4324 results about "Process time" patented technology

A semiconductor processing system includes a factory interface. A central transfer chamber is coupled to the factory interface. A first number of etch chambers are coupled to the central transfer chamber. The first number of etch chambers are configured to etch a substrate at about a first processing time. A second number of post-etch treatment chambers are coupled to the central transfer chamber. The second number of post-etch treatment chambers are configured to process the substrate at about a second processing time, wherein a ratio of the first number to the second number is substantially proportional to a ratio of the first processing time to the second processing time.

An apparatus for cooling a skin surface includes a support structure coupled to an electromagnetic energy delivery device. The electromagnetic energy delivery device is configured to be coupled to an electromagnetic energy source. A cooling member is coupled to the electromagnetic energy delivery device and is configured to create a reverse thermal gradient through a skin surface. A memory is coupled to the electromagnetic energy delivery device and is positioned at the support structure or the electromagnetic energy delivery device. The memory is configured to store information to facilitate operation of at least one of the cooling member, and the electromagnetic energy source. Resources are coupled to the cooling member to permit different levels of cooling at different times of treatment.

Provided are a semiconductor layer manufacturing method and a semiconductor manufacturing apparatus capable of forming a high quality semiconductor layer even by a single chamber system, with a shortened process time required for reducing a concentration of impurities that exist in a reaction chamber before forming the semiconductor layer. A semiconductor device manufactured using such a method and apparatus is also provided. The present invention relates to a semiconductor layer manufacturing method of forming a semiconductor layer inside a reaction chamber (101) capable of being hermetically sealed, including an impurities removing step of removing impurities inside the reaction chamber (101) using a replacement gas, and a semiconductor layer forming step of forming the semiconductor layer, the impurities removing step being a step in which a cycle composed of a replacement gas introducing step of introducing the replacement gas into the reaction chamber (101) and an exhausting step of exhausting the replacement gas is repeated a plurality of times, the impurities removing step being performed at least before the semiconductor layer forming step.

A method of effectively representing and processing data sets with time series is disclosed. The method may comprise representing time series as a virtual part of data in a data store layer of a user system, thereby allowing processing of time-series related queries in said data store layer of said user system.

In a method for distributing a transaction in a computer system including a plurality of computers each formed by processors, a plurality of estimated loads are calculated for the computers. Then, a plurality of estimated process time expansion ratios are calculated for the computers, in accordance with the estimated loads and the numbers of processors in the computers. Then, a plurality of load indexes one for each of the computers are calculated in accordance with the estimated process time expansion ratios. Finally, the transaction is distributed in accordance with the load indexes.

A system for optimizing response time to events or representations thereof waiting in a queue has a first server having access to the queue; a software application running on the first server; and a second server accessible from the first server, the second server containing rules governing the optimization. In a preferred embodiment, the software application at least periodically accesses the queue and parses certain ones of events or tokens in the queue and compares the parsed results against rules accessed from the second server in order to determine a measure of disposal time for each parsed event wherein if the determined measure is sufficiently low for one or more of the parsed events, those one or more events are modified to a reflect a higher priority state than originally assigned enabling faster treatment of those events resulting in relief from those events to the queue system load.

In Internet and related networks, a method of and system for substitute use of the normal checksum field space in information processing (IP) datagram headers for obviating current processing time and addressing space limitations, involving replacing the current checksum usage in the checksum field with its attendant processing time with further source host and destination host addresses of lesser processing time, thereby increasing the address space for the network and decreasing the require header processing time, and/or providing space for autonomous system numbers, a higher layer protocol-based routing information (including of the MPLS type) or for Virtual Private Networks Indentifiers in the header.

A circuit layout methology is provided for eliminating the extra processing time and file-space requirements associated with the optical proximity correction (OPC) of a VLSI design. The methodology starts with the design rules for a given manufacturing technology and establishes a new set of layer-specific grid values. A layout obeying these new grid requirements leads to a significant reduction in data preparation time, cost, and file size. A layout-migration tool can be used to modify an existing layout in order to enforce the new grid requirements.

Disclosed herein is a touch screen 100 designed to control an image displayed on image display units 140 and 150 on both-sides of the touch screen. The touch screen 100 according to the present invention may overcome an obscured screen problem caused by an input device, increase production yield while reducing a process time of the touch screen 100 by simultaneously forming transparent electrodes and electrode wires on a transparent substrate and, after forming an image display unit and an active region on the transparent substrate, folding the transparent substrate, and minimize an area of a bezel region.

Three block concepts are introduced in HEVC: coding unit (CU), prediction unit (PU), and transform unit (TU). The overall coding structure is characterized by the various sizes of CU, PU and TU in a recursive fashion. For transform processing in current HEVC, a hierarchy RQT (Residual Quad Tree) is used and the TU size is related to the CU size, but independent of the PU size. This results in high encoding complexity and also causes increased processing time to process the syntax of residual quad tree. Accordingly a modified transform unit partition with reduced complexity is disclosed. According to an embodiment, the TU size may be restricted to the minimum of PU width and height, except for a 2N×2N coding unit with the 2N×2N partition type. In another embodiment, the maximum TU size equals to maximum of PU width and height, and the minimum TU size equals to minimum of the PU width and height, except for a 2N×2N coding unit with the 2N×2N partition type. In yet another embodiment, the TU size is selected between 2N×2N and N×N for the 2N×2N, 2N×N, N×2N and N×N partition types. The syntax element, split_transform_flag, is used to indicate the selection of 2N×2N or N×N TU size when needed. Furthermore, a method with reduced complexity of selecting the best merge candidate for the 2N×2N CU merge mode is disclosed. The method relies on R-D cost associated with the motion vector of merge candidate to reduce required computation.

