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22363 results about "Alkyl" patented technology
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In organic chemistry, an alkyl substituent is an alkane missing one hydrogen. The term alkyl is intentionally unspecific to include many possible substitutions. An acyclic alkyl has the general formula CₙH₂ₙ₊₁. A cycloalkyl is derived from a cycloalkane by removal of a hydrogen atom from a ring and has the general formula CₙH₂ₙ₋₁. Typically an alkyl is a part of a larger molecule. In structural formula, the symbol R is used to designate a generic (unspecified) alkyl group. The smallest alkyl group is methyl, with the formula CH₃−.
Mixed micellar drug deliver system and method of preparation
Pharmaceutical compositions comprising a macromolecular pharmaceutical agent in micellar form are disclosed. The micelles are formed from an alkali metal alkyl sulfate, and at least one additional micelle-forming compound as described in the specification. An alkali metal salicylate and a pharmaceutically acceptable edetate are also included in the composition. Micelle size ranges between about 1 and 10 nanometers. Methods for making and using the compositions are also disclosed.
Owner:GENEREX PHARMA
Precursors for depositing silicon containing films and processes thereof
Processes for precursors for silicon dielectric depositions of silicon nitride, silicon oxide and silicon oxynitride on a substrate using a hydrazinosilane of the formula:[R12N—NH]nSi(R2)4−nwhere each R1 is independently selected from alkyl groups of C1 to C6; each R2 is independently selected from the group consisting of hydrogen, alkyl, vinyl, allyl, and phenyl; and n=1–4. Some of the hydrazinosilanes are novel precursors.
Owner:VERSUM MATERIALS US LLC
Cyclic azine derivatives, processes for producing these, and organic electroluminescent element containing these as component
ActiveUS20120214993A1Improve drivabilityAccelerate emissionsOrganic chemistryElectroluminescent light sourcesOrganic electroluminescenceOrganic compound
A cyclic azine compound represented by general formula (1):wherein each Ar1 represents an aromatic group, which is unsubstituted or substituted by a C1-4 alkyl group, a phenyl group or a pyridyl group; and A represents a group selected from those which are represented by general formulae (2) to (5), described in the description. The cyclic azine compound is useful for an organic compound layer of fluorescent or phosphorescent EL device.
Owner:TOSOH CORP +1
Organometallic compound and organic electroluminescence device employing the same
InactiveUS20130033172A1Indium organic compoundsDischarge tube luminescnet screensChemical structureOrganic electroluminescence
Organometallic compounds and organic electroluminescence devices employing the same are provided. The organometallic compound has a chemical structure represented below:wherein, X is C—H or N, Y is CH2 or NH; R1 is H, or C1-8 alkyl; and A1 is acetylacetone ligand, acetylacetone with phenyl group ligand, or derivatives thereof.
Owner:IND TECH RES INST
Atomic layer deposition of high k metal silicates
InactiveUS20060228888A1Reduce carbon pollutionReduce stepsSolid-state devicesSemiconductor/solid-state device manufacturingHafniumAtomic layer deposition
The present invention relates to the atomic layer deposition (“ALD”) of high k dielectric layers of metal silicates, including hafnium silicate. More particularly, the present invention relates to the ALD formation of metal silicates using metal organic precursors, silicon organic precursors and ozone. Preferably, the metal organic precursor is a metal alkyl amide and the silicon organic precursor is a silicon alkyl amide.
Owner:AVIZA TECHNOLOGY INC +1
Organoaminodisilane precursors and methods for depositing films comprising same
Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is a precursor of following Formula I:wherein R1 and R3 are independently selected from linear or branched C3 to C10 alkyl group, a linear or branched C3 to C10 alkenyl group, a linear or branched C3 to C10 alkynyl group, a C1 to C6 dialkylamino group, an electron withdrawing and a C6 to C10 aryl group; R2 and R4 are independently selected from hydrogen, a linear or branched C3 to C10 alkyl group, a linear or branched C3 to C10 alkenyl group, a linear or branched C3 to C10 alkynyl group, a C1 to C6 dialkylamino group, an electron withdrawing, and a C6 to C10 aryl group; and wherein any one, all, or none of R1 and R2, R3 and R4, R1 and R3, or R2 and R4 are linked to form a ring.
