3 results about "Positive type" patented technology

The invention relates to an onium salt, a chemically amplified resist composition and a pattern forming method. The present invention addresses the problem of providing, in optical lithography using energy rays, high sensitivity and excellent resolution regardless of the positive type or the negative type, whereby lithography performance such as LWR of a line pattern and CDU, EL, and DOF of a hole pattern can be improved, and photolithographic performance can be improved. The present invention relates to an onium salt for use in a chemically amplified resist composition, a chemically amplified resist composition, and a pattern forming method, and more particularly, to a chemically amplified resist composition and a pattern forming method. [Solution] An onium salt represented by formula (1).

Provided is a thick film chemically amplified positive type resist composition. A thick film chemically amplified positive type resist composition comprising an alkali-soluble resin (A) having a certain structure, a photoacid generator (B), and a solvent (C).

To provide an onium salt used for a chemically amplified resist composition which has high sensitivity, excels in resolution, improves lithography performance such as EL, LWR, CDU, and DOF, and can suppress collapse of a resist pattern in photolithography using high energy rays regardless of a positive type or a negative type, and to provide a chemically amplified resist composition and a pattern forming method.SOLUTION: An onium salt having the formula (1): Herein Xq - is an anion. However, the acid (XqH) having Xq - as a conjugate base has a boiling point of less than 165 °C. and a molecular weight of 150 or less. ) SELECTED DRAWING: None