Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

24839results about How to "Improve productivity" patented technology

System and method for providing answers to questions

A system, method and computer program product for providing answers to questions based on any corpus of data. The method facilitates generating a number of candidate passages from the corpus that answer an input query, and finds the correct resulting answer by collecting supporting evidence from the multiple passages. By analyzing all retrieved passages and that passage's metadata in parallel, there is generated an output plurality of data structures including candidate answers based upon the analyzing. Then, by each of a plurality of parallel operating modules, supporting passage retrieval operations are performed upon the set of candidate answers, and for each candidate answer, the data corpus is traversed to find those passages having candidate answer in addition to query terms. All candidate answers are automatically scored causing the supporting passages by a plurality of scoring modules, each producing a module score. The modules scores are processed to determine one or more query answers; and, a query response is generated for delivery to a user based on the one or more query answers.
Owner:IBM CORP

Thin-film deposition apparatus

A gas-feeding apparatus configured to be connected to an evacuatable reaction chamber includes a gas-distribution head for introducing gases into the chamber through a head surface. The gas-feeding head includes a first section for discharging a gas through the head surface toward a susceptor and a second section for discharging a gas through the head surface toward the susceptor. The first and the second sections are isolated from each other in the gas-distribution head, at least one of which section is coupled to an exhaust system for purging therefrom a gas present in the corresponding section without passing through the head surface.
Owner:ASM JAPAN

Process and apparatus for organic vapor jet deposition

ActiveUS20080233287A1Good directionalityMinimize material wasteVacuum evaporation coatingSputtering coatingOrganic vaporOrganic film
A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber.
Owner:THE TRUSTEES FOR PRINCETON UNIV

Producing method of semiconductor device and substrate processing apparatus

Disclosed is a producing method of a semiconductor device, comprising: loading a substrate into a reaction furnace; forming a film on the substrate in the reaction furnace; unloading the substrate from the reaction furnace after the film has been formed; and forcibly cooling an interior of the reaction furnace in a state where the substrate does not exist in the reaction furnace after the substrate has been unloaded.
Owner:KOKUSA ELECTRIC CO LTD

Method of plasma treatment using amplitude-modulated RF power

A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
Owner:ASM JAPAN

Method of and apparatus for improving productivity of human reviewers of automatically transcribed documents generated by media conversion systems

An apparatus for improving productivity of human reviewers of transcribed documents generated by media conversion systems includes a server / client network of computers, memories and file systems. The server receives and stores voice files created by users of the system. The server is configured for coupling to a speech-to-text media conversion system to receive converted text files of the audio voice files. The server analyzes the converted text files and routes the converted files to the appropriate reviewers according to an adaptive algorithm. The converted files are displayed on the assigned reviewer's screen at the reviewer's workstation. To aid the reviewer in pinpointing potential errors, the workstation displays different segments of the converted files in different colors to reflect different confidence levels of transcription accuracy. Portions of the original voice message that correspond to the potential errors are played back for the reviewer. The reviewers' workstations also perform productivity enhancing functions such as spelling and grammar checking. After the reviewer has made all the necessary corrections, the reviewed files are transmitted back to the server to be stored and accessed by the users. A user database in the server is also updated to store recurrent user-specific errors corrected by the reviewer. A language analysis system is also disposed to adaptively correct user-specific errors in future reviews according to the information in the user database.
Owner:AVAYA INC

Base plate processing device,base plate processing method and progarm

An etching apparatus 100 as the substrate processing apparatus is provided with a rotary arm 103 for carrying a substrate included in a lot, and process chambers 106 and 107 for carrying out etching to the substrate as product processing. The etching apparatus 100 is controlled by a host computer 200 in which a transportation recipe, a recipe for product processing and a recipe for dummy processing are registered. When a chamber neglecting time being each neglecting time of the process chambers 106 and 107 does not become time out, the host computer 200 discriminates that processing atmosphere in the process chambers used for etching to the lot is stable, omits the execution of the dummy processing, and executes etching to the substrate of the lot.
Owner:TOKYO ELECTRON LTD

Plasma enhanced vapor phase deposition

A plasma enhanced vapor deposition apparatus includes a process chamber including a first space and a second space, a substrate holder provided in the first space and supporting a substrate, a plasma generating device combined to the process chamber and inducing plasma in the second space, an ion species screening member separating the first and second spaces from each other and filtering ion species to prevent the ion species from diffusing from the second space to the first space, a first gas supplier supplying a first process gas including a precursor gas into the first space, wherein the precursor gas includes atoms constituting a material layer deposited over the substrate, a second gas supplier supplying a second process gas including a reactive gas into the second space, and a gas discharger coupled to the process chamber and inducing a gas flow from the second space to the first space.
Owner:SK HYNIX INC +1

Substrate processing apparatus, substrate processing method, and program for implementing the method

A substrate processing apparatus which is capable of enhancing productivity in manufacturing product substrates. In process chambers 106 and 107 of an etching apparatus 100, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer 200 determines whether or not the dummy processing is to be executed. The host computer 200 determines whether or not the interior of each of the process chambers 106 and 107 is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.
Owner:TOKYO ELECTRON LTD

Powered nose aircraft wheel system

A powered nose aircraft wheel system (130) for an aircraft (12) includes landing gear (104) that extends from the aircraft (12). A wheel axel (136) is coupled to the landing gear (104). A wheel (134) is coupled to the wheel axel (136). A wheel motor (106) is coupled to the wheel axel (136) and the wheel (134). A controller (120) is coupled to the wheel motor (106) and rotates the wheel (134). A method of taxiing an aircraft (12) includes permitting the wheel (134) of the aircraft (12) to freely spin during the landing of the aircraft (12). Power is transferred from an auxiliary power unit (73) of the aircraft (12) to the wheel motor (106). The wheel (134) is rotated via the wheel motor (106). The aircraft (12) is steered and the speed of the wheel (134) is controlled via one or more controllers selected from an onboard controller (18, 118, 120) and an offboard controller (45, 58, 59).
Owner:THE BOEING CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products