2141results about "Plasma technique" patented technology

The invention relates to the technical field of light sources, particularly discloses a method and a device for adjusting the central position of a plasma, and aims to realize accurate positioning and stable control of the plasma by accurately controlling output parameters of a magnetic field generator. According to the method, a magnetic field generator with a specific shape and distribution is utilized, a magnetic field with a closed magnetic line structure is generated in a plasma chamber, charged particles in plasma are guided to move along a preset path, and it can be ensured that the plasma reaches and is kept at an expected position by monitoring and adjusting magnetic field parameters in real time.

The invention discloses a multi-mode magnetic field intelligent closed-loop plasma confinement system and method. The system comprises a multi-mode magnetic field generation module, a multi-dimensional plasma diagnosis module and a layered intelligent closed-loop control module. The multi-mode magnetic field generation module generates a steady-state, pulse and alternating composite magnetic field to realize adjustable space gradient; the multi-dimensional diagnosis module synchronously acquires electrical, optical and particle parameters, and ensures the accuracy through data fusion; and the hierarchical intelligent closed-loop control module generates an adjusting instruction to realize closed-loop optimization based on dynamic threshold and multi-algorithm scheduling. According to the method, the constraint performance is improved through the steps of initialization, data acquisition, state evaluation and closed-loop adjustment in combination with parameter self-optimization and three-level fault protection. According to the scheme, the plasma constraint time exceeds 300 s, the escape rate is lower than 5%, the adjustment response is smaller than or equal to 10 ms, the method adapts to multiple working conditions and can be popularized to the fields of nuclear fusion experiments and plasma processing, and the problems that a traditional system is poor in stability and lags in response are solved.

The invention discloses a parallel discharge circuit and an electric flame stove. The parallel discharge circuit comprises a transformer and at least two groups of discharge branches, and the two groups of discharge branches comprise a first discharge branch and a second discharge branch. The scheme that a single transformer replaces multiple transformers is adopted, multi-time conversion loss of electric energy-magnetic energy-electric energy is reduced, electromagnetic interference is reduced, meanwhile, a stove body does not need to be provided with a large number of transformers, the size is more compact, and the parallel connection requirement of hundreds of discharging devices of the high-power electric flame stove is met; according to the invention, continuous control of asynchronous breakdown and independent charging and discharging of multiple discharging branches is realized, the method is adaptive to the breakdown threshold value difference of discharging devices among the discharging branches and the charging speed deviation of voltage-multiplying capacitors, extra voltage-sharing control is not needed, and it is ensured that all the discharging branches can stably complete charging and discharging closed loop, discharging failure is avoided, and mutual interference is avoided; the wide-voltage input circuit is suitable for various voltage inputs, and wide-voltage input is achieved.

Disclosed in the present invention are a scanning box device and an electron accelerator, the electron accelerator comprising an accelerating tube and a deflection coil; the scanning box device comprising a scanning chamber and a scanning box, wherein the scanning chamber is sealingly connected to the scanning box; the scanning chamber is arranged above the scanning box; the accelerating tube is arranged above the scanning chamber; the deflection coil is arranged on the outer side of the scanning chamber; and the scanning chamber is made of a non-metallic material. The present invention can prevent the generation of eddy currents in the scanning box, thus reducing the problems of energy loss and heat generation, improving the performance and stability of the apparatus.

The utility model discloses a wide-width atmosphere gun plasma device, which belongs to the technical field of plasma, and comprises a protective shell, a plasma gas outlet, a gas inlet, a gas outlet, a gas inlet, a gas outlet, a gas outlet, a gas outlet, a gas inlet and a gas outlet, and is characterized in that the protective shell is provided with an accommodating cavity extending along the length direction and a plasma gas outlet communicated with the accommodating cavity; the ceramic insulation tube is arranged in the containing cavity, an airflow channel is formed between the ceramic insulation tube and the containing cavity, the ceramic insulation tube is provided with a containing cavity, and the two ends of the containing cavity are communicated with the airflow channel; the electrode is arranged in the accommodating cavity and is used for generating plasma gas; the gas inlet connecting block is connected with the protective shell and comprises a first gas inlet and a first gas outlet which are communicated with each other, the first gas inlet is used for feeding process gas, and the first gas outlet is communicated with the gas flow channel. Compared with the prior art, the wide atmosphere gun plasma equipment is high in stability, and can cool the equipment and plasma gas.

