38results about How to "Increase photosensitivity" patented technology

The embodiment of the invention provides a display panel and a display device. The display panel comprises a pixel driving circuit, the pixel driving circuit comprises a silicon semiconductor transistor, an oxide transistor and a storage capacitor which are electrically connected, and the display panel comprises a first active layer, a first gate layer and a second active layer which are sequentially arranged in a stacked mode. A grid electrode of the oxide transistor, a grid electrode of the silicon semiconductor transistor and a first pole plate of the storage capacitor are located on a first grid electrode layer, an active pattern of the oxide transistor and a second pole plate of the storage capacitor are located on a second active layer, and the first grid electrode layer can be adopted to form a bottom grid of the oxide transistor. The active pattern of the transistor in the second active layer is prevented from being influenced by light, so that the photosensitivity and the electrical property of the transistor are improved, the performance of the display panel is improved, and the electrical property improvement effect of the oxide transistor is good due to the fact that the distance between the first gate layer and the second active layer is small.

The invention discloses a photoresist composition and a patterning method thereof, the photoresist composition comprises an organic solvent, a free radical photoinitiator, a co-initiator and a film-forming monomer, the film-forming monomer is metal oxygen cluster and metal oxide nanoparticles, the mass percentage content of the film-forming monomer is 1-30%, the mass percentage content of the co-initiator is 1-30%, and the mass percentage content of the film-forming monomer is 1-30%. The mass percentage content of the free radical photoinitiator is 0.01%-3%, the mass percentage content of the auxiliary initiator is 0-10%, and the mass percentage content of the organic solvent is 57%-98.99%. According to the photoresist composition introduced with the free radical photoinitiator, free radicals are efficiently generated under illumination, cross-linking polymerization of double bonds on the surfaces of metal oxygen clusters and metal oxide nanoparticles is promoted, the photosensitive performance is greatly improved, excellent sensitivity is shown in extreme ultraviolet, electron beams and visible light (within the light source range of 250-600 nanometers), and high-precision photoetching patterning is achieved.

This invention discloses a copper-based ternary chalcogenide semiconductor material, its preparation method, and its applications. The material is prepared by mixing CuSn(OH)6 nanomaterials, thioacetamide, ethylenediaminetetraacetic acid, and water and carrying out a hydrothermal reaction to obtain Cu3SnS4 nanomaterials. This semiconductor material exhibits excellent photoelectrochemical properties. Photoelectrochemical sensors constructed based on this material demonstrate high detection accuracy, fast response speed, low detection limit, and strong stability, enabling rapid and accurate real-time detection of microplastic content. The preparation method is simple, low-cost, and suitable for industrial production.

The utility model relates to the technical field of semiconductors, in particular to a chip packaging structure. The chip packaging structure comprises a substrate, a chip, a first photocuring layer and a light-transmitting layer, the chip is provided with a first surface and a second surface which are opposite to each other, the chip is arranged on the substrate through the first surface, and the chip is electrically coupled with the substrate; the first photocuring layer is arranged on the substrate and covers the peripheral side of the chip and the part, close to the peripheral side of the chip, of the second surface; the light-transmitting layer is arranged on the first photocuring layer and is distributed opposite to the chip; wherein the light-transmitting layer, the first light-curing layer and the part, not covered by the first light-curing layer, of the second surface are jointly surrounded to form a functional space. According to the chip packaging structure, the problem that light is reflected by the adhesive layer for arranging the light-transmitting layer on the chip can be solved, so that the performance of the chip packaging structure is ensured.

The invention belongs to the technical field of photoresist materials, and particularly relates to an etching-resistant ArF photoresist and a preparation method thereof. The etching-resistant ArF photoresist is prepared from the following raw materials in parts by weight: 90 to 100 parts of film-forming resin, 5 to 15 parts of a photoacid generator, 0.5 to 2 parts of organic alkali, 3 to 10 parts of an etching-resistant additive and 3000 to 5000 parts of a photoresist solvent, and the etching-resistant additive is a cholic acid derivative; the film-forming resin comprises metacrylic acid ester with a side chain containing lactone, metacrylic acid ester with a side chain containing an aliphatic ring protecting group and metacrylic acid ester with a side chain containing a polar group; according to the etching-resistant ArF photoresist disclosed by the invention, the photoresist with a relatively high-resolution pattern can be formed; the photoresist has high resolution and etching resistance, and the application range of the photoresist can be widened.

