458 results about "Susceptor" patented technology

A method of processing waste consumable aerosol-generating articles by pyrolysis, the method comprising the steps of: feeding waste consumable aerosol-generating articles into a pyrolysis reactor, the aerosol-generating articles comprising at least some aerosol-generating articles comprising an aerosol-generating substrate with a metallic susceptor; heating the aerosol-generating articles in the pyrolysis reactor to a temperature sufficient to cause pyrolysis of non-metallic components of the aerosol-generating articles into gaseous products and char, wherein the temperature is less than a melting temperature of the metallic susceptors; extracting the gaseous products from the pyrolysis reactor and feeding the gaseous products to a condensing separator; and feeding the char from the pyrolysis reactor to a magnetic separator and separating the metallic susceptors from the char by applying a magnetic field; wherein at least some of the heat in the pyrolysis reactor is generated by applying an alternating electromagnetic field to the aerosol-generating articles so as to induce eddy currents in the metallic susceptors.

The invention provides semiconductor process equipment and a semiconductor cavity thereof. The semiconductor chamber comprises a chamber body which comprises a reaction space and an air exhaust space; the air inlet assembly is arranged at the top of the chamber body and is provided with an air outlet communicated with the interior of the chamber body; a reaction space is defined by the base, the shielding piece and the air inlet assembly, and the shielding piece is provided with a plurality of air exhaust holes communicating the reaction space with the air exhaust space of the cavity body; the shielding piece comprises an inner peripheral side wall and an outer peripheral side wall which are coaxially arranged, and the diameter of the inner peripheral side wall is smaller than that of the outer peripheral side wall; and at least one air exhaust hole is distributed in the inner peripheral side wall.

Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and / or thickness) profiles of material on a substrate surface.

A method for forming a film, including: atomizing a raw material solution into a mist to form raw material mist; mixing raw material mist and a carrier gas to form gas mixture; placing a substrate on a placement section of susceptor; supplying gas mixture from an atomizer to the substrate to perform film formation by thermal reaction on substrate; and discharging gas mixture after the film formation through an exhaust unit, wherein in the step of supplying the gas mixture from atomizer to substrate to perform film formation by thermal reaction on the substrate, at least a part of gas mixture is supplied from a smooth section adjacent to placement section to a surface of substrate, the smooth section having a surface roughness of 200 μm or less. A method for forming a film capable of uniformly and stably producing a high-quality film on a surface of a large-diameter substrate.

Disclosed are a susceptor for enabling uniform plasma treatment over the entire surface of a wafer, and a manufacturing method therefor. Provided is the susceptor comprising: a dielectric plate having an upper surface on which a wafer is loaded, and a lower surface facing same; and an inner RF electrode and an outer RF electrode that are buried in the dielectric plate, wherein, with respect to the lower surface, the height of a first plane in which the inner RF electrode is buried is less than the height of a second plane in which the outer RF electrode is buried.

An apparatus (2) for an aerosol provision device, the apparatus comprising a central controller (4) and a plurality of induction cells (7a-c). Each induction cell of the plurality of induction cells (7a-c) comprises a resonant circuit (6a-c) comprising an inductive element (8a-c) and a capacitive element (10a-c) configured to inductively heat a susceptor, and a local controller (12a-c). The local controller (12a-c) is configured to: receive one or more commands from the central controller (4); perform at least one action based on the one or more commands received from the central controller (4); and send feedback to the central controller (4).

An aerosol-generating device (12) comprising a cavity (41) configured to removably receive at least a portion of an aerosol-generating article comprising an aerosol-forming substrate. The aerosol-generating device (12) comprising an inductor (42) configured to generate an alternating magnetic field in the cavity (41) to heat a susceptor in the aerosol-generating article; a power supply (44) for supplying power to the inductor (42); and power control electronics (43) configured to control power supplied from the power supply (44) to the inductor (42) to generate an alternating magnetic field in the cavity (41). In a first mode the power control electronics (43) are configured to: supply a monitoring power to the inductor (42) to monitor an electrical quantity response to the monitoring power; detect whether the monitored electrical quantity meets a predetermined condition that indicates a puff; and if the monitored electrical quantity meets the predetermined condition, to supply a heating power to the inductor (42) to heat the susceptor to generate an aerosol from the aerosol-forming substrate.