The invention relates to a beam feedback system based on radio frequency direct acquisition, which comprises a beam position detector, a sum and difference device, a front-end processing module, a feedback processor and an amplification excitation module which are connected in sequence, the sum-difference device is used for determining a horizontal position signal, a vertical position signal and a longitudinal position signal of the beam bunch according to the position signal of the beam bunch, the front-end processing module is used for pre-processing the position signals of the beam bunch, and the feedback processor is used for sampling the pre-processed position signals of the beam bunch; the feedback module is used for receiving a beam bunch and generating a horizontal feedback signal, a vertical feedback signal and a longitudinal feedback signal of the beam bunch, and the amplification excitation module is used for amplifying the feedback signals of the beam bunch and acting the amplified feedback signals of the beam bunch on the beam bunch, so that the instability of the beam is inhibited.

The invention relates to the technical field of electronic circuits, in particular to a polar field magnet coil power supply system and a power supply method. The polar field magnet coil power supply system comprises a super capacitor, a control module and a driving module. The control module is coupled with the driving module and the polar field magnet coil, and the control module is configured to obtain feedback current of the polar field magnet coil, generate a first pulse width modulation signal group and generate a second pulse width modulation signal group. And the driving module is configured to respond to the first pulse width modulation signal group and generate the second pulse width modulation signal group, transmit energy stored by the super capacitor to the polar field magnet coil in the current rising sub-stage and the current maintaining sub-stage, and feed back the energy of the polar field magnet coil to the super capacitor in the current feedback sub-stage. According to the polar field magnet coil power supply system, the energy utilization rate can be greatly improved, the problem that energy cannot be recycled in the prior art is solved, and the problem that the failure rate is high is solved.

Provided is a superconducting cryo module that can be made more compact. A superconducting cryo module according to the present disclosure comprises: a superconducting accelerating cavity that has a cell part accelerating electrons, a beam pipe part extending from the cell part to an electron incidence side, and an extraction part of the electrons which were accelerated by the cell part; and an electron gun that is located in the interior of the beam pipe part of the superconducting accelerating cavity, is located on the same axis as a beam axis BA of the superconducting accelerating cavity, and emits electrons into the cell part.

The invention provides a directional ultra-short strong field electromagnetic pulse generation device, a plasma channel is formed through laser targeting gas and ultra-short strong field electromagnetic pulses are generated, the device comprises a high-power laser, a laser focusing module, a gas target module and a vacuum cavity, the high-power laser is used for generating femtosecond laser pulses and emitting the femtosecond laser pulses into the vacuum cavity; the laser focusing module is arranged in the vacuum cavity and is used for focusing femtosecond laser pulses generated by the high-power laser onto the gas target; the gas target module is arranged in the vacuum cavity and used for generating a high-density gas target and spraying the high-density gas target upwards, and a gas spraying opening of a gas target nozzle is located below the laser focus and can be adjusted in an electric control mode. According to the invention, escape electrons with charge quantity larger than that of a solid target and a low-density gas target can be generated, and laser forms arc discharge similar to thunder and lightning cloud in near-critical density plasma to generate EMP, so that electromagnetic radiation which is stronger than that of the solid target and far better than that of a common gas target can be generated.

A method of determining wear / degradation levels of a consumable assembly of a welding / plasma torch may utilize a controlled sound signal in order to determine an acoustic profile or full spectral audio analysis dataset of the consumable assembly that facilitate the identification of patterns that correlate to certain wear / degradation levels of the consumable assembly. The full spectral audio analysis dataset may be obtained by subjecting a given consumable assembly to a controlled sound signal between operations and as the consumable assembly degrades over time. The full spectral audio analysis may serve as a wear / degradation profile over the life of the given consumable assembly. With a full dataset known for a particular consumable assembly model, an acoustic profile of another consumable assembly of the same model may be obtained and compared to the full dataset in order to identify the wear / degradation level of the tested consumable assembly.

A plasma processing apparatus includes a chamber, a bias power supply to supply a pulsed bias DC signal, a substrate support to support a substrate and an edge ring in the chamber, and an electrical path. The substrate support has an electrostatic chuck that includes a first region to hold the substrate and a second region provided around the first region and to hold the edge ring, and is formed from a dielectric, a first bias electrode inside the first region, a second bias electrode inside the second region, a base to support the electrostatic chuck, and a first impedance adjustment mechanism to have a first variable capacitor connected between the second bias electrode and the base.

