26 results about "Plasma density" patented technology

The invention belongs to the technical field of biomedical detection, and discloses a Raman spectrum analysis device for quantitative detection of hematologic tumor markers, which comprises a blood collection centrifugal unit with a self-adaptive load regulation mechanism for monitoring blood density and components in real time, centrifugal force and time parameters are automatically adjusted according to the blood density and components; the optical fiber Raman spectrometer is provided with an automatic wavelength calibration system, and an ultrafast laser pulse transmitter and a high-sensitivity photon counting detector are integrated on the optical fiber Raman spectrometer. Raman scattering signals are enhanced by adopting a quantum entanglement light source and a nonlinear optical crystal; according to the invention, the detection capability on low-concentration tumor markers can be obviously improved. Due to the improvement, the device can accurately detect the existence of the tumor marker at the early stage of cancer, and powerful support is provided for early treatment of a patient.

To improve the uniformity of the plasma density in an ionization chamber.SOLUTION: An ion source 1 includes a vaporizer 100 that generates vapor from a solid source material, a first container 10 having a plenum chamber 20 fluidly connected to the vaporizer 100, and a second container 50 having an ionization chamber 50a fluidly connected to the plenum chamber 20, and the first container 10 having a first wall 20a to which the vaporizer 100 is connected and a second wall 20b opposite the first wall 20a, the second wall 20b having a slit 45 opening along the longitudinal direction of the plenum chamber 20, and the vapor is supplied from the plenum chamber 20 to the ionization chamber 50a through the slit 45.SELECTED DRAWING: Figure 2

The invention relates to the technical field of vapor deposition, and discloses a reaction cavity for enhancing chemical vapor deposition, which comprises a cavity main body, two ends of the cavity main body are respectively provided with a gas inlet and an extraction opening, the surface of the inner wall of the cavity main body is provided with an insulation shielding layer, and the inner wall of the cavity main body is provided with a magnetic field enhancing assembly in a surrounding manner. An objective table is arranged close to the bottom of the inner wall of the cavity main body, a sub-electrode is arranged close to the upper end of the inner wall of the cavity main body, the cavity main body comprises a cylindrical shape and a rectangular shape, a heating device is integrated in the objective table, and a magnetic field enhancing assembly restrains plasma through a radial magnetic field to reduce collision loss with the cavity wall. The plasma density of the marginal area is increased by 20-30%; the distributed radio frequency electrodes can realize partition power regulation and control, and the thickness uniformity error of the thin film on the surface of the silicon wafer is controlled within + / -2% in combination with dynamic compensation of real-time monitoring data.

The application discloses a method and system for measuring plasma density gradient, and belongs to the technical field of plasma physics diagnosis, which comprises the following steps: a femtosecond laser pulse with wide spectrum characteristics and an initial pulse width is incident to a to-be-measured plasma; the pulse width of the femtosecond laser pulse reflected by the to-be-measured plasma is measured; according to a preset mapping relationship between the pulse width of the reflected femtosecond laser pulse and the plasma density gradient and the pulse width of the femtosecond laser pulse reflected by the to-be-measured plasma measured at present, the density gradient of the to-be-measured plasma is determined. The application overcomes the limitation of insufficient time resolution of traditional methods such as the interference method and the shadow method, does not need complex density distribution reconstruction algorithms or model assumptions, can directly obtain gradient information according to the preset mapping relationship between the reflected pulse width and the density gradient, and reduces the data processing complexity and inversion error.

A plasma lining structure is used in a process chamber to block direct line-of-sight for plasma generated within to grounded surface. The plasma lining structure includes a plurality of sections to cover at least one or more portions of an inside surface of a plasma confinement structure disposed in the process chamber. The sections of the plasma lining structure are positioned between a plasma region and the sidewall of the plasma confinement structure, when the plasma lining structure and the plasma confinement structure are disposed in the plasma chamber, such that the sections directly face the plasma region.

