121 results about "Reflectivity measurement" patented technology

The invention discloses a microwave link-weather radar combined rainfall inversion method based on Z-R relation adaptive adjustment, and the method comprises the steps: defining a related parameter set of microwave link rainfall estimation and weather radar reflectivity measurement in observation time, and carrying out the matching and space-time averaging processing, and obtaining rainfall intensity-radar reflectivity characteristics; fitting a radar reflectivity-rainfall intensity relation within observation time by using a least square method based on the rainfall intensity-radar reflectivity characteristics; according to the radar reflectivity-rainfall intensity relation sample of the known position, calculating the spatial distribution of the radar reflectivity-rainfall intensity relation in the research area by using an inverse distance weighted interpolation method; and according to the spatial distribution of the radar reflectivity-rainfall intensity relationship within the observation time and the average reflectivity factor measured by the radar, calculating to obtain a spatial distribution result of the accumulated rainfall within the observation time. According to the invention, the accuracy of regional rainfall monitoring is effectively improved.

The invention relates to the technical field of semiconductor critical dimension measurement, and particularly provides a device compatible with critical dimension small-angle X-ray scattering measurement and X-ray reflectivity measurement, which comprises an SAXS light source unit, an XRR light source unit, an SAXS detection unit, an XRR detection unit and a multi-degree-of-freedom sample table for bearing a sample and driving the sample to rotate, the SAXS measuring light and the XRR measuring light are perpendicular to each other in light path intersection point positions on the multi-degree-of-freedom sample table, the SAXS measuring light is transmitted and passes through a measuring point, the XRR measuring light is reflected by the measuring point, and when the multi-degree-of-freedom sample table rotates to a preset angle range, the SAXS detection unit and the XRR detection unit can synchronously perform SAXS measurement and XRR measurement on a sample, so that the SAXS measurement and the XRR measurement are synchronously performed. The consistency of data obtained by two measurement technologies in spatial positions is ensured, extra time required for transferring samples among different measurement systems is also avoided, and CD-SAXS measurement and XRR measurement of the same measurement point can be simultaneously and synchronously realized through one device.

The invention discloses a spatial position and reflectivity information extraction device and method based on a hyperspectral camera, and relates to the field of hyperspectral imaging, and the device comprises an upper computer, a three-dimensional imaging module, a sliding module, a holder and a connecting frame. The three-dimensional imaging module, the connecting frame, the holder and the sliding module are connected in sequence. The three-dimensional imaging module comprises a first line scanning hyperspectral camera and a second line scanning hyperspectral camera; the upper computer is respectively connected with the first line scanning hyperspectral camera and the second line scanning hyperspectral camera; the upper computer determines three-dimensional space position information of the target object based on the characteristic wave band according to the first hyperspectral image and the second hyperspectral image; according to the height value of the target object, determining 100% white board spectral irradiance by using a white board height correction formula; and determining the reflectivity of the target object by using a reflectivity calculation formula. The method can adapt to object reflectivity measurement in different light intensity environments and at different heights, and extra equipment is not needed for data fusion.

An optical sensor device configured for use in combination with a fluid flowing through a tubing, the optical sensor device includes a light source configured to emit a light, with at least a portion of the light being exposed to a fluid in the tubing and reflected, an optical sensor configured to receive at least a portion of the reflected light and analyze at least a portion of the received reflected light to determine a reflectance measurement, and a controller configured to correlate the reflectance measurement to an input particulate level and generate an output indicative of the fluid flow rate corresponding to the reflectance measurement. Also disclosed is a method of optically measuring fluid flow rate in a fluid processing system including optically monitoring fluid flow through a transparent portion of a tubing by measuring light reflectance of particles in the fluid.