The invention relates to the technical field of cooling of particle accelerators and nuclear power equipment, and discloses a cooling device suitable for high-power rays, which comprises an absorber assembly, a cooling water system assembly, a vacuum tube assembly, a shield assembly and a support assembly. The absorber assembly is formed by welding internal graphite and external copper through a brazing process, and air holes penetrating to a graphite layer are formed in the copper and communicated with an air cavity in the graphite to form a vacuum sealing cavity. The cooling water system assembly comprises a water segregator with two layers of water inlet ring cavities and two layers of water outlet ring cavities, and uniform flow distribution is ensured. And the absorber cooling water pipe is embedded into the copper and is connected with the U-shaped pipe to form a cooling loop. The electron beam bombards the graphite to generate heat, and the heat is transferred to the copper and taken away by cooling water in the cooling water pipe embedded in the copper. The shield assembly is arranged around the vacuum tube assembly to prevent radiation leakage. The cooling device realizes effective heat dissipation of 8GeV high-power rays, and has excellent radiation resistance and extremely long fatigue life.

A system for treating and / or preventing a viral, bacterial and / or fungal infection in the oral cavity and / or along the respiratory tract, in particular the interior of the nose, throat, trachea and / or lungs, of a patient by reactive species generated by plasma as well as a plasma for such use is disclosed. The system comprises a plasma source generating reactive species in a gas, the plasma source being configured to be located outside a body of the patient, and a species directing member forming at least one duct for guiding at least a part of the reactive species generated by the plasma source into the oral cavity and / or the respiratory tract.

The invention discloses a method and a device for in-situ excitation of plasma in a high-temperature and high-pressure medium, at least one electrode is provided, the surface of the electrode is provided with a micro-nano structure with a tip enhancement effect, and the micro-nano structure is used for improving a local field enhancement factor on the surface of the electrode; placing the electrode in a reaction container filled with an aqueous solution; voltage is applied to the electrode through the power supply, the micro-nano structure generates a local high electric field at the tip of the micro-nano structure under the voltage, electron tunneling emission is caused, liquid phase discharge is triggered, and discharge plasma is generated. Through the electrode with the micro-nano structure on the surface, a local field enhancement factor is improved, so that the electrode can trigger liquid phase discharge under a relatively low potential. Resonance driving or three-phase alternating current input is adopted, and the self-adaptive tuning technology that the dielectric constant of an aqueous solution changes along with temperature and pressure is combined, so that efficient excitation of plasmas in a container is achieved. The method does not need an external heating device, is low in energy consumption and quick in response, and is particularly suitable for efficient heat management in a space limited or linear pipeline heat transfer scene.

The invention discloses a plasma-assisted surface activation method. The method comprises the following steps: placing a material matrix in a reaction cavity, vacuumizing, introducing oxygen and inert gas, exciting a radio frequency power supply and a microwave power supply to form multi-frequency composite plasma, and treating the material. The physical bombardment of the radio frequency plasma and the chemical activation of the microwave plasma have a synergistic effect, and deep cleaning and efficient modification of the surface of the material are realized in a low-vacuum environment. The surface water contact angle of the treated material is reduced to 35 degrees or below, the adhesive force of a coating reaches 0-1 level, the tensile shear strength is improved to 22.5 MPa or above, the problems that a traditional surface treatment method is unstable in effect and insufficient in modification depth are effectively solved, and the surface treatment method has the outstanding advantages of being high in treatment efficiency, uniform and lasting in modification effect, environmentally friendly and the like.

A plasma processing apparatus includes a radio-frequency (RF) power supply; a pair of plasma electrodes, and a matcher disposed between the pair of plasma electrodes and the RF power supply. The matcher includes an RF feed line supplied with RF power from the RF power supply; a ground line; a first load line connected to one of the plasma electrodes; a second load line connected to the other of the plasma electrodes; an impedance matching circuit connected to the RF feed line, the first load line, the second load line, and the ground line, and including variable reactance elements; an RF sensor that is provided in the RF feed line and detects the RF power; a voltage sensor that detects a first peak value; and a matcher controller that controls the variable reactance elements by inputting detected values from the RF sensor and the voltage sensor.

The invention relates to a method for treating a reflective optical element (1) for the VUV wavelength range having an aluminum surface (3). The treatment of the reflective optical element (1) comprises irradiating the reflective optical element (1) with a hydrogen plasma jet (10) to remove the aluminum oxide layer (4) formed on the aluminum surface (3). The invention also relates to a reflective optical element (1) for use in the VUV wavelength range treated by such a method, and to an optical arrangement comprising at least one such optical element (1).

According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.

