335 results about "Pyrometer" patented technology

An object of the invention is to calibrate an upper pyrometer for indirectly measuring a substrate temperature at the time of epitaxial growth in a comparatively short time and with accuracy to thereby improve the quality of an epitaxial substrate. After calibrating an upper pyrometer by a thermocouple mounted to a temperature calibrating susceptor, a measured value of a lower pyrometer is adjusted to a calibrated value of the upper pyrometer. Then, a correlation line between substrate temperature indirectly measured by the upper pyrometer at the time of epitaxial growth onto a sample substrate and haze of a sample substrate measured immediately after epitaxial growth is set to indirectly measure a substrate temperature by the upper pyrometer at the time of epitaxial growth onto a mass-production substrate. Moreover, substrate temperature at the time of epitaxial growth onto the mass-production substrate is estimated by applying the haze of the mass-production substrate measured immediately after epitaxial growth to the correlation line and then a measured temperature of the upper pyrometer is adjusted to the estimated temperature.

In a system for thermal processing of a semiconductor substrate, an RTP system employs a reflector plate which is highly reflective of radiation in a target wavelength range, and less reflective of radiation outside that target wavelength range. In one embodiment, the reflector plate has a highly reflective portion overlying a less reflective portion, wherein the highly reflective portion is highly reflective of radiation in the target wavelength range. As radiation emitted by the substrate is received on the reflector, the radiation in the target wavelength range is reflected, thereby facilitating measurement of the substrate temperature by the pyrometer(s), while radiation outside the target wavelength range is absorbed, thereby facilitating cooling of the substrate.

The invention provides a steam oven with multiple operating modes, which is characterized in that it includes a box body, the box body includes a steam oven room and a control room; a steam oven module, the steam oven module includes a heating tube, a steam generating device, spiral fan and infrared thermometer; humidity adjustment detection module, said humidity adjustment detection module includes dryer, humidifier and humidity detector; menu editing storage module, said menu editing storage module includes menu memory and U disk Reading port; central temperature detection module, the central temperature detection module is used to provide food internal temperature detection; control module, the control module includes a camera, a timer, an alarm, a controller and a central processing unit, the control module Modules are used to provide operational control. The present invention has multiple operation modes through the arrangement of each module, can meet the diversified requirements of food processing, and has high processing efficiency.

Tunnel is provided for conditioning of food products, especially for sterilization of food in containers or vessels of the heat-sealed type, in which the conditioning unit has: 1) an active temperature and pressure control system provided in at least one magnetron supported heating stage, which provides for balancing of the pressure within the heat-sealed vessels or containers; 2) a conveyor which conveys the heat-sealed vessels or containers through the stages along the conditioning unit which contains mechanisms that move the conveyor outside of the conditioning tunnel, and 3) doors operating like check valves that separate the conditioning stages, but still provide for continuous linear feed of products through conditioning tunnel. In preferred embodiment, the conditioning tunnel in includes a plurality temperature sensors, such as linear pyrometers for measuring the temperature of for mapping the temperature of products within the tunnel Moreover, preferably the conveyor is adjustable to move forward and rearward, and the magnetrons, which preferably operate at approximately 915 Mhz and 2400 Mhz, are adjustable to provide a controllable movement and amplitude. A controller is connected to the temperature sensors, conveyor and magnetrons to cause the conveyor to move products forward or rearward, or cause the magnetrons to move the magnetic field relative to the food products to more thoroughly and evenly cook the food products. Movement of the magnetron electromagnetic field and/or conveyor is controlled by software which utilizes the temperature and/or density measurements in a closed loop process to ensure uniform heating of the products.

Systems that measure temperatures of tissue during electrosurgery or laser therapy of the tissue or organs is provided. One system provides a pyrometer that measures infrared electromagnetic energy emitted by a surface of a tissue or organ thereby determining a sub-surface temperature of the tissue or organ. The system further has an energy generator and an ablation electrode or laser probe that delivers energy from the energy generator to a tissue or organ, responsive to a sub-surface temperature determined by the pyrometer. The pyrometer can be calibrated using a luminescent material having known optical properties as a function of temperature. The luminescent material can be positioned on the surface of the tissue or organ or inserted directly into the tissue or organ using a catheter. Methods in which the surface or sub-surface temperature of the tissue is measured during therapy are also provided.

A prepn. method of silicon thin film heterojunction solar cell includes following steps: cleaning substrate, semiconductor cleaning technology is used to do primary cleaing to substrate surface, then do ultrasonic cleaning in deionized water several times; nitrogen blow drying; prepare nitrinsic amorphous silicon layer by heater chemical vapour phase depositing technology, tungsten filament temp. is measured by pyrometer, temp of heater and sample are determined separately by two electric thermo-couples, temp. is controlled by electric temp. controller; to react and grow thin film on substrate surface; to redeposit a transmitting layer on intrinsic amorphous silicon thin film; front and back electrodes forming, sputtering technology is used to form front and back electrodes; finally to proceed vacuum heat annealing process. The thin film produced by the invention has illumination stability, the photoconduction gain can reach to 10 to the power 6 on Am1.5 100mW/cm2 standard illumination.

A method and system are disclosed for determining at least one optical characteristic of a substrate, such as a semiconductor wafer. Once the optical characteristic is determined, at least one parameter in a processing chamber may be controlled for improving the process. For example, in one embodiment, the reflectivity of one surface of the substrate may first be determined at or near ambient temperature. From this information, the reflectance and/or emittance of the wafer during high temperature processing may be accurately estimated. The emittance can be used to correct temperature measurements using a pyrometer during wafer processing. In addition to making more accurate temperature measurements, the optical characteristics of the substrate can also be used to better optimize the heating cycle.

