an N-GaN layer on
sapphire according to a conventional
blue light LED manufacturing process; and S2, a layer of N-Al0. 2Ga0. 8N is additionally arranged behind the N-GaN layer, and SiH4, TMAl and TEGa are introduced at the same time. And S3, continuing to be consistent with the conventional
blue light LED manufacturing process, and extending Q1, Q2 and Q3
quantum well
layers. And S4, according to the Last
Barrier layer, a conventional Al < 0.3 > Ga < 0.7 > N + AlN layer is changed into an Al < 0.7 > Ga < 0.3 > N-Al < 0.65 > Ga < 0.35 > N gradient layer, and the time is shortened by half. S5, a hole storage acceleration layer is formed on the rear portion of the Last
Barrier layer in an epitaxial mode, P-In0. 2Ga0. 8N is introduced, a shallow
energy level layer is formed, the time is consistent with that of S4, and S6, an Al0. 45Ga0. 55N-Al0. 5Ga0. 5N gradient layer is formed on the rear portion of the Last
Barrier layer in an epitaxial mode again, and the time is half of that of S5. The
quantum well structure is redesigned, and the n-AlGaN and the hole storage acceleration layer are added to realize the deceleration of electrons in the
quantum well and the acceleration of holes, so that the main light-emitting region is migrated to a
deep level, the carrier recombination efficiency is improved, and the light-emitting efficiency is further improved.