8303results about "Plasma technique" patented technology

A plasma processing method includes (a) generating plasma in a chamber of a plasma processing apparatus including a substrate support provided in the chamber and supporting a substrate placed thereon, (b) applying a voltage pulse from a bias power supply to a bias electrode of the substrate support in order to draw ions from the plasma into the substrate, and (c) repeating (b). In (c), a duration length of the voltage pulse is changed to change a potential of the substrate.

A dielectric barrier plasma generator includes: a dielectric substrate, a high-voltage electrode provided on a first surface of the dielectric substrate, a low-voltage electrode provided to face a second surface of the dielectric substrate, a power introduction section provided at a first end of the high-voltage electrode, a gas channel formed from a first end to a second end thereof between the dielectric substrate and the low-voltage electrode to allow gas to flow from the first end of the gas channel to the second end thereof, and a blowout outlet formed at the second end of the gas channel to blow out the gas that has flown through the gas channel and plasma that has been generated in the gas channel. The dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet.

A power generator is described that provides at least one of electrical and thermal power comprising (i) at least one reaction cell for reactions involving atomic hydrogen products identifiable by unique analytical and spectroscopic signatures, (ii) a molten metal injection system comprising at least one pump such as an electromagnetic pump that provides a molten metal stream to the reaction cell and at least one reservoir that receives the molten metal stream, and (iii) an ignition system comprising an electrical power source that provides low-voltage, high-current electrical energy to the at least one steam of molten metal to ignite a plasma to initiate rapid kinetics of the reaction and an energy gain. In some embodiments, the power generator may comprise: (v) a source of H2 and O2 supplied to the plasma, (vi) a molten metal recovery system, and (vii) a power converter capable of (a) converting the high-power light output from a blackbody radiator of the cell into electricity using concentrator thermophotovoltaic cells with plasma light recycling or (b) converting the energetic plasma into electricity using a magnetohydrodynamic converter.

The invention discloses a coil connecting device for a star imitator magnet and the star imitator magnet, the coil connecting device comprises a shell, a first connecting part and a second connecting part, and a movable space is formed between the outer peripheral surface of each connecting part and the inner wall surface of an accommodating space and between the outer peripheral surface of each connecting part and a connecting hole. The first part of the first connecting part and the second connecting part can relatively rotate around the axial direction of the shell, so that the first connecting part and the second connecting part have a certain degree of freedom of movement in the radial direction of the shell and can adapt to irregular changes of adjacent surfaces of adjacent coils in the radial direction; and the risks of plastic deformation, fatigue cracks and fracture of the connecting part can be reduced.

The invention belongs to the field of laser plasmas, and discloses a device and a method for generating an extreme ultraviolet (EUV) super-continuum light source with luminous efficiency at a 10-20nm waveband, which can be used for quantity detection in advanced semiconductor manufacturing. The device comprises a vacuum pump set, a vacuum chamber, a target material, an EUV spectral measurement system, a laser, a half-wave plate and polarizer combination, a focusing lens and a beam expanding lens, the vacuum pump is used for pumping air to enable the vacuum chamber to keep a proper vacuum degree, and the target material is irradiated by laser to generate plasma to emit supercontinuum radiation of 10-20 nm. According to the invention, after spectral radiation energy and laser-EUV radiation conversion efficiency are quantified through an EUV spectral measurement system and a radiation calibration and energy calculation method, focusing spot sizes with optimal luminous efficiency under different laser wavelengths, laser pulse time and laser energy are obtained, and finally, the maximum luminous efficiency of different laser parameters in a 10-20nm wave band is realized.

The invention features a replaceable cartridge for a plasma arc torch. The cartridge includes a cartridge body having a first section and a second section. The first and second sections are joined at an interface to form a substantially hollow chamber. The interface provides a coupling force that secures the first and second sections together. The cartridge also includes an arc constricting member located in the second section; an electrode included within the substantially hollow chamber; and a contact start spring element affixed to the electrode. The spring element imparts a separating force that biases the electrode toward at least one of the first section or the second section of the body. The separating force has a magnitude that is less than a magnitude of the coupling force.

Systems and methods for generating nitric oxide are disclosed. A nitric oxide (NO) generation system includes at least one pair of electrodes configured to generate a product gas containing NO from a flow of a reactant gas; and a controller configured to regulate the amount of nitric oxide in the product gas produced by the at least one pair of electrodes by utilizing duty cycle values of plasma pulses selected from a plurality of discrete duty cycles to produce a target rate of NO production based on an average of discrete production rates associated with each of the plurality of discrete duty cycles.