The invention discloses a Mo / Si reflector reflectivity measurement system and method based on an acousto-optic monochromator, the system comprises an EUV light source, an EUV energy meter, a monochromator and an EUV reflectivity meter, the EUV light source is used as a detection light source, the EUV energy meter is used for monitoring the fluctuation condition of the EUV light source and providing a light source fluctuation calibration coefficient for reflectivity measurement, the monochromator screens light based on the acousto-optic effect of an acousto-optic crystal, and the EUV reflectivity meter is used for measuring the reflectivity of the EUV light source. It is ensured that the EUV reflectivity meter only receives light with the required wavelength; the EUV reflectivity meter serves as a measurement space of a Mo / Si reflector sample, mechanical design is adopted, the size of the EUV reflectivity meter is reduced, meanwhile, a collimation optical system is added, and the accuracy of a measurement result is improved. The invention further provides a measurement method, accurate measurement of the angular spectrum and the reflection spectrum of the Mo / Si reflector is achieved, an effective technology is provided for measurement and development of the Mo / Si reflector, and therefore the EUV photoetching technology is continuously improved.

The present invention proposes a fitting method for the ultra-low reflectivity of optical coatings to solve the technical problem of large measurement errors in the ultra-low reflectivity of optical coatings. The steps of the present invention are as follows: simulating and calculating the effective refractive index of the waveguide of an uncoated FP laser chip at both ends to obtain the reflectivity of the uncoated FP laser chip and air; performing a P-I test on the uncoated FP laser chip at both ends to obtain a threshold current; performing an ultra-low optical coating on one end of the uncoated FP laser chip to obtain a laser chip with one end coated; applying different current values ​​to the laser chip with one end coated according to the threshold current and testing the corresponding spectral curves; using the spectral curves under different current values, the reflectivity of the ultra-low optical coating is obtained according to the reflectivity fitting. The present invention can accurately estimate the ultra-low reflectivity of the optical coating, playing a decisive role in the optimization of SLD and SOA products.

The invention provides a soil organic matter content prediction method based on hyperspectrum, and relates to the technical field of hyperspectrum prediction. The method comprises the following steps: firstly, collecting and treating a soil sample, and carrying out SOM content measurement and soil spectral reflectivity measurement; the soil spectral reflectivity data are preprocessed, and spectral noise and redundant information are eliminated; secondly, preliminarily screening characteristic wave bands by adopting an improved spotted serow optimization ISHO algorithm, and then carrying out secondary screening on the characteristic wave bands by utilizing an iterative reserved information variable IRIV algorithm; and finally, establishing a hyperspectral prediction model to predict the SOM content, and evaluating the precision of the model. According to the method, the ISHO algorithm and the IRIV algorithm are adopted to perform characteristic wave band selection on the spectral reflectivity data, and the XGBoost method is adopted to establish the SOM content prediction model, so that the precision of the prediction model is improved, and theoretical and technical support is provided for SOM content monitoring.

The invention discloses a plant leaf reflectivity detector, and aims to accurately measure the reflectivity of a plant leaf so as to evaluate the nitrogen content and guide scientific fertilization. The detector is composed of a main shell, an auxiliary shell, a main control board, a display module, an acquisition mechanism, a handheld shell and the like, an optical system is built through a mechanical structure system, an electrical control system controls AD acquisition, LED start and stop and optical filter wheel rotation, and reflectivity measurement is achieved. The uniquely designed optical filter wheel is made of aluminum alloy, so that the stable operation of the system is ensured; the shell is made of resin materials, so that protection performance is improved, and portability is achieved. The operation process comprises the steps of startup initialization, zero calibration, measurement of a standard whiteboard and plant leaves, and data query and analysis. In addition, the detector has maintenance measures such as regular cleaning, battery maintenance and safe storage, and long-term stable operation is ensured.

An anti-glare film is attached on a surface of a display, and includes an anti-glare layer. The anti-glare layer is set to have a sparkle value falling within a range from 6 to 10, which is defined based on a value of a standard deviation of luminance distribution of the display under a state in which the anti-glare film is attached on the surface of the display, a value of specular gloss of 30% or less, which is measured with 60-degree specular gloss, a value of transmission image clarity of 60% or less, which has an optical comb of 0.5 mm, and a haze value of 50% or less. Consequently, satisfactory anti-glare property can be provided while appropriately suppressing sparkle on the display.

