23 results about "Reflectivity measurement" patented technology

An anti-glare film is attached on a surface of a display, and includes an anti-glare layer. The anti-glare layer is set to have a sparkle value falling within a range from 6 to 10, which is defined based on a value of a standard deviation of luminance distribution of the display under a state in which the anti-glare film is attached on the surface of the display, a value of specular gloss of 30% or less, which is measured with 60-degree specular gloss, a value of transmission image clarity of 60% or less, which has an optical comb of 0.5 mm, and a haze value of 50% or less. Consequently, satisfactory anti-glare property can be provided while appropriately suppressing sparkle on the display.

The application discloses a reflectivity measuring method, a laser radar device and a storage medium, and relates to the technical field of reflectivity measurement. The reflectivity measuring method comprises the following steps: acquiring the distance between a laser radar device and a measured object and the characteristic parameters of a return signal; acquiring a first preset characteristic relationship; and calculating the reflectivity of the measured object according to the first preset characteristic relationship. The first preset characteristic relationship is a corresponding relationship between the characteristic parameters and the reflectivity which is stored in advance. The measured object does not need to be moved multiple times to obtain different distances. According to the acquired first preset characteristic relationship, the reflectivity of the measured object at any distance can be directly calculated according to the characteristic parameters and the distance. The measuring method is simple, the calibration process is simple, and the measuring efficiency of the surface reflectivity of the measured object is improved.

The application discloses a coated fuel particle optical anisotropy detection method and device and computing equipment, and the method comprises the following steps: traversing a plurality of first field metallographic section images covering the whole metallographic sample to determine the image position information of each coated fuel particle and perform coordinate splicing to obtain a global coordinate map; based on the global coordinate map, the second field metallographic section image of each coated fuel particle is collected one by one; the second field metallographic section image is coated by a semantic segmentation model to define the coating, and then the coated fuel particle is subjected to measurability analysis to screen a plurality of target coated fuel particles; based on the layer definition image, the dense pyrolysis carbon layer region is extracted from the second field metallographic section image of the target coated fuel particle, and the measured region is selected therefrom to perform reflectivity measurement, so as to determine the optical anisotropy of the target coated fuel particle. The application can realize the automation and intelligentization of the coated fuel particle optical anisotropy detection process.

A method for measuring the thickness of a semiconductor structure includes illuminating the semiconductor structure with non-coherent and non-parallel light from at least one light source, and acquiring at least one image of the semiconductor structure illuminated by the light source using a camera. The at least one image includes separate images of a first color, a second color, and a third color, where the first, second, and third colors are distinct from each other. A thickness map is generated for at least two layers of the semiconductor structure based on the images of the first, second, and third colors and reference images of a reference silicon wafer in the first, second, and third colors.

A method of measuring a thickness of a semiconductor structure includes illuminating the semiconductor structure with the incoherent, uncollimated light from at least one light source, and capturing, using a camera, at least one image of the semiconductor structure illuminated by the light from the light source. The at least one image includes separate first color, second color, and third color images, the first, second, and third colors being different from each other. Thickness maps are produced for at least two layers of the semiconductor structure based on the first color, second color, and third color images and reference first color, second color, and third color images of a reference silicon wafer.

The utility model relates to the technical field of sampling devices, and provides an automatic sampling device for measuring the reflectivity of a plate surface of a continuous annealing line, which comprises a movable seat movably arranged on the ground; the sampling piece is movably arranged on the moving seat, the sampling piece is provided with a mounting part, an adhesive tape is mounted on the mounting part, and the sampling piece is configured to be capable of driving the adhesive tape to approach different positions of the steel belt after moving; the push block is slidably arranged on the sampling piece, and the push block is configured to be capable of pushing the adhesive tape to adhere to the steel belt after sliding. By means of the technical scheme, the technical problems that in the prior art, manual pasting sampling consumes manpower, and the labor intensity is increased are solved. And the device can automatically sample different positions of the steel belt due to the moving and adjusting functions of the moving seat and the sampling piece.