To provide an EMR base system effectively treating pigmentation of the skin.SOLUTION: A system includes a focus optic system configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region between the focal region and the focus optic system along the optical axis, wherein the window is configured to make contact with a surface of a tissue.SELECTED DRAWING: Figure 5

The invention discloses a method and equipment for rapidly and continuously preparing carbon nano tubes with adjustable tube diameters, which are used for continuously and rapidly preparing carbon nano tubes with different tube diameters and at least comprise a catalyst precursor atomizing chamber, a plasma device, a carbon nano tube preparation reactor, a collector and a tail gas treatment device. A catalyst precursor solution enters the atomizing chamber through the injection pump to be atomized, atomized mist enters the plasma treatment device and then enters a reaction from a sample inlet in the upper portion of the reactor, after the reaction in the reactor is completed for a short time, the carbon nanotubes are collected from a collecting device on the lower portion of the reactor, and tail gas can be returned to the reactor after being filtered by the filter. The tail gas can be repeatedly used; and the continuous preparation of the carbon nano tubes with different tube diameters can be realized.

The invention relates to the technical field of high-energy particle diagnosis, and discloses an ion probe and diagnosis device.According to the scheme, an insulating plate is arranged in a probe, the insulating plate is plated with a plurality of aluminum films (forming conductive parts) arranged at intervals, when high-energy ions bombard the aluminum films at different positions, current signals can be generated in the corresponding conductive parts, and the high-energy ions can be detected through the current signals; the current amplifier amplifies a generated current signal, transmits the current signal to the signal processing system through the isolation amplifier, collects and analyzes the current signal by the signal processing system, and judges whether the conductive part is bombarded by high-energy ions by detecting the current signals formed in different conductive parts; the angle range of the high-energy ions relative to magnetic lines and the energy distribution range of the high-energy ions are obtained; according to the scheme, the aluminum film is bombarded based on the high-energy ions, the current signal is generated, the experiment cost can be effectively reduced, collection is greatly facilitated, interference of other signals is avoided, and the accuracy of high-energy ion diagnosis is improved to a certain extent.

The utility model provides a switch network unit for plasma breakdown of a nuclear fusion magnet power supply, which is connected in series between a power supply and a magnet load, and comprises an input connection bar which is arranged on a bottom plate and is connected with the power supply; the output connecting bar is installed on the bottom plate and connected with a magnet load, the input connecting bar and the output connecting bar are arranged on the two sides of the insulating layer, the projections of the input connecting bar and the output connecting bar on the insulating layer are overlapped, and currents in the input connecting bar and the output connecting bar on the two sides of the insulating layer are equal in magnitude and opposite in direction; the commutation switch network comprises a plurality of commutation switches which are connected in parallel between the input connection bar and the output connection bar; and the current-limiting resistor is connected in series between the input connection bar and the output connection bar and is connected in parallel with the commutation switch. The currents flowing through the symmetrical parts on the two sides of the insulating layer are equal in magnitude and opposite in direction, so that magnetic fields generated by the currents are offset, stray inductance can be effectively reduced, and the current sharing effect of each converter switch is improved.

A plasma processing apparatus includes a chamber, a substrate support, an edge ring, a lifter, a plasma generator, and a bias power supply. The substrate support is in the chamber. The lifter raises and lowers the edge ring relative to the substrate support. The substrate support includes a base electrically coupled to at least one of the bias power supply or a radio-frequency power supply in a plasma generator, and an electrostatic chuck on the base. The lifter includes a conductive ring and a connector. The conductive ring is electrically coupled to the edge ring while supporting the edge ring placed on the conductive ring. The connector maintains electrical coupling between the conductive ring and the base for movement of the edge ring and the conductive ring with the lifter.