Semiconductor wafer fabrication equipment comprising a selecting device for selecting semiconductor wafers destined to a processor on the basis of a remaining process time applicable to that processor in the equipment, a transporting device for transporting the selected semiconductor wafers to the processor, another selecting device for selecting a processor or a storage device constituting a transport destination to which to transport processed semiconductor wafers, and another transporting device for transporting the semiconductor wafers to the destination processor or storage device in accordance with a transport control changeover code read from the processors and storage devices of the equipment.

An apparatus and method for providing a security function of frames transmitted between optical network terminals (OLTs) and optical network units (ONUs) in an Ethernet passive optical network (EPON) providing media access control (MAC) services are provided. The apparatus includes: a frame classifier distinguishing the type of a frame, and based on the logical link identifier (LLID) of the distinguished frame, determining whether or not the frame is a security link to which a security function is to be applied; a bypass unit delaying a no-security-function frame so that a processing time for converting the security-function-applied frame classified in the frame classifier into an encrypted frame is the same as a time for processing the no-security-function frame; and a parameter generation unit transmitting in relation to each of the LLIDs, a parameter set value including a security-function-application setting signal used in the encryption, decryption and authentication of the frame, a frame decryption signal, an encryption mode selection signal, and an authentication intensity adjustment signal.

A method of creating and using an adaptive DMC type or other MPC controller includes using a model switching technique to periodically determine a process model, such as a parameterized process model, for a process loop on-line during operation of the process. The method then uses the process model to generate an MPC control model and creates and downloads an MPC controller algorithm to an MPC controller based on the new control model while the MPC controller is operating on-line. This technique, which is generally applicable to single-loop MPC controllers and is particularly useful in MPC controllers with a control horizon of one or two, enables an MPC controller to be adapted during the normal operation of the process, so as to change the process model on which the MPC controller is based to thereby account for process changes. The adaptive MPC controller is not computationally expensive and can therefore be easily implemented within a distributed controller of a process control system, while providing the same or in some cases better control than a PID controller, especially in dead time dominant process loops, and in process loops that are subject to process model mismatch within the process time to steady state.

A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.

The present invention relates generally to an apparatus and method for counting currency notes, and more particularly, to an apparatus and method that automatically feed and count a plurality of currency notes, recognize the denominations thereof by reading the images thereof, and extract, store and output the serial numbers thereof. In accordance with the present invention, it is possible to database apparatus-related information, such as the denominations, serial numbers, amounts, serial number region images, and installation locations of continuously fed currency notes, together with processed time information, and to effectively use the currency note counting apparatus in receipt/payment management through the management of the serial numbers of currency notes.

A transistor suitable for high-voltage applications is provided. The transistor is formed on a substrate having a deep well of a first conductivity type. A first well of the first conductivity type and a second well of a second conductivity type are formed such that they are not immediately adjacent each other. The well of the first conductivity type and the second conductivity type may be formed simultaneously as respective wells for low-voltage devices. In this manner, the high-voltage devices may be formed on the same wafer as low-voltage devices with fewer process steps, thereby reducing costs and process time. A doped isolation well may be formed adjacent the first well on an opposing side from the second well to provide further device isolation.

A sterilization system consisting of a mobile emitter, a sensing subsystem and a data logging subsystem is described. The emitter has one or more UV emitting lamps or devices. The sensing system comprises at least one remote UV sensor and at least one door sensor. The door sensor comprises a safety shut off door detector and may contain an emergency stop detector and arming detector to protect people from being exposed to UV energy. The system has a remote control for starting, stopping and setting system parameters which include but are not limited to: treatment time, dosage, room size, room number, unit number, floor, facility name, operator name, operator identification number, password, default dosage values, dosage, and patient identification number. The number of treatments per unit of time can be maximized because of the use of incident light measurement.

A method, code and system for planning the treatment a lesion on or adjacent to the retina of an eye of a patient are disclosed. There is first established at least two beam paths along which x-radiation is to be directed at the retinal lesion. Based on the known spectral and intensity characteristics of the beam, a total treatment time for irradiation along each beam paths is determined. From the coordinates of the optic nerve in the aligned eye position, there is determined the extent and duration of eye movement away from the aligned patient-eye position in a direction that moves the patient's optic nerve toward the irradiation beam that will be allowed during treatment, while still maintaining the radiation dose at the patient optic nerve below a predetermined dose level.

Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

A light source apparatus and a fabrication method thereof can prevent light interference between light emitting devices adjacent to each other by forming a groove in a sub-mount and bonding a light emitting device to the groove, enhance heat radiating effect as well as luminous efficiency by collecting light emitted from the side of the light emitting device toward the front of the light source apparatus, reduce the process time and costs and increase reliability by directly connecting the sub-mount to the stem by the first electrode and the second electrode which pass through holes of the sub-mount, and extend a life span of the light emitting device because of the enhanced heat radiating effect.

Joint temperature monitoring and control systems and methods are described herein in which the temperature of a fluid within a body or joint space is determined and/or monitored despite the energy generated during treatment by an ablation probe. One or more temperature sensors are positioned along the probe proximally of the electrode assembly and measure the temperature of an electrically conductive fluid without being overly influenced by the surgical effect occurring proximate the electrode assembly. The controller coupled to the probe can also be configured to set temperature limits and treatment times as well as moderating joint temperature by altering the electrically conductive fluid flow.