A susceptor for processing a substrate is provided, comprising a base and a coating formed over the base. The base includes an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge, and an inner dish disposed within the outer rim and coupled to the outer rim, the inner dish being recessed from the top of the outer rim and having a front surface and an opposite back surface. The coating has an outer surface including a first portion formed over the front surface of the inner dish. The first portion of the outer surface of the coating includes a first region and a second region, the first region having a first average level of roughness and the second region having a second average level of roughness.

A substrate processing apparatus according to one embodiment of the present invention may comprise: a process chamber in which a processing space is formed; and a controller for controlling same. The controller can control that a warpage compensation layer in which a main layer and a buffer layer are alternately stacked at least once on one surface of the substrate loaded on the susceptor in the process chamber is formed such that the density of the buffer layer is lower than that of the main layer.

The utility model provides an edge ring flatness detection device which is applied to a vapor deposition chamber, the vapor deposition chamber comprises a base and an edge ring located at the edge of the base, a heater is arranged in the base and is used for heating the base, and the edge ring flatness detection device comprises a detection main body and a control device, the contact indication structure surrounds the edge of the detection main body; wherein the projection of the detection main body along the vertical direction coincides with the projection of the base along the vertical direction; the positioning rotating device is positioned on the detection main body and is used for positioning the detection main body to a preset position on one side, deviating from the heater, of the base, and the outer edge of the detection main body is matched with the outer edge of the base at the preset position; and the detection main body is rotated at the preset position. According to the embodiment of the invention, the flatness of the edge ring can be detected, so that the deposition effect of substrate film deposition is improved.

A substrate processing apparatus according to an example embodiment includes a chamber having a sidewall, a susceptor having an inclined side surface and mounting a substrate inside the chamber, an upper dome covering an upper surface of the chamber and formed of a dielectric material, a lower dome covering a lower surface of the chamber and formed of a dielectric material, and a liner disposed inside the chamber and disposed between the upper dome and the lower dome. The liner may include an inclined portion having an inclined inner side surface opposing the included side surface of the susceptor.

A method, performed by an aerosol-generating device, of determining a temperature model of a susceptor, includes applying a first signal having a first frequency to a coil of a heater so that an alternating magnetic field is generated, determining a first value of an electrical characteristic of a susceptor indicated by the first signal, applying a second signal having a second frequency to the coil of the heater so that an alternating magnetic field is generated, determining a second value of the electrical characteristic of the susceptor indicated by the second signal, and determining a first temperature model for the susceptor based on the first value and the second value, wherein the first temperature model may be a model used for determining a temperature of the susceptor based on the electrical characteristic of the susceptor.

The utility model belongs to the technical field of reduction furnace chassis cleaning, and particularly relates to a chassis junction silicon cleaning tool which comprises a supporting cover, handles are fixedly connected to the front side and the rear side of the supporting cover respectively, a rotating pipe is installed on the inner wall of the supporting cover through a bearing, and a spray pipe is fixedly connected to the lower side of a cross pipe of the rotating pipe. And the cross pipe of the rotating pipe and the supporting cover are jointly provided with a guide mechanism. According to the scheme, through the arrangement of the air supercharger, the spray pipe and other structures, air can be sprayed in a pressurized mode, under the action of the second belt wheel, the servo motor and other structures, the spray pipe can rotationally spray high-pressure air, then silicon attached to the surface of an electrode tip of the reduction furnace chassis is efficiently cleaned, and under the action of a negative pressure dust collector, the cleaning efficiency is improved. And silica fume and the like can be absorbed and treated in time, and the rotating pipe can be rotationally guided under the action of a guide ring groove, a guide ball and the like, so that stable rotation of components such as a spray pipe and the like is ensured.

The present invention relates to a susceptor, and in the ceramic susceptor of the present invention, a multi-layered structure of a heating element pattern is arranged in a manner that circular arc portions do not overlap, or a straight line section of the heating element is arranged at different angles with respect to the center in different layers, or even in a single layer structure of the heating element pattern, a straight line section of the heating element is arranged at different angles with respect to the center, thereby improving the temperature uniformity in the entire area of the upper surface of the susceptor.

The invention relates to a crucible assembly for physical vapor deposition on a surface, the crucible assembly comprising: - a susceptor (22) for supporting and driving a crucible (18) in rotation about an axis of rotation (A), the susceptor comprising a susceptor upper surface (34) having a first alignment relief (30), - a crucible (18) comprising: - at least one cavity (24) arranged at a peripheral region (38) of the crucible (18) with respect to the axis of rotation (A), - a crucible bottom surface (25) intended to contact the susceptor upper surface (34) of the susceptor (22), the crucible bottom surface (25) having a second alignment relief (32) complementary in shape with respect to the first alignment relief (30), the second alignment relief (32) being arranged at a central region (36) of the crucible (18) with respect to the axis of rotation (A).