The invention discloses a terpyridyl zinc complex as well as a preparation method and application thereof, and belongs to the technical field of materials. The terpyridyl zinc complex has the following molecular structure: # imgabs0 #, wherein X is a balancing anion; r1 and R2 are independently selected from a nitrogen heterocyclic unit, a benzene ring unit or a triphenylamine unit. The compound has semiconductor properties, can generate hydrogen peroxide with water and oxygen under sunlight illumination, and can be used as a photosensitizer or a photocatalyst.

The present invention provides a photoresist composition, a preparation method and an application thereof, and a method for forming a photoresist pattern, and specifically relates to the field of photoresist technology. The photoresist composition comprises a poly(p-hydroxystyrene) homopolymer and a photodeactivator, and the mass ratio of the two is 100-600:2-50. The weight average molecular weight of the poly(p-hydroxystyrene) homopolymer is 1000-20000. The photoresist composition has strong photosensitivity, and after exposure by a 248nm deep ultraviolet lithography light source, the exposure dose can be reduced to 10mJ / cm at a film thickness of 500nm. 2 The poly(p-hydroxystyrene) homopolymer has no protective group and can participate in cross-linking, so it has a higher carbon atom content, significantly improves dry etching resistance, improves etching ratio, greatly improves customer production efficiency, and reduces production costs.

The invention provides a photolithography coated high-nickel ternary positive electrode material and a preparation method thereof, and belongs to the technical field of lithium ion battery positive electrode materials, and the preparation method comprises the following steps: carrying out wet spraying coating on LiNixCoyMn1-x-y-wZrwO2 matrix powder by using a conductive photoresist as a modifier to obtain a coated product, and under the protection condition of an oxygen atmosphere, carrying out wet spraying coating on LiNixCoyMn1-x-y-wZrwO2 matrix powder to obtain the high-nickel ternary positive electrode material. And sequentially carrying out exposure reaction, washing and developing treatment, drying, sieving and iron removal on the coated product by utilizing illumination or thermal radiation to obtain the conductive polymer coated high-nickel ternary positive electrode material. According to the invention, the advantages of good conductivity and stable structure of the conductive polymer are fully utilized, so that the problem of migration resistance of Li < + > on a material interface is reduced in the high-current charging and discharging process of the battery, and dissolution of metal particles on the surface of the material and surface side reaction are inhibited; the obtained high-nickel ternary positive electrode material crystal coated with the conductive polymer is high in first discharge efficiency, good in rate capability and cycle performance, and simple in process operation.

The invention relates to the technical field of polyurethane materials, and discloses a flexible photosensitive polyurethane film and a preparation method thereof. The preparation method of the flexible photosensitive polyurethane film comprises the following steps: preparing a photosensitive monomer; the preparation method comprises the following steps: reacting diisocyanate, soft-segment diol and a photosensitive monomer through a one-pot method to obtain a polyurethane solution; and coating the polyurethane solution on a substrate, and drying to obtain the flexible photosensitive polyurethane film. The flexible photosensitive polyurethane film is prepared by adopting a one-step synthesis process, the preparation process is simple, and the production efficiency is improved. The flexible photosensitive polyurethane film prepared by the invention has high photosensitive performance and pattern resolution, a highly regular microstructure can be accurately constructed on the surface of the flexible photosensitive polyurethane film through photomask and ultraviolet exposure treatment, the processing technology is simple, and complex highly ordered patterns can be realized; and the microstructure on the surface can evolve along with time, so that the characteristic that the optical performance of the material surface changes along with time is endowed.