The present invention relates to a method for radiation enhancement based on non-uniform plasma. This method aims to overcome the relatively simple physical models of existing plasma enhancement technologies and the lack of general discussion on how to achieve optimal enhancement using non-uniform plasma. The method is based on a plasma-enhanced small electric antenna, which includes a spherical plasma shroud and a small electric antenna located within the shroud. Furthermore, the plasma within the shroud is non-uniformly distributed along the radius of the shroud. The radiation enhancement method is as follows: the plasma density and the size of the plasma shroud are adjusted to meet the following conditions, thereby enhancing the radiation of the small electric antenna with the non-uniform plasma.

The invention relates to the technical field of nuclear fusion, in particular to a spherical Tokamak feeding system based on ultrasonic molecular beam injection. Comprising the steps that a gas tank, a hydrogen tank, a pressure reducing valve, a needle valve and the like form a common gas supply loop to serve as an initial feeding channel so as to meet the feeding requirement of daily operation, and an ultrasonic molecular beam injection gas path is additionally arranged on the basis to serve as a secondary supplementing feeding channel in the plasma discharging process and used for improving the plasma density; and compared with a traditional air supply mode for secondary feeding, the response time is shorter, and the feeding efficiency is higher. Finally, the ultrasonic molecular beam injection gas path and the initial feeding channel are connected through a gas pressure measuring assembly so as to monitor the gas pressure of the two gas paths; based on the air pressure of the two air paths, the amount of air fed every time can be accurately measured. According to the invention, staged fuel gas injection can be carried out on the spherical tokamak, the injection efficiency of the fuel gas is greatly improved, and the wall circulation is reduced.

This application discloses a coil device and a plasma device. Based on the actual distribution of plasma in the reaction chamber, this application adjusts the distance between at least one sub-coil segment and the dielectric window by means of a driving component, thereby changing the plasma density in the region corresponding to the sub-coil segment in the reaction chamber, so that the plasma density at any position in the entire reaction chamber is basically the same, thereby improving the uniformity of plasma distribution in the reaction chamber and improving the etching uniformity of the wafer.

The invention provides a plasma processing device and a method for preventing plasma leakage, and the device comprises a reaction cavity which is internally provided with a pedestal used for bearing a wafer, and the pedestal is electrically connected with a first non-constant voltage power supply; the restraint ring is arranged on the periphery of the base in a surrounding mode, and the space in the reaction cavity is divided into a plasma processing area and an exhaust area communicated with an external vacuumizing device; the restraint ring is electrically connected with the second non-constant-voltage power supply; plasma is prevented from entering the exhaust area through the restraint ring. Even under the condition that the plasma density in the reaction cavity is high, the plasma leakage can be avoided, and the condition that the exhaust flow guide of the restraint ring meets the process requirement is ensured.

The invention discloses an optical fiber interferometer precision adjustment vibration reduction platform for plasma density diagnosis, and belongs to the technical field of magnetic confinement nuclear fusion plasma diagnos.The optical fiber interferometer precision adjustment vibration reduction platform comprises symmetrically-arranged vibration reduction bases, supporting columns are arranged above the vibration reduction bases, a cross beam is arranged above the supporting columns, and the cross beam is arranged above the vibration reduction bases. Cantilever supports are symmetrically arranged on the lower surface of the cross beam, cylindrical coil fixers are arranged on the peripheries of the cantilever supports, Helmholtz coils are arranged on the cylindrical coil fixers, L-shaped collimator fixers are arranged on the cantilever supports, and optical fiber interferometer collimators are arranged on the L-shaped collimator fixers; according to the optical fiber interferometer precision adjustment vibration reduction platform for plasma density diagnosis, environment vibration can be effectively restrained, it is ensured that the optical fiber interferometer reaches the theoretical phase resolution, precision height adjustment and firm locking can be achieved, and the accuracy and reliability of plasma density measurement data are guaranteed.