The invention relates to the technical field of electronic circuits, in particular to a magnet coil power supply system, a control method and electronic equipment. The magnet coil power supply system comprises a subsystem and a control module. The subsystem comprises a plurality of sub-modules and a magnet coil sub-module; the plurality of sub-modules are arranged in an array in the form of M rows and N columns; the sub-module comprises a first capacitor and a driving module; the first capacitor is connected in parallel with the driving module; the control module is connected with the driving module; the control module is configured to generate M * N groups of driving pulse signals for the plurality of sub-modules by adopting a carrier phase-shifting modulation mode; for the ith row of sub-modules in the array, the corresponding driving pulse signals have the same phase offset relative to the driving pulse signals of the first row of sub-modules, and the offset of the phase offset is (i-1) / M carrier periods. The power supply voltage and the working current of the magnet coil can be greatly improved by arranging the plurality of sub-modules in an array, and current ripples can be reduced and the control efficiency can be improved by a phase shift control strategy.

To provide a technique capable of reducing power consumption in a substrate processing apparatus.SOLUTION: The substrate processing apparatus includes a chamber, an exhaust system configured to exhaust a gas in the chamber, the exhaust system including a vacuum pump, a dry pump, and an exhaust pipe connecting the vacuum pump and the dry pump, a first heat transfer member covering an outer wall of the chamber, a second heat transfer member covering an outer wall of the vacuum pump, and a heat transfer line configured to thermally connect the first heat transfer member and the second heat transfer member to the exhaust pipe and transfer heat of the chamber and the vacuum pump from the first heat transfer member and the second heat transfer member to the exhaust pipe.SELECTED DRAWING: Figure 2

The invention provides a high-enthalpy shock tunnel free flow electron density two-dimensional diagnosis system and method. The system comprises a laser, a sheet light assembly, a double-camera imaging system, a time sequence synchronizer, a work station and other core components. NO molecules in a flow field are excited by laser to generate fluorescence, two fluorescence images with nanosecond delay are obtained by using a spectroscope and two sets of synchronous acquisition systems, fluorescence lifetime two-dimensional distribution is calculated based on a fluorescence intensity ratio, and then two-dimensional space distribution of electron density is obtained through inversion of a physical model. Non-contact measurement is achieved, interference of a traditional probe on a flow field is avoided, the method has the outstanding advantages of two-dimensional visualization, high temporal-spatial resolution, high measurement precision and the like, and a reliable diagnosis means is provided for high-enthalpy flow field characteristic research and aircraft communication performance evaluation.

An ion implantation system has a first linear accelerator for accelerating ions of an ion beam to a first energy along a beam path. A second linear accelerator positioned downstream of the first linear accelerator along the beam path accelerates the ions to a second energy. A charge stripper has a stripper tube with a passageway positioned between the first and second linear accelerators. A charge stripping medium is provided in the passageway to strip at least one electron from the ions as the ion beam passes through the charge stripping medium. A focusing apparatus is associated with the stripper tube to control a trajectory of the ions within the passageway of the stripper tube. The focusing apparatus can be two or more quadrupoles and include an electrostatic lens, a magnet, a solenoid, or a Einzel lens.

The invention provides a method for measuring impedance of a capacitively coupled plasma source, which comprises the following steps of: under the condition that plasma is not ignited, dividing a cavity into an upper part and a lower part along an electrical middle plane, and establishing an equivalent circuit model comprising five elements to be determined; three measurement ports are defined, five independent measurement boundary conditions are set, sweep frequency measurement is carried out by using a network analyzer, and multiple groups of Z parameter data are obtained; then, on each frequency point, joint fitting is carried out on a theoretical impedance expression of the equivalent circuit and actually measured data, and parameter values of all undetermined elements are solved; and finally, outputting a parameter curve of each element along with frequency change and a cavity equivalent impedance spectrum. According to the method, the problem that equivalent parameters cannot be identified is solved through multi-working-condition data redundancy, universal, accurate and reproducible measurement of the impedance of the pure cavity is realized, and a reliable quantitative basis is provided for matching network design, process window prediction and cavity optimization.

The invention provides a rotating target for generating monoenergetic neutrons, which comprises a target chamber, a target sheet, a sealing flange and a vacuum system, the target sheet is composed of a TiD / TiT target material and a substrate, a deviation distance of 5-10mm exists between the center of the target material and the center of the substrate, the substrate is connected with a motor outside the target chamber through a fixed connecting rod, and the target chamber is driven by the motor to rotate at a speed of 3-5min / r. The target material is designed to be the eccentric target rotating slowly, so that the utilization rate of the target material can be improved, and the phenomena that the temperature of a single point is too high, a coating layer penetrates or falls off, enriched gas escapes and neutron yield fluctuation is caused due to the fact that beam bombards one position of the target material for a long time can be avoided. The energy width of neutrons generated by the rotating target is lower than 5%, the rotating target has good monochromaticity and low energy loss, the design precision requirement of the fourth-generation nuclear reactor can be met, and a possible guarantee is provided for commercialized popularization and application of the fourth-generation nuclear reactor.

