22150 results about "Alkyl" patented technology

Pharmaceutical compositions comprising a macromolecular pharmaceutical agent in micellar form are disclosed. The micelles are formed from an alkali metal alkyl sulfate, and at least one additional micelle-forming compound as described in the specification. An alkali metal salicylate and a pharmaceutically acceptable edetate are also included in the composition. Micelle size ranges between about 1 and 10 nanometers. Methods for making and using the compositions are also disclosed.

Processes for precursors for silicon dielectric depositions of silicon nitride, silicon oxide and silicon oxynitride on a substrate using a hydrazinosilane of the formula:

[R¹₂N—NH]_nSi(R²)_4−n

where each R¹ is independently selected from alkyl groups of C₁ to C₆; each R² is independently selected from the group consisting of hydrogen, alkyl, vinyl, allyl, and phenyl; and n=1–4. Some of the hydrazinosilanes are novel precursors.

The present invention relates to the atomic layer deposition (“ALD”) of high k dielectric layers of metal silicates, including hafnium silicate. More particularly, the present invention relates to the ALD formation of metal silicates using metal organic precursors, silicon organic precursors and ozone. Preferably, the metal organic precursor is a metal alkyl amide and the silicon organic precursor is a silicon alkyl amide.

Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is a precursor of following Formula I:

wherein R¹ and R³ are independently selected from linear or branched C₃ to C₁₀ alkyl group, a linear or branched C₃ to C₁₀ alkenyl group, a linear or branched C₃ to C₁₀ alkynyl group, a C₁ to C₆ dialkylamino group, an electron withdrawing and a C₆ to C₁₀ aryl group; R² and R⁴ are independently selected from hydrogen, a linear or branched C₃ to C₁₀ alkyl group, a linear or branched C₃ to C₁₀ alkenyl group, a linear or branched C₃ to C₁₀ alkynyl group, a C₁ to C₆ dialkylamino group, an electron withdrawing, and a C₆ to C₁₀ aryl group; and wherein any one, all, or none of R¹ and R², R³ and R⁴, R¹ and R³, or R² and R⁴ are linked to form a ring.

The present invention relates to the atomic layer deposition (“ALD”) of high k dielectric layers of metal oxides containing Group 4 metals, including hafnium oxide, zirconium oxide, and titanium oxide. More particularly, the present invention relates to the ALD formation of Group 4 metal oxide films using an metal alkyl amide as a metal organic precursor and ozone as a co-reactant.

The present invention relates to a method of forming an insulating film in a semiconductor device. After a mixed gas of alkyl silane gas and N₂O gas is supplied into the deposition equipment, a radio frequency power including a short pulse wave for causing incomplete reaction upon a gas phase reaction is applied to generate nano particle. The nano particle is then reacted to oxygen radical to form the insulating film including a plurality of nano voids. A low-dielectric insulating film that can be applied to the nano technology even in the existing LECVD equipment is formed.

Improved methods for synthesis of oligonucleotides and other phosphorus-linked oligomers are disclosed. The methods include the use of aromatic solvents, alkyl aromatic solvents, halogenated aromatic solvents, halogenated alkyl aromatic solvents, or aromatic ether solvents to achieve deprotection of protected hydroxyl groups.

The present invention comprises methods and compositions for antimicrobial silver compositions comprising silver nanoparticles. The present invention further comprises compositions for preparing silver nanoparticles comprising at least one stabilizing agent, one or more silver compounds, at least one reducing agent and a solvent. In one aspect, the stabilizing agent comprises a surfactant or a polymer. The polymer may comprise polymers such as polyacrylamides, polyurethanes, and polyamides. In one aspect, the silver compound comprises a salt comprising a silver cation and an anion. The anion may comprise saccharinate derivatives, long chain fatty acids, and alkyl dicarboxylates. The methods of the present invention comprise treating devices with the silver nanoparticle compositions, including, but not limited to, such devices as woven wound care materials, catheters, patient care devices, and collagen matrices. The present invention further comprises treatment of humans and animals wacr6ith the antimicrobial devices described herein.

A compound which has thermal stability and moderate vaporizability and is satisfactory as a material for the CVD or ALD method; a process for producing the compound; a thin film formed from the compound as a raw material; and a method of forming the thin film. A compound represented by the general formula (1) is produced by reacting a compound represented by the general formula (2) with a compound represented by the general formula (3). The compound produced is used as a raw material to form a metal-containing thin film. [Chemical formula 1] (1) [Chemical formula 2] (2) [Chemical formula 3] M_p(NR⁴R⁵)_q(3) (In the formulae, M represents a Group 4 element, aluminum, gallium, etc.; n is 2 or 3 according to cases; R¹ and R³ each represents C_1-6 alkyl, etc.; R² represents C_1-6 alkyl, etc.; R⁴ and R⁵ each represents C_1-4 alkyl, etc.; X represents hydrogen, lithium, or sodium; p is 1 or 2 according to cases; and q is 4 or 6 according to cases.)

