A device for holding at least one
planar substrate (1,2) in an apparatus for non-immersive wet-
chemical treatment of the substrate (1,2) comprises a pair of flow guide surfaces (23,24;50,51;88,89) on opposite sides of a space (28;55;93) for accommodating an
edge region of at least one substrate (1). The flow guide surfaces (23,24;50,51;88,89) extend in a first direction (-z) to respective edges (25,26;52,53;90,91) and extend in a second direction (y) transverse to the first direction (-z). Each of the edges (25,26;52,53;90,91) bounds a gap (27;54;92) for
insertion of an
edge region of at least one substrate (1) into the space (28;55;93). A dimension of the space (28;55;93) in a third direction (x) transverse to the first and second directions (-z,y) decreases in the first direction (-z) over at least part of an extent in the first direction (-z) of the space (28;55;93). The device comprises at least one first array (15;44;76) of protruding engagement features and at least one second array (16;45;77) of protruding engagement features, protruding towards each other from first and second engagement feature supports (19;20;47;49;81;84), respectively. The first and second arrays (15,16;44,45;76,77) extend in the second direction (y). The engagement feature supports (19;20;47;49;81;84) are at least partially movable with respect to each other to move the first and second arrays (15,16;44,45;76,77) in the third direction (x). The protruding engagement features are located in the space (28;55;93) at a distance from the edges (25,26;52,53;90,91) in opposite direction (z) to the first direction (-z). The space (28;55;93) is accessible to liquid at a distance from the edges (25,26;52,53;90,91) in opposite direction (z) to the first direction (-z).