The invention discloses an infrared temperature measurement error compensation method and system in a dust environment, and the method comprises the following steps: collecting an infrared image of power transmission and transformation equipment in the dust environment through a thermal infrared imager, and synchronously recording environment parameters, including environment temperature, humidity, reflectivity / measurement distance and dust particle physical characteristics; preprocessing the infrared image, including graying, noise filtering and dust coverage area segmentation, classifying according to dust interference types, and extracting statistical characteristics of the infrared image; the method has the beneficial effects that the precision advantage is as follows: experimental data shows that when the dust concentration is 500mg / m < 3 >, MAE is reduced to + / -1.5 DEG C from + / -4.5 DEG C of a traditional method and is increased by 66.7%; dynamic adaptability: model online updating and threshold dynamic adjustment ensure stability (error fluctuation is less than + / -0.8 DEG C) under sudden dust or load fluctuation; and the operation and maintenance efficiency is as follows: the defect positioning time is shortened from 15 minutes to 3 minutes by AR assistance, and the inspection efficiency is improved by 80%.

The invention relates to a wide-spectrum polarization reflectivity measuring system, and belongs to the technical field of optical measuring equipment, and the measuring system comprises a mounting table which is used for placing a to-be-measured sample; the light source is used for providing incident light; the transmission assembly comprises a transmission module, a polarization module and a microscope objective, the transmission module comprises a first semi-transparent and semi-reflective mirror and a second semi-transparent and semi-reflective mirror, the second semi-transparent and semi-reflective mirror is used for reflecting incident light to a sample to be detected, and the polarization module and the microscope objective are sequentially arranged on a light path between the second semi-transparent and semi-reflective mirror and the sample to be detected; and the light collecting direction of the spectrograph is arranged towards the first output light path of the first semi-transparent semi-reflecting mirror. The method has the effect of improving the accuracy of the measurement result of the polarization reflectivity of the to-be-measured sample in a wide spectral range.

Embodiments of the present disclosure relate to reflectivity sensing using a time-of-flight camera. Techniques for obtaining reflectivity measurements using a time-of-flight (ToF) measurement device. An example method includes: obtaining distance measurements using one or more pixels in a ToF sensor; obtaining intensity measurements corresponding to the distance measurements using one or more pixels; and calculating a reflectivity value based on the distance measurements, the intensity measurements, and a reflectivity calibration factor. In some embodiments, the calibration distance is obtained as follows: by measuring a reference distance to a calibration surface using a reference pixel in the ToF sensor and obtaining the calibration distance from the measured reference distance. In some embodiments, the reflectivity calibration factor is obtained as follows: by obtaining a reference intensity corresponding to the reference distance using the reference pixel and calculating the reflectivity calibration factor as a function of the reference intensity and the viewing angles of one or more pixels.

The application discloses a reflectivity measuring method, a laser radar device and a storage medium, and relates to the technical field of reflectivity measurement. The reflectivity measuring method comprises the following steps: acquiring the distance between a laser radar device and a measured object and the characteristic parameters of a return signal; acquiring a first preset characteristic relationship; and calculating the reflectivity of the measured object according to the first preset characteristic relationship. The first preset characteristic relationship is a corresponding relationship between the characteristic parameters and the reflectivity which is stored in advance. The measured object does not need to be moved multiple times to obtain different distances. According to the acquired first preset characteristic relationship, the reflectivity of the measured object at any distance can be directly calculated according to the characteristic parameters and the distance. The measuring method is simple, the calibration process is simple, and the measuring efficiency of the surface reflectivity of the measured object is improved.

The application provides an optical thin film reflectivity measurement system based on optical interference, comprising: a fiber end surface reflectivity test subsystem, which collects multiple sets of interference spectra by changing the cavity length distance between two fiber end surfaces and calculates the corresponding cavity length; fits the multiple sets of interference spectra based on a double-beam interference formula and calculates the measured reflectivity of the fiber end surface; compares the measured reflectivity with the standard reflectivity of the fiber end surface directly measured by a spectrometer, and obtains a relationship formula of the reflectivity compensation coefficient-cavity length through polynomial fitting; a graphene thin film reflectivity test subsystem, which collects multiple sets of interference spectra by changing the distance between the aligned single-mode optical fiber and the optical thin film, fits the interference spectra based on a double-beam interference formula, and thus calculates the measured reflectivity of the optical thin film; and a correction subsystem, which corrects the measured reflectivity of the optical thin film based on the expression of the reflectivity compensation coefficient to obtain the corrected reflectivity of the optical thin film. A corresponding measurement method is also disclosed.