A kind of weak reflection grating array reflectivity measurement method, using optical time domain reflectometer OTDR, including direct current light source, modulator, erbium-doped fiber amplifier, circulator, photoelectric detector, data acquisition card, data analysis processing module and display module;1) weak reflection grating array is accessed to above-mentioned measurement system, the weak reflection grating array to be measured is accessed to the second port of circulator;2) the output port of laser is connected with the input port of modulator;Laser output direct current light signal is modulated into probe light pulse by modulator, is amplified after being amplified by erbium-doped fiber amplifier, forms probe signal by entering the weak reflection grating array to be measured through circulator;3) the input port of photoelectric detector is connected with the third port of circulator;The input port of data acquisition card is connected with the output port of photoelectric detector;It is sent to data acquisition card by photoelectric detector output port;4) the output port of data acquisition card is connected with data analysis processing module.

A distance and reflectivity measurement method, apparatus, storage medium, and lidar are disclosed. The lidar acquires an echo signal from light reflected by a target object. A distance threshold measures the echo signal to determine the target's distance relative to the lidar. A reflectivity threshold, higher than the distance threshold, measures the echo signal to determine the target's reflectivity. Using separate thresholds, with the reflectivity threshold being higher, provides high accuracy for distance measurement and high differentiation for reflectivity measurement, improving the overall accuracy of calculating both distance and reflectivity for the target object.

A distance and reflectivity measurement method, apparatus, storage medium, and lidar are disclosed. The lidar acquires an echo signal from light reflected by a target object. A distance threshold measures the echo signal to determine the target's distance relative to the lidar. A reflectivity threshold, higher than the distance threshold, measures the echo signal to determine the target's reflectivity. Using separate thresholds, with the reflectivity threshold being higher, provides high accuracy for distance measurement and high differentiation for reflectivity measurement, improving the overall accuracy of calculating both distance and reflectivity for the target object.

The invention belongs to the field of large-aperture spherical reflector reflectivity measurement, and discloses a spherical reflector reflectivity automatic measurement system and method. The method comprises the following steps: arranging a tray and a multi-dimensional mobile platform in a black box; a light source and a light intensity detection unit are carried on the multi-dimensional mobile platform; a spherical reflector to be measured is placed on the tray; for each to-be-detected point position on the spherical reflector, the positions of the light source and the light intensity detection unit are adjusted through the multi-dimensional mobile platform, so that a light beam emitted by the light source is incident to the current to-be-detected point position, the light intensity detection unit is used for detecting reflected light of the light beam reflected by the current to-be-detected point position, and the reflected light intensity is obtained; and obtaining the reflectivity of the current point location to be measured according to the incident light intensity and the reflected light intensity. According to the invention, not only can the reflectivity of the spherical reflector be automatically measured with high precision and the measurement efficiency be improved, but also the reflectivity of the spherical reflector can be directly measured and the accuracy is improved.

This application provides a method, apparatus, electronic device, and medium for determining sample deformation information, relating to the field of photothermal detection technology. The method includes: after the sample surface of the sample to be tested is excited by pump light and a probe light detects any point on the excited sample surface, acquiring the difference signal between the signal light and the reference light determined by the detection device and converted into electrical signals; processing the difference signal using a preset algorithm to determine the change in reflectivity of an SPR element (Surface Plasmon Resonance Optical Element); determining the change in reflection angle corresponding to the change in reflectivity of the SPR element based on the correspondence between the reflectivity of the configured SPR element and the reflection angle of the probe light on the sample to be tested; and determining the deformation information of the corresponding point on the sample surface of the sample to be tested based on the change in reflection angle. This method utilizes an SPR element to achieve direct conversion between the reflectivity measurement of the sample to be tested and surface deformation information, ensuring the accuracy of deformation information measurement.

This application discloses a method, apparatus, storage medium, and lidar for measuring distance and reflectivity. Specifically, it applies to a lidar that obtains an echo signal based on the echo light reflected from a target object. The echo signal is an electrical signal corresponding to the echo light. The application measures the echo signal based on both a distance threshold and a reflectivity threshold. The distance threshold determines the distance of the target object relative to the lidar, and the reflectivity threshold determines the reflectivity of the target object. The reflectivity threshold is higher than the distance threshold. By using different threshold values ​​to determine the distance and reflectivity of the target object, and with the reflectivity threshold being higher than the distance threshold, this application achieves higher ranging accuracy and higher reflectivity discrimination when measuring the reflectivity of the target object, thereby improving the accuracy of distance measurement and reflectivity calculations.