A direct metal deposition (DMD) process is stabilized by monitoring the temperature and the shape of the melt pool during deposition, applying a recursive least square (RLS) model estimation algorithm to adaptively identify process characteristics in accordance with the temperature and the shape of the melt pool, and delivering the process characteristics to a generalized predictive controller with input constraints to control the process. The process may be controlled by adjusting laser power or by adjusting the speed of the movement of the laser. In the preferred embodiment the temperature is monitored using a two-color pyrometer, and the shape of the melt pool is monitored by detecting the edge of the melt pool with a camera and/or photodetector.

A rapid thermal processing (RTP) system including a transmission pyrometer monitoring the temperature dependent absorption of the silicon wafer for radiation from the RTP lamps at a reduced power level. A look-up table is created relating unnormalized values of photodetector photocurrents with wafer and radiant lamp temperatures. A calibrating step measures the photocurrent with known wafer and lamp temperatures and all photocurrents measured thereafter are accordingly normalized. The transmission pyrometer may be used for closed loop control for thermal treatments below 500° C. or used in the pre-heating phase for a higher temperature process including radiation pyrometry in closed loop control. The pre-heating temperature ramp rate may be controlled by measuring the initial ramp rate and readjusting the lamp power accordingly. Radiation and transmission pyrometers may be included in an integrated structure with a beam splitter dividing radiation from the wafer.

A linear model based generalized predictive control system controls the molten pool temperature during a Direct Metal Deposition (DMD) process. The molten pool temperature is monitored by a two-color pyrometer. A single-input single-output linear system that describes the dynamics between the molten pool temperature and the laser power is identified and validated. The incremental generalized predictive control algorithm with Kalman filter estimation is used to control the molten pool temperature.

A method and apparatus for acquiring battery temperature measurements using stereographic thermal imaging sensors or a simple single thermal imaging sensor which can detect increases in battery heat within the field of view of any single thermal sensor, or any combination of a plurality of thermal imaging sensors is presented. Infrared Detection (ID) using the thermal imaging sensor (pyrometer) is used to focus on certain parts of a housing thereby providing an ability to “see through” or “partially see through” the battery housing to battery cells enclosed by the battery housing. Advantageously, this affords the unique capability of measuring the battery temperature before heat propagates from an individual battery cell or a plurality of battery cells to the battery housing, allowing faster heat gradient detection. Moreover, universality of battery temperature monitoring is achieved by elimination of proprietary communication between the manufacturer of the battery and the charger.

In a system for thermal processing of a semiconductor substrate, a reflector plate has a stepped surface facing the substrate during heating and cooling of the substrate. The raised surface of the reflector plate has reduced reflectivity, providing advantages during, among other things, cooling of the substrate. The reflector plate also includes a number of recesses to which one or more pyrometers are coupled. These recesses have a highly reflective surface, providing advantages in the performance of the pyrometers.

A system and method for calibrating a pyrometer used in temperature detection in a chemical vapor deposition system is provided. A calibration wafer with a reference region including a metal such as Al or Ag for forming a eutectic, and an exposed non-reference region without such a metal, are provided. Reflectivity measurements are taken from the reference region, and temperature measurements are taken from the non-reference region, over a range of temperatures including a known melting point for the metal eutectic. The pyrometer is calibrated based on the correlation of the known eutectic melting point with the change in reflectivity data obtained in the reference region, in light of the temperature data obtained from the non-reference region.

A system for measuring the true temperature of a substrate in a deposition system is disclosed. The temperature measurement system has at least one opening formed within a showerhead or manifold placed above a substrate of the deposition system. The temperature measurement system includes an optical pyrometer and reflectometer external to the coating chamber that looks through a window or windows and through the at least one opening in the showerhead to sense the substrate being coated. Depending on the particular chamber and showerhead configuration, the system either makes a passive emissivity correction or has an integral reflectometer for an active emissivity correction. Optical features confer an insensitivity to small motions of the showerhead in large coaters where optical alignment is not assured due to thermal and mechanical influences.

Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber.

A method of in-situ pyrometer calibration for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of positioning a calibrating pyrometer at a first calibrating position and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating the support element about the rotational axis, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer installed at a first operating position, and obtaining first calibrating temperature measurements from the calibration pyrometer. Both the calibrating pyrometer and the first operating pyrometer desirably are adapted to receive radiation from a first portion of a wafer support element at a first radial distance from a rotational axis of the wafer support element.

The system uses a color camera and an optical system to map two colors emitted from an object such as a furnace, boiler combustion zone, or burner flame into a temperature image. The color camera utilizes a color video chip with interspersed pixels for each color to reduce alignment issues and utilize the same optical path. In addition, the optical system utilizes a dual band pass optical filter thereby eliminating the number of optical elements and minimizing radiation loss through the optical system thereby improving the dynamic range of the system.

The object of the invention is to measure temperature using pyrometers, in a simple and economic way, enabling precise temperature measurement, even for low temperatures. The invention presents a device and method for thermally treating substrates, wherein the substrate is exposed to at least a first and at least a second radiation; the predetermined wavelengths of the first radiation are absorbed between the first radiation source and the substrate; a radiation from the substrate is measured in the predetermined wavelength using a radiation detector arranged on the same side as a second radiation source; the second radiation from the second radiation source is modulated and determined.