74 results about "Errors measurement" patented technology

The invention discloses a spindle rotation error detection device and a detection calculation method, and belongs to the field of spindle error detection. The detection device comprises a base, an arc-shaped tool and an annular cover plate, wherein the arc-shaped tool comprises a buckle main shaft, and the annular cover plate is arranged on the inner periphery of the arc-shaped tool; the clamping part comprises an annular seat mounted at the top of the annular cover plate and a circular shell arranged on the inner periphery of the annular seat; the detection part is arranged in the circular shell and comprises a mounting seat mounted at the top end of the main shaft and a detection assembly arranged on the mounting seat; and the plurality of detectors respectively penetrate through the circular shell, are clamped and fixed on the circular shell, and are used for radially detecting distance data between the detectors and the detection assembly. According to the invention, the six degrees of freedom of the main shaft can be detected and the problems of overturning, end jumping, radial jitter and the like can be identified at the same time. The device has the advantages of high precision, high efficiency, dynamic continuity, complete error measurement and convenient installation.

The invention relates to the technical field of chip manufacturing, in particular to a photoetching plate, an overlay error measurement method and a medium, and aims to improve the accuracy of overlay error measurement. The photoetching plate comprises a first grating mark group and a second grating mark group, the first grating mark group is used for measuring the overlay error, and the second grating mark group is used for correcting the overlay error generated by the overlay error measuring system including the photoetching plate; therefore, a more accurate overlay error value can be obtained after overlay error measurement and correction based on the photoetching plate.

The invention provides a three-dimensional linear quantity simultaneous measurement and compensation system based on a single detector, and belongs to the technical field of optical precision measurement instruments. The system structure is simplified, synchronous measurement of three-dimensional linear quantity (X-axis length and Y / Z-axis straightness) and light two-dimensional drift angle (pitch / deflection angle drift) is realized by using a single four-quadrant detector, a compensation model is established based on angle drift, interference to straightness error is reduced, measurement precision, stability and integration are improved, and the system is suitable for large-scale popularization and application. And finally, the problems of complexity and coupling in multi-dimensional geometric error measurement are solved, and simultaneous high-precision measurement of multi-degree-of-freedom errors is realized. The optical path design is simplified, and the measurement stability is improved.

The application provides an integrated circuit overlay error measurement method based on information fusion, which is characterized in that, for a given diffraction or scattering type overlay error measurement mark, model-based overlay error measurement (MBO), experience-based overlay error measurement (EBO), model / model hybrid measurement (MBO+MBO) and model / experience hybrid measurement (EBO+MBO) are used to extract overlay error values. Based on the calculation of electromagnetic field simulation means, the measurement distribution and its uncertainty of different methods are estimated, the prior knowledge is provided to eliminate abnormal measurement results, and the fusion decision basis is provided. Further, the different measurement extraction calculation results obtained by the actual measurement signal are fused by using a hierarchical information fusion method to obtain the final overlay error result. The method provided by the application can realize high-credibility extraction and calculation of overlay error, and is suitable for overlay error measurement under non-ideal measurement conditions.

The invention discloses a five-axis machine tool geometric error identification method based on single-axis and multi-axis measurement, and belongs to the field of numerical control machine tool precision detection. Error kinematics and multi-axis motion models are established based on a multi-body system theory, and error identification models of a linear axis and a rotating axis are respectively constructed. On the aspect of a linear axis, an identification method based on measurement of a positioning error and a straightness error is provided, two measurement / identification schemes of single-axis motion and two-axis linkage are designed, and 18 linear axis geometric error parameters related to the position and 3 linear axis geometric error parameters irrelevant to the position are obtained through calculation. In the aspect of a rotating shaft, 12 rotating shaft geometric error parameters related to the position and 4 rotating shaft geometric error parameters irrelevant to the position are obtained on the basis of an existing linear shaft result based on a measurement and identification scheme of a double-ball-rod instrument in three directions and six positions. According to the method, positioning and straightness error detection are completed in combination with auxiliary equipment such as a laser interferometer and a double-ball-rod instrument, and the method has good universality.

