732 results about "Susceptor" patented technology

Described herein are susceptors, processing chambers having the susceptors, and methods of processing substrates using the susceptors. In one example, a susceptor for supporting a substrate during processing is provided. The base has a disc-shaped body that includes a side surrounding an interior region. The interior region is recessed to form a recessed pocket configured to receive a substrate. A plurality of bumps extends radially into the interior region, the bumps configured to contact an outer edge of the substrate when the substrate is disposed in the recessed pocket. A vent region is defined within the interior region. The vent region is defined by a plurality of vent holes formed through the body. The vent region terminates at a radius from a centerline of the body that is at least 4.0 mm less than a radius of an inner wall defining the edge.

A method of processing waste consumable aerosol-generating articles by pyrolysis, the method comprising the steps of: feeding waste consumable aerosol-generating articles into a pyrolysis reactor, the aerosol-generating articles comprising at least some aerosol-generating articles comprising an aerosol-generating substrate with a metallic susceptor; heating the aerosol-generating articles in the pyrolysis reactor to a temperature sufficient to cause pyrolysis of non-metallic components of the aerosol-generating articles into gaseous products and char, wherein the temperature is less than a melting temperature of the metallic susceptors; extracting the gaseous products from the pyrolysis reactor and feeding the gaseous products to a condensing separator; and feeding the char from the pyrolysis reactor to a magnetic separator and separating the metallic susceptors from the char by applying a magnetic field; wherein at least some of the heat in the pyrolysis reactor is generated by applying an alternating electromagnetic field to the aerosol-generating articles so as to induce eddy currents in the metallic susceptors.

The invention provides an induction heating device, an aerosol generation system and a control method, and the device is used for heating an aerosol generation product comprising a magnetic metal receptor, and comprises an AC power supply module, an excitation winding, a detection winding and a voltage measurement module. After the aerosol generating product is loaded to the induction heating device, the magnetic metal receptor contained in the aerosol generating product is located in the space of the excitation winding; the length direction of the magnetic metal receptor is parallel to the axes of the excitation winding and the detection winding; the Curie temperature of the magnetic metal is higher than 200 DEG C; the temperature measurement precision is high, the influence of parasitic parameters of components on the measurement precision is eliminated, the influence of position change of the magnetic metal receptor on measurement is reduced, and the defects of airflow obstruction, heating interference and energy consumption increase in temperature measurement of an existing active sensor are overcome.

The invention provides semiconductor process equipment and a semiconductor cavity thereof. The semiconductor chamber comprises a chamber body which comprises a reaction space and an air exhaust space; the air inlet assembly is arranged at the top of the chamber body and is provided with an air outlet communicated with the interior of the chamber body; a reaction space is defined by the base, the shielding piece and the air inlet assembly, and the shielding piece is provided with a plurality of air exhaust holes communicating the reaction space with the air exhaust space of the cavity body; the shielding piece comprises an inner peripheral side wall and an outer peripheral side wall which are coaxially arranged, and the diameter of the inner peripheral side wall is smaller than that of the outer peripheral side wall; and at least one air exhaust hole is distributed in the inner peripheral side wall.

An aerosol-generating device is provided, including: a housing defining a chamber configured to receive at least one susceptor and at least one aerosol-forming substrate, the chamber having a length along a longitudinal axis thereof extending from a first end of the chamber to a second end of the chamber; and an inductor coil provided within the housing, disposed around the chamber, and extending along at least a portion of the length of the chamber, the inductor coil including a first portion disposed closest to the first end of the chamber, a second portion disposed closest to the second end of the chamber, and a third portion disposed between the first and the second portions, and a number of turns per unit length in the third portion is less than a number of turns per unit length in one or both of the first and the second portions.

The present disclosure relates to a ceramic susceptor including a ceramic plate having an electrode disposed thereon, wherein the ceramic plate may include an electrode pad connected to the electrode and an electrode rod having one end connected to the electrode pad to supply power to the electrode, and the electrode rod may include an extension part connected to the electrode pad and a power connection part provided at an end of a tapered portion of the extension part.

Various embodiments of the present technology may provide an apparatus having a susceptor with a plurality of gas channels therethrough and a plurality of pressure sensors coupled to the gas channels. The apparatus may further include a controller in communication with the plurality of sensors and configured to detect a change in pressure or flow rate within the plurality of channels, determine a failure of at least one of the plurality of lift pins based on the detected change in pressure or flow rate, and generate an error signal based on the determined failure.

Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and / or thickness) profiles of material on a substrate surface.

A method is provided for recycling an aerosol generating article comprising a non-liquid aerosol generating material and an inductively heatable susceptor. The method comprises a first step of shredding the aerosol generating article to break up the non-liquid aerosol material and the inductively heatable susceptor. The method comprises a second step of separating the inductively heatable susceptor and the non-liquid aerosol generating material.

The present application relates to an aerosol-generating product and an aerosol-generating system comprising the same, the aerosol-generating product comprising: a support assembly configured as a tubular structure, the support assembly comprising a susceptor or a heat conductor; the aerosol generating substrate layer is arranged in a continuous ring shape or a discrete ring shape in the circumferential direction of the supporting assembly, and the aerosol generating substrate layer is arranged on the surface of the susceptor or the heat conductor.

The convertible container, carton, or tray and method of use for microwave ovens including a cooking portion and a base portion. The cooking portion defines a quadrilateral panel which may include a susceptor material, the cooking portion including at least one diagonal fold line defining at least one corner tab. The base portion is configured to support the cooking portion in an elevated position. The base portion includes at least one invertible corner configured to transition from a first configuration defining a near-orthogonal external angle, to a second configuration defining a near-orthogonal internal angle to reduce a diagonal dimension of the convertible container to enable rotation within the confines of a microwave.

A method for forming a film, including: atomizing a raw material solution into a mist to form raw material mist; mixing raw material mist and a carrier gas to form gas mixture; placing a substrate on a placement section of susceptor; supplying gas mixture from an atomizer to the substrate to perform film formation by thermal reaction on substrate; and discharging gas mixture after the film formation through an exhaust unit, wherein in the step of supplying the gas mixture from atomizer to substrate to perform film formation by thermal reaction on the substrate, at least a part of gas mixture is supplied from a smooth section adjacent to placement section to a surface of substrate, the smooth section having a surface roughness of 200 μm or less. A method for forming a film capable of uniformly and stably producing a high-quality film on a surface of a large-diameter substrate.

Disclosed are a susceptor for enabling uniform plasma treatment over the entire surface of a wafer, and a manufacturing method therefor. Provided is the susceptor comprising: a dielectric plate having an upper surface on which a wafer is loaded, and a lower surface facing same; and an inner RF electrode and an outer RF electrode that are buried in the dielectric plate, wherein, with respect to the lower surface, the height of a first plane in which the inner RF electrode is buried is less than the height of a second plane in which the outer RF electrode is buried.

An apparatus (2) for an aerosol provision device, the apparatus comprising a central controller (4) and a plurality of induction cells (7a-c). Each induction cell of the plurality of induction cells (7a-c) comprises a resonant circuit (6a-c) comprising an inductive element (8a-c) and a capacitive element (10a-c) configured to inductively heat a susceptor, and a local controller (12a-c). The local controller (12a-c) is configured to: receive one or more commands from the central controller (4); perform at least one action based on the one or more commands received from the central controller (4); and send feedback to the central controller (4).

An aerosol-generating device (12) comprising a cavity (41) configured to removably receive at least a portion of an aerosol-generating article comprising an aerosol-forming substrate. The aerosol-generating device (12) comprising an inductor (42) configured to generate an alternating magnetic field in the cavity (41) to heat a susceptor in the aerosol-generating article; a power supply (44) for supplying power to the inductor (42); and power control electronics (43) configured to control power supplied from the power supply (44) to the inductor (42) to generate an alternating magnetic field in the cavity (41). In a first mode the power control electronics (43) are configured to: supply a monitoring power to the inductor (42) to monitor an electrical quantity response to the monitoring power; detect whether the monitored electrical quantity meets a predetermined condition that indicates a puff; and if the monitored electrical quantity meets the predetermined condition, to supply a heating power to the inductor (42) to heat the susceptor to generate an aerosol from the aerosol-forming substrate.

A susceptor for processing a substrate is provided, comprising a base and a coating formed over the base. The base includes an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge, and an inner dish disposed within the outer rim and coupled to the outer rim, the inner dish being recessed from the top of the outer rim and having a front surface and an opposite back surface. The coating has an outer surface including a first portion formed over the front surface of the inner dish. The first portion of the outer surface of the coating includes a first region and a second region, the first region having a first average level of roughness and the second region having a second average level of roughness.