Antimicrobial compositions, especially those useful when applied topically, particularly to mucosal tissues (i.e., mucous membranes), including a cationic antiseptic such as biguanides and bisbiguanides such as chlorhexidine and its various salts including but not limited to the digluconate, diacetate, dimethosulfate, and dilactate salts; polymeric quaternary ammonium compounds such as polyhexamethylenebiguanide; silver and various silver complexes; small molecule quaternary ammonium compounds such as benzalkoium chloride and alkyl substituted derivatives; di-long chain alkyl (C8-C18) quaternary ammonium compounds; cetylpyridinium halides and their derivatives; benzethonium chloride and its alkyl substituted derivatives; and octenidine. The compositions can also include an enhancer component, a surfactant, a hydrophobic component, and/or a hydrophilic component. Such compositions provide effective topical antimicrobial activity and are accordingly useful in the treatment and/or prevention of conditions that are caused, or aggravated by, microorganisms (including viruses).

An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.

A method for forming a conformal film of aluminum oxide on a substrate having a patterned underlying layer by PEALD includes: adsorbing an Al precursor containing an Al—C bond and an Al—O—C or Al—N—C bond; providing an oxidizing gas and an inert gas; applying RF power to the reactant gas and the reaction-assisting gas to react the adsorbed precursor with the reactant gas on the surface, thereby forming a conformal film of aluminum oxide on the patterned underlying layer of the substrate, wherein the substrate is kept at a temperature of about 200° C. or lower.

A method for forming a metal nitride film with good film closure at low temperatures is disclosed. The method may comprise utilizing plasma to form NH and NH₂ radicals to allow for the formation of the metal nitride at low temperatures. The method may also comprise flowing an etch gas to result in an amorphous film with uniform thickness. The method may also comprise flowing an alkyl hydrazine to inhibit three-dimensional island growth of the metal nitride film.

The present invention comprises methods and compositions comprising metal nanoparticles. The invention comprises metal nanoparticles and surfaces treated with a metal nanoparticle coating. The present invention further comprises compositions for preparing nanoparticles comprising at least one stabilizing agent, one or more metal compounds, at least one reducing agent and a solvent. In one aspect, the stabilizing agent comprises a surfactant or a polymer. The polymer may comprise polymers such as polyacrylamides, polyurethanes, and polyamides. In one aspect, the metal compound comprises a salt comprising a metal cation and an anion. The anion may comprise saccharinate derivatives, long chain fatty acids, and alkyl dicarboxylates.

A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

A method of forming a dielectric film, includes: introducing a siloxane gas essentially constituted by Si, O, C, and H and a silazane gas essentially constituted by Si, N, H, and optionally C into a reaction chamber where a substrate is placed; depositing a siloxane-based film including Si—N bonds on the substrate by plasma reaction; and annealing the siloxane-based film on the substrate in an annealing chamber to remove Si—N bonds from the film.

The invention is an epoxy resin based adhesive composition comprising an epoxy resin and a compound comprising an elastomeric prepolymer residue selected from the group of a polyurethane, a polyurea and a polyurea polyurethane having isocyanate end groups, the isocyanate end groups of said prepolymer residue being capped by a capping compound selected from the group consisting of a primary aliphatic, cycloaliphatic, heteroaromatic and araliphatic amine, a secondary aliphatic, cycloaliphatic, aromatic, heteroaromatic and araliphatic amine, a thiol and an alkyl amide, said capping compound being bound to the end of the polymer chain of the elastomeric prepolymer in a manner such that the end to which it is bonded no longer has a reactive group. In addition to the capping compound defined above above, a capping compound selected from the group consisting of a phenol and a polyphenol can be used for capping the isocyanate end groups of the prepolymer residue

The invention relates to a new catalyst for single active central Ziegler-Natta alkene polymerization. Said catalyst takes salicylal containing dentate or substituted salicylal derivatives as electrons, and is prepared by adding pretreated carrier, metallic compound and electrons into magnesium compound/ tetrahydrofuran solution. The catalyst can produce ethane homopolymer and copolymer with narrow molecular weight distribution (1.6-3.8) and even comonomer distribution, with high activity and under action of adjuvant catalyst of alkyl aluminium and alkyl aluminoxanes. The ethane polymerization, homopolymerization or combined polymerization of ethane and 1- olefin, ring olefin and polar monomer through slurry method or gas phase method by using said catalyst can be realized.

Sulfanylsilanes of the formula X1X2X3Si-A-S-SiR1R2R3 are prepared by reacting mercaptosilanes of the formula X1X2X3Si-Alkyl-SH with chlorosilanes Cl-SiR1R2R3. They are used as coupling agents in rubber mixtures.

A process for producing a blended fuel from a paraffin rich component and a cyclic rich component, where each of the components are generated from a renewable feedstock, is presented. The paraffin rich component is generated from a first renewable feedstock comprising at least one component selected from the group consisting of glycerides, free fatty acids, biomass, lignocellulose, free sugars, and combinations thereof. The cyclic rich component is generated from a second renewable feedstock comprising at least one component selected from the group consisting of glycerides, free fatty acids, free fatty alkyl esters, biomass, lignocellulose, free sugars, and combinations thereof. The blended fuel may a gasoline boiling point range blended fuel, a diesel boiling point range blended fuel, an aviation boiling point range blended fuel, any combination thereof, or any mixture thereof.

The invention relates to a group of methoxyl methyl acrylate compounds having a formula (I), wherein X=F or H, Q=N or CH; R1, R2, R3, R4=H, NO2, CN, Cl, C1-C9 alkyl or unsaturated hydrocarbons, C1-C6 alkoxy imine methyl, or C1-C6 alkoxy carbonyl. The invention also discloses the process for preparing the compounds and the use of the compounds in making agricultural bactericides.