This invention relates to a method, apparatus, device, and medium for error compensation in a dual-drive feed system, belonging to the field of CNC equipment error measurement and compensation technology. The method includes: establishing a low-order volume array of the equipment to be modeled, equipped with a dual-drive feed system; obtaining an error transmission chain from the workpiece to the tool based on the low-order volume array; establishing a mathematical model of tool error and dual-axis error when the dual axes of the dual-drive feed system drive the tool; determining the homogeneous coordinate transformation matrix between any two volumes in the low-order volume array; establishing an error transmission matrix from the workpiece coordinate system to the tool coordinate system based on the error transmission chain, mathematical model, and homogeneous coordinate transformation matrix; establishing a comprehensive error model of the dual-drive feed system based on the error transmission matrix and the transmission matrix under ideal conditions; and performing error compensation on the dual-drive feed system based on the comprehensive error model, thereby improving the error compensation accuracy of the dual-drive feed system.

The utility model discloses an error measurement system, which is characterized in that the focus of stimulation coil equipment is adopted to sequentially coincide with the position of each mark position, a calibration module is utilized to respectively acquire coordinate values of the focus of the stimulation coil equipment at each mark position, and a measurement module is utilized to calculate the distance between the coordinate values. The method comprises the following steps of: acquiring coordinate values, comparing the distance data with actual distance data between the marker positions to obtain corresponding error values, repeatedly acquiring the coordinate values and comparing for multiple times to obtain a plurality of error values, and calculating an average value of the error values, so as to quickly and accurately determine the error condition and ensure the accuracy of the stimulation coil equipment during stimulation treatment.

The invention provides a shafting error measurement method and electronic equipment, and the method comprises the steps: when a first orthogonal error test instruction is received, executing the following steps: transmitting a first instruction to a tested stable platform, so as to control an azimuth axis of the tested stable platform to be fixed, a pitch axis of the tested stabilized platform is controlled to rotate by multiple angles, and a cross wire target assembly is installed on one side of the pitch axis of the tested stabilized platform; triggering a vision measurement system at each angle position of the pitch axis to acquire a target image, performing image processing on the acquired target image to obtain a target cross wire center coordinate corresponding to each angle position, and performing circle center fitting on the plurality of target cross wire center coordinates to obtain a first circle center coordinate; controlling the azimuth axis of the tested stabilized platform to rotate by 180 degrees, and repeating the steps to obtain a second circle center coordinate; and calculating a coordinate deviation between the first circle center coordinate and the second circle center coordinate, and obtaining a shafting orthogonal error of the tested stabilized platform according to the coordinate deviation.

The application provides a sensor error parameter estimation method and system, comprising: collecting measurement data of a sensor by using a six-position method, the sensor comprising a gyroscope and / or an accelerometer; modeling a sensor error, performing sensor deterministic error parameter fitting by using a least square method; performing error compensation according to the deterministic error parameter to obtain a random error of the sensor; taking the random error as a measurement value of a Kalman filtering algorithm, modeling the random error by using a Gaussian-Markov model to take the random error as a state value of the Kalman filtering algorithm; designing a random error matrix and a driving noise covariance matrix; performing time updating and measurement updating of the Kalman filtering algorithm based on the measurement value, the state value, the random error matrix and the driving noise covariance matrix to correct the random error of the sensor. In real-time measurement, estimation of the deterministic error parameter and the random error parameter can overcome error measurement caused by the instrument itself, and more accurate measurement data can be obtained.