The utility model provides a three-camera light guide structure comprising a light guide assembly which comprises a housing, cameras, a support, a rectangular block, a rotating rod, a driving motor, a light guide structure, a telephoto lens and a photosensitive element. And three cameras are arranged on the shell. According to the utility model, the camera is used for shooting, the light emitted by the camera is transmitted to the photosensitive element through the corresponding light guide structure, and the incident light can be effectively guided to the photosensitive element through the reflection of the reflective mirror, so that the light utilization rate is improved, and the photosensitive capability of the camera is enhanced; the driving motor drives the corresponding rotating rod to rotate, and the rotating rod drives the corresponding light guide structure to rotate, so that the inclination angle of the light guide structure can be adjusted, the light guide structure can adapt to different light incident angles and shooting scenes, the adaptability to different light conditions can be realized by adjusting the angle of the reflective mirror, and the shooting performance of the camera is improved.

The present invention discloses a two-dimensional organic / inorganic heterojunction optoelectronic neuron device and a preparation method thereof, belonging to the technical field of optoelectronic devices. In the present invention, the TMDC material MoS is firstly peeled off by mechanical stripping. 2 Transferred to the substrate, and then on MoS 2 The thin film electrode is plated on the MoS layer, and finally the inverted method is used to 2 A single layer of Me-PTCDI crystal is grown epitaxially on the layer to form a heterojunction. MoS 2 The formation of the / Me‑PTCDI heterojunction makes the optoelectronic neuron device have excellent photosensitivity and light adaptability, and can simulate the response of the intrinsic photosensitive ganglion cells of the retina under different light conditions; the device can make current changes under the stimulation of light pulses, thereby imitating the production and action of human melatonin, and can achieve visual adaptation in bright and dark environments under gate voltage regulation. The corresponding characteristics make this device have broad application prospects in the field of autonomous driving.

The application discloses a kind of light-responsive ordered porous membrane materials for cell spontaneous adhesion and detachment and preparation method thereof.The porous membrane material component includes polymer and light-responsive compound spiropyran, and the polymer is at least one of polylactic acid, polystyrene.The preparation method of porous membrane material is as follows: (1) polymer and light-responsive compound are dissolved in solvent; (2) the prepared solution is added dropwise to the surface of substrate, and the substrate is placed on the rotating platform of spin coater; (3) air is introduced into the spin coater, so that the air flow is blown to the solution from directly above the solution, and the air rate introduced, the temperature and relative humidity inside the chamber of spin coater are controlled, while starting the spin coater and controlling its rotating speed; (4) after the solvent is completely volatilized, stop the spin coater rotation, take out the substrate to obtain the ordered porous membrane material.The ordered porous membrane can make cell spontaneous adhesion and spontaneous detachment, so as to improve the success rate and harvest rate of cell culture.

Disclosed are a photosensitive resin composition, use thereof, a display device, and a semiconductor device. The photosensitive resin composition comprises: an alkali-soluble resin, a polymerizable monomer different from the alkali-soluble resin, and a photoinitiator comprising at least one oxime ester compound represented by Formula I. The oxime ester compound represented by Formula I has high thermal stability, good solubility in solvents commonly used for preparing photosensitive resin compositions, and can impart good film-forming properties, developability, and photosensitivity to the photosensitive resin composition. The photosensitive resin composition is suitable for use in preparing photo-cured materials such as a photoresist for semiconductors, a colored photoresist, a photo-spacer, etc. The definitions of the substituents in Formula I are as described in the specification and claims.[Formula I]

The utility model discloses a reflective shielding structure for an automobile handle. The reflective shielding structure comprises a shading ring body and connecting parts which are arranged at the two ends of the shading ring body and used for installing the shading ring body to the automobile handle. The shading ring body comprises an arc-shaped extension sheet; the connecting part comprises a clamping groove; and the arc-shaped extension sheet is folded inwards along the end part extending in the circumferential direction to form the clamping groove. The connecting part and the shading ring body are arranged, and the shading ring body is connected to the automobile handle through the connecting part, so that the problem that the rotating shaft of the automobile handle is exposed and reflects light can be solved.

The invention discloses a fluorine-containing porphyrinyl covalent organic framework and a preparation method and application thereof, the structure of the fluorine-containing porphyrinyl covalent organic framework is # imgabs0 #, the fluorine-containing porphyrinyl covalent organic framework is prepared through a Schiff base reaction that amino and aldehyde are subjected to condensation to remove one molecule of water to obtain C = N double bonds (imine bonds), hydrolysis is not prone to happening, and the fluorine-containing porphyrinyl covalent organic framework can be used for preparing the fluorine-containing porphyrinyl covalent organic framework. The hydrogel has excellent biocompatibility and stable chemical properties; the photosensitivity is remarkably improved, and oxygen can be efficiently loaded, so that photodynamic therapy is promoted under photoresponse, and the tumor treatment effect is improved.