Owner:VERSUM MATERIALS US LLC
Atomic layer deposition of high-k metal oxides
InactiveUS20060258078A1Improve thermal stabilityLess growthSolid-state devicesSemiconductor/solid-state device manufacturingDielectric layerTitanium oxide
The present invention relates to the atomic layer deposition (“ALD”) of high k dielectric layers of metal oxides containing Group 4 metals, including hafnium oxide, zirconium oxide, and titanium oxide. More particularly, the present invention relates to the ALD formation of Group 4 metal oxide films using an metal alkyl amide as a metal organic precursor and ozone as a co-reactant.
Owner:AVIZA TECHNOLOGY INC +1
Method for forming aluminum oxide film using Al compound containing alkyl group and alkoxy or alkylamine group
ActiveUS8784950B2Safety with regard to handling and storage of the precursor can be ensuredDamage is causedChemical vapor deposition coatingPlasma techniqueProduct gasPhotochemistry
Owner:ASM IP HLDG BV
Method for forming dielectric film using siloxane-silazane mixture
ActiveUS8003174B2High densityHigh strengthPretreated surfacesSemiconductor/solid-state device manufacturingSilazaneMetallurgy
Owner:ASM JAPAN
Method of forming insulating layer in semiconductor device
The present invention relates to a method of forming an insulating film in a semiconductor device. After a mixed gas of alkyl silane gas and N2O gas is supplied into the deposition equipment, a radio frequency power including a short pulse wave for causing incomplete reaction upon a gas phase reaction is applied to generate nano particle. The nano particle is then reacted to oxygen radical to form the insulating film including a plurality of nano voids. A low-dielectric insulating film that can be applied to the nano technology even in the existing LECVD equipment is formed.
Owner:SK HYNIX INC
Preparation of metal silicon nitride films via cyclic deposition
InactiveUS20060182885A1Quality improvementProcess safetyLighting support devicesSemiconductor/solid-state device manufacturingSilyleneSilanes
This invention relates to an improved process for producing ternary metal silicon nitride films by the cyclic deposition of the precursors. The improvement resides in the use of a metal amide and a silicon source having both NH and SiH functionality as the precursors leading to the formation of such metal-SiN films. The precursors are applied sequentially via cyclic deposition onto the surface of a substrate. Exemplary silicon sources are monoalkylamino silanes and hydrazinosilanes represented by the formulas: (R1NH)nSiR2mH4-n-m (n=1,2; m=0,1,2; n+m=<3); and (R32N—NH)xSiR4yH4-x-y (x=1,2; y=0,1,2; x+y=<3) wherein in the above formula R1-4 are same or different and independently selected from the group consisting of alkyl, vinyl, allyl, phenyl, cyclic alkyl, fluoroalkyl, silylalkyls.
Owner:VERSUM MATERIALS US LLC
Methods for synthesis of oligonucleotides
Improved methods for synthesis of oligonucleotides and other phosphorus-linked oligomers are disclosed. The methods include the use of aromatic solvents, alkyl aromatic solvents, halogenated aromatic solvents, halogenated alkyl aromatic solvents, or aromatic ether solvents to achieve deprotection of protected hydroxyl groups.
