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2154 results about "Copper plating" patented technology

Copper plating is the process of plating a layer of copper electrolytically on the surface of an item. It takes place in an electrolytic cell where electrolysis which uses direct electric current to dissolve a copper rod and transport the copper ions to the item. Into a container of water are placed a copper rod, and the item. The water contains an ionic solution which allows a direct electric current to flow from the copper rod to the item. The copper rod is the anode and the item is the cathode. This current flow causes the copper to ionize, become oxidized which means each atom becomes positively charged by losing an electron. As the copper ions dissolve into the water, they form a coordination complex with salts already present. The copper then physically flows to the item, where it is reduced to the metallic state by gaining electrons. This forms a thin, solid, metallic copper film on the surface of the item.

Method of electroless plating copper on nitride barrier

A method with three embodiments of manufacturing metal lines and solder bumps using electroless deposition techniques. The first embodiment uses a PdSix seed layer 50 for electroless deposition. The PdSix layer 50 does not require activation. A metal line is formed on a barrier layer 20 and an adhesion layer 30. A Palladium silicide seed layer 50 is then formed and patterned. Ni, Pd or Cu is electroless deposited over the Palladium silicide layer 50 to form a metal line. The second embodiment selectively electrolessly deposits metal 140 over an Adhesion layer 130 composed of Poly Si, Al, or Ti. A photoresist pattern 132 is formed over the adhesion layer. A metal layer 140 of Cu or Ni is electrolessly deposited over the adhesion layer. The photoresist layer 132 is removed and the exposed portion of the adhesion layer 130 and the underlying barrier metal layer 120 are etched thereby forming a metal line. The third embodiment electroless deposits metal over a metal barrier layer that is roughen by chemical mechanical polishing. A solder bump is formed using an electroless deposition of Cu or Ni by: depositing an Al layer 220 and a barrier metal layer 230 over a substrate 10. The barrier layer 230 is polished and activated. Next, the aluminum layer 220 and the barrier metal layer 230 are patterned. A metal layer 240 is electroless deposited. Next a solder bump 250 is formed over the electroless metal layer 240.
Owner:TAIWAN SEMICON MFG CO LTD

Lead frame, method for partial noble plating of said lead frame and semiconductor device having said lead frame

A lead frame for a semiconductor device, made of a copper alloy, capable of preventing the creation of delamination between encapsuling resin and attributable to a lead frame without sacrificing the wire bondability and, a process for producing the lead frame and a semiconductor device using the lead frame. According to the present invention, (1) there is provided a lead frame for a plastic molded type semiconductor device, made of a copper alloy material partially plated with at least one noble metal, for wire bonding or die bonding purposes, selected from silver, gold, and palladium, wherein the whole area or a predetermined area of the surface of the copper at least on its side to be contacted with a encapsuling resin has a thin noble metal plating of at least one member selected from silver, gold, platinum, and palladium. (2) A copper strike plating is provided as a primer plating for the partial noble plating, a copper plating is provided on the thin noble metal plating, and the partial noble metal plating is provided on the copper plating in its predetermined area. (3) A die pad for mounting a semiconductor chip is provided, a partial silver plating is provided, and a zinc flash plating and a copper strike plating are provided in that order at least one on the surface of copper in the back surface of the die pad remote from the surface on which the semiconductor chip is mounted.
Owner:DAI NIPPON PRINTING CO LTD

Wire saw for cutting hard and fragile materials and manufacturing method thereof

The invention relates to a wire saw for cutting hard and fragile materials and a manufacturing method thereof. The wire saw is fixed with an grinding material on a core wire through a bonding agent and is characterized in that the bonding agent consists of an inner layer UV resin bonding agent and an outer layer heat reactive resin bonding agent; and the grinding material is evenly and continuously distributed in a monolayer mode around the core wire, partial grinding material is embedded in the UV resin bonding agent, other partial grinding material is exposed outside the heat reactive resin bonding agent to form an exit lip, and the rest part is enwrapped by the outer layer heat reactive resin. The grinding material adopts a diamond or CBN adopting surface metal plating; and the core wire adopts a copperized music wire. The manufacturing method is performed continuously and quickly according to the following steps: under the traction of a driving device, setting out the core wire continuously through a wire plate, surface preparation, cleaning, drying, coating with the inner layer UV resin bonding agent, grinding material cementation, UV curing, coating with the outer layer heat reactive resin bonding agent, thermocuring and drawing in a cable to form a plate. The wire saw and the method solve the problem of driving aspects before cured resin is completely cured, and can effectively solve the problem that the grinding material in the prior art is easy to agglomerate.
Owner:NANJING NORMAL UNIVERSITY

Lithium battery with novel current collectors and preparation method of lithium battery with novel current collectors

The invention discloses a lithium battery with novel current collectors and a preparation method of the lithium battery with the novel current collectors. The lithium battery comprises a positive pole piece, a diaphragm and a negative pole piece. The positive pole piece comprises a novel positive pole current collector in a multi-layer structure, the positive pole current collector comprises a first plastic film, and each of upper and lower surfaces of the first plastic film is coated with a first adhesion reinforcement layer, an aluminum metal plating layer and a first antioxidant layer sequentially. The negative pole piece comprises a novel negative pole current collector in a multi-layer structure, the negative pole current collector comprises a second plastic film, and each of upper and lower surfaces of the second plastic film is coated with a second adhesion reinforcement layer, a copper metal plating layer and a second antioxidant layer sequentially. The preparation method includes: laminating the positive pole piece, the diaphragm and the negative pole piece, packaging through aluminum-plastic films, injecting an appropriate amount of electrolyte, and subjecting the aluminum-plastic films to hot-press packaging. The lithium battery has advantages that light weight, energy density improvement and cost reduction of the battery can be realized, and copper/aluminum plating layers are less prone to shedding and oxidization.
Owner:CONTEMPORARY AMPEREX TECH CO

Process for producing circuit board metallized semi-holes

The invention discloses a process for producing circuit board metallized semi-holes, which comprises the following steps: A) carrying out board cutting on a circuit board substrate, attaching a sensitive dry film on the surface of the substrate, and carrying out copper plating and tinplating on circuits according to a circuit board positive process; B) completing the exposure of the inner-layer circuits; C) carrying out press-fitting on the obtained board so as to obtain a laminated board; D) carrying out PTH (plated though hole) plating on the whole laminated board, and carrying out outer pattern transfer and pattern plating on the laminated board subjected to PTH plating; E) producing semi-holes; F) carrying out AOI detection on the outer-layer circuits, detecting the defects such as open/short circuits, and the like in the outer layer, and then modifying the defects; G) carrying out welding resistance on the obtained product; H) carrying out immersion nickel/gold on the whole board; and I) testing and checking the electrical properties and appearances of the finished board so as to obtain the finished product. The process of the invention is adjusted from the production flow, without drilling for deburring, thereby not only simplifying the production processes of traditional semi-hole boards, but also completely solving the problem of copper burrs in the semi-holes; the forming effect of the semi-hole is good; and the process of the invention has wide market application prospect.
Owner:JIANGMEN SUNTAK CIRCUIT TECH
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