The present invention achieves a technique for making plasma density uniform throughout the entirety of a vacuum chamber without reducing plasma density, by suppressing a decrease in plasma density at a portion close to the side wall of the vacuum chamber. A plasma treatment device (1) is provided with: a treatment chamber (64); a stage (30) that is disposed inside the treatment chamber (64) and on which an object to be processed is placed; and one or a plurality of antennas (20) that generate a magnetic field for producing plasma inside the treatment chamber (64). The antenna (20) has a structure in which, when viewed from a direction orthogonal to the placement surface of the stage (30), the tip of the linear antenna (20) is curved or bent.

The invention relates to the technical field of plasma physics and magnetic field compression, in particular to a low-temperature high-density plasma target preparation device and method. According to the technical scheme, the device comprises a pulse magnetization plasma generation assembly, a magnetic field compression transmission cavity, a reversible superconducting cooling type magnet assembly and a multi-window diagnosis observation cavity which are sequentially connected in the plasma transmission direction. Through a two-stage compression mechanism combining eddy current preliminary compression and gradient magnetic field deep compression, on the premise that a complex transient pulse power system is not needed, the plasma density is successfully increased by three orders of magnitude to 1023m <-3 > order of magnitude, and efficient conversion from kinetic energy to internal energy is synchronously achieved; the device adopts a steady-state superconducting magnet and a compact integrated design, the structure is simplified, the operation is stable, the whole-process real-time diagnosis capability is realized, and an efficient and reliable scheme is provided for magnetization target pulse fusion and high-energy density physical research.

The application discloses a direct blood vessel continuous pressure measuring system based on an ultrasonic transducer, which comprises an information collecting module, an information preprocessing module and an information display module, wherein the information collecting module is used for collecting information such as blood flow velocity, pipe diameter and blood density; the information preprocessing module is connected with the information collecting module through Bluetooth, wireless or electricity and is used for preprocessing information such as blood flow velocity, pipe diameter and blood density; and the information display module is connected with the information preprocessing module through electricity; wherein the information collecting module is an ultrasonic micro probe, one end of the ultrasonic micro probe is arranged on a catheter in a trocar, the other end of the catheter is directly contacted with blood in an arterial blood vessel or a venous blood vessel, the catheter is movably sleeved in a sleeve of the trocar, and one end of the catheter is stretched out of the front end of the sleeve. The application has the beneficial effect of accurately monitoring the hemodynamic (arterial / venous blood vessel pressure) change in a continuous and invasive manner.

The present invention relates to a plasma filtering device and a filtering method. The plasma filtering device comprises: a first passage and a second passage located within a main body of the plasma filtering device. A baffle is provided between the first passage and the second passage, and the baffle is provided with an opening with an adjustable opening. When the opening is closed, plasma, after being formed, diffuses upward in the first passage, passes over the top of the baffle, and then flows downward in the second passage. When the plasma diffuses upward in the first passage, part of the plasma collides with the sidewall of the first passage and is filtered and removed, thereby reducing the plasma density and alleviating damage to the substrate. When the opening is open, at least part of the plasma, after being formed in the first passage, can directly enter the second passage through the opening, thereby increasing the plasma density and improving the reaction rate.

The invention belongs to the technical field of calibration, and discloses a self-adaptive calibration system and method for invasive blood pressure signal drift. The method comprises the steps that original blood pressure, posture and height signals are collected and preprocessed through an invasive sensor, initial blood pressure signals, posture angles and height changes are obtained, and first waveform features are extracted; calibrating the blood density of the patient, judging interference in combination with the attitude angle and height change, and extracting to obtain a second waveform feature; inputting into an attenuation classification model to obtain an attenuation probability to judge an attenuation type, and extracting corresponding blood pressure signals and waveform features according to the attenuation type; calculating a theoretical reference value by taking a calibration reference point, and calculating an actual drift distance calibration blood pressure signal by combining waveform characteristics; finally, non-invasive blood pressure measurement values are synchronized, attenuation classification model parameters are optimized, and accurate calibration is achieved. According to the method, the influence of macroscopic interference on signal judgment is thoroughly eliminated, and accurate distinguishing between microcosmic physical interference and electron drift is realized.

