349 results about "Positive type" patented technology

A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator component which generates acid on exposure, in an organic solvent component (C), wherein the resin component (A) is a copolymer comprising (a1) a unit derived from a (meth)acrylate ester comprising an acid dissociable, dissolution inhibiting group containing a polycyclic group, (a2) a unit derived from a (meth)acrylate ester comprising a lactone containing monocyclic group or polycyclic group, (a3) a unit derived from a (meth)acrylate ester comprising a hydroxyl group containing polycyclic group, and (a4) a unit derived from a (meth)acrylate ester comprising a polycyclic group which is different from the unit (a1), the unit (a2) and the unit (a3). This composition provides a chemically amplified positive type resist composition which displays excellent resolution, enables the depth of focus range of an isolated resist pattern to be improved, and enables the proximity effect to be suppressed.

A positive type photosensitive resin composition which comprises (A) 100 parts by weight of a polyamide represented by the general formula (1): wherein X represents a tetravalent aromatic group; Y represents a divalent aromatic group; Z represents a group represented by the formula: in which R1 and R2 represent organic groups and R3 and R4 represent monovalent organic groups; a and b represent molar fractions; a+b=100 mole %; a=60.0-100.0 mole %; b=0-40.0 mole %; and n represents an integer of 2 to 500, (B) 1 to 100 parts by weight of a photosensitive diazoquinone compound and (C) 1 to 50 parts by weight of a phenol compound represented by a specific structural formula and / or (D) 0.1 to 20 parts by weight of an organosilicon compound represented by a specific structural formula; and a semiconductor device in which a pattern of a polybenzoxazole resin obtained by using the above photosensitive resin composition is formed in a thickness of 0.1 to 20 mu m on a semiconductor element.

Disclosed is a positive-type photosensitive resin composition comprising: (a) an alkali-soluble resin; (b) a quinone diazide compound; (c) a heatsensitive compound which colors upon being heated and which shows an absorption maximum at a wavelength of not less than 350 nm and not more than 700 nm; and (d) a compound which does not have an absorption maximum at a wavelength of not less than 350 nm to less than 500 nm, and has an absorption maximum at a wavelength of not less than 500 nm and not more than 750 nm. The composition is preferably used for forming light-blocking separators or black matrices of organic electroluminescent devices and liquid crystal display elements.

A method for mitigating false positive type errors while applying an information leak prevention policy, the method comprising the computer implemented steps of: defining at least one positive criterion for a positive set, wherein the positive criterion comprises at least one indicator of a possible breach of the information leak prevention policy; defining at least one negative criterion for a negative set, wherein the negative criterion comprises at least one indicator of benign traffic; establishing an ambiguity set in association with an intersection between the positive set and the negative set, such that information items in the intersection enter the ambiguity set; defining at least one ambiguity resolution criterion for resolving the ambiguity; monitoring and analyzing electronic traffic, where each information item in the traffic is searched for matches with the positive set; checking for membership of each item in the positive set in the ambiguity set; resolving ambiguities using one of the ambiguity resolution criterion for each member of the ambiguity set and removing items from the positive set accordingly, and applying information leak prevention policy for all items remaining in the positive set following the removal of items using ones of the ambiguity resolution criteria.

There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator component which generates acid on exposure, in an organic solvent component (C), wherein the resin component (A) is a copolymer comprising (a1) a unit derived from a (meth)acrylate ester comprising an acid dissociable, dissolution inhibiting group containing a polycyclic group, (a2) a unit derived from a (meth)acrylate ester comprising a lactone containing monocyclic group or polycyclic group, (a3) a unit derived from a (meth)acrylate ester comprising a hydroxyl group containing polycyclic group, and (a4) a unit derived from a (meth)acrylate ester comprising a polycyclic group which is different from the unit (a1), the unit (a2) and the unit (a3). This composition provides a chemically amplified positive type resist composition which displays excellent resolution, enables the depth of focus range of an isolated resist pattern to be improved, and enables the proximity effect to be suppressed.

