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93 results about "Errors measurement" patented technology

Detection device and detection calculation method for rotation error of main shaft

The invention discloses a spindle rotation error detection device and a detection calculation method, and belongs to the field of spindle error detection. The detection device comprises a base, an arc-shaped tool and an annular cover plate, wherein the arc-shaped tool comprises a buckle main shaft, and the annular cover plate is arranged on the inner periphery of the arc-shaped tool; the clamping part comprises an annular seat mounted at the top of the annular cover plate and a circular shell arranged on the inner periphery of the annular seat; the detection part is arranged in the circular shell and comprises a mounting seat mounted at the top end of the main shaft and a detection assembly arranged on the mounting seat; and the plurality of detectors respectively penetrate through the circular shell, are clamped and fixed on the circular shell, and are used for radially detecting distance data between the detectors and the detection assembly. According to the invention, the six degrees of freedom of the main shaft can be detected and the problems of overturning, end jumping, radial jitter and the like can be identified at the same time. The device has the advantages of high precision, high efficiency, dynamic continuity, complete error measurement and convenient installation.
Owner:FOSHAN DMT INTELLIGENT EQUIPMENT TECHNOLOGY CO LTD

Overlay mark structure and overlay error measurement method

The invention provides an overlay mark structure and an overlay error measuring method.The overlay mark structure comprises a front-layer overlay mark and a current-layer overlay mark, the front-layer overlay mark comprises a plurality of first sub-overlay marks, the current-layer overlay mark comprises a plurality of second sub-overlay marks, and the first sub-overlay marks are arranged on the first sub-overlay marks. The plurality of first sub-overlay marks form a hollow first square, the plurality of second sub-overlay marks form a hollow second square, the first square surrounds the second square, and the center of the first square coincides with the center of the second square; and each first sub-overlay mark comprises a plurality of grooves filled with marking materials. According to the invention, the load effect problem during etching is reduced through the arrangement of the plurality of grooves, and the etching depth at the position of the front-layer overlay mark is increased, so that the completeness and identifiability of the front-layer overlay mark are ensured.
Owner:RONGXIN SEMICONDUCTOR (NINGBO) CO LTD

Tool axis non-orthogonal five-axis machine tool rotating shaft error measurement method based on R-test

The invention relates to an R-test-based linkage rotating shaft geometric error identification method of a tool axis non-orthogonal five-axis machine tool, and belongs to the technical field of numerical control machine tools. Secondly, an R-test is installed on a workbench, after the RTCP function is started, the measuring track is within the range of the R-test, and the stroke of each feed shaft needs to be as large as possible, R-test data is extracted, namely, the actual tool nose position error is obtained; and finally, the position-independent geometric error and the position-related geometric error of the AB rotating shaft are identified through the actual tool nose position error. According to the method, the geometric error of the linkage rotating shaft of the tool-axis non-orthogonal five-axis machine tool is quickly identified, and the method has the advantages of high efficiency, accuracy, simplicity and convenience.
Owner:XI AN JIAOTONG UNIV

Photoetching plate, overlay error measurement method and medium

The invention relates to the technical field of chip manufacturing, in particular to a photoetching plate, an overlay error measurement method and a medium, and aims to improve the accuracy of overlay error measurement. The photoetching plate comprises a first grating mark group and a second grating mark group, the first grating mark group is used for measuring the overlay error, and the second grating mark group is used for correcting the overlay error generated by the overlay error measuring system including the photoetching plate; therefore, a more accurate overlay error value can be obtained after overlay error measurement and correction based on the photoetching plate.
Owner:张江国家实验室

Three-dimensional linear quantity simultaneous measurement and compensation system and method based on single detector

The invention provides a three-dimensional linear quantity simultaneous measurement and compensation system based on a single detector, and belongs to the technical field of optical precision measurement instruments. The system structure is simplified, synchronous measurement of three-dimensional linear quantity (X-axis length and Y / Z-axis straightness) and light two-dimensional drift angle (pitch / deflection angle drift) is realized by using a single four-quadrant detector, a compensation model is established based on angle drift, interference to straightness error is reduced, measurement precision, stability and integration are improved, and the system is suitable for large-scale popularization and application. And finally, the problems of complexity and coupling in multi-dimensional geometric error measurement are solved, and simultaneous high-precision measurement of multi-degree-of-freedom errors is realized. The optical path design is simplified, and the measurement stability is improved.
Owner:BEIJING JIAOTONG UNIV