A monitoring system comprises sensors adapted to be worn by a user, and, a processor linked with the sensor. The processor receives sensor data and processes this data to determine user posture data including data indicative of vertical distance between level of the user's heart and ankle. Based on the posture data together with a value for degree of user chronic venous insufficiency and / or blood density, generate an estimate of user static venous pressure while the user is static, without calf muscle pump activity. The processor also processes the sensor data to determine if there is calf muscle pump activity, and generates an estimate of user active venous pressure according to the static venous pressure estimate, rate of calf muscle activity, and a value for degree of user chronic venous insufficiency. The processor may generate the venous pressure estimate in real time, and may control an NMES device accordingly.

The invention provides a central control system suitable for a wave heating magnetic plasma linear device, and the system comprises a parameter calculation module which is configured to calculate and output the corresponding inflation rate, air inflow and wave heating power in real time based on an input target plasma parameter; the experiment recording module is connected with the parameter calculation module and the diagnosis system and is configured to automatically record experiment data and generate experiment logs; and the temperature control module is connected with the diagnosis system and is configured to perform cooling according to the part temperature data fed back by the diagnosis system in real time. Different systems can be organically coupled, integrated process control is achieved, an operator directly provides target plasma parameters (plasma density and temperature), a central control system directly calculates and adjusts related parameters (air inflow and wave heating power), and the control process is simple, accurate and safe.

A monitoring system comprises sensors adapted to be worn by a user, and, a processor linked with the sensor. The processor receives sensor data and processes this data to determine user posture data including data indicative of vertical distance between level of the user's heart and ankle. Based on the posture data together with a value for degree of user chronic venous insufficiency and / or blood density, generate an estimate of user static venous pressure while the user is static, without calf muscle pump activity. The processor also processes the sensor data to determine if there is calf muscle pump activity, and generates an estimate of user active venous pressure according to the static venous pressure estimate, rate of calf muscle activity, and a value for degree of user chronic venous insufficiency. The processor may generate the venous pressure estimate in real time, and may control an NMES device accordingly.

The application belongs to the technical field of biomedical detection, and discloses a Raman spectrum analysis device for quantitative detection of blood tumor markers, which comprises a blood collection and centrifugal unit with an adaptive load adjustment mechanism, which is used for real-time monitoring of blood density and composition, and automatic adjustment of centrifugal force and time parameters according to the blood density and composition; a fiber Raman spectrometer equipped with an automatic wavelength calibration system, wherein an ultrafast laser pulse emitter and a high-sensitivity photon counting detector are integrated on the fiber Raman spectrometer; the application enhances the Raman scattering signal by adopting a quantum entangled light source and a nonlinear optical crystal, and can significantly improve the detection capability of low-concentration tumor markers. This improvement enables the device to accurately detect the presence of tumor markers in the early stage of cancer, providing strong support for early treatment of patients.

The present invention relates to a plasma filtering device and a filtering method. The plasma filtering device comprises an upwardly directed first plasma path and a downwardly directed second plasma path located within the plasma filtering device body and connected to the first plasma path. The first plasma path includes sidewalls. After plasma is formed, it diffuses upward within the first plasma path before flowing downward within the second plasma path. In the plasma filtering device, when plasma diffuses upward within the first plasma path, a portion of the plasma collides with the sidewalls of the first plasma path and is filtered and removed, thereby reducing plasma density and mitigating damage to the substrate.

The utility model relates to the technical field of blood culture and blood collection, in particular to a blood culture and blood collection auxiliary device which comprises an installation base, two elastic bandages are installed at the side end of the installation base, and a limiting plate is fixedly installed at the side end, away from one side of the elastic bandages, of the installation base. A limiting box is rotatably mounted between the mounting base and the limiting plate, a shifting fluted disc is rotatably mounted at the side end of the limiting box, a clamping plate is slidably mounted in the limiting box, and the improved blood collection auxiliary device for blood culture is made of a transparent material, facilitates observation, can adjust the inclination angle, limits a blood culture bottle and is convenient to use. The other side of the device can limit the limb distance of the blood sampling part of a patient at the same time, the electronic scale is installed below the blood culture bottle, the blood sampling amount can be inferred according to the blood density and the milliliter number of blood needing to be collected, whether the blood sampling amount meets the requirement or not is observed in combination with the box body, and a pressure rebound ball is arranged on the lower side in the box body. The blood culture bottle can be effectively fixed and is convenient to take and install.

