514 results about "Depth of focus" patented technology

A system, apparatus and method for performing low coherence ranging of a sample with high transverse resolution and large depth of focus can be provided. For example, an optical ranging system including a light source can be used. Certain exemplary arrangement can be provided, e.g., a first arrangement for directing light from the light source to the sample, a second arrangement for directing reflected light from the sample to a detector, at least one detector, and a third arrangement for processing light data received by the detector and which generates an image can be utilized. Further, for example, an optical element can be provided which can have a transverse resolution defined as .Δris less than or equal to about μ5 m, and a depth of focus Δz of at least about 50 μm.

A photolithography and etch process sequence includes a photomask having a pattern with compensation features that alleviate patterning variations due to the proximity effect and depth of focus concerns during photolithography. The compensation features may be disposed near isolated or outermost lines of a device pattern. A photoresist pattern is formed to include the compensation features and the pattern etched to form a corresponding etched pattern including the compensation features. After etching, a protection material is formed over the layer and a trim mask is used to form a further photoresist pattern over the protection material. A subsequent etching pattern etches the protection material and removes the compensation features and results in the device lines being formed unaffected by proximity effects. Flare dummies may additionally be added to the mask pattern to increase pattern density and assist in endpoint detection. Flare dummies, like the compensation features, are subsequently removed by a photolithography and etching process sequence.

An exposure method and apparatus for use in exposing a photoresist on a semiconductor wafer do not employ an aperture for shaping the exposure light. The exposure apparatus includes a light source unit, a reflecting mirror unit having a micro mirror array (MMA) and a control unit that controls the MMA, and a pattern transfer unit that transfers the pattern of a photomask onto the photoresist. The angles of inclination of the respective mirrors of the MMA are adjusted to reflect incident light in a manner that shapes the incident light. Accordingly, it is possible to form a pattern having the highest degree of resolution and optimum depth of focus (DOF) in the shortest amount of processing time.

A method for creating a pattern on a photomask includes steps of recognizing a space between main patterns by using pattern data which indicate the main patterns to be adjacently transferred onto a wafer, determining a 1st rule about arrangement of an assist pattern on the photomask, the assist pattern being adjacent to the main patterns and not being transferred onto the wafer, estimating a depth of focus in the presence of the assist pattern among the main patterns, determining a 2nd rule about arrangement of the assist pattern on the photomask to improve the depth of focus in the presence of the 1st assist pattern among the main patterns in a group having one or more number of appearance times of the space between main patterns, and correcting the assist pattern on the photomask using the assist pattern data on the basis of the 2nd rule.

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming beams respectively passing through a plurality of different, concentric regions around the optical axis of the projection optical system on the Fourier transform plane. The coherence reducing member may be a polarization state control member for making a difference in polarization state, a member for making a difference in optical path length, or space filters with different shapes.

Circular and annular lens zones are disclosed which, at a given lens area, exhibit a depth of focus of a lens of considerably smaller area. The large depth of focus is achieved by imparting the lens zones a refractive power profile. An assembly of such large depth of focus lens zones represents a lens of large diameter which lens, in polychromatic light, exhibits essentially the same depth of focus as the lens zones from which it is composed.

A large depth of focus (DOF) display provides an image in which the apparent focus plane is adjusted to track an accommodation (focus) of a viewer's eye(s) to more effectively convey depth in the image. A device is employed to repeatedly determine accommodation as a viewer's gaze within the image changes. In response, an image that includes an apparent focus plane corresponding to the level of accommodation of the viewer is provided on the large DOF display. Objects that are not at the apparent focus plane are made to appear blurred. The images can be rendered in real-time, or can be pre-rendered and stored in an array. The dimensions of the array can each correspond to a different variable. The images can alternatively be provided by a computer controlled, adjustable focus video camera in real-time.