The embodiment of the present application discloses a kind of three-dimensional overlay mark and overlay error measurement equipment calibration method.Three-dimensional overlay mark includes substrate and multiple overlay marks on substrate;In multiple overlay marks, the height of the vertical projection of any two overlay marks on the first plane is different;The first plane is perpendicular to the plane where substrate is located.Due to the height of overlay mark in the first plane extension direction is different, the distance of different height overlay mark and shooting point is different, that is, the different height overlay mark forms the different defocus degree that image can express. Thus, once image shooting can obtain the image of overlay mark under different defocus range, without moving the position of overlay mark repeatedly traversing measurement, greatly improve the calibration efficiency of overlay error measurement equipment, avoid environmental factors to cause interference during long time calibration;It can also avoid that overlay mark is offset in horizontal direction, influence calibration precision.

The invention relates to a dynamic update path planning method and system based on Voronoi error measurement. The method comprises the following steps: acquiring input data and preprocessing the input data; generating a seed set according to the preprocessed data, and constructing a Voronoi diagram; extracting seed points according to the Voronoi diagram, and generating a candidate point set in the neighborhood of the seed points; comprehensive error calculation is carried out on candidate points in the candidate point set, and position updating is carried out on the seed points according to comprehensive errors; when the position of the seed point is updated or the local environment is changed, performing local reconstruction on the Voronoi diagram; and constructing a navigation map according to the reconstructed Voronoi map, obtaining a path with the minimum comprehensive cost according to the navigation map, generating a new local optimal path fragment, and obtaining a path planning result. According to the method, only the affected area is updated when the environment is locally changed, so that real-time and low-overhead path reconstruction and re-planning are realized.

1. Name of the design product: calibration block. 2. Use of the design product: suitable for in-machine error measurement and calibration of linear and rotary axes of five-axis machine tools. 3. Design points of the design product: in shape. 4. Picture or photo best indicating the design points: perspective view.

The invention provides an error measurement method and device for a rotating shaft of a five-axis machine tool and electronic equipment, and relates to the technical field of machine tools, and the method comprises the steps: fixing a workbench of the five-axis machine tool around a second rotating shaft, rotating the workbench around a first rotating shaft, and rotating the workbench around the first rotating shaft to a first angle, determining the error of the first rotating shaft according to the relative position between the connecting line of the first positions of the two measuring balls on the workbench and the first rotating shaft; the workbench is fixed around the first rotating shaft and rotates around the second rotating shaft, and under the condition that the workbench rotates around the second rotating shaft to a second angle, the error of the second rotating shaft is determined according to the relative position between the connecting line of the second positions of the two measuring balls and the second rotating shaft and the workbench plane. According to the embodiment of the invention, the error of the two rotating shafts is calculated according to the connecting line of the two measuring balls and the relative position between the two rotating shafts, so that the equipment cost is reduced, and the measuring cost is reduced.

The application discloses a kind of based on fixed longitude vector measurement's curved surface edge error measurement method and system, the method steps include: S1) fixed longitude vector calibration is carried out to the measuring probe to obtain the trigger radius of the measuring probe;S2) according to trigger radius, obtain the measurement program of the edge to be measured;S3) the theoretical profile point coordinate is obtained by the measurement program of the edge to be measured, the actual profile point coordinate is obtained by the measuring probe actual measurement, by comparing theoretical profile point coordinate and actual profile point coordinate, the vector error of the edge to be measured is calculated.Compared with the traditional vector measurement method, the present application can realize the in-machine measurement of curved surface edge error, be used to guide chamfering or edge cutting process, and improve product qualification rate.

The method includes obtaining first data indicating the overlay error of a substrate using a processing device. The method further includes generating second data indicating the first stress uniformity of the substrate based on the first data. The method further includes performing corrective actions based on the second data.

A method includes obtaining, by a processing device, first data indicative of an overlap error of a substrate. The method further includes generating second data indicative of a first stress uniformity of the substrate based on the first data. The method further includes performing a corrective action based on the second data.