The method relates to a method for operating an EUV reflectometer (1) comprising at least one controllable radiation source (4) and a radiation sensor (17), wherein, to perform a reflectivity measurement, a light beam (10) is projected by means of the radiation source (4) onto a first test area of ​​a surface of a test specimen (3) to be examined, and the light beam (16) reflected from the surface is detected by means of the radiation sensor (17) in order to determine the reflectivity of the surface in the first test area. It is provided that the radiation sensor (17) is moved along the light beam (16) reflected from the surface to a first distance (b) relative to the test specimen (3), at which the radiation sensor (17) detects a reflectivity maximum of the reflected light beam (16), and that the reflectivity measurement is only then carried out.

The application provides a reflectivity measuring device and a measuring method thereof, which solve the technical problem of low confidence and poor reproducibility of the measuring result obtained by a traditional measuring method. The measuring device comprises a light source monitoring unit and a measuring unit. The light source monitoring unit comprises a rigid pipe and a light source, a beam splitter and a first detector which are closed and connected through the rigid pipe. The measuring unit comprises an integrating sphere, a second detector and a test chamber. The test chamber is closed and connected to the bottom sidewall of the integrating sphere, and a stage is arranged in the test chamber. The stage is used for adjusting the position and attitude of a diffuse reflection reference body or a sample to be measured which are placed on the bearing surface. In the measuring method, the reflected light of the light source enters the first detector, the transmitted light is incident on the diffuse reflection reference body, the readings of the first detector and the second detector when the diffuse reflection reference body and the sample to be measured are respectively placed on the stage are collected, and the reflectivity of the sample to be measured is obtained by combining the readings with a formula.

A temperature increase detection system (300) for an environment consisting of several distinct zones (Z1-Z10), the system comprising a branched cable network with several branches (CS1-CS10), each intended to be deployed in one of the zones, and at least one reflectometry device (DR1) connected to one end of at least one branch of the network and configured to: Acquire an initial reflectometry measurement corresponding to an initial state of said branched cable network; Acquire a current reflectometry measurement corresponding to a current state of said branched cable network; Compare the current reflectometry measurement to the initial reflectometry measurement to infer a temperature increase on one of the branches of said network. Figure 3

The invention provides a graphite plate emissivity detection method and device, and the method comprises the steps: collecting the target specular reflection light intensity and the target diffuse reflection light intensity of a target graphite plate at the same time, and carrying out the comparison operation with the standard specular reflection light intensity and the standard diffuse reflection light intensity of a standard white board; and the specular reflectance and the diffuse reflectance of the target graphite plate are obtained by combining the specular reflectance and the diffuse reflectance of the standard white board, so that the emissivity of the target graphite plate is obtained according to the specular reflectance and the diffuse reflectance of the target graphite plate. According to the graphite disc emissivity detection method and the graphite disc emissivity detection device, the specular reflectance can be obtained while the diffuse reflectance is obtained, the measurement accuracy of the reflectance determined by the sum of the diffuse reflectance and the specular reflectance is high, the accuracy of the emissivity obtained by the reflectance method can be improved, the service life detection precision of the graphite disc is improved, and the detection cost is reduced. Therefore, the opportunity accuracy of replacing the graphite disc with short service life can be improved, the service life of the stone mill disc is accurately controlled, and the production quality is guaranteed.

A reflectance measurement part measures the reflectance of a back surface of a semiconductor wafer. An imaging parameter of a camera is adjusted based on the measured reflectance. The imaging parameter includes exposure time and sensitivity of the camera. The camera with the adjusted imaging parameter images the back surface of the semiconductor wafer to determine the presence or absence of a flaw from the obtained image data. The camera is able to perform appropriate imaging in accordance with the reflectance of the back surface of the semiconductor wafer. Thus, a flaw in the back surface of the semiconductor wafer is detected with reliability even if the reflectance of the back surface is varied due to the deposition of a thin film on the back surface.