Mask and overlay error measurement method

The invention provides a mask and an overlay error measurement method, and relates to the technical field of detection. The mask plate comprises a test pattern structure arranged in the middle area of the mask plate, the test pattern structure is used for forming an overlay mark on a wafer, and the test pattern structure comprises a first overlay pattern group, a first reference pattern group, a second overlay pattern group and a second reference pattern group which are sequentially arranged in the circumferential direction of a rotation center, the first reference pattern group and the second reference pattern group are of a central symmetry structure, and marks, mapped on the wafer, of the first overlay pattern group and the second overlay pattern group are arranged in a mutually offset mode and do not coincide with the marks, mapped on the wafer, of the first reference pattern group and the second reference pattern group. According to the invention, a plurality of different pattern groups are integrated on a single mask plate at the same time, and three overlay layer marks can be directly formed in the quadrant region corresponding to the wafer, so that more effective overlay mark image information is obtained, and the detection precision of the overlay error is improved.
Owner:SHENZHEN WENDING CORE POLYMER TECH CO LTD

An integrated circuit overlay error measurement method based on information fusion

The application provides an integrated circuit overlay error measurement method based on information fusion, which is characterized in that, for a given diffraction or scattering type overlay error measurement mark, model-based overlay error measurement (MBO), experience-based overlay error measurement (EBO), model / model hybrid measurement (MBO+MBO) and model / experience hybrid measurement (EBO+MBO) are used to extract overlay error values. Based on the calculation of electromagnetic field simulation means, the measurement distribution and its uncertainty of different methods are estimated, the prior knowledge is provided to eliminate abnormal measurement results, and the fusion decision basis is provided. Further, the different measurement extraction calculation results obtained by the actual measurement signal are fused by using a hierarchical information fusion method to obtain the final overlay error result. The method provided by the application can realize high-credibility extraction and calculation of overlay error, and is suitable for overlay error measurement under non-ideal measurement conditions.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS +1

Five-axis machine tool geometric error identification method based on single-axis and multi-axis measurement

The invention discloses a five-axis machine tool geometric error identification method based on single-axis and multi-axis measurement, and belongs to the field of numerical control machine tool precision detection. Error kinematics and multi-axis motion models are established based on a multi-body system theory, and error identification models of a linear axis and a rotating axis are respectively constructed. On the aspect of a linear axis, an identification method based on measurement of a positioning error and a straightness error is provided, two measurement / identification schemes of single-axis motion and two-axis linkage are designed, and 18 linear axis geometric error parameters related to the position and 3 linear axis geometric error parameters irrelevant to the position are obtained through calculation. In the aspect of a rotating shaft, 12 rotating shaft geometric error parameters related to the position and 4 rotating shaft geometric error parameters irrelevant to the position are obtained on the basis of an existing linear shaft result based on a measurement and identification scheme of a double-ball-rod instrument in three directions and six positions. According to the method, positioning and straightness error detection are completed in combination with auxiliary equipment such as a laser interferometer and a double-ball-rod instrument, and the method has good universality.
Owner:BEIJING UNIV OF TECH

A double-drive feeding system error compensation method, device, equipment and medium

This invention relates to a method, apparatus, device, and medium for error compensation in a dual-drive feed system, belonging to the field of CNC equipment error measurement and compensation technology. The method includes: establishing a low-order volume array of the equipment to be modeled, equipped with a dual-drive feed system; obtaining an error transmission chain from the workpiece to the tool based on the low-order volume array; establishing a mathematical model of tool error and dual-axis error when the dual axes of the dual-drive feed system drive the tool; determining the homogeneous coordinate transformation matrix between any two volumes in the low-order volume array; establishing an error transmission matrix from the workpiece coordinate system to the tool coordinate system based on the error transmission chain, mathematical model, and homogeneous coordinate transformation matrix; establishing a comprehensive error model of the dual-drive feed system based on the error transmission matrix and the transmission matrix under ideal conditions; and performing error compensation on the dual-drive feed system based on the comprehensive error model, thereby improving the error compensation accuracy of the dual-drive feed system.
Owner:WUHAN UNIV OF TECH