To provide a technique capable of measuring a gear shape error.SOLUTION: The machine tool includes a controller configured to execute an error measurement process. In the error measurement processing, an approach start point and an approach direction of a touch trigger probe held by a tool holding device are determined based on a posture of a gear-shaped workpiece held by a workpiece holding device, an actuator is controlled to move the touch trigger probe from the approach start point in the approach direction, and a center position of a tip ball of the touch trigger probe when the touch trigger probe is brought into contact with a surface of the workpiece by the movement is obtained, the method includes determining a candidate value of an error between a gear shape and a target shape of a gear product, generating a cross-sectional model representing a cross-sectional shape of a tooth surface based on the candidate value, the target shape, and a posture, obtaining a minimum distance between the cross-sectional model and a center position, changing the candidate value, and determining, as the error, a candidate value at which an absolute value of a difference between the minimum distance and a radius of a tip ball is equal to or less than an allowable value.SELECTED DRAWING: Figure 6

The hollow pile error-proof measuring device comprises a scale, a fixed measuring claw fixed to one end of the scale, a sliding measuring claw in sliding fit with the scale, and an error-proof measuring unit fixed with the sliding measuring claw; the error-proof measuring unit comprises the laser position calibrator for ensuring correct measuring position and reducing errors, a displacement sensor for converting displacement of the sliding measuring claw into data for digital display of readings, a central controller for calculation and implementation of various functions, an electronic display screen for display of data and interactive information, a key for human-computer interaction, and a battery for power supply; the central controller is connected with the laser position calibrator, the displacement sensor, the electronic display screen, the key, and the battery. The present application has the beneficial technical effect of automatically prompting the user to correctly measure the position and effectively avoid measurement errors.

The application discloses a kind of main shaft rotation error measurement method and device based on optical principle.The main shaft rotation error measurement method is as follows: one, constructs coordinate system;Two, the axial error of main shaft is measured using light interference principle, and a beam is separated in the test light of axial error measurement and is shot to PSD, and radial error is obtained.The application sets up taper angle reflector at the end of main shaft, and the axial error of main shaft is measured using laser interference principle, the axial error measured by this mode is not influenced by radial error, the influence of inclination error can also be ignored, the complexity of axial error settlement is greatly reduced, and the detection precision is improved.In addition, while detecting axial and radial error, the application synchronously detects inclination error using annular reflector and laser autocollimator, and separates the measurement error caused by the inclination change of main shaft in radial error using the value of measured inclination error, and improves the detection accuracy of radial error.

The embodiment of the invention provides an overlay alignment mark and a forming method thereof, and an overlay error measuring method and device.The overlay alignment mark comprises a zero-layer mark located on the back face of a substrate; the current layer mark is located on the front face side of the substrate, and the front face and the back face of the substrate are oppositely arranged; wherein, from the back surface to the front surface, the current layer mark is located right above the zero layer mark. By adopting the technical scheme, the flatness of the front surface of the substrate can be improved.

An overlay alignment mark and an overlay error measurement method, the overlay alignment mark comprising: a front-layer mark having a first geometric center in a direction parallel to the surface of the front-layer mark; the current-layer mark is located above the front-layer mark, the current-layer mark has a second geometric center in the direction parallel to the surface of the current-layer mark and is located on the same projection plane, and the projection pattern of the current-layer mark is located in the projection pattern of the front-layer mark. According to the embodiment of the invention, the offset vector between the first coordinate and the second coordinate can be determined by acquiring the first coordinate of the first geometric center and the second coordinate of the second geometric center, and is used for representing the overlay error, so that the error numerical values including the transverse overlay error and the longitudinal overlay error can be acquired at the same time; compared with the scheme that transverse and longitudinal overlay alignment marks need to be arranged respectively, the area of the overlay alignment marks is saved, and then the performance of the overlay alignment marks is improved.