The invention discloses a photoresist composition and a patterning method thereof, the photoresist composition comprises an organic solvent and titanium oxide compound nanoparticles, the mass percentage content of a metal oxygen cluster film forming monomer is 1%-30%, and the mass percentage content of the organic solvent is 70%-99%. Titanium commonly used as photocatalytic metal is selected as central metal, benzoic acid which is long in absorption wavelength and easy to leave or a derivative of benzoic acid is selected as ligand, carboxylic acid ligand is easy to leave under the action of extreme ultraviolet, electron beams and visible light (within the light source range of 250-600 nanometers), the solubility of photoresist is promoted to be converted, excellent sensitivity is shown, and the preparation method is simple and easy to implement. And high-precision photoetching patterning is realized.

This invention discloses a class of tin-oxygen metal clusters coordinated with dialkyl and organic cyclic carboxylic acids, their synthesis, and applications. These clusters exhibit higher reactivity due to the presence of more Sn atoms and more Sn-C bond reaction sites. The tin-oxygen metal clusters have the structure of general formula I.

The invention discloses a lipid droplet targeted photosensitive fluorescent molecule as well as a preparation method and application thereof. The fluorescent molecule has a structure as shown in a formula I, wherein R is selected from at least one of a formula a, a formula b, a formula c, a formula d, a formula e and a formula f; according to the application, the lipid droplet targeting and photosensitivity of fluorescent molecules are utilized to realize proximity labeling of proteins around lipid droplets in cells, and regulatory factors of interaction of the lipid droplets and mitochondria are disclosed through proteome analysis. The probe realizes proximity markers which do not depend on genetic manipulation in the field.

The application provides a small-molecule photosensitive polyaryletherketone precursor, a preparation method and application thereof, and belongs to the technical field of photosensitive resin and functional molecule synthesis. The application is designed from the photosensitivity of a small molecule. By regulating the photosensitivity of the small molecule, the polymerization of the small-molecule precursor with high molecular weight can be completed through photopolymerization. Meanwhile, the forming and curing problems of the small-molecule precursor can be further solved, and two goals are achieved at one time. The principle design of the application is different from the prior art scheme of realizing the photosensitivity of polyaryletherketone by using an oligomer. The prior art is difficult to realize good solubility, controllability of molecular weight and precise regulation of molecular structure, so that a polyaryletherketone photosensitive resin with good comprehensive performance cannot be prepared. The small-molecule photosensitive polyaryletherketone precursor obtained by the application has controllable molecular weight, controllable molecular structure, excellent photosensitivity and good solubility in active diluents and solvents.

The application provides a modified polyurethane acrylate oligomer and a preparation method and application thereof, and belongs to the technical field of high polymer materials.The modified polyurethane acrylate oligomer has a structure as shown in formula (I); and the preparation method comprises the following steps: using hydroxyl-terminated polybutadiene and ethylene oxide as raw materials to perform ring-opening addition reaction to obtain hydroxyl-terminated polybutadiene / EO polymer; performing urethane reaction of the hydroxyl-terminated polybutadiene / EO polymer and diisocyanate, and then performing urethane reaction of the obtained product and 2-hydroxyethyl acrylate or 2-hydroxyethyl 2-alkyl acrylate.The modified polyurethane acrylate oligomer contains polybutadiene segments, which can obviously improve the flexibility of a photosensitive dry film, enhance the resistance to developer or etchant impact, and significantly improve the hole masking performance.