Error measurement device and encoder

The invention relates to the technical field of detection equipment, in particular to an error measurement device and an encoder. The code disc is provided with at least two incremental code channels; at least one incremental code channel is provided with first stripes which are arranged at intervals, and a first included angle is formed between the first stripes and the direction perpendicular to the relative motion path of the code disc and the detection assembly; at least one incremental code channel is provided with second stripes which are arranged at intervals, a second included angle is formed between the second stripes and the direction perpendicular to the relative motion path of the code disc and the detection assembly, and the extension direction of the first stripes intersects with the extension direction of the second stripes; when the code disc moves, the detection assembly detects the reading difference value of the first stripe and the second stripe, and the reading difference value is used for calculating the offset of the code disc. According to the embodiment of the invention, the radial offset of the rotating member such as the bearing can be measured by using the coded disc, and the eccentric error detection of the mechanical rotating member is realized.
Owner:SHANGHAI QIJI TECHNOLOGY CO LTD

Methods, architectures, apparatuses and systems for transmission point relative error measurement and reporting

Procedures, methods, architectures, apparatuses, systems, devices, and computer program products for transmission point relative error measurement and reporting are described. A wireless transmit / receive unit, WTRU, receives information indicative of a configuration for joint reception from a plurality of transmission points including a reference transmission point, and for reporting of measurements of relative errors related to received reference signals from at least one pair of transmission points of the plurality of transmission points, transmits information indicative of measured relative errors related to received reference signals from the at least one pair of transmission points, receives information indicative of at least one scheduled downlink gap, and during the at least one scheduled downlink gap, monitors received signals from a subset of the plurality of transmission points that satisfy a calibration condition.
Owner:INTERDIGITAL PATENT HOLDINGS INC

Simulation method for determining calibration error of inclinometer

The invention discloses a simulation method for determining calibration errors of an inclinometer, which comprises the following steps of: firstly, acquiring a simulation measurement value of a three-axis sensor, an error measurement value of the three-axis sensor and a rotary table reference angle matrix R, and further determining a second calibration multiplication coefficient matrix and a second calibration addition coefficient matrix of the three-axis sensor by utilizing a least square method; then, a verification rotation position is randomly constructed, a simulation measurement value for verifying the three-axis acceleration sensor and a calibration value for verifying errors of the three-axis magnetic sensor are obtained, finally, the average value of the azimuth angle relative calibration errors serves as the calibration error value of the azimuth angle of the three-axis magnetic sensor, and simulation of the calibration errors of the inclinometer is achieved. The technical problems that in the prior art, an inclinometry calibration method is too long in error evaluation time and low in efficiency are solved.
Owner:XIAN RES INST OF CHINA COAL TECH & ENG GRP CORP

Circular trajectory error measurement and off-line compensation system and method based on angle installation ball bar

The invention relates to the technical field of industrial robots, in particular to a circular trajectory error measurement and off-line compensation system and method based on angle installation of a ball bar, a ball connecting rod is installed on a main shaft through a tool holder, and an industrial robot is arranged at the end, away from the ball connecting rod, of the main shaft; the end, away from the tool holder, of the ball connecting rod is in magnetic connection with the scanning ball end of the ball bar, the ball bar is fixedly connected with the improved small circle adapter through threads, one end of the improved small circle adapter is connected with the ball bar, and the other end of the improved small circle adapter is connected with the fixing ball-connecting thread integrated piece through threads. A fixed ball of the fixed ball-connecting thread integrated piece is connected with the magnetic connecting base through magnetic force, and the end, away from the fixed ball-connecting thread integrated piece, of the magnetic connecting base is magnetically connected with a workbench. The invention provides a universal solution which is low in cost, high in precision and easy to integrate for industrial robot path precision detection and compensation, and has a wide engineering application prospect.
Owner:JINAN SENFENG TECH CO LTD

Error measurement system

ActiveCN224216062UGuaranteed accuracyQuickly and accurately determineUsing optical meansMedicineAlgorithm
The utility model discloses an error measurement system, which is characterized in that the focus of stimulation coil equipment is adopted to sequentially coincide with the position of each mark position, a calibration module is utilized to respectively acquire coordinate values of the focus of the stimulation coil equipment at each mark position, and a measurement module is utilized to calculate the distance between the coordinate values. The method comprises the following steps of: acquiring coordinate values, comparing the distance data with actual distance data between the marker positions to obtain corresponding error values, repeatedly acquiring the coordinate values and comparing for multiple times to obtain a plurality of error values, and calculating an average value of the error values, so as to quickly and accurately determine the error condition and ensure the accuracy of the stimulation coil equipment during stimulation treatment.
Owner:SHENZHEN YINGCHI TECH CO LTD