The invention discloses a small sample actual measurement data-based tooth surface contact mark intelligent regulation and control method, which comprises the following steps of: obtaining a pair of installation error measurement values of a gear through a test to carry out boundary expansion, and obtaining an installation error variation range; after the tooth surface measurement is accurately positioned, the point-by-point measurement of tooth surface grid points is completed by using a measurement program of the CMM, and the deviation between a real tooth surface and a theoretical tooth surface is obtained; establishing an ETCA sensitivity model based on installation error probability distribution, and constructing an installation error-contact impression sample data pair according to an ETCA analysis result; a multi-head self-attention mechanism model based on Transform position coding is established to intelligently predict tooth surface contact impressions, assembly parameters are intelligently regulated and controlled in combination with a reinforcement learning algorithm, automatic traceability, positioning and optimization of errors are achieved, and finally rapid assembly of the hypoid gear is achieved.

The application discloses a kind of adjustment methods of tunnel overrun through error, according to the through error measurement value and through control measurement results of rechecking, through locking tunnel hole inside traverse control network and using line design software to design conforming line type, including step one, tunnel through error determination is carried out;Step two, tunnel lining section cross section survey is carried out;Step three, tunnel through control measurement is carried out;Step four, lining section cross section rechecking is carried out;Step five, tunnel through section line type is calculated;Step six, tunnel through section construction is carried out.This method maximally ensures that lining section does not need to be changed and reworked, uses road design software through line adjustment link, can greatly adjust tunnel overrun through error, can be quickly and accurately calculated, without reworking the part that has been constructed, fast construction fast closure.

The embodiment of the invention provides a method for determining a measurement point of a wafer, electronic equipment and a storage medium. The method for determining the measurement point of the wafer comprises the following steps: determining process parameter data of a target wafer; and inputting the process parameter data of the target wafer into a measurement point prediction model to obtain position information of a plurality of target measurement points of the target wafer, the measurement point prediction model being obtained by training with training data, the training data comprises process parameter data of the training wafer, position information of historical measurement points of the training wafer and error measurement data corresponding to the historical measurement points. The target measurement point can be intelligently and automatically determined through data driving, and the human subjective influence is reduced. Moreover, the scheme can be suitable for rapidly determining the target measurement point through a new process and a new design, the determined target measurement point can adapt to the process parameters of the target wafer, local errors caused by specific process parameters can be captured, and the accuracy of the target measurement point can be improved.

This utility model relates to the field of laser seeker zero-position error measurement and calibration technology, and particularly to a laser seeker zero-position error measurement and calibration device, comprising: a worktable and a product under test. A support platform is fixedly mounted on the worktable, the product under test is placed on the support platform, a light target substrate is fixedly mounted on the worktable, a laser sensor is fixedly mounted on the worktable, two mutually symmetrical stabilizing blocks are fixedly mounted on the worktable, a bidirectional screw is rotatably mounted on the stabilizing blocks, and two mutually symmetrical clamping blocks are threadedly connected to the bidirectional screw. A rotary motor is fixedly mounted on one of the stabilizing blocks, and the motor shaft of the rotary motor is fixedly mounted on one end of the bidirectional screw. This utility model clamps the product under test, improves stability, and provides a foggy environment for the measurement and calibration of the laser seeker zero-position error under foggy conditions.

The application belongs to the technical field of error measurement, and discloses a rotary shaft position related error measurement device and identification method for a double-rotary-table five-axis numerical control machine tool, which comprises an R-test measurement unit, a first standard ball, a second standard ball, a standard ball tool clamp, a connecting rod, a first supporting rod, a second supporting rod and two magnetic bases. The R-test measurement unit comprises a micro-ohmmeter clamp and three micro-ohmmeters, wherein the three micro-ohmmeters are fixed on the micro-ohmmeter clamp; the first standard ball and the second standard ball are fixed on the two ends of the connecting rod; the connecting rod is connected with the first supporting rod and the second supporting rod through two standard ball tool clamps; the first supporting rod and the second supporting rod are fixed on the two magnetic bases respectively, and the two magnetic bases are fixed on a horizontal rotary table; the length of the first supporting rod is greater than that of the second supporting rod, and the first standard ball is arranged at the end of the first supporting rod. The application avoids the clamping error introduced by multiple installations and solves the problem of high difficulty in full-geometric-error identification.