The application discloses a building material light reflection effect evaluation method and system, relates to the technical field of building material measurement, adds description information to the ceramic tile material after collecting different kinds of ceramic tile materials, generates a difference degree from a ceramic tile description information set, screens the ceramic tile material according to the difference degree, and collects reflectivity data of the obtained ceramic tile material in different test scenes; key factors affecting the reflectivity of the ceramic tile material are identified by using multiple linear regression analysis, and reflectivity data and corresponding image data of the ceramic tile material in an actual use environment are collected; corresponding measured reflectivity is output from the output of the trained reflectivity measurement model, building energy consumption data is output from a building energy consumption digital twin model, and if the predicted energy consumption exceeds the expectation, optimization is made on the selection of the ceramic tile material of the building. The application can reduce the difficulty of evaluating the reflection effect of the ceramic tile material for the building, improve the evaluation efficiency, and ensure the authenticity and reliability of the evaluation.

The system includes a light source configured to emit light at one or more wavelengths, one or more angles of incidence (AOI), and one or more azimuthal angles; a polarization assembly configured to generate one or more polarization states of light; a main objective configured to focus the light of the one or more polarization states onto a target that reflects the light; an analyzer assembly configured to analyze the one or more polarization states of light reflected from the target; a detector configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor configured to generate measurements of the target based on the output signals generated at the one or more polarization states, one or more wavelengths, one or more AOIs, and one or more azimuthal angles.

A method and system for determining radar-compatible coatings are provided. In one example, the method includes acquiring a reflectance measurement of a target coating to characterize its color. One or more candidate formulations are generated to determine color matches with the target coating's color. A corresponding color and corresponding radar property are predicted for each of the one or more candidate formulations. A radar-compatible coating composition that is visually identical or substantially similar to the target coating is generated. The generation of the radar-compatible coating composition is at least in part based on the corresponding color and corresponding radar property of one of the one or more candidate formulations.

The invention provides a relative reflectivity measuring device and a relative reflectivity measuring method. The relative reflectivity measuring equipment comprises a measuring light source, an optical fiber spectrometer, a first optical conversion device, a second optical conversion device, a first optical fiber group, a second optical fiber group, a sample measuring part, a reference measuring part, a third optical fiber group and a fourth optical fiber group, the first optical conversion device is used for opening or closing the first channel and the second channel, and the second optical conversion device is used for opening or closing the third channel and the fourth channel. According to the measuring equipment, only one measuring light source and one optical fiber spectrometer are adopted, the optical conversion device and the multiple optical fiber sets are matched, optical channels can be rapidly switched, the switching delay of the optical conversion device is small, and therefore the reflected light intensity of the to-be-measured sample and the standard reflectivity plate can be measured in real time; errors caused by instability of the light source to be measured are eliminated, spectral errors of different optical fiber spectrometers are eliminated, and cost and data processing difficulty are remarkably reduced.

The application discloses a normal distribution-based equivalent ground reflectivity curve acquisition method, and belongs to the field of space optical remote sensing. The method comprises the following steps: using a spectrometer to measure the ground to obtain measurement data; reading the measurement data to obtain a measurement curve; intercepting the average value of the reflectivity of a relatively stable wavelength interval as the description value of the measurement curve, processing all the measurement curves to obtain a list list1 of the description values; through continuous clustering, counting the classes with higher frequency, and obtaining the maximum value and the minimum value of the class descriptors; counting all the description values of list1 between the maximum value and the minimum value to obtain list3, and calculating the average value a and the standard deviation sigma of list3; the curve corresponding to the descriptor in list1 within the range of [a-1.5*sigma, a+1.5*sigma] is a reserved spectral curve. The method can more effectively eliminate various error data in the reflectivity measurement process, and improve the absolute radiation calibration accuracy.

The present application relates to a kind of polarized reflectivity measurement method and device, including using ellipsometer to measure a reference sample, collect light intensity signal, and carry out ellipsometer system calibration, obtain the system parameters after calibration and reference sample film thickness;Using the system parameters after calibration and the light intensity signal, the measurement mueller matrix of reference sample is calculated to obtain;Using the system parameters after calibration and reference sample film thickness, the reflectivity of reference sample is simulated to obtain;According to the measurement mueller matrix of reference sample and the reflectivity of reference sample, the equivalent light source light intensity is calculated to obtain;For any to-be-measured sample, using ellipsometer to collect light intensity signal, and using the system parameters after calibration, the measurement mueller matrix of to-be-measured sample is calculated to obtain;Using the equivalent light source light intensity and the measurement mueller matrix of to-be-measured sample, the polarized reflectivity of to-be-measured sample is calculated to obtain.