13results about How to "Increase photosensitivity" patented technology

This invention discloses a copper-based ternary chalcogenide semiconductor material, its preparation method, and its applications. The material is prepared by mixing CuSn(OH)6 nanomaterials, thioacetamide, ethylenediaminetetraacetic acid, and water and carrying out a hydrothermal reaction to obtain Cu3SnS4 nanomaterials. This semiconductor material exhibits excellent photoelectrochemical properties. Photoelectrochemical sensors constructed based on this material demonstrate high detection accuracy, fast response speed, low detection limit, and strong stability, enabling rapid and accurate real-time detection of microplastic content. The preparation method is simple, low-cost, and suitable for industrial production.

The application discloses a kind of light-responsive ordered porous membrane materials for cell spontaneous adhesion and detachment and preparation method thereof.The porous membrane material component includes polymer and light-responsive compound spiropyran, and the polymer is at least one of polylactic acid, polystyrene.The preparation method of porous membrane material is as follows: (1) polymer and light-responsive compound are dissolved in solvent; (2) the prepared solution is added dropwise to the surface of substrate, and the substrate is placed on the rotating platform of spin coater; (3) air is introduced into the spin coater, so that the air flow is blown to the solution from directly above the solution, and the air rate introduced, the temperature and relative humidity inside the chamber of spin coater are controlled, while starting the spin coater and controlling its rotating speed; (4) after the solvent is completely volatilized, stop the spin coater rotation, take out the substrate to obtain the ordered porous membrane material.The ordered porous membrane can make cell spontaneous adhesion and spontaneous detachment, so as to improve the success rate and harvest rate of cell culture.

Disclosed are a photosensitive resin composition, use thereof, a display device, and a semiconductor device. The photosensitive resin composition comprises: an alkali-soluble resin, a polymerizable monomer different from the alkali-soluble resin, and a photoinitiator comprising at least one oxime ester compound represented by Formula I. The oxime ester compound represented by Formula I has high thermal stability, good solubility in solvents commonly used for preparing photosensitive resin compositions, and can impart good film-forming properties, developability, and photosensitivity to the photosensitive resin composition. The photosensitive resin composition is suitable for use in preparing photo-cured materials such as a photoresist for semiconductors, a colored photoresist, a photo-spacer, etc. The definitions of the substituents in Formula I are as described in the specification and claims.[Formula I]

This invention discloses a class of tin-oxygen metal clusters coordinated with dialkyl and organic cyclic carboxylic acids, their synthesis, and applications. These clusters exhibit higher reactivity due to the presence of more Sn atoms and more Sn-C bond reaction sites. The tin-oxygen metal clusters have the structure of general formula I.

The invention discloses a lipid droplet targeted photosensitive fluorescent molecule as well as a preparation method and application thereof. The fluorescent molecule has a structure as shown in a formula I, wherein R is selected from at least one of a formula a, a formula b, a formula c, a formula d, a formula e and a formula f; according to the application, the lipid droplet targeting and photosensitivity of fluorescent molecules are utilized to realize proximity labeling of proteins around lipid droplets in cells, and regulatory factors of interaction of the lipid droplets and mitochondria are disclosed through proteome analysis. The probe realizes proximity markers which do not depend on genetic manipulation in the field.

The application provides a small-molecule photosensitive polyaryletherketone precursor, a preparation method and application thereof, and belongs to the technical field of photosensitive resin and functional molecule synthesis. The application is designed from the photosensitivity of a small molecule. By regulating the photosensitivity of the small molecule, the polymerization of the small-molecule precursor with high molecular weight can be completed through photopolymerization. Meanwhile, the forming and curing problems of the small-molecule precursor can be further solved, and two goals are achieved at one time. The principle design of the application is different from the prior art scheme of realizing the photosensitivity of polyaryletherketone by using an oligomer. The prior art is difficult to realize good solubility, controllability of molecular weight and precise regulation of molecular structure, so that a polyaryletherketone photosensitive resin with good comprehensive performance cannot be prepared. The small-molecule photosensitive polyaryletherketone precursor obtained by the application has controllable molecular weight, controllable molecular structure, excellent photosensitivity and good solubility in active diluents and solvents.

The application provides a modified polyurethane acrylate oligomer and a preparation method and application thereof, and belongs to the technical field of high polymer materials.The modified polyurethane acrylate oligomer has a structure as shown in formula (I); and the preparation method comprises the following steps: using hydroxyl-terminated polybutadiene and ethylene oxide as raw materials to perform ring-opening addition reaction to obtain hydroxyl-terminated polybutadiene / EO polymer; performing urethane reaction of the hydroxyl-terminated polybutadiene / EO polymer and diisocyanate, and then performing urethane reaction of the obtained product and 2-hydroxyethyl acrylate or 2-hydroxyethyl 2-alkyl acrylate.The modified polyurethane acrylate oligomer contains polybutadiene segments, which can obviously improve the flexibility of a photosensitive dry film, enhance the resistance to developer or etchant impact, and significantly improve the hole masking performance.