The invention discloses a detection control device, a detection control method and a petroleum logging neutron tube system. The detection control device comprises a radio frequency power supply, an impedance matching module, a filtering module, a current detection module and a control module, the radio frequency power supply is used for providing radio frequency energy for the radio frequency electrode, so that working gas in an ion source in the neutron generator generates plasma; the current detection module is used for providing direct current voltage for the radio frequency electrode and detecting information of direct current flowing through the radio frequency electrode; the filtering module is used for preventing radio frequency energy from entering the current detection module and preventing direct current from entering the radio frequency power supply; the control module is used for controlling the output power of the radio frequency power supply according to the direct current information. According to the detection control device, the detection control method and the petroleum logging neutron tube system, the density of plasma in the neutron generator can be obtained in real time, a stable and reliable feedback signal is provided for output power control of a radio frequency power supply, and the stability of neutron output is ensured.

The etching method disclosed herein includes a process (a) of preparing a substrate within a chamber of a plasma processing apparatus. The substrate includes a silicon-containing film. The etching method also includes a process (b) of etching the silicon-containing film by chemical species from a plasma formed from a process gas within the chamber. The process gas includes a phosphorous-containing gas, a fluorine-containing gas, and a hydrogen-containing gas. The hydrogen-containing gas contains at least one selected from the group consisting of hydrogen fluoride, H2, ammonia, and a hydrocarbon.

To provide a method and a device for smoothing a work by which the working time of finish flattening is drastically shortened by predicting stress deformation in advance and roughly working the work into a shape corresponding to a finish shape in advance in a working method for smoothing the work in which the stress deformation is caused, especially the work having a bimetal structure in which thermal stress deformation is caused by temperature rise.SOLUTION: The method includes a first machining process for locally machining the surface of the workpiece based on machining data, and a second machining process which is performed after the first machining process and has a machining mechanism for preferentially removing a contact part between a machining pad having a planar machining reference surface and the workpiece, wherein stress deformation of the workpiece at the time of machining in the second machining process is predicted, and machining data of the first machining process is created from a difference between a predicted surface shape 4 at deformation and a predicted finished surface shape 5 or a difference between a final finished surface shape 7 and the pre-machining surface shape 6.SELECTED DRAWING: Figure 1

The utility model provides an ion source cavity structure, an ion source and an ion implanter. The cavity structure comprises a first arc chamber, a second arc chamber, a first cathode unit, a second cathode unit and a switch. One end of the first arc chamber away from the second arc chamber is provided with an air inlet, and one end of the second arc chamber away from the first arc chamber is provided with an ion outlet; the first cathode unit is arranged on one side of the first arc chamber, and the first cathode unit and the first arc chamber are electrically insulated from each other; the switch is connected in series with the first cathode unit; the second cathode unit is arranged on one side of the second arc chamber, and the second cathode unit and the second arc chamber are electrically insulated from each other. According to the utility model, the gas dissociation efficiency can be effectively improved, so that the size of an ion beam can be effectively improved, the whole process circulation time during the running of goods on a machine table is reduced, and the production efficiency of the machine table is improved.

The invention discloses a semi-conductor finished product packaging system integrating labeling, coding and sealing quality control, which relates to the field of semi-conductor packaging and comprises an initial detection module, a static electricity removing module, a static electricity real-time monitoring and discharging module, a gas processing module and a sealing quality detection module. Through efficient electrostatic control, sealing quality detection and gas treatment processes, the surface voltage of the semiconductor product is monitored in real time, discharge measures are accurately triggered, and electrostatic damage is prevented. In the sealing process, the sealing temperature, pressure and speed are dynamically adjusted, and the sealing quality of each product is ensured. The gas exchange process is optimized, and gas waste and quality fluctuation are avoided. The automation level is improved, the response speed is increased, and the energy consumption and the rejection rate are reduced.

A nozzle for a liquid-cooled plasma arc torch is provided. The nozzle includes an inner nozzle body defining a proximal end and a distal end extending along a central longitudinal axis of the nozzle. The inner nozzle body comprises a plasma bore disposed along the central longitudinal axis. An outer nozzle body is disposed about the inner nozzle body. The outer nozzle body and the inner nozzle body are joined at a distal interface to form a circumferential fluid seal. A liquid coolant channel defined between the inner nozzle body and the outer nozzle body. The liquid coolant channel is disposed substantially circumferentially into the inner nozzle body. A distal tip portion of the liquid coolant channel is located in the inner nozzle body between the distal interface and the plasma bore along a radial axis that is substantially perpendicular to the central longitudinal axis.