The invention provides a liquid crystal display device which has blue phase liquid crystal. The liquid crystal display device comprises a plurality of electrodes. In the invention, at least one pair of electrodes is arranged on one side of the blue phase liquid crystal to supply a transverse electric field to drive the macromolecular stabilized positive type blue phase liquid crystal for increasing the penetration rate of the light and controlling the bright state of the liquid crystal display device; and at least one pair of electrodes are arranged on the opposite sides of the blue phase crystal liquid to supply a vertical electric field, so the macromolecular stabilized positive type blue phase liquid crystal has excellent optical isotropy in a dark state and light leak in the dark state is reduced.

The present invention provides an ink jet recording head forming method which can be improved in a discharging characteristic. The method includes at least the step of forming an ink flow path pattern on a substrate by a photodecomposable positive type resist resin, the step of once executing each of the steps of applying, exposing and baking thereon a nozzle-constituting resin layer which is a negative type resist containing an optical cation polymerization starting agent and having an epoxy resin as a chief component with respect to each of an ink flow path pattern and an ink discharge port pattern, the step of collectively developing unexposed portions on the respective nozzle-constituting resin layers, and the step of removing the formed photodecomposable resin. Therefore, a minute projection is formed at a location separate from the substrate surface side of the cross section of the ink discharge port and thus, the deviation of the flying direction of an ink droplet due to the asymmetry of the inner shape of the ink flow path is minimized.

A positive-type planographic printing material contains (a) a water-insoluble and alkaline water-soluble polymer including a main chain and having a phenol structure in the main chain, the phenol structure having an aromatic ring and at least one electron-withdrawing substituent on the aromatic ring; and (b) an infrared absorbing agent.

In the manufacturing method of a GOLD structured TFT having a gate electrode of double-layered structure, in which, compared to a second layer gate electrode, the first layer gate electrode is thinner in film thickness and longer in dimension of the channel direction, by controlling the density of the photo-absorbent contained in a positive type resist, which contains a photo-absorbent of diazonaphthoquinone (DNQ)-novolac resin series, the taper angle of the side wall is controlled to a desired angle range so that the angle thereof becomes smaller. Owing to this, it is possible to control the retreat amount of the resist when carrying out dry etching and the dimension of Lov area to a desired dimensional range so that the dimension thereof becomes larger.

There is provided a dye-containing resist composition comprising a ketol solvent; a negative type resist composition comprising a resin, a photoacid generator or a photobase generator, a crosslinking compound, a dye and a ketol solvent; a negative type resist composition comprising a resin, a photoradical generator, a crosslinking compound, a dye and a ketol solvent; a positive type resist composition comprising a resin, a photoacid generator, a crosslinking compound, a dye and a ketol solvent. The ketol is preferably β-hydroxyketone, more preferably 4-hydroxy-4-methyl-2-pentanone. The resist composition does not occur problems such as occurrence of foreign matters (particles) even when the concentration of dye is increased, and enables the production of color filters in a shape of thinner film.

Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350°C or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a polymer having, as the main component, at least one structure selected from the group consisting of a polyimide precursor structure, a polybenzoxazole precursor structure, and a polyimide structure, (b) a quinonediazide compound, (c) a silane coupling agent having a styryl group, (d) a silane coupling agent having an epoxy group, an oxetanyl group, a methacryloxy group, an acryloxy group, an amino group, an amide group or mercapto group and an alkoxysilyl group, and (e) a solvent.

A method of manufacturing a liquid ejection head includes a step of forming a layer of a positive-type photosensitive resin on a substrate; a step of forming a pattern, used to form a liquid channel, by exposing the positive-type photosensitive resin layer to light; a step of forming a photosensitive layer, used to form a discharge port-forming member, on the pattern; and a step of forming a discharge port in such a manner that the photosensitive layer is patterned by exposing the photosensitive layer to i-line. The pattern has a predetermined absorbance for i-line and contains a specific compound.

This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3 μm of film thickness at a wavelength of 400 nm is 95% or more.

In a transflective liquid crystal display device, assuming that a narrower angle among angles formed by the initial liquid crystal alignment direction of a liquid crystal layer, and the projection direction of a pixel electrode of a transmissive unit is Et and that a narrower angle among angles formed by the initial liquid crystal alignment direction of the liquid crystal layer, and the projection direction of a pixel electrode of a reflective unit is θr, (1) when the liquid crystal layer possesses a positive-type liquid crystal, the relation of θt>θr is satisfied, and (2) when the liquid crystal layer possesses a negative-type liquid crystal, the relation of θr>θt is satisfied. The relations are satisfied by slanting or bending at least one of the pixel electrodes, and the reflectivity is improved.