Owner:IONIS PHARMA INC
Antimicrobial silver compositions
The present invention comprises methods and compositions for antimicrobial silver compositions comprising silver nanoparticles. The present invention further comprises compositions for preparing silver nanoparticles comprising at least one stabilizing agent, one or more silver compounds, at least one reducing agent and a solvent. In one aspect, the stabilizing agent comprises a surfactant or a polymer. The polymer may comprise polymers such as polyacrylamides, polyurethanes, and polyamides. In one aspect, the silver compound comprises a salt comprising a silver cation and an anion. The anion may comprise saccharinate derivatives, long chain fatty acids, and alkyl dicarboxylates. The methods of the present invention comprise treating devices with the silver nanoparticle compositions, including, but not limited to, such devices as woven wound care materials, catheters, patient care devices, and collagen matrices. The present invention further comprises treatment of humans and animals wacr6ith the antimicrobial devices described herein.
Owner:AVENT INC
Metal-containing compound, its production method, metal-containing thin film, and its formation method
ActiveUS20100105936A1Appropriate thermal stabilityAppropriate volatilityGroup 3/13 organic compounds without C-metal linkagesGroup 4/14 organic compounds without C-metal linkagesLithiumHydrogen
Owner:TOSOH CORP +1
Cationic antiseptic compositions and methods of use
ActiveUS20060051385A1Reduce eliminateReduce and eliminate clinical signAntibacterial agentsBiocideAmmonium compoundsCetylpyridinium
Antimicrobial compositions, especially those useful when applied topically, particularly to mucosal tissues (i.e., mucous membranes), including a cationic antiseptic such as biguanides and bisbiguanides such as chlorhexidine and its various salts including but not limited to the digluconate, diacetate, dimethosulfate, and dilactate salts; polymeric quaternary ammonium compounds such as polyhexamethylenebiguanide; silver and various silver complexes; small molecule quaternary ammonium compounds such as benzalkoium chloride and alkyl substituted derivatives; di-long chain alkyl (C8-C18) quaternary ammonium compounds; cetylpyridinium halides and their derivatives; benzethonium chloride and its alkyl substituted derivatives; and octenidine. The compositions can also include an enhancer component, a surfactant, a hydrophobic component, and / or a hydrophilic component. Such compositions provide effective topical antimicrobial activity and are accordingly useful in the treatment and / or prevention of conditions that are caused, or aggravated by, microorganisms (including viruses).
Owner:3M INNOVATIVE PROPERTIES CO
Gas treatment systems
ActiveUS20080173735A1Suppress unwanted depositionDust removalFire preventionNuclear engineeringProduct gas
An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.
Owner:VEECO INSTR
Method for Forming Aluminum Oxide Film Using Al Compound Containing Alkyl Group and Alkoxy or Alkylamine Group
ActiveUS20140017414A1Increase deposition rateDamage is causedChemical vapor deposition coatingPlasma techniquePhotochemistryConformal film
A method for forming a conformal film of aluminum oxide on a substrate having a patterned underlying layer by PEALD includes: adsorbing an Al precursor containing an Al—C bond and an Al—O—C or Al—N—C bond; providing an oxidizing gas and an inert gas; applying RF power to the reactant gas and the reaction-assisting gas to react the adsorbed precursor with the reactant gas on the surface, thereby forming a conformal film of aluminum oxide on the patterned underlying layer of the substrate, wherein the substrate is kept at a temperature of about 200° C. or lower.
Owner:ASM IP HLDG BV
Removal of permanganate reducing compounds from methanol carbonylation process stream
ActiveUS7223886B2Reduce solubilitySimple methodOrganic compound preparationPreparation by carbon monoxide or formate reactionAcetic acidIodide
Owner:CELANESE INT CORP
Methods for forming low temperature semiconductor layers and related semiconductor device structures
ActiveUS20180350588A1Semiconductor/solid-state device manufacturingSemiconductor devicesNitrideSemiconductor
A method for forming a metal nitride film with good film closure at low temperatures is disclosed. The method may comprise utilizing plasma to form NH and NH2 radicals to allow for the formation of the metal nitride at low temperatures. The method may also comprise flowing an etch gas to result in an amorphous film with uniform thickness. The method may also comprise flowing an alkyl hydrazine to inhibit three-dimensional island growth of the metal nitride film.