The application discloses a water-soluble light-induced release nitric oxide antibacterial supramolecular complex and a preparation and application thereof. The complex contains a host compound and a guest compound. Hydrogen bond interaction between a cavity of the host compound and an alkyl chain of the guest compound realizes stable existence of the alkyl chain in the cavity, so that the complex based on the interaction of the host compound and the guest compound is formed. The application solves the problem that the existing nitrobenzene derivative has extremely low photosensitivity, poor water solubility and obvious cytotoxicity, thereby limiting the biological application of the nitrobenzene derivative. The application effectively improves the photosensitivity, water solubility and biocompatibility of the nitrobenzene derivative, and has excellent in-vitro and in-vivo antibacterial performance.

The application discloses an etching process of screen cloth for silk screen printing, and relates to the technical field of silk screen printing.The etching process of screen cloth for silk screen printing comprises the following steps: S1, taking a silk screen and a screen frame according to printing requirements, cleaning, drying, tightly fixing the cleaned silk screen on the screen frame, and adjusting the tension to 20N-25N; S2, uniformly coating a photosensitive glue on the surface of the silk screen, drying, and obtaining a photosensitive film; S3, preparing a positive film according to printing requirements, combining the positive film with the photosensitive film, exposing under iodine gallium lamp light, then soaking in water, cleaning, and drying to obtain a developed screen printing plate; S4, checking the developed screen printing plate, repairing the missing part, and drying after repairing; and S5, smearing a curing agent on the surface of the repaired screen printing plate, curing, and obtaining the screen cloth.The photosensitive glue prepared by the application has good thermal stability and developing effect, and the prepared screen cloth has higher resolution.

The application discloses a series of compounds with a multi-benzene ring hydroxyl system and application of the compounds as photoinitiators. The multi-benzene ring hydroxyl aromatic system compound of the application can be combined with diazonium naphthoquinone (DNQ) to form a photoresist which is loaded on the surface of a substrate, and the photoresist can be processed by a photoetching process to obtain a high depth gradient, thus having practical significance for becoming an I-line photoinitiator.

The application relates to the technical field of composite materials and discloses a protein separation special precise ultrafiltration membrane and a preparation method thereof, which comprises the following steps: S1: polyether sulfone, zinc oxide, glycerol, acetone and a solvent are added into a reaction kettle to be configured into a mixed solution, and the mixed solution is stirred and heated; S2: the mixed solution prepared in S1 is uniformly stirred, vacuum defoaming treatment is carried out, and an ultrafiltration membrane casting solution is prepared; S3: the casting solution in S2 is extruded from a ring-shaped spinneret through a metering pump, warm and humid air is introduced into the inner cavity of the ring-shaped spinneret, the air enters a gel tank, is phase-separated and solidified to be a hollow fiber membrane, the initial polyether sulfone hollow fiber ultrafiltration membrane is obtained through traction and winding; and S4: the initial polyether sulfone hollow fiber ultrafiltration membrane in S3 is cleaned with pure water, is hung and dried in a dehumidification room with certain temperature and humidity, and the hollow fiber special ultrafiltration membrane is prepared; the application has the following advantages and effects: the finished product has better hydrophilicity, higher pure water flux and more precise separation effect.

The invention discloses a photoactive dielectric film, a preparation method and application, and relates to the field of organic electronics and neuromorphic devices, the film is made of a poly (octyl citrate)-cysteine copolymer, and the film has enhanced photoluminescence characteristics after being thermally activated; according to the photoactive dielectric film, L-cysteine is introduced into a polyester matrix, and specific heat treatment (180 DEG C or 200 DEG C annealing) is performed after synthesis, so that the dielectric film is endowed with an adjustable photoluminescence characteristic, and the dielectric layer is converted into an active photoactive functional layer from a passive insulating layer; therefore, the multi-wavelength light response of the neuromorphic device is effectively improved.

This invention provides a photosensitive resin composition, its preparation method, a photosensitive dry film, and its applications. The photosensitive resin composition, by weight, comprises: 45-65 parts of an alkali-soluble resin, 35-55 parts of a photopolymerizable monomer, 0.08-1.8 parts of a first photoinitiator, and 0.5-5 parts of additives; the first photoinitiator has the structure shown. This invention uses an acridine-modified oxime ester photoinitiator as the core photoinitiator component, achieving a significant improvement in the photosensitivity of the photosensitive resin composition.