The application provides a smoking body and a smoke cartridge. The smoking body comprises a smoking main body and a susceptor. The smoking main body comprises a plurality of wire bodies in contact with each other and extending along a preset direction; the wire bodies contain aerosol substrates; the susceptor is a metal wire containing a magnetic metal; the metal wire and the smoking main body are in contact, and when the susceptor generates heat through electromagnetic induction, the heat is transferred to the smoking main body to heat the smoking main body. The metal wire extends around the axis of the smoking main body, and the metal wire is dispersedly arranged on the smoking main body, so that the metal wire as a heater is uniformly distributed in the smoking main body, effectively avoiding local overhigh temperature of the smoking body, improving the taste of smoking, and thus improving the experience of users.

This fusion bonding method for fusion bonding a second member to a first member comprises an arrangement step and a scanning step. The arrangement step is for arranging a susceptor on the side of the second member opposite to the surface that faces a repair target area of the first member, the second member being arranged according to the repair target area, and a heat transfer member being interposed between the susceptor and the second member. The scanning step is for scanning a magnetic field generation device along the surface of the susceptor from the side of the susceptor opposite to the surface facing the heat transfer member after completion of the arrangement step. The susceptor is a member that generates heat by the magnetic field of the magnetic field generation device in the scanning step.

A method for controlling aerosol production in an aerosol-generating device is provided, the device including an inductive heating arrangement and a power source, the method including: performing, during a first heating phase, a calibration process for measuring calibration values associated with a susceptor inductively coupled to the arrangement; during a second heating phase, controlling power such that a temperature of the susceptor is adjusted based on the calibration values; and performing a pre-heating process, during the first heating phase and before the calibration process, the process including: controlling the power provided to cause an increase of susceptor temperature, monitoring a power source parameter based on current, and interrupting provision of power at a first predetermined value of the parameter, the first predetermined value being associated with a current value greater than a minimum operating current, and the first value of the parameter being determined during manufacture.

The present invention provides a film deposition method, a wafer support structure, and a vapor phase growth apparatus that can suppress deterioration of film deposition characteristics. [Solution] The film deposition method of the embodiment is a film deposition method that forms a film on the surface of a wafer using a vapor phase growth apparatus. The film deposition method of the embodiment includes a film deposition process that forms a film on the surface of the wafer. The vapor phase growth apparatus has a susceptor and a plurality of wafer guide parts. The susceptor supports the wafer and is rotated about a rotation axis that extends in the vertical direction. The plurality of wafer guide parts are arranged at intervals in the circumferential direction about the rotation axis, protrude above the susceptor and surround the wafer. The film deposition process includes surrounding the wafer with the plurality of wafer guide parts such that, when viewed in the vertical direction, the direction connecting the rotation axis and each of the wafer guide parts is different from the cleavage direction of the wafer.

A device comprising a plurality of heater modules, each heater module comprising a resonant circuit having an inductive element for inductively heating a susceptor device and one or more capacitors. Each of the plurality of heater modules further comprises a bridge circuit for selectively coupling a first side and a second side of each of the plurality of heater modules to positive and negative supply voltages. The device further comprises a demultiplexer device for providing a clock signal to one of the plurality of heater modules in response to a control signal received from a control module, and a multiplexer device for providing a feedback signal from the one of the plurality of heater modules.

According to an aerosol-generating device according to an embodiment, in a case where a flange temperature sensed by a flange temperature sensor is included in a preset reference temperature range, a switching frequency of a power conversion unit is swept in a reference frequency range and at least one DC current value is acquired from a current sensing sensor; and generates temperature data for estimating the temperature of the susceptor on the basis of the DC current value.

A vapor phase growth apparatus of an embodiment has a susceptor supporting a wafer, and a ring-shaped wafer guide surrounding the wafer. The susceptor has a wafer support portion supporting the wafer from below, a guide support portion supporting the wafer guide from below, and an inward portion positioned on an inward side in a radial direction from the wafer support portion. An upper surface of the inward portion is positioned below a wafer contact surface of the wafer support portion. The wafer contact surface is positioned above a guide contact surface of the guide support portion. During film formation processing, a control unit measures a temperature of a part in the wafer overlapping the wafer support portion by a first temperature sensor, measures a temperature of a part in the wafer overlapping the inward portion by a second temperature sensor.