A substrate processing apparatus according to one embodiment of the present invention may comprise: a process chamber in which a processing space is formed; and a controller for controlling same. The controller can control that a warpage compensation layer in which a main layer and a buffer layer are alternately stacked at least once on one surface of the substrate loaded on the susceptor in the process chamber is formed such that the density of the buffer layer is lower than that of the main layer.

There is described an aerosol-forming substrate for use in combination with an inductive heating device. The aerosol-forming substrate comprises a solid material which is capable of releasing volatile compounds that can form an aerosol upon heating of the aerosol-forming substrate and at least a first susceptor material for heating the aerosol-forming substrate. The at least first susceptor material is arranged in thermal proximity of the solid material. The aerosol-forming substrate further comprises at least a second susceptor material which has a second Curie-temperature which is lower than a first Curie-temperature of the first susceptor material. The second Curie-temperature of the second susceptor material corresponds to a predefined maximum heating temperature of the first susceptor material. There is also described an aerosol-delivery system.

The application discloses a semiconductor process chamber, which comprises a chamber body, a susceptor and a first inner liner, wherein the susceptor is arranged in the chamber body, the first inner liner is movably arranged in the chamber body, the first inner liner is arranged around the susceptor and between the susceptor and the chamber body; when a deposition process is performed in the semiconductor process chamber, the first inner liner is moved to a first position, at least a part of the first inner liner is higher than a bearing surface of the susceptor; when an etching process is performed in the semiconductor process chamber, the first inner liner is moved to a second position, the first inner liner is lower than the bearing surface or flush with the bearing surface. The above scheme can solve the problem that in the related art, when an etching process is performed in a process chamber, a film layer deposited on the inner wall of the chamber is easy to fall on a wafer, thereby causing pollution to the wafer.

The invention relates to the technical field of sputter coating, in particular to a VOx thin film steady-state growth gas inlet device based on quick response gas control, which is used for injecting reaction gas into a reaction cavity in a VOx thin film sputtering system, a base and a heater arranged in the base are arranged in the reaction cavity, the gas inlet device comprises a reaction gas conveying channel and a gas inlet hole, the conveying channel is connected with an external gas source and conveys reaction gas to the reaction cavity, and the conveying channel is arranged below the base; the air inlet holes are formed in the base table top and communicated with the conveying channel, and the distribution of the air inlet holes in the base table top is that the density of an edge area below a wafer is larger than that of a central area. According to the invention, the inherent deposition non-uniformity of the edge and the center of the wafer is compensated through the non-uniform air inlet holes, so that the uniformity of the film is improved on the whole; the oxygen partial pressure adjusting rate is increased through a shortened gas conveying path, the target voltage fluctuation range is narrowed, and finally steady-state control is achieved.

The utility model provides an edge ring flatness detection device which is applied to a vapor deposition chamber, the vapor deposition chamber comprises a base and an edge ring located at the edge of the base, a heater is arranged in the base and is used for heating the base, and the edge ring flatness detection device comprises a detection main body and a control device, the contact indication structure surrounds the edge of the detection main body; wherein the projection of the detection main body along the vertical direction coincides with the projection of the base along the vertical direction; the positioning rotating device is positioned on the detection main body and is used for positioning the detection main body to a preset position on one side, deviating from the heater, of the base, and the outer edge of the detection main body is matched with the outer edge of the base at the preset position; and the detection main body is rotated at the preset position. According to the embodiment of the invention, the flatness of the edge ring can be detected, so that the deposition effect of substrate film deposition is improved.

A substrate processing apparatus according to an example embodiment includes a chamber having a sidewall, a susceptor having an inclined side surface and mounting a substrate inside the chamber, an upper dome covering an upper surface of the chamber and formed of a dielectric material, a lower dome covering a lower surface of the chamber and formed of a dielectric material, and a liner disposed inside the chamber and disposed between the upper dome and the lower dome. The liner may include an inclined portion having an inclined inner side surface opposing the included side surface of the susceptor.

A method, performed by an aerosol-generating device, of determining a temperature model of a susceptor, includes applying a first signal having a first frequency to a coil of a heater so that an alternating magnetic field is generated, determining a first value of an electrical characteristic of a susceptor indicated by the first signal, applying a second signal having a second frequency to the coil of the heater so that an alternating magnetic field is generated, determining a second value of the electrical characteristic of the susceptor indicated by the second signal, and determining a first temperature model for the susceptor based on the first value and the second value, wherein the first temperature model may be a model used for determining a temperature of the susceptor based on the electrical characteristic of the susceptor.