The invention provides a flexible fiber-based organic phototransistor serum amyloid protein A sensor and a preparation method thereof. According to the method, two flexible fibers are used as base materials, one base material is immersed in a dispersed conductive polymer and inorganic nanometer oxide mixed solution, and conductive polymer fibers are obtained and used as a source electrode and a drain electrode of the phototransistor; and the other substrate is a conductive fiber, after uniform inorganic oxide nanorods grow on the surface of the conductive fiber, inorganic quantum dots are adsorbed, and the conductive fiber is used as a grid electrode of the photoelectric transistor. The grid electrode is modified by a silane coupling agent, a serum amyloid protein A antibody solution and a biocompatible solution, and then the source electrode, the drain electrode, the grid electrode and ionic gel electrolyte are assembled to prepare the fiber-based organic phototransistor serum amyloid protein A sensor. The flexible fiber-based organic electrochemical transistor sensor disclosed by the invention is simple in preparation process, low in toxicity, good in repeatability, fast in electrochemical response to serum starch protein A, high in sensitivity and low in detection lower limit.

The invention discloses a modified titanium dioxide odor-removing product applied to the field of environmental protection and a manufacturing method thereof. The product forms comprise powder, paste and spray, a light inducer and a light absorber as modified materials, the modified materials are dissolved in a solvent to form a modified impregnation liquid, the modified materials are attached to the surfaces or cavities of titanium dioxide particles through impregnation and grinding, and ultraviolet light is transmitted to the shady surface of the particles under the combined action of the two agents, so that the shady surface has a'photocatalyst 'catalytic effect. Materials used for a powdery product mainly comprise titanium dioxide particles, a light inducer, a light absorbent, a solvent and the like, an adhesive, a cross-linking agent and the like are added to a pasty material, and yttrium oxide, antibacterial perfume and the like are added to a spray product. The powder can be used for deodorizing sewage, the paste can be used for deodorizing outdoor dirt and large space after being diluted, and the spray is suitable for deodorizing living rooms.

The present invention discloses a cold-region hydrangea strain and a high-yield cultivation method thereof, which relates to the field of biotechnology and aims to solve the problem that there is a lack of high-yield hydrangea varieties suitable for cold-region cultivation in the prior art. Sparassis crispa ) Haxiu 3 was deposited in the General Microbiology Center of China Microorganism Culture Collection Committee on June 20, 2024. The deposit address is No. 3, Yard No. 1, Beichen West Road, Chaoyang District, Beijing, and the deposit number is CGMCC No. 41342. The hydrangea fungus Haxiu 3 obtained by separation and domestication in the present invention has the advantages of short mycelium growth time, higher primordium formation rate, and high yield. It can have a higher mushroom production rate in the temperature range of 10~25℃, has stronger adaptability to the environment, has good low temperature resistance, and is more suitable for cultivation in cold areas. Haxiu 3 of the present invention is highly sensitive to light. Irradiation with yellow light during the primordium differentiation period can promote primordium formation, shorten the primordium formation time, and improve the uniformity of mushroom production.

The utility model provides a telephoto lens and an unmanned aerial vehicle, the telephoto lens comprises at least four lenses which are sequentially arranged from an object side to an image side, at least one of the at least four lenses is a super lens, and the rest lenses are refractors; the at least four lenses are arranged such that the telephoto lens satisfies: f / EPDlt; 6, 6.0, (43.27 / IMGH) * fgt; 180, and f is the effective focal length of the telephoto lens; the EPD is the entrance pupil aperture of the telephoto lens; iMGH is the imaging height of the telephoto lens; meanwhile, imaging quality such as chromatic aberration is improved, light weight and miniaturization of the telephoto lens can be promoted, and the telephoto lens is suitable for application scenes of unmanned aerial vehicles.

The utility model provides an image sensor, which comprises a semiconductor substrate, a first isolation structure is formed in the semiconductor substrate, the first isolation structure divides the semiconductor substrate into a plurality of pixel areas, and each pixel area is provided with a plurality of photoelectric conversion elements and at least one conduction part connected with at least two photoelectric conversion elements. Electrons generated by the connected photoelectric conversion elements can move to other photoelectric conversion elements through the conduction parts, and each pixel area further comprises an isolation area which separates the photoelectric conversion elements. The image sensor provided by the utility model is better in photosensitive effect and higher in sensitivity.