The application discloses a kind of hypersonic vehicle plasma density on-line diagnosis method, including the current of probe zero position acquisition is obtained to obtain the current of modified probe plasma acquisition;In the current of modified probe plasma acquisition, effective data is selected, and is divided into n sections;The I-V curve of each section data in n section data is obtained;According to I-V curve, electron temperature and saturated ion current are obtained, and then the electron density of n section data is obtained;Edge effect and collision effect correction are carried out to the electron density, and the plasma density of plasma flow field is obtained.The application also discloses a kind of hypersonic vehicle plasma density on-line diagnosis system, including power supply module, power conversion module, triangular wave conversion module, signal conditioning module, acquisition and frequency adjustment module, probe and data processing equipment.The application improves plasma measurement data processing efficiency and accuracy under real environment, and can be used to guide basic theory research, predict model correction and support reliable measurement and control communication research.

To realize a technique for uniformizing the whole plasma density without lowering it by suppressing the lowering of the plasma density at a place near the side wall of a vacuum vessel.SOLUTION: A plasma processing apparatus (1) includes a processing chamber (64), a stage (30) that is disposed inside the processing chamber (64) and on which a processing target is placed, and one or a plurality of antennas (20) that generate a magnetic field for generating plasma inside the processing chamber (64), in which the antenna (20) has a structure in which an end portion of the linear antenna (20) is curved or bent when viewed from a direction orthogonal to a placement surface of the stage (30).SELECTED DRAWING: Figure 1

The utility model discloses a microwave normal-pressure plasma jet array based on a power divider, which relates to the field of microwave normal-pressure plasma and comprises a cavity and an upper cavity arranged at the upper end of an outer cavity, a metal cover plate is arranged at the upper end of the upper cavity, an inner conductor is arranged in the outer cavity, and an outer conductor is arranged in the outer cavity. And the surface of the inner conductor is arranged between the outer cavity and the upper cavity. According to the microwave normal-pressure plasma jet array based on the power divider, microwave low-temperature plasmas can increase the excitation, ionization and dissociation processes of gas molecules, the number of excited sub-state atoms is large, the ionization and dissociation degrees of the plasma to gas are one order of magnitude higher than those of other types of plasmas (such as radio-frequency electric field plasmas), the plasma density is large, and the plasma density is high. The plasma beam is high in ionization degree, large in energy and high in activity, related physical and chemical reactions are easier to occur or initiate, the bacteria can be killed by hitting a culture dish containing the bacteria or a skin wound, and the sterilization effect is achieved.

A plasma processing system includes a processing chamber including a substrate support. A plasma generator is configured to selectively generate plasma in the processing chamber to treat a substrate arranged on the substrate support. An emitter is configured to transmit first terahertz waves through the plasma in the processing chamber. A detector is configured to receive second terahertz waves corresponding to the first terahertz waves transmitted through the plasma in the processing chamber.

The invention discloses an impedance matching circuit, an impedance matching method, a storage medium and a plasma generation device, and the impedance matching circuit comprises a control circuit, a detection circuit and an impedance adjustment circuit. The detection circuit is used for detecting plasma density information in a reaction chamber of the plasma generation device and outputting the plasma density information to the control circuit; the control circuit is used for predicting impedance change in the reaction chamber according to the plasma density information and outputting an impedance adjusting instruction to the impedance adjusting circuit; and the impedance adjusting circuit is used for changing the input impedance of the system according to the impedance adjusting instruction so as to realize impedance matching. According to the invention, the impedance value of the reaction chamber is obtained by detecting the plasma density information, so that the input impedance of the system is adjusted, and impedance matching is realized. Because the plasma density information can be continuously detected, the change of the impedance value of the reaction chamber can be reflected in time, and then real-time impedance matching is realized.