The application discloses a laser chip end face reflectivity monitoring method and relates to the technical field of computer processing.The method comprises the following steps: S01, obtaining a chip end face to be monitored and inputting the chip end face to a preset micro area division model to obtain a plurality of micro areas of the laser chip end face and recording preset reflectivity standard values of each micro area; S02, using a high-precision reflectivity measuring device to obtain actual reflectivity measuring values of each micro area; and S03, determining reflectivity deviation conditions of each micro area according to a comparison between the actual reflectivity measuring values and the preset reflectivity standard values of each micro area and integrating micro area information containing the reflectivity deviation conditions into multi-area reflectivity distribution information.The application combines gridded reflectivity space analysis with multi-source data fusion technology and realizes micron-level precision monitoring of a chip patch coverage range.

1. Name of the Design Product: Radar Coating Material Vertical Reflectivity Measuring Device. 2. Use of the Design Product: It is used by grass-roots troops, mainly to achieve in-situ measurement of the vertical reflectivity of radar coating materials, and it is a ground support device for performance inspection under the use conditions of an uncontrolled environment site. 3. Design Key Points of the Design Product: Lies in the shape. 4. Picture or Photograph that Best Illustrates the Design Key Points: Perspective View 1.

The application discloses a coated fuel particle optical anisotropy detection method and device and computing equipment, and the method comprises the following steps: traversing a plurality of first field metallographic section images covering the whole metallographic sample to determine the image position information of each coated fuel particle and perform coordinate splicing to obtain a global coordinate map; based on the global coordinate map, the second field metallographic section image of each coated fuel particle is collected one by one; the second field metallographic section image is coated by a semantic segmentation model to define the coating, and then the coated fuel particle is subjected to measurability analysis to screen a plurality of target coated fuel particles; based on the layer definition image, the dense pyrolysis carbon layer region is extracted from the second field metallographic section image of the target coated fuel particle, and the measured region is selected therefrom to perform reflectivity measurement, so as to determine the optical anisotropy of the target coated fuel particle. The application can realize the automation and intelligentization of the coated fuel particle optical anisotropy detection process.

A method for measuring the thickness of a semiconductor structure includes illuminating the semiconductor structure with non-coherent and non-parallel light from at least one light source, and acquiring at least one image of the semiconductor structure illuminated by the light source using a camera. The at least one image includes separate images of a first color, a second color, and a third color, where the first, second, and third colors are distinct from each other. A thickness map is generated for at least two layers of the semiconductor structure based on the images of the first, second, and third colors and reference images of a reference silicon wafer in the first, second, and third colors.

The invention belongs to the technical field of radar radome testing, and discloses a radar radome equivalent panel reflectivity measuring method and device, and the method comprises the steps: installing a transmitting antenna and a receiving antenna on a straight line parallel to an equivalent panel, enabling the equivalent panel to rotate an angle towards the direction of the straight line where the transmitting antenna and the receiving antenna are located, and measuring the reflectivity of the equivalent panel. Then the angles of the transmitting antenna and the receiving antenna are rotated, so that the incident angle and the reflection angle of the transmitting antenna and the receiving antenna relative to the rotated equivalent flat plate are equal, a rectangular coordinate system is established by taking the rotating point of the equivalent flat plate as an original point, and according to the coordinates of the transmitting antenna and the receiving antenna in the rectangular coordinate system, a rectangular coordinate is established; calculating whether the incident angle is within the measurable range of the equivalent plate reflectivity; and finally measuring the reflectivity of the equivalent flat plate by using the transmitting antenna and the receiving antenna. According to the invention, the reflectivity test of the equivalent flat plate at different angles can be completed within the incident angle range, the dragging of the microwave cable is reduced, the interference to the microwave signal is avoided, the measurement frequency range is wide, the measurement speed is high, and the reproducibility is good.