Intraocular implants and methods of making intraocular implants are provided. The intraocular implants can improve the vision of a patient, such as by increasing the depth of focus of an eye of a patient. In particular, the intraocular implants can include a mask having an annular portion with a relatively low visible light transmission surrounding a relatively high transmission central portion such as a clear lens or aperture. This construct is adapted to provide an annular mask with a small aperture for light to pass through to the retina to increase depth of focus. The intraocular implant may have an optical power for refractive correction. The intraocular implant may be implanted in any location along the optical pathway in the eye, e.g., as an implant in the anterior or posterior chamber.

An accommodating intraocular lens implantable in an eye. The lens comprises an anterior portion having an anterior biasing element and an anterior optic having refractive power. The lens further comprises a posterior portion having a posterior biasing element and a posterior optic having refractive power. The anterior optic and the posterior optic are relatively moveable in response to action of the ciliary muscle to change the separation between the optics and the refractive power of the lens. The lens has an aberration-inducing force characteristic of about 70 mg to about 115 mg to allow aberration-inducing relative movement of the optics when the lens is in the eye, thereby adding optical aberration to the lens which increases depth of focus of the lens. In one variation, the lens has an aberration-inducing force characteristic of 70 mg to 115 mg. Related methods are also disclosed.

A single-optic accommodative lens system comprising two intraocular elements. The two intraocular elements are designed to be located within the capsular bag to extend depth of focus and / or restore accommodation following extraction of a natural lens. A first intraocular element comprises a circumferential capsular ring having interlock features to couple to and control the dynamic vault response of a second intraocular element. This second intraocular element comprises an intraocular lens (IOL) having an optic and a plurality of haptics and is designed to move axially in response to changes in the geometry of the eye capsule and thus provide a range of accommodative power. The IOL further comprises interlock features complementary to the interlock features of the first intraocular element for coupling the IOL to the capsular ring in a manner that provides for controlled movement of the IOL in response to capsular forces. Capsular force can be applied to the IOL from anterior, posterior and / or intermediate sections of the capsule equator, resulting in movement of the IOL and commensurate accommodation.

A controlled, switched laser system for vaporizing a target structure on a substrate includes a diode-pumped, solid-state laser for producing a laser output, a controllable switch for controlling the on / off state and power level of the laser, and a wavelength shifter. The wavelength shifter shifts the wavelength of the laser output from a conventional wavelength to a wavelength beyond the absorption edge of the substrate but shorter than 1.2 μm in order to obtain a decrease in absorption of the laser output by the substrate due to the shift in the wavelength of the laser output. The wavelength shifter is removably insertable into the switched laser system so as to enable the switched laser system to operate at the conventional wavelength and at the wavelength beyond the absorption edge of the substrate. Heating of the substrate and hence damage to the substrate is limited due to the wavelength being beyond the absorption edge of the substrate. Good depth of focus of the laser beam output is maintained relative to spot size of the laser beam output due to the wavelength being less than about 1.2 μm.

A method and apparatus for increasing the depth of focus of the human eye is comprised of a lens body, an optic in the lens body configured to produce light interference, and a pinhole-like optical aperture substantially in the center of the optic. The optic may be configured to produce light scattering or composed of a light reflective material. Alternatively, the optic may increase the depth of focus via a combination of light interference, light scattering, light reflection and / or light absorption. The optic may also be configured as a series of concentric circles, a weave, a pattern of particles, or a pattern of curvatures. One method involves screening a patient for an ophthalmic lens using a pinhole screening device in the lens to increase the patient's depth of focus. Another method comprises surgically implanting a mask in the patient's eye to increase the depth of focus.

A method of making a mask configured to improve the depth of focus of an eye of a patient is provided. A substrate with a mask forming feature is provided. The mask forming feature comprises a forming surface that extends from an outer periphery. The forming surface is centered on a central axis of the mask forming feature. A release layer is formed on the forming surface. A mask layer is formed such that the release layer is between the mask layer and the substrate. The mask layer is formed of a biocompatible metal. A surface of the mask layer opposite the release layer is configured to not corrode. The mask layer is separated from the substrate.