An aerosol provision device is provided. The device comprises a receptacle configured to receive aerosol generating material, wherein the aerosol generating material is heatable by a susceptor. The device further comprises an inductor coil extending around the receptacle, wherein the inductor coil is configured to generate a varying magnetic field for heating the susceptor. The device further comprises a magnetic shield member extending at least partially around the inductor coil.

The present invention relates to a substrate processing apparatus. A substrate processing apparatus according to the present embodiment comprises: a susceptor configured to be rotatable and including a plurality of substrate support modules that are spaced at regular intervals so that substrates can be positioned in each of a plurality of process zones; and a plurality of separation gas spraying units that spray a separation gas for separating the plurality of process zones. The plurality of separation gas spraying units spray the separation gas at different flow rates depending on whether the susceptor is rotating or standing still.

A method and apparatus for processing a substrate usable in semiconductor manufacturing is described. The method includes rotating a first shaft having a first bore, at least a portion of the first shaft disposed within a second shaft. The method further includes flowing a gas through a piping connected to the second bore in the second shaft. The method also includes flowing a gas through the second perforations and the first perforations into an interior of the first shaft. The method further includes flowing a gas from the interior of the first shaft to an underside of a substrate disposed in the processing chamber.

The invention discloses an aerosol generating device. An aerosol-generating device of the present disclosure may include a body providing an insertion space extending in an elongated shape, a wand having a medium portion disposed therein and inserted into the insertion space, a susceptor surrounding the insertion space and extending in a length direction of the insertion space, and a conductive track disposed in the insertion space and electrically conductive to the susceptor. A heater surrounding the susceptor and heating the susceptor and the insertion space; a downstream-side end of the conductive track may be aligned with a downstream-side end of a medium portion of the rod inserted into the insertion space in a radial direction of the insertion space.

The application provides a mounting and adjusting device and a semiconductor process equipment, which comprises an insulating fixing ring, a mounting part for fixing an upper electrode and an adjusting assembly, wherein the insulating fixing ring is arranged on the top of a process chamber of the semiconductor process equipment and is used for electrically insulating the mounting part and the upper electrode from the cavity of the process chamber; the mounting part is located in the space surrounded by the insulating fixing ring and is connected to the insulating fixing ring in a liftable manner through the adjusting assembly; the upper electrode is arranged on the bottom of the mounting part; the adjusting assembly is connected to the insulating fixing ring and is used for driving the mounting part to lift or lower, so as to adjust the vertical distance between the lower surface of the upper electrode and the upper surface of a susceptor in the process chamber and to adjust the levelness of the lower surface of the upper electrode. The mounting and adjusting device and the semiconductor process equipment provided by the application can realize the relative levelness of the upper electrode and the susceptor and can adjust the vertical distance between the upper electrode and the upper surface of the susceptor according to the process requirement.

A vapor generation device is configured to heat a vapor generation article to generate an aerosol for inhalation, including: a cavity, configured to receive a vapor generation article; a susceptor, configured to be penetrated by a changing magnetic field and generate heat, to heat the vapor generation article received in the cavity; an extractor, at least partially received in the cavity and configured to extract the vapor generation article vapor generation article through movement in an axial direction of the cavity or removal from the cavity; an induction coil, configured to generate the changing magnetic field and held on the extractor; and a first electrical contact, configured to conduct with the induction coil when the extractor is received in the cavity, to supply power to the induction coil.

The present application provides an aerosol generation system and a control method. The aerosol generation system comprises: a susceptor for heating an aerosol-generating substrate to generate an aerosol; an LC oscillator comprising an induction coil and a capacitor, the LC oscillator being configured to guide an alternating current to flow through the induction coil, thereby driving the induction coil to supply energy to the susceptor so that the susceptor heats the aerosol-generating substrate; and a controller programmed to determine an alternating-current impedance of the susceptor by means of a resonance voltage of the LC oscillator, and further programmed to determine the temperature of the susceptor by means of the alternating-current impedance of the susceptor. According to the aerosol generation system, the working temperature of the susceptor is controlled by means of detecting the alternating-current impedance of the susceptor during operation.

Methods are described for performing microwave-driven pyrolysis reactions. The reactions utilize a catalyst comprising a microwave susceptor, silicon carbide. Exemplary microwave-driven pyrolysis reactions described include methane pyrolysis to produce hydrogen and solid carbon nanostructured products, such as graphene. Hydrogen can be produced from microwave-driven methane pyrolysis as described herein with improved conversion and stability and significantly higher energy efficiency than a thermally-driven pyrolysis reaction.