A method of measuring a thickness of a semiconductor structure includes illuminating the semiconductor structure with the incoherent, uncollimated light from at least one light source, and capturing, using a camera, at least one image of the semiconductor structure illuminated by the light from the light source. The at least one image includes separate first color, second color, and third color images, the first, second, and third colors being different from each other. Thickness maps are produced for at least two layers of the semiconductor structure based on the first color, second color, and third color images and reference first color, second color, and third color images of a reference silicon wafer.

The invention discloses a method for measuring the specular reflectance of a tower type solar photo-thermal heliostat. The method comprises the following steps of: mounting a certain number of ultrasonic sensors on a heat absorption tower at a specified position below a heat absorber; measuring optical reflectivity and ultrasonic reflectivity by using a handheld optical reflectivity measuring instrument and an ultrasonic sensor, and constructing a data set; establishing a relationship between the ultrasonic reflectivity and the optical reflectivity; establishing a linear regression model of the relationship between the ultrasonic reflectivity and the optical reflectivity by using the measured data set, and solving a fitting coefficient through a least square method so as to obtain a fitted model; and detecting the heliostat to be measured by using an ultrasonic sensor, substituting the obtained ultrasonic reflectivity into the fitted model, and calculating to obtain the optical reflectivity of the heliostat to be measured. The method disclosed by the invention is simple and convenient to operate and high in measurement speed, reduces the measurement cost of the reflectivity of the heliostat, and does not affect the normal work of a heliostat field.

The utility model relates to the technical field of sampling devices, and provides an automatic sampling device for measuring the reflectivity of a plate surface of a continuous annealing line, which comprises a movable seat movably arranged on the ground; the sampling piece is movably arranged on the moving seat, the sampling piece is provided with a mounting part, an adhesive tape is mounted on the mounting part, and the sampling piece is configured to be capable of driving the adhesive tape to approach different positions of the steel belt after moving; the push block is slidably arranged on the sampling piece, and the push block is configured to be capable of pushing the adhesive tape to adhere to the steel belt after sliding. By means of the technical scheme, the technical problems that in the prior art, manual pasting sampling consumes manpower, and the labor intensity is increased are solved. And the device can automatically sample different positions of the steel belt due to the moving and adjusting functions of the moving seat and the sampling piece.

A kind of weak reflection grating array reflectivity measurement method, using optical time domain reflectometer OTDR, including direct current light source, modulator, erbium-doped fiber amplifier, circulator, photoelectric detector, data acquisition card, data analysis processing module and display module;1) weak reflection grating array is accessed to above-mentioned measurement system, the weak reflection grating array to be measured is accessed to the second port of circulator;2) the output port of laser is connected with the input port of modulator;Laser output direct current light signal is modulated into probe light pulse by modulator, is amplified after being amplified by erbium-doped fiber amplifier, forms probe signal by entering the weak reflection grating array to be measured through circulator;3) the input port of photoelectric detector is connected with the third port of circulator;The input port of data acquisition card is connected with the output port of photoelectric detector;It is sent to data acquisition card by photoelectric detector output port;4) the output port of data acquisition card is connected with data analysis processing module.

The present invention relates to a reflectance measuring device and a film forming device. It is used to prevent the measurement accuracy of reflectance from decreasing. The reflectance measuring device comprises: a light source; a light projecting and receiving head, the light projecting and receiving head comprising a light projecting unit, a reflected light input unit and a correction light input unit, the light projecting unit irradiates the object to be measured with the first light of the first light and the second light included in the light from the light source input into the light projecting and receiving head, the reflected light input unit inputs the reflected light after the first light is reflected by the object to be measured into the first wire, and the correction light input unit inputs the second light into the second wire without irradiating the object to be measured; a measuring component, the measuring component measures the intensity of the third light transmitted via the first wire and the intensity of the fourth light transmitted via the second wire; and a determining component, the determining component determines the reflectance of the object to be measured based on the intensity of the third light and the intensity of the fourth light measured by the measuring component.