Owner:ASM IP HLDG BV
Methods and compositions for metal nanoparticle treated surfaces
ActiveUS20070207335A1Extended shelf lifeConvenient coatingMaterial nanotechnologyBiocidePolyamideSolvent
The present invention comprises methods and compositions comprising metal nanoparticles. The invention comprises metal nanoparticles and surfaces treated with a metal nanoparticle coating. The present invention further comprises compositions for preparing nanoparticles comprising at least one stabilizing agent, one or more metal compounds, at least one reducing agent and a solvent. In one aspect, the stabilizing agent comprises a surfactant or a polymer. The polymer may comprise polymers such as polyacrylamides, polyurethanes, and polyamides. In one aspect, the metal compound comprises a salt comprising a metal cation and an anion. The anion may comprise saccharinate derivatives, long chain fatty acids, and alkyl dicarboxylates.
Owner:AVENT INC
Compositions and methods for the deposition of silicon oxide films
InactiveUS20150275355A1Silicon organic compoundsSemiconductor/solid-state device manufacturingHydrogenSilicon oxide
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one precursor having the following formula:R1nSi(NR2R3)mH4-m-n wherein R1 is independently selected from a linear C1 to C6 alkyl group, a branched C2 to C6 alkyl group, a C3 to C6 cyclic alkyl group, a C2 to C6 alkenyl group, a C3 to C6 alkynyl group, and a C4 to C10 aryl group; wherein R2 and R3 are each independently selected from hydrogen, a C1 to C6 linear alkyl group, a branched C2 to C6 alkyl group, a C3 to C6 cyclic alkyl group, a C2 to C6 alkenyl group, a C3 to C6 alkynyl group, and a C4 to C10 aryl group, wherein R2 and R3 are linked or, are not linked, to form a cyclic ring structure; n=1, 2, 3; and m=1, 2.
Owner:VERSUM MATERIALS US LLC
Ester compounds, polymers, resist compositions and patterning process
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Owner:SHIN ETSU CHEM IND CO LTD
Olefinic polymerization and copolymerization method of supported non-metallocene catalyst
A method of alkene polymerization and copolymarization with f load non- metallocene catalyst: emplying the load non- metallocene catalyst and catalyst promoter forming the catalytic system, introducing polymer monomer or comonomer for alkene polymerization or copolymarization; adding the load non- metallocene catalyst into dissolvent and mixing with catalyst promoter and then transferring the mixture into polymerization reactor, or adding the load non- metallocene catalyst and catalyst promoter into the polymerization reactor in order or simultaneously. The catalyst promoter is chosen from: alkyl aluminium, aluminium oxane, Lewis acid, boralotano, alkyl borane or alkyl borane ammonium salt. The load non- metallocene catalyst is loaded to multiple poral solid by employing methods of solution dipping, equivoluminal dipping or solution dipping-before-equivoluminal dipping to form organic integral of property stable and strong binding force. The invention is characterized by the high alkene polymerization active, high fusion point and good normalization of the produced polymer, and the sastification of the demand of high level product production.
Owner:YANGZI PETROCHEM
Method for forming dielectric film using siloxane-silazane mixture
ActiveUS20090156017A1High densityHigh strengthPretreated surfacesSemiconductor/solid-state device manufacturingSilazaneMetallurgy
A method of forming a dielectric film, includes: introducing a siloxane gas essentially constituted by Si, O, C, and H and a silazane gas essentially constituted by Si, N, H, and optionally C into a reaction chamber where a substrate is placed; depositing a siloxane-based film including Si—N bonds on the substrate by plasma reaction; and annealing the siloxane-based film on the substrate in an annealing chamber to remove Si—N bonds from the film.