The invention discloses a dissociation rate testing device of a remote plasma source in the field of remote plasma sources. The dissociation rate testing device is characterized in that the remote plasma source is used for dissociating process gas, and a gas outlet is communicated with an etching testing table through a water cooling pipeline; the gas ionization detection device comprises a maintenance gas input control module, an output detection unit and an output calculation unit, the maintenance gas input control module is used for controlling the amount of input maintenance gas, the output detection unit is used for detecting the amount of residual maintenance gas, and the output calculation unit is used for calculating the dissociation rate; the Fourier infrared spectrometer is used for collecting infrared spectrum data of the residual maintenance gas; the RPS control test bench is used for detecting and controlling the air inlet flow, the pressure in the cavity and the cooling water flow of the remote plasma source; the tail gas treatment equipment is used for treating the residual maintenance gas. According to the testing device, full-process monitoring and closed-loop control of the plasma source operation state are realized, and the dissociation rate detection precision and the process stability are improved.

A device for inhibiting condensation distortion on an optical element of a medical instrument configured for insertion into a body cavity is provided. The device may include a housing; a cavity within the housing, the cavity being sized to removably retain at least a portion of the medical instrument therein, wherein the portion includes the optical element; a plasma activation zone within the cavity and arranged such that when the at least a portion of the medical instrument is retained within the cavity, the optical element is located within the plasma activation zone; a plasma generator configured to be activated to cause formation of a plasma cloud in the plasma activation zone in a vicinity of the optical element; and a controller configured to activate the plasma generator for a time period sufficient to cause the optical element to become hydrophilic prior to insertion into the body cavity.

The invention provides a method and a system for measuring plasma current in a quasi-ring symmetrical star simulator, and relates to the technical field of star simulators, and the method comprises the steps: determining a sensor design index according to a bootstrap current simulation calculation result, and converting the design index into an actual arrangement scheme according to an installation environment constraint; all the magnet coils are independently excited in a plasma-free state, wall eddy current interference signals generated by the magnet coils are calibrated, and thus wall eddy current calibration voltage signals are output; a sensor in an actual arrangement scheme is used for synchronously collecting a total original induced voltage signal including plasma current and wall eddy current; an integral voltage signal representing the total current is output; and compensating the integral voltage signal by using the wall eddy current calibration voltage signal, and inverting the final measurement value of the plasma current in the quasi-ring symmetric star simulator. The device and the method have the beneficial effects that the interference of a stray field on a measurement result is weakened, and a high-precision diagnostic tool is provided for the plasma physical research of the star simulator.

The invention is applicable to the technical field of microwave plasmas, and provides a normal-pressure microwave plasma jet device which comprises an outer conductor, an inner conductor coaxially arranged in the outer conductor, a nozzle in threaded connection with the bottom end of the outer conductor, a pin at the end of a radio frequency connector connected with the inner conductor through a connecting conductor, and a gas pipe joint in threaded connection with the outer conductor. The short-circuit plug screw is in threaded connection with the top end of the outer conductor, a short-circuit reflecting surface is arranged at the bottom of a connecting piece installed in the short-circuit plug screw, and the air guide ring is nested on the inner conductor and located between the radio-frequency connector and the air pipe joint; the scheme is simple, reliable and low in cost, stable normal-pressure microwave plasma jet can be obtained without configuring a complex control module to adjust the impedance matching degree of the system, the gas flowing state can be more stable, plasma at an outlet is prevented from being affected, the short-circuit reflecting surface is further designed to be in a threaded up-and-down adjusting mode, and the service life of the system is prolonged. And the impedance matching effect is achieved by finely adjusting the short-circuit reflecting surface.

In a plasma processing apparatus, a radio-frequency power supply adjusts frequencies of radio-frequency power in each bias cycle of electrical bias energy. The radio-frequency power supply uses a reference time series of frequencies of the radio-frequency power in each bias cycle. The radio-frequency power supply repeats using a changed time series of frequencies of the radio-frequency power in each bias cycle to increase a degree of match based on an evaluation value. The changed time series results from shifting the reference time series by a phase shift amount, scaling the reference time series in a frequency direction, or scaling two or more of multiple time zones of the reference time series in a time direction.