The invention relates to the technical field of high polymer materials, in particular to an alkali-soluble polyimide precursor, a preparation method thereof and a positive photosensitive resin composition. The alkali-soluble polyimide precursor includes a polyesteramide resin formed by a silanization reaction of a polyamic acid resin and a silanization reagent, and the polyamic acid resin is formed by a polycondensation reaction of an acid dianhydride compound and a diamine compound, the diamine compound comprises a siloxane-containing diamine and an aromatic diamine. The alkali-soluble polyimide precursor has a low dielectric constant. Meanwhile, after the alkali-soluble polyimide precursor is applied to the positive photosensitive resin composition, the photosensitivity is relatively good, the removal rate of a film layer after exposure and development is relatively high, and the visible light transmittance of the cured film layer is relatively high.

The present invention discloses a backlight module and a display device. The backlight module includes: a main body; a through hole, which penetrates the main body along a first direction, and the first direction is perpendicular to the light-emitting surface of the backlight module; a frame structure, which is at least partially located in the through hole; the frame structure includes at least two sub-frames that are sequentially ringed; a light-guiding channel is formed between any two adjacent sub-frames, and the entrance of the light-guiding channel faces the side wall of the through hole, and the exit of the light-guiding channel faces the light-emitting surface of the backlight module. In the present application, the thickness of a single sub-frame along the second direction is relatively thin, and no "black line" will appear when the display device displays normally; at the same time, the light-guiding channel formed between adjacent sub-frames can conduct vertical directional guidance of light, thereby improving the light leakage phenomenon. The above scheme is adopted to improve the display effect of the display device and the photosensitivity effect of the electronic photosensitive device.

The invention relates to the technical field of photosensitive polymer synthesis, and discloses a photosensitive monomer, photosensitive polyurethane and a preparation method and application thereof. The photosensitive monomer is prepared by reacting 5-hydroxy-2-nitrobenzaldehyde with a compound M and a compound N capable of accepting external electron pairs in a first polar solvent. The photosensitive monomer has high cross-linking activity, can be subjected to efficient polycondensation with isocyanate and the like to synthesize a polyurethane holographic high polymer material, and can endow the material with physical cross-linking photoisomerization performance, a pyridine structure generated under ultraviolet irradiation can form intermolecular hydrogen bonds with a hydrogen-containing structure in a molecular chain, reversible cross-linking is achieved, and the photoisomerization performance is improved. And complexation with metal ions can be realized. According to the photosensitive monomer, the selection range of the photosensitive monomer required by production of a holographic high polymer material can be widened, and the development of holography is effectively promoted. The photosensitive monomer synthesis process is simple, the yield is high, the product is easy to separate, the controllability is high, and low-cost continuous production can be realized.

The application discloses a water-soluble light-induced release nitric oxide antibacterial supramolecular complex and a preparation and application thereof. The complex contains a host compound and a guest compound. Hydrogen bond interaction between a cavity of the host compound and an alkyl chain of the guest compound realizes stable existence of the alkyl chain in the cavity, so that the complex based on the interaction of the host compound and the guest compound is formed. The application solves the problem that the existing nitrobenzene derivative has extremely low photosensitivity, poor water solubility and obvious cytotoxicity, thereby limiting the biological application of the nitrobenzene derivative. The application effectively improves the photosensitivity, water solubility and biocompatibility of the nitrobenzene derivative, and has excellent in-vitro and in-vivo antibacterial performance.

The application discloses an etching process of screen cloth for silk screen printing, and relates to the technical field of silk screen printing.The etching process of screen cloth for silk screen printing comprises the following steps: S1, taking a silk screen and a screen frame according to printing requirements, cleaning, drying, tightly fixing the cleaned silk screen on the screen frame, and adjusting the tension to 20N-25N; S2, uniformly coating a photosensitive glue on the surface of the silk screen, drying, and obtaining a photosensitive film; S3, preparing a positive film according to printing requirements, combining the positive film with the photosensitive film, exposing under iodine gallium lamp light, then soaking in water, cleaning, and drying to obtain a developed screen printing plate; S4, checking the developed screen printing plate, repairing the missing part, and drying after repairing; and S5, smearing a curing agent on the surface of the repaired screen printing plate, curing, and obtaining the screen cloth.The photosensitive glue prepared by the application has good thermal stability and developing effect, and the prepared screen cloth has higher resolution.