The application discloses a measuring device in a small five-axis machine tool space error measurement system based on R-test, which comprises a tool holder, a shell and a center mounting frame. The center mounting frame is a I-shaped cylindrical component, which is divided into three sections, the front, middle and rear sections. The front section of the center mounting frame is the mounting part of the sensor. The middle section of the center mounting frame is a connecting column. The rear section of the center mounting frame is the connecting end of the tool holder. The shell is assembled from the rear section to the front section of the center mounting frame, and wraps the center mounting frame. The application solves the problems of the existing R-test device, such as difficult flexible adaptation to small five-axis machine tool automatic tool changing, insufficient structural rigidity and small measurement range, by designing an integrated overall structure (a non-contact measurement system with a I-shaped center frame as the core), realizes the characteristics of high integration, high rigidity and in-situ measurement of the device, and improves the measurement sensitivity, stability and measurement space size through sensor mounting pose optimization.

The application provides an overlay error measurement method, a semiconductor process method and a semiconductor structure. The measurement method comprises: providing a structure to be measured, which comprises a lower structure layer, an intermediate structure layer and an upper structure layer; the lower structure layer comprises a first hole filled with a first material; the upper structure layer comprises a groove filled with a photoetching layer, and the photoetching layer comprises a second hole formed by exposure and development; the three structure layers are respectively provided with corresponding overlay marks; and the overlay error between adjacent structure layers is obtained by simultaneously exposing and imaging the positions of corresponding overlay coordinates of the three structure layers according to the overlay marks. The overlay pattern is obtained by simultaneously imaging the same overlay coordinates of the three structure layers, the delay time of transferring and positioning required for measuring adjacent overlay patterns twice is saved, the process efficiency is improved, the interference of variables introduced by measuring the overlay patterns of different overlay coordinates twice on the overlay error is reduced, and the product yield is improved.

The invention provides a method for improving overlay error measurement accuracy and a measurement identifier. The method comprises the following steps: acquiring basic structure information of a front-layer pattern and a current-layer pattern, wherein the front-layer pattern is formed by a self-alignment multi-exposure process; according to the basic structure information, performing size optimization or structure optimization on the current layer pattern to obtain an overlay error measurement identifier, so that the overlay error measurement identifier eliminates the influence of the pitch step of the previous layer pattern on overlay error measurement; acquiring an image of the overlay error measurement mark; and calculating an overlay error between the current-layer graph and the previous-layer graph according to the image. According to the method, the pattern design of the current layer is optimized, so that the interference of pitch walking caused by a multiple exposure process on measurement is effectively eliminated, and the measurement accuracy is improved.

The invention provides a sensor error parameter estimation method and system, and the method comprises the steps: collecting the measurement data of a sensor through a six-position method, and the sensor comprises a gyroscope and / or an accelerometer; carrying out sensor error modeling, and carrying out deterministic error parameter fitting on the sensor by using a least square method; performing error compensation according to the deterministic error parameter to obtain a random error of the sensor; taking the random error as a measurement value of a Kalman filtering algorithm, and modeling the random error by adopting a Gaussian-Markov model to serve as a state value of the Kalman filtering algorithm; designing a random error matrix and a driving noise covariance matrix; and based on the measurement value, the state value, the random error matrix and the driving noise covariance matrix, performing time updating and measurement updating of a Kalman filtering algorithm, and correcting the random error of the sensor. In the real-time measurement, the estimation of the deterministic error parameter and the random error parameter can overcome the error measurement caused by the instrument, and more accurate measurement data can be obtained.