The present disclosure is related to a system for generating high-temperature fluids, designed to reduce carbon emissions and improve energy efficiency in various industrial processes. The system leverages advanced thermal energy transfer and storage technologies to efficiently utilize diverse energy sources, including grid electricity, renewable energy, and waste heat from industrial processes. Particularly, the system comprises a heating subsystem, a heat transfer and storage subsystem, a post-heating subsystem, and an electrical feeding subsystem, a fluid circulation subsystem and a cooling circulation subsystem. The heat transfer and storage subsystem utilize innovative materials and techniques to efficiently store and release thermal energy, enabling the system to operate with high thermal efficiency and flexibility.The system can be integrated into various industrial processes, and by optimizing energy utilization and reducing reliance on fossil fuels, the system contributes to a more sustainable and environmentally friendly future. Additionally, the system can be integrated with different renewable electricity generation systems such a photovoltaic, wind, hydroelectric, among others. The system can also be integrated with the electrical grid, providing valuable grid services such as load balancing, energy shifting, and frequency regulation. This enhances grid stability and enables the system to contribute to a more resilient and efficient energy infrastructure.Furthermore, this invention offers a promising solution for reducing carbon emissions, improving energy efficiency, and enhancing the flexibility and reliability of industrial processes.

In a plasma processing apparatus, a radio-frequency power supply adjusts frequencies of radio-frequency power in each bias cycle of electrical bias energy. The radio-frequency power supply uses a reference time series of frequencies of the radio-frequency power in each bias cycle. The radio-frequency power supply repeats using a changed time series of frequencies of the radio-frequency power in each bias cycle to increase a degree of match based on an evaluation value. The changed time series results from shifting the reference time series by a phase shift amount, scaling the reference time series in a frequency direction, or scaling two or more of multiple time zones of the reference time series in a time direction.

An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma having a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.

Apparatus comprising an energy cell and controller is disclosed. The energy cell is configured to apply electrical energy to liquid in the cell to generate bubbles of plasma which heat the liquid. A c

The invention belongs to the technical field of plasmas, and provides a remote plasma generator, which comprises an ionization cavity, an ignition assembly, a magnetic core assembly and a heat dissipation assembly, and is characterized in that an air channel is formed in the ionization cavity; the ignition assembly is used for conducting excitation ignition on gas in the gas channel to form plasma. The ignition assembly comprises a dielectric sheet, a sealing structure and an ignition structure, and the dielectric sheet is attached to the ionization cavity; the sealing structure is arranged on the outer side of the dielectric sheet; the ignition structure is used for performing excitation ignition on gas; an anodic oxidation coating film is formed on the inner wall of the ionization cavity; an anodic oxidation coating film is formed on the surface of the dielectric sheet through an anodic oxidation process. The anodic oxidation coating film is formed on the surface of the dielectric sheet, the dielectric sheet serves as a dielectric material, meanwhile, the anodic oxidation coating film on the surface is tightly attached to the anodic oxidation coating film in the ionization cavity, the contact surface stress is increased, the dielectric sheet is prevented from cracking, gas corrosion caused by plasma bombardment is effectively reduced, and the service life is prolonged.

The disclosed plasma processing apparatus includes a chamber, a substrate support part, an excitation electrode, an emission unit, and a resonator. The substrate support part is provided in a processing space in the chamber. The excitation electrode is provided above the substrate support part. The emission unit emits electromagnetic waves into a plasma generation space below the excitation electrode. The resonator is provided on the excitation electrode and is electromagnetically coupled to the emission unit. A conductor portion that defines the waveguide of the resonator is formed from a first conductor in a first portion including a position 1 / 4 of a wavelength in the guide of the electromagnetic wave in the resonator from one end of the waveguide, and is formed from a second conductor in a second portion other than the first portion. The thermal conductivity of the first conductor is lower than the thermal conductivity of the second conductor.

A plasma processing apparatus includes a chamber, a substrate support, a gas supplier for supplying gas into the chamber, a radio-frequency power supply for supplying a source radio-frequency power to generate plasma, and a bias power supply for generating electric bias. During a first processing period, the radio-frequency power supply uses frequencies, which are included in a first frequency set determined to reduce a degree of reflection of the source radio-frequency power from a load, as source frequencies of the source radio-frequency power for each of phase periods in a waveform period of the electric bias. During a second processing period, the radio-frequency power supply uses frequencies, which are included in a second frequency set different from the first frequency set and determined to reduce the degree of reflection, as the source frequencies for each of the phase periods.

In an electrode unit of an active gas generation apparatus according to the present disclosure, a dielectric film support member includes a support surface supporting a high voltage side dielectric film from a lower side. A lower surface of the dielectric film suppression member provided on an upper side of a ground side dielectric film includes a dielectric contact region overlapped with a peripheral region of the high voltage side dielectric film and the support surface of the dielectric film support member in a plan view and a dielectric non-contact region overlapped with an intermediate region of the high voltage side dielectric film in a plan view. The high voltage side dielectric film is suppressed from the dielectric contact region on an upper side by the dielectric film suppression member receiving suppress strength of a plurality of suppression auxiliary members.