Shafting error measurement method and electronic equipment

The invention provides a shafting error measurement method and electronic equipment, and the method comprises the steps: when a first orthogonal error test instruction is received, executing the following steps: transmitting a first instruction to a tested stable platform, so as to control an azimuth axis of the tested stable platform to be fixed, a pitch axis of the tested stabilized platform is controlled to rotate by multiple angles, and a cross wire target assembly is installed on one side of the pitch axis of the tested stabilized platform; triggering a vision measurement system at each angle position of the pitch axis to acquire a target image, performing image processing on the acquired target image to obtain a target cross wire center coordinate corresponding to each angle position, and performing circle center fitting on the plurality of target cross wire center coordinates to obtain a first circle center coordinate; controlling the azimuth axis of the tested stabilized platform to rotate by 180 degrees, and repeating the steps to obtain a second circle center coordinate; and calculating a coordinate deviation between the first circle center coordinate and the second circle center coordinate, and obtaining a shafting orthogonal error of the tested stabilized platform according to the coordinate deviation.
Owner:WUHAN HUAZHONG AERONAUTICS M&C TECH CO LTD

System and method for measuring six-degree-of-freedom kinematic error of rotating shaft

The invention discloses a six-degree-of-freedom motion error measurement system and method for a rotating shaft, and the system comprises the rotating shaft, and an angle position error measurement assembly and a tilt motion and radial run-out error measurement assembly which are connected with the rotating shaft, and the tilt motion and radial run-out error measurement assembly comprises a first laser light path. The device further comprises an axial run-out error measurement assembly which is integrated on the first laser light path. The rotating shaft six-degree-of-freedom motion error measurement system is simple in structure and small in occupied space, the method is easy to operate, and accurate measurement of two tilt motion errors, two radial run-out errors, angle positioning errors and axial run-out errors can be achieved.
Owner:BEIJING RES INST OF AUTOMATION FOR MACHINERY IND

A method and system for error parameter estimation of a sensor

The application provides a sensor error parameter estimation method and system, comprising: collecting measurement data of a sensor by using a six-position method, the sensor comprising a gyroscope and / or an accelerometer; modeling a sensor error, performing sensor deterministic error parameter fitting by using a least square method; performing error compensation according to the deterministic error parameter to obtain a random error of the sensor; taking the random error as a measurement value of a Kalman filtering algorithm, modeling the random error by using a Gaussian-Markov model to take the random error as a state value of the Kalman filtering algorithm; designing a random error matrix and a driving noise covariance matrix; performing time updating and measurement updating of the Kalman filtering algorithm based on the measurement value, the state value, the random error matrix and the driving noise covariance matrix to correct the random error of the sensor. In real-time measurement, estimation of the deterministic error parameter and the random error parameter can overcome error measurement caused by the instrument itself, and more accurate measurement data can be obtained.
Owner:CCCC SECOND HIGHWAY CONSULTANTS CO LTD

Machine tool, gear measurement device, error measurement method, gear manufacturing method, and computer program

Provided is a technique capable of measuring a gear shape error. 【Solution means】The machine tool includes a control device configured to execute error measurement processing. The error measurement processing determines the approach start point and approach direction of a touch probe held by a tool holding device based on the posture of a workpiece machined into a gear shape held by a workpiece holding device, controls an actuator to move the touch probe in the approach direction from the approach start point, obtains the center position of the tip sphere of the touch probe when the touch probe contacts the surface of the workpiece due to the movement, determines a candidate value for the error between the gear shape and the target shape of the gear product, generates a cross-sectional model representing the cross-sectional shape of the tooth surface based on the candidate value, the target shape, and the posture, obtains the minimum distance between the cross-sectional model and the center position, changes the candidate value, and determines, as the error, a candidate value for which the absolute value of the difference between the minimum distance and the radius of the tip sphere is equal to or less than an allowable value.
Owner:YAMAZAKI MAZAK KK

A three-dimensional overlay mark and overlay error measurement apparatus calibration method