The utility model belongs to the technical field of reduction furnace chassis cleaning, and particularly relates to a chassis junction silicon cleaning tool which comprises a supporting cover, handles are fixedly connected to the front side and the rear side of the supporting cover respectively, a rotating pipe is installed on the inner wall of the supporting cover through a bearing, and a spray pipe is fixedly connected to the lower side of a cross pipe of the rotating pipe. And the cross pipe of the rotating pipe and the supporting cover are jointly provided with a guide mechanism. According to the scheme, through the arrangement of the air supercharger, the spray pipe and other structures, air can be sprayed in a pressurized mode, under the action of the second belt wheel, the servo motor and other structures, the spray pipe can rotationally spray high-pressure air, then silicon attached to the surface of an electrode tip of the reduction furnace chassis is efficiently cleaned, and under the action of a negative pressure dust collector, the cleaning efficiency is improved. And silica fume and the like can be absorbed and treated in time, and the rotating pipe can be rotationally guided under the action of a guide ring groove, a guide ball and the like, so that stable rotation of components such as a spray pipe and the like is ensured.

The present invention relates to a susceptor, and in the ceramic susceptor of the present invention, a multi-layered structure of a heating element pattern is arranged in a manner that circular arc portions do not overlap, or a straight line section of the heating element is arranged at different angles with respect to the center in different layers, or even in a single layer structure of the heating element pattern, a straight line section of the heating element is arranged at different angles with respect to the center, thereby improving the temperature uniformity in the entire area of the upper surface of the susceptor.

Provided is a technique capable of quickly controlling the temperature of a substrate or a substrate support. The substrate support includes: a susceptor including a flow path for a temperature control medium to flow; a support portion disposed on the susceptor, the support portion including a front surface that supports a substrate and a back surface; and a heat flux sensor disposed on the back surface of the support portion.

The invention relates to a crucible assembly for physical vapor deposition on a surface, the crucible assembly comprising: - a susceptor (22) for supporting and driving a crucible (18) in rotation about an axis of rotation (A), the susceptor comprising a susceptor upper surface (34) having a first alignment relief (30), - a crucible (18) comprising: - at least one cavity (24) arranged at a peripheral region (38) of the crucible (18) with respect to the axis of rotation (A), - a crucible bottom surface (25) intended to contact the susceptor upper surface (34) of the susceptor (22), the crucible bottom surface (25) having a second alignment relief (32) complementary in shape with respect to the first alignment relief (30), the second alignment relief (32) being arranged at a central region (36) of the crucible (18) with respect to the axis of rotation (A).

The application provides a smoking body and a smoke cartridge. The smoking body comprises a smoking main body and a susceptor. The smoking main body comprises a plurality of wire bodies in contact with each other and extending along a preset direction; the wire bodies contain aerosol substrates; the susceptor is a metal wire containing a magnetic metal; the metal wire and the smoking main body are in contact, and when the susceptor generates heat through electromagnetic induction, the heat is transferred to the smoking main body to heat the smoking main body. The metal wire extends around the axis of the smoking main body, and the metal wire is dispersedly arranged on the smoking main body, so that the metal wire as a heater is uniformly distributed in the smoking main body, effectively avoiding local overhigh temperature of the smoking body, improving the taste of smoking, and thus improving the experience of users.

This fusion bonding method for fusion bonding a second member to a first member comprises an arrangement step and a scanning step. The arrangement step is for arranging a susceptor on the side of the second member opposite to the surface that faces a repair target area of the first member, the second member being arranged according to the repair target area, and a heat transfer member being interposed between the susceptor and the second member. The scanning step is for scanning a magnetic field generation device along the surface of the susceptor from the side of the susceptor opposite to the surface facing the heat transfer member after completion of the arrangement step. The susceptor is a member that generates heat by the magnetic field of the magnetic field generation device in the scanning step.

The present invention relates to a susceptor assembly and a chemical vapor deposition apparatus, and more particularly, to a susceptor assembly and a chemical vapor deposition apparatus capable of reducing temperature deviation of a substrate when depositing a silicon carbide (SiC) film and the like on the substrate.