There is provided an apparatus for processing a substrate, comprising: a substrate holder disposed in a processing chamber and configured to hold the substrate; a processing gas supplying part configured to supply a processing gas into the processing chamber; a surrounding member disposed to surround a peripheral portion of the substrate held by the substrate holder and having an annular wall portion made of a dielectric; a plasma actuator disposed at the wall portion and configured to plasmarize the processing gas supplied by the processing gas supply part and form flow of plasma of the processing gas along the wall portion in a preset direction; and an injection mechanism configured to inject the plasma formed by the plasma actuator and flowing along the wall portion toward the peripheral portion of the substrate held by the substrate holder to perform processing using the plasma.

The invention provides an implementation method of a novel low-distortion digital modulation direct drive power amplifier device, and relates to the field of plasma generation radio frequency power supplies, the method realizes acquisition of modulation waveform signals through a delta-sigma oversampling technology, and realizes further improvement of the sampling rate of the modulation waveform signals through a PDM pulse distribution unit interpolation filter. The exciter can generate multi-phase PDM modulation waveform pulses and carrier wave driving pulses, and directly drives the power amplifier module to complete carrier wave generation and waveform modulation. Multi-phase PDM modulation can achieve a better modulation waveform THD (Total Harmonic Distortion) index, it is ensured that a modulation waveform signal is basically subjected to distortion-free recovery, but in order to reduce the complexity of a system and give consideration to the modulation waveform total harmonic distortion index, the multi-phase PDM modulation is generally controlled within 12 phases. In addition, a modulation waveform signal is divided into a plurality of equal-amplitude PDM square wave signals by a multi-phase PDM modulation and superposition technology, so that the power amplifier works in an on-off state, and the efficiency of the power amplifier is improved.

The invention describes an air plasma propulsion system and method comprising: an air turbine plant adapted to receive supply air from an external environment, and a plasma propulsion unit adapted to increase a speed of said air after a corresponding ionization and passage into air plasma phase. The plant comprises a turbine compressing air which transits in the plasma propulsion unit which ionizes it strongly and accelerates it through a frequency or microwaves in magnetic field produced by a laser beam.

The invention discloses a plasma ion three-dimensional flow velocity distribution detection system and method, and belongs to the technical field of plasma diagnosis. The system comprises a Mach probe, a controllable voltage source, a sampling resistor and a voltage acquisition system, the Mach probe, the sampling resistor and the controllable voltage source are connected in series through wires to form a loop, and the voltage acquisition system is connected in parallel with the controllable voltage source and the sampling resistor and is used for acquiring the voltage of the controllable voltage source and the sampling resistor. According to the detection method, on the basis of the multi-axis vector synthesis principle, ion flow velocity components in different planes are obtained by inserting a Mach probe in the three-axis direction, and a three-dimensional flow velocity component is calculated through a vector synthesis algorithm. According to the invention, the local flow field structure in the ion source can be diagnosed, the spatial distribution characteristic of the ion flow velocity can be revealed, the spatial resolution is high, the velocity information of particles can be directly provided, the three-dimensional data of the ion flow velocity measurement can be synthesized without complex optical path rotation or multiple scanning, and the experimental device is simple and low in cost.

The invention discloses a radio frequency plasma comprehensive testing device and method for an ion process system, and relates to the technical field of plasma testing, and the device comprises a host and a coupling probe; the coupling probe is placed on a radio frequency transmission line of an ion process system, is used for carrying out coupling sampling on radio frequency energy through a capacitance or inductance coupling mode according to an electromagnetic field coupling principle, obtains current and voltage signals through coupling, and is also used for sensing and obtaining real-time temperature data in the probe; the host comprises a main body shell and a shielding frame arranged in the main body shell, and a data processing and analyzing unit is arranged in the shielding frame and used for performing data processing on the received voltage, current and temperature signals; the radio frequency power supply power, the radio frequency power supply frequency spectrum, the impedance of the matcher and the vacuum reaction cavity and other ion process system parameter values are calculated and generated, and meanwhile clutter capture and radio frequency transmission harmonic wave test results in radio frequency transmission are output, so that the comprehensive test of the ion process system is realized.