A temperature increase detection system (300) for an environment consisting of several distinct zones (Z1-Z10), the system comprising a branched cable network with several branches (CS1-CS10), each intended to be deployed in one of the zones, and at least one reflectometry device (DR1) connected to one end of at least one branch of the network and configured to: Acquire an initial reflectometry measurement corresponding to an initial state of said branched cable network; Acquire a current reflectometry measurement corresponding to a current state of said branched cable network; Compare the current reflectometry measurement to the initial reflectometry measurement to infer a temperature increase on one of the branches of said network. Figure 3

A distance and reflectivity measurement method, apparatus, storage medium, and lidar are disclosed. The lidar acquires an echo signal from light reflected by a target object. A distance threshold measures the echo signal to determine the target's distance relative to the lidar. A reflectivity threshold, higher than the distance threshold, measures the echo signal to determine the target's reflectivity. Using separate thresholds, with the reflectivity threshold being higher, provides high accuracy for distance measurement and high differentiation for reflectivity measurement, improving the overall accuracy of calculating both distance and reflectivity for the target object.

The invention discloses a coated fuel particle optical anisotropy detection method and device and computing equipment, and the method comprises the steps: traversing and collecting a plurality of first view metallographic section images covering a whole metallographic sample to determine the image position information of each coated fuel particle, and carrying out the coordinate splicing to obtain a global coordinate map; acquiring a second view metallographic section image of each coated fuel particle one by one based on the global coordinate map; performing coating definition on the second visual field metallographic section image by utilizing a semantic segmentation model, and further performing testability analysis on the coated fuel particles to screen out a plurality of target coated fuel particles; and extracting a dense pyrolytic carbon layer region from the second view metallographic cross-section image of the target coated fuel particle based on the layer definition image, selecting a region to be measured from the region, and performing reflectivity measurement on the region to be measured so as to determine the optical anisotropy of the target coated fuel particle. According to the invention, automation and intellectualization of the optical anisotropy detection process of the coated fuel particles can be realized.

A distance and reflectivity measurement method, apparatus, storage medium, and lidar are disclosed. The lidar acquires an echo signal from light reflected by a target object. A distance threshold measures the echo signal to determine the target's distance relative to the lidar. A reflectivity threshold, higher than the distance threshold, measures the echo signal to determine the target's reflectivity. Using separate thresholds, with the reflectivity threshold being higher, provides high accuracy for distance measurement and high differentiation for reflectivity measurement, improving the overall accuracy of calculating both distance and reflectivity for the target object.

When measuring a reflectivity of an object for measurement light, initially the object and a reflectivity measurement apparatus are provided. The latter includes a measurement light source, an object holder for holding the object and a spatially resolving detector for capturing measurement light reflected by the object. A measurement light beam impinges on a section of the object within a field of view of the measurement apparatus. The reflected measurement light coming from the impinged-upon section of the object is captured. A surface area of the captured section is at most 50 μm×50 μm. The measurement is performed by the detector. Next, at least one reflectivity parameter of the object is determined on the basis of an intensity of the captured measurement light. The result is a measurement method and a metrology system operating therewith, whereby reflectivities in particular of very finely structured objects, such as lithography masks, can be measured with sufficient precision.

The invention relates to a method for analyzing milk, in which method light is introduced into the milk and signals resulting from a reflectance (R) measurement, a transmittance (T) measurement and an unscattered transmittance (UT) measurement are obtained, which signals are electronically processed in combination in order to output information indicative of at least one parameter of the milk. In other aspects, the invention relates to a method for analyzing the carbohydrate content in milk by introducing light into the milk and analyzing a light signal exiting the milk, where the wavelength of the light introduced into the milk is not greater than 2500 nm, and an apparatus for analyzing milk, where the wavelength of the light introduced into the milk is not greater than 2500 nm. The device has a first measurement length (4, 14) for measuring the transmittance (T) of light through the milk and the reflectivity (R) of the milk to light, and a second measurement length (24) for measuring the non-scattered transmittance (UT) of light through the milk, where the second measurement length (24) is thinner than the first measurement length (4, 14) by a factor of at least 10.