Provided is a polyamic acid resin composition for formation of a bank, which provides excellent film characteristics and adhesion to a substrate, which can undergo patterning with use of a positive type photoresist, and which can be transformed into a polyimide after the patterning to yield a polyimide resin with upper part of film having a low surface energy. It is achieved by a polyamic acid resin composition comprising a polyamic acid [a] as a base and a polyamic acid [b] having a fluorine-containing alkyl group with a carbon number of at least 2, and containing the polyamic acid [b] in an amount of from 0.1 to 30 wt % to the total amount of the polyamic acid [a] and the polyamic acid [b].

A transflective liquid crystal display device with improved display quality in which the liquid initial alignment direction of the liquid crystal layer is in a direction perpendicular to the extending direction of a clearance between the counter electrode of a transmission portion and a counter electrode of a reflection portion or in a direction within a range of ±2° in the clockwise direction perpendicular to the extending direction of the clearance in a case where the liquid crystal layer comprises positive type liquid crystals, or the liquid crystal initial alignment direction of the liquid crystal layer is in a direction parallel with the extending direction of a clearance, or a direction within a range of ±2° in the clockwise direction relative to the extending direction of the clearance in a case where the liquid crystal layer comprises negative type liquid crystals.

The invention discloses a positive type photosensitive polyimide resin composition. The composition includes alkaline solubility polyimide (a), a photosensitizer (b) and a cross-linking agent (c). The cross-linking agent is composed of one or two of a benzoxazine compound and a compound with two or more epoxy groups contained in one molecule according to any ratio. The weight percentage of the alkaline solubility polyimide (a), the photosensitizer (b) and the cross-linking agent (c) is 100:10-50:5-20. According to the composition, 2,2-bis[4-(5-amino-2-pyridyloxy)phenyl]hexafluoropropane or 2,2-bis[4-(5-amino-2-pyridyloxy)phenyl] propane, 3,3-di-tert-butyl benzidine and siloxane diamine are used as diamine components for preparing the alkaline solubility polyimide resin. The prepared positive photosensitive polyimide resin composition is high in transmittance, low in coefficient of thermal expansion, high in heat resistance and excellent in photosensitive property.

The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units represented by the following general formula (1) and, furthermore, in that it satisfies the following conditions (a) and / or (b). The invention provides an alkali-developable photosensitive composition.(a) There is included an ester of a naphthoquinone diazide sulphonic acid and a phenol compound of dipole moment 0.1 to 1.6 debye(b) There is included a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid and / or an ester of a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid(In general formula (1), R1 represents a bivalent to octavalent organic group with at least two carbon atoms, R2 represents a bivalent to hexavalent organic group with at least two carbon atoms, and R3 represents hydrogen or an organic group with from one to ten carbons. n is an integer in the range 10 to 100,000, m is an integer in the range 0 to 2, and p and q are integers in the range 0 to 4, but p and q are not simultaneously 0.)(In the formula, R23, R24, R26 and R27 each represents a hydrogen atom or a C1-8 alkyl group, alkoxy group, carboxyl group or ester group. At least one R25 is hydroxyl group, while the rest represent hydrogen atoms and C1-8 alkyl groups. aa, bb, cc and dd represent integers in the range 0 to 3. However, aa+bb<=5, bb+dd<=5 and aa+bb>0. ee represents an integer in the range 1 to 3.)

An insert-exchangeable, rotary tool to which throwaway inserts are detachably attached, the insert comprising substantially square-shaped face and bottom surface and an outward curved flank on each side surface, and having a positive-type shape in which an outward curved edge line formed by the face and the flank serves as a cutting edge; each flank having in a substantially center portion a flat surface portion extending to the bottom surface without contacting with the cutting edge; a major cutting edge formed by the outward curved edge line circularly extending from its lowermost point toward a periphery of the tool when the insert is attached to the insert-exchangeable, rotary tool, such that it has a negative radial rake; and the lowermost point being positioned inward a center of the outward curved major cutting edge.