Owner:ASM JAPAN
Pharmaceutical compositions for buccal and pulmonary application
Pharmaceutical compositions comprising a macromolecular pharmaceutical agent in mixed micellar form are disclosed. The mixed micelles are formed from an alkali metal alkyl sulfate, and at least three different micelle-forming compounds as described in the specification. Micelle size ranges between about 1 and 10 nanometers. Methods for making and using the compositions are also disclosed. A preferred method for administering the present composition is through the buccal region of the mouth.
Owner:GENEREX PHARMA INC +1
Toughened epoxy adhesive composition
ActiveUS20060276601A1Improved lap shear and impact peel strengthGood storage stabilityPolyureas/polyurethane adhesivesSynthetic resin layered productsElastomerEnd-group
The invention is an epoxy resin based adhesive composition comprising an epoxy resin and a compound comprising an elastomeric prepolymer residue selected from the group of a polyurethane, a polyurea and a polyurea polyurethane having isocyanate end groups, the isocyanate end groups of said prepolymer residue being capped by a capping compound selected from the group consisting of a primary aliphatic, cycloaliphatic, heteroaromatic and araliphatic amine, a secondary aliphatic, cycloaliphatic, aromatic, heteroaromatic and araliphatic amine, a thiol and an alkyl amide, said capping compound being bound to the end of the polymer chain of the elastomeric prepolymer in a manner such that the end to which it is bonded no longer has a reactive group. In addition to the capping compound defined above above, a capping compound selected from the group consisting of a phenol and a polyphenol can be used for capping the isocyanate end groups of the prepolymer residue
Owner:DOW GLOBAL TECH LLC
Mono-active center Ziegler-Natta catalyst for olefinic polymerization
The invention relates to a new catalyst for single active central Ziegler-Natta alkene polymerization. Said catalyst takes salicylal containing dentate or substituted salicylal derivatives as electrons, and is prepared by adding pretreated carrier, metallic compound and electrons into magnesium compound / tetrahydrofuran solution. The catalyst can produce ethane homopolymer and copolymer with narrow molecular weight distribution (1.6-3.8) and even comonomer distribution, with high activity and under action of adjuvant catalyst of alkyl aluminium and alkyl aluminoxanes. The ethane polymerization, homopolymerization or combined polymerization of ethane and 1- olefin, ring olefin and polar monomer through slurry method or gas phase method by using said catalyst can be realized.
Owner:SHANGHAI INST OF ORGANIC CHEMISTRY - CHINESE ACAD OF SCI
Production of Blended Fuel from Renewable Feedstocks
A process for producing a blended fuel from a paraffin rich component and a cyclic rich component, where each of the components are generated from a renewable feedstock, is presented. The paraffin rich component is generated from a first renewable feedstock comprising at least one component selected from the group consisting of glycerides, free fatty acids, biomass, lignocellulose, free sugars, and combinations thereof. The cyclic rich component is generated from a second renewable feedstock comprising at least one component selected from the group consisting of glycerides, free fatty acids, free fatty alkyl esters, biomass, lignocellulose, free sugars, and combinations thereof. The blended fuel may a gasoline boiling point range blended fuel, a diesel boiling point range blended fuel, an aviation boiling point range blended fuel, any combination thereof, or any mixture thereof.
Owner:UOP LLC
Methoxyl group displacement methyl acrylate compound bactericidal agent
InactiveCN1907024AEasy to solveGood prevention effectBiocideAnimal repellantsUnsaturated hydrocarbonMethyl acrylate
The invention relates to a group of methoxyl methyl acrylate compounds having a formula (I), wherein X=F or H, Q=N or CH; R1, R2, R3, R4=H, NO2, CN, Cl, C1-C9 alkyl or unsaturated hydrocarbons, C1-C6 alkoxy imine methyl, or C1-C6 alkoxy carbonyl. The invention also discloses the process for preparing the compounds and the use of the compounds in making agricultural bactericides.
Owner:ZHEJIANG CHEM TECH GRP CO LTD
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