The embodiment of the present application discloses a kind of three-dimensional overlay mark and overlay error measurement equipment calibration method.Three-dimensional overlay mark includes substrate and multiple overlay marks on substrate;In multiple overlay marks, the height of the vertical projection of any two overlay marks on the first plane is different;The first plane is perpendicular to the plane where substrate is located.Due to the height of overlay mark in the first plane extension direction is different, the distance of different height overlay mark and shooting point is different, that is, the different height overlay mark forms the different defocus degree that image can express. Thus, once image shooting can obtain the image of overlay mark under different defocus range, without moving the position of overlay mark repeatedly traversing measurement, greatly improve the calibration efficiency of overlay error measurement equipment, avoid environmental factors to cause interference during long time calibration;It can also avoid that overlay mark is offset in horizontal direction, influence calibration precision.
Owner:HEFEI YUWEI SEMICONDUCTOR TECHNOLOGY CO LTD

Dynamic update path planning method and system based on Voronoi error measurement

The invention relates to a dynamic update path planning method and system based on Voronoi error measurement. The method comprises the following steps: acquiring input data and preprocessing the input data; generating a seed set according to the preprocessed data, and constructing a Voronoi diagram; extracting seed points according to the Voronoi diagram, and generating a candidate point set in the neighborhood of the seed points; comprehensive error calculation is carried out on candidate points in the candidate point set, and position updating is carried out on the seed points according to comprehensive errors; when the position of the seed point is updated or the local environment is changed, performing local reconstruction on the Voronoi diagram; and constructing a navigation map according to the reconstructed Voronoi map, obtaining a path with the minimum comprehensive cost according to the navigation map, generating a new local optimal path fragment, and obtaining a path planning result. According to the method, only the affected area is updated when the environment is locally changed, so that real-time and low-overhead path reconstruction and re-planning are realized.
Owner:GUANGDONG UNIV OF TECH

calibration block

1. Name of the design product: calibration block. 2. Use of the design product: suitable for in-machine error measurement and calibration of linear and rotary axes of five-axis machine tools. 3. Design points of the design product: in shape. 4. Picture or photo best indicating the design points: perspective view.
Owner:SHENZHEN SHUMA ELECTRONICS TECH

Error measurement method and device for rotating shaft of five-axis machine tool and electronic equipment

The invention provides an error measurement method and device for a rotating shaft of a five-axis machine tool and electronic equipment, and relates to the technical field of machine tools, and the method comprises the steps: fixing a workbench of the five-axis machine tool around a second rotating shaft, rotating the workbench around a first rotating shaft, and rotating the workbench around the first rotating shaft to a first angle, determining the error of the first rotating shaft according to the relative position between the connecting line of the first positions of the two measuring balls on the workbench and the first rotating shaft; the workbench is fixed around the first rotating shaft and rotates around the second rotating shaft, and under the condition that the workbench rotates around the second rotating shaft to a second angle, the error of the second rotating shaft is determined according to the relative position between the connecting line of the second positions of the two measuring balls and the second rotating shaft and the workbench plane. According to the embodiment of the invention, the error of the two rotating shafts is calculated according to the connecting line of the two measuring balls and the relative position between the two rotating shafts, so that the equipment cost is reduced, and the measuring cost is reduced.
Owner:BEIJING FANUC MECHATRONICS CO LTD

A method and system for measuring edge error of a curved surface based on longitude vector measurement

The application discloses a kind of based on fixed longitude vector measurement's curved surface edge error measurement method and system, the method steps include: S1) fixed longitude vector calibration is carried out to the measuring probe to obtain the trigger radius of the measuring probe;S2) according to trigger radius, obtain the measurement program of the edge to be measured;S3) the theoretical profile point coordinate is obtained by the measurement program of the edge to be measured, the actual profile point coordinate is obtained by the measuring probe actual measurement, by comparing theoretical profile point coordinate and actual profile point coordinate, the vector error of the edge to be measured is calculated.Compared with the traditional vector measurement method, the present application can realize the in-machine measurement of curved surface edge error, be used to guide chamfering or edge cutting process, and improve product qualification rate.
Owner:WUHAN HUAZHONG NUMERICAL CONTROL

Controlling substrate stress uniformity based on overlay error measurement.

