The invention discloses a method for preparing a
tellurium-
indium-lead polycrystal material for
single crystal growth by a horizontal gradient
crystallization method, and relates to a preparation method of the
tellurium-
indium-lead polycrystal material. The technical problems that an existing PIT
single crystal is serious in
cracking and high in optical absorption are solved. The method comprises the following steps: weighing a Pb source, an In source, a Te source and In2Te3 raw materials, putting the raw materials into a
crucible, putting Te providing
atmosphere pressure into another
crucible, putting the two crucibles at two ends of a
quartz tube, filling
inert gas, and sealing by melting; the method comprises the following steps: putting a
quartz tube into a double-temperature-zone horizontal
tube furnace, putting a
raw material crucible into a high-temperature zone, putting another crucible into a low-temperature zone, and carrying out a reaction stage, a homogenization stage, a gradient
crystallization stage and a cooling stage to obtain the
tellurium-
indium-lead polycrystal material. The
polycrystalline material is used for growing a
single crystal, the optical absorption of a
wafer with the thickness of 4.385 mm and double polished faces is smaller than 0.17 cm <-1 > at the 2.09 mu m position, middle and
far infrared laser can be output by means of
laser pumping, and the
polycrystalline material is used in the fields of industry,
medical treatment and energy.