PendingJP2026525197AOverlayAlgorithm
The method includes obtaining first data indicating the overlay error of a substrate using a processing device. The method further includes generating second data indicating the first stress uniformity of the substrate based on the first data. The method further includes performing corrective actions based on the second data.
Owner:APPLIED MATERIALS INC

Photomask group and overlay error measuring method

The invention discloses a photomask group and an overlay error measurement method, and the scheme provides a photomask which can be repeatedly used for multiple times, a plurality of groups of first mark patterns can be transferred to a front layer of a wafer at one time through a first photomask in the photomask group to form a first overlay mark group, and when a second photomask in the photomask group is used, the first overlay mark group is transferred to the front layer of the wafer at one time. In each time of etching, only a certain group of mark patterns in the second photomask are transferred to the current film layer of the wafer so as to be combined with the first overlay mark group to determine the overlay error of the photoetching process, and the plurality of mark pattern groups are arranged on the second photomask, so that the second photomask can be repeatedly used for a plurality of photoetching processes of a product, and the production efficiency is improved. And the preparation cost of the semiconductor is reduced.
Owner:BEIJING SUPERSTRING ACAD OF MEMORY TECH

Substrate stress uniformity management based on overlap error measurement

A method includes obtaining, by a processing device, first data indicative of an overlap error of a substrate. The method further includes generating second data indicative of a first stress uniformity of the substrate based on the first data. The method further includes performing a corrective action based on the second data.
Owner:APPLIED MATERIALS INC

Machine tool, gear measuring device, error measuring method, gear manufacturing method, and computer program

To provide a technique capable of measuring a gear shape error.SOLUTION: The machine tool includes a controller configured to execute an error measurement process. In the error measurement processing, an approach start point and an approach direction of a touch trigger probe held by a tool holding device are determined based on a posture of a gear-shaped workpiece held by a workpiece holding device, an actuator is controlled to move the touch trigger probe from the approach start point in the approach direction, and a center position of a tip ball of the touch trigger probe when the touch trigger probe is brought into contact with a surface of the workpiece by the movement is obtained, the method includes determining a candidate value of an error between a gear shape and a target shape of a gear product, generating a cross-sectional model representing a cross-sectional shape of a tooth surface based on the candidate value, the target shape, and a posture, obtaining a minimum distance between the cross-sectional model and a center position, changing the candidate value, and determining, as the error, a candidate value at which an absolute value of a difference between the minimum distance and a radius of a tip ball is equal to or less than an allowable value.SELECTED DRAWING: Figure 6
Owner:YAMAZAKI MAZAK KK

Error-proof measuring device for hollow piles

The hollow pile error-proof measuring device comprises a scale, a fixed measuring claw fixed to one end of the scale, a sliding measuring claw in sliding fit with the scale, and an error-proof measuring unit fixed with the sliding measuring claw; the error-proof measuring unit comprises the laser position calibrator for ensuring correct measuring position and reducing errors, a displacement sensor for converting displacement of the sliding measuring claw into data for digital display of readings, a central controller for calculation and implementation of various functions, an electronic display screen for display of data and interactive information, a key for human-computer interaction, and a battery for power supply; the central controller is connected with the laser position calibrator, the displacement sensor, the electronic display screen, the key, and the battery. The present application has the beneficial technical effect of automatically prompting the user to correctly measure the position and effectively avoid measurement errors.
Owner:CHINA CONSTRUCTION SIXTH ENGINEERING DIVISION CO LTD

A spindle rotation error measurement method and device based on optical principles

The application discloses a kind of main shaft rotation error measurement method and device based on optical principle.The main shaft rotation error measurement method is as follows: one, constructs coordinate system;Two, the axial error of main shaft is measured using light interference principle, and a beam is separated in the test light of axial error measurement and is shot to PSD, and radial error is obtained.The application sets up taper angle reflector at the end of main shaft, and the axial error of main shaft is measured using laser interference principle, the axial error measured by this mode is not influenced by radial error, the influence of inclination error can also be ignored, the complexity of axial error settlement is greatly reduced, and the detection precision is improved.In addition, while detecting axial and radial error, the application synchronously detects inclination error using annular reflector and laser autocollimator, and separates the measurement error caused by the inclination change of main shaft in radial error using the value of measured inclination error, and improves the detection accuracy of radial error.
Owner:HANGZHOU DIANZI UNIV

Overlay alignment mark and formation method thereof, and overlay error measurement method and device

The embodiment of the invention provides an overlay alignment mark and a forming method thereof, and an overlay error measuring method and device.The overlay alignment mark comprises a zero-layer mark located on the back face of a substrate; the current layer mark is located on the front face side of the substrate, and the front face and the back face of the substrate are oppositely arranged; wherein, from the back surface to the front surface, the current layer mark is located right above the zero layer mark. By adopting the technical scheme, the flatness of the front surface of the substrate can be improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP