28results about "Ion beam tubes" patented technology

This aims to increase the current flow rate of the ion beam containing aluminum ions drawn from the ion source, while also achieving stable ion beam extraction. [Solution] The ion source IS comprises a plasma generation chamber 3 and an aluminum-containing material 1 placed inside the plasma generation chamber 3. The aluminum-containing material 1 is an intermetallic compound, and the potential of the aluminum-containing material 1 is lower than the potential of the plasma generation chamber 3.

The present invention provides a gas cluster ion beam apparatus that enables flat processing of a material substrate by irradiation with a neutral beam during irradiation with a gas cluster ion beam. [Solution] A neutralization gas introduction device 26 is provided for the first vacuum vessel 2. By introducing neutralization gas from the neutralization gas introduction device, the gas cluster ion beam 11 along the beamline in the beam transport system BT collides with the neutralization gas, causing dissociation and neutralization to form a high-energy neutral beam 25. Furthermore, a reflective electrode 28 is provided between the electrostatic lens 9b and the material substrate 15 to which a high voltage equivalent to the acceleration voltage is applied.

A method, apparatus, and computer program product for detecting volatile organic compounds (VOCs) in a gas is provided. An example VOC detector may include a processing device and a detecting region. The detecting region may further include a first interdigital pole electrically connected to a separation voltage source, a second interdigital pole electrically connected to a switch, and an ionization device configured to interact with the gas within the detecting region to create a plurality of ionized gas molecules. To facilitate detection of VOCs, the switch may alternate the connection of the second interdigital pole between a compensation voltage source and the processing device. The processing device may determine a number of volatile organic compounds in the gas based at least in part on a number of ionized gas molecules that contact the second interdigital pole while the second interdigital pole is electrically connected to the processing device.

The present application provides an ion source, inhibits clogging of a nozzle, and improves the life of a vaporizer. An ion source (IS1, IS2, IS3) includes a vaporizer (C1, C2, C3) having a hollow crucible (2, 32) having a long side direction in one direction and a nozzle (3) connected to the crucible (2, 32); a plasma generation chamber (14) to which a gas is supplied from the crucible (2, 32) through the nozzle (3); and a control device (C) that controls a set temperature of the vaporizer (C1, C2, C3). The control device (C) controls the set temperature of the vaporizer (C1, C2, C3) based on a temperature of the plasma generation chamber (14) or a parameter having a correlation with the temperature of the plasma generation chamber (14) so that a temperature of a connection portion (P2) of the crucible (2, 32) and the nozzle (3) is higher than a temperature of a central portion (P1) of the crucible (2, 32) in the long side direction of the crucible (2, 32).

The application relates to a device and a method for precise assembly of an ECR ion source, which comprises a support, a sliding rail device, a measuring head, a motor device and a control system; the top of the support is provided with the sliding rail device, the sliding rail device is provided with the measuring head, the measuring head is provided with two Hall piece grooves for mounting Hall pieces, the Hall pieces are used for measuring the magnetic field intensity at the corresponding positions of a plasma arc cavity of the ECR ion source; the sliding rail device is further provided with a grating ruler, a reference origin switch, a positive limit switch and a negative limit switch; the control system is electrically connected with the motor device, the grating ruler, the reference origin switch, the positive limit switch and the negative limit switch, the motor device is electrically connected with the sliding rail device, the control system is used for controlling the motor device to work, thereby controlling the movement and rotation of the measuring head in a three-dimensional space through the sliding rail device, determining the magnetic field intensity in any direction, and determining the assembly of related components of the ECR ion source based on the magnetic field intensity, and the application can be widely used in the field of precise assembly.

In a state in which an ion beam from an ion source 101 is shielded by a shutter 102, an ion milling apparatus applies a discharge voltage Vd between an anode 203 and cathodes 201 and 202 and an acceleration voltage Va between the anode and an acceleration electrode 205 with respect to the ion source, and retracts the shutter by a shutter drive source 103 to a position where the ion beam is not shielded after any one of a discharge current flowing between the anode and the cathodes due to discharge and an ion beam current flowing caused by irradiation on the shutter the ion beam falls below a predetermined reference value.

An ion source includes a vaporizer that includes a crucible that is long in a longitudinal direction and a nozzle connected to the crucible at a connecting portion of the crucible, a plasma generation chamber to which gas is supplied from the crucible through the nozzle, and a controller that controls a temperature of the vaporizer. The controller controls the temperature of the vaporizer in response to a temperature of the plasma generation chamber or in response to a parameter correlated with the temperature of the plasma generation chamber so that a temperature of the connecting portion is higher than a temperature of a central portion of the crucible in the longitudinal direction.

An ion source is disclosed which may be used to introduce a dopant material into an arc chamber. A component containing the dopant material is placed in the path of the etching gas entering the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas moves through the liquid. In several other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, thereby allowing the etching gas to flow through the solid material. In several other embodiments, one or more components of the ion source are manufactured using a material containing the dopant material, thereby allowing the etching gas to etch the component to release the dopant material.

An ion source capable of different operation modes is disclosed. A vaporizer communicates with the ion source. The ion source can have a plurality of gas inlets communicating with different gases. When operating in the first mode, the ion source can supply a first gas, such as an inert gas, while heating the vaporizer. When operating in the second mode, the ion source can supply a second gas, and the second gas can be an organoaluminum gas. When operating in the third mode, the ion source can supply the second gas while heating the vaporizer. Ions having a single charge can be generated in the first and second modes, while ions having multiple charges can be generated in the third mode.

An ion extraction optics including an extraction plate defining first, second, and third extraction apertures, the second extraction aperture being located between the first and third extraction apertures, first, second, and third beam blockers located adjacent the first, second, and third extraction apertures, respectively, wherein the first beam blocker and the first extraction aperture define first and second extraction slits, the second beam blocker and the second extraction aperture define third and fourth extraction slits, and the third beam blocker and the third extraction aperture define fifth and sixth extraction slits, wherein a height of the first extraction slit is greater than a height of at least one of the third extraction slit and the fourth extraction slit, and wherein a height of the sixth extraction slit is greater than the height of at least one of the third extraction slit and the fourth extraction slit.

To provide a charged particle beam alignment apparatus.SOLUTION: Variations in a charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam-defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response thereto is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.SELECTED DRAWING: Figure 1A

The present disclosure provides an ion source grid structure. The ion source grid structure comprises a grid body, a dielectric buffer layer, a lower electrode layer, a piezoelectric film layer, an upper electrode layer, an encapsulation layer, and a signal lead-out and polarization channel circuit, wherein the encapsulation layer, the upper electrode layer, the piezoelectric film layer, the lower electrode layer, the dielectric buffer layer, and the grid body are sequentially arranged from top to bottom along a stacking direction; the signal lead-out and polarization channel circuit is arranged on the upper electrode layer and the lower electrode layer. The present disclosure solves the technical problem that the prior art lacks an acoustic / piezoelectric sensing and excitation element which can be directly integrated into the ion source grid body and can work stably.

The application discloses a screen grid auxiliary pulse ignition starting method and device for a microwave ion source. The screen grid auxiliary pulse ignition starting device for the microwave ion source comprises a pulse generation module, a direct-current screen grid power supply, a switching switch and a timing and control unit, and the timing and control unit is configured to execute the screen grid auxiliary pulse ignition starting method for the microwave ion source. The application utilizes the inherent screen grid electrode of the ion source, applies a short ignition pulse on the screen grid electrode, and utilizes the pulse electric field to assist the initial ionization of the gas, so that the starting success rate is significantly improved, the starting time is shortened, and the robustness of the starting process is enhanced.

An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes may be utilized to remove the interaction between the biased extraction plate and the plasma. The cross-section of the arc chamber may be circular or nearly circular to facilitate the rotation of electrons in the chamber. In another embodiment, biased electrodes may be disposed in the chamber on opposite sides of the extraction aperture in the height direction. In some embodiments, only one of the electrodes is biased at a voltage greater than the body of the arc chamber.

An ion source that is capable of extending the life of a charge material in a vaporizer is disclosed. A controller uses information about the desired beam current and the amount of charge material remaining in the vaporizer to determine the temperature experienced by the vaporizer. The temperature of the vaporizer determines the rate at which the charge material is consumed. By considering both the amount of charge material left, as well as the desired beam current, the temperature of the vaporizer may be maintained at a lower temperature than would otherwise be possible. This serves to extend the life of the charge material, while still supplying the desired beam current.

It prevents nozzle clogging and improves the lifespan of the vaporizer. [Solution] The ion sources IS1, IS2, and IS3 are ion sources having vaporizers C1, C2, and C3 that supply gas generated inside crucibles 2 and 32 to the plasma generation chamber 1 through nozzles 3. When the ion sources IS1, IS2, and IS3 are operated from a stopped state, the plasma generation chamber 1 is heated up before gas is generated inside crucibles C1, C2, and C3, so that the temperature of the plasma generation chamber 1 is equal to or higher than the crucible temperature during ion source operation.

The present disclosure provides a method for generating an ion beam array. The present disclosure relates to the field of micro-nano processing. The method for generating an ion beam array comprises: performing phase modulation on incident light emitted by an incident light source through a spatial light modulator loaded with a preset phase pattern to obtain excitation light; irradiating a cold atom group using the excitation light to cause a plurality of target cold atoms of a plurality of cold atoms in the cold atom group located at a target spatial position to produce atomic transition, so as to obtain an array of excited-state atom groups, the target spatial position being determined based on the preset phase pattern; and sequentially applying ionization light and a guiding electric field to the array of excited-state atom groups, so that the array of excited-state atom groups emits a plurality of target ion beams to form an ion beam array.

To provide a high power ion beam generator system and method.SOLUTION: Provided herein are a high energy ion beam generator system and a method that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current / high-moderate voltage generation of neutrons and protons. Such a system and a method find use for commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.SELECTED DRAWING: None

The present invention appropriately controls the distribution of charged particles in an ion source. To this end, the present invention comprises: a plurality of plasma generation units (140) each provided with a magnetic flux generation unit (143); an expansion chamber (160) that is connected to the plurality of plasma generation units and emits charged particles; and a magnetic path member (150) through which the magnetic flux generated by the magnetic flux generation units passes. Defining a first magnetic flux density (B) to be the magnetic flux density in an interior space of the expansion chamber and defining a second magnetic flux density (B0) to be the magnetic flux density in the interior space of the expansion chamber in the case of having removed the magnetic path member, the magnetic path member is formed such that the magnetic flux density ratio (B / B0) at a central axis (CL-P) of the expansion chamber and the magnetic flux density ratio (B / B0) at the periphery of the expansion chamber are different.

The application relates to a neutron tube and application thereof, which comprises an ion source device, a neutron target, an X-ray target and an accelerating electrode device, the ion source device is used for ionizing gas and generating an ion beam; the neutron target and the X-ray target are coaxially arranged on one side of the ion source device; the accelerating electrode device is used for applying voltage and forming an electric field one and an electric field two between the ion source device and the neutron target respectively, the electric field one accelerates the ion beam, so that the ion beam bombards the neutron target to generate neutrons and electrons, and the electric field two can inhibit the electrons to generate neutrons when the neutron target is positively biased relative to the accelerating electrode device, and can reversely accelerate the electrons and make the electrons bombard the X-ray target to generate X-rays when the neutron target is negatively biased relative to the accelerating electrode device. The application can generate neutrons and X-rays, is various in functions and can meet different requirements; and the neutron generator can be applied to the fields of petroleum logging and article detection, can detect elements of articles and has high resolution.

It prevents nozzle clogging and improves the lifespan of the vaporizer. [Solution] The ion sources IS1, IS2, and IS3 are equipped with vaporizers C1, C2, and C3 that supply gas generated in crucibles 2 and 32 to the plasma generation chamber 14 via nozzles 3 connected to hollow crucibles 2 and 32 that are elongated in one direction, and extract an ion beam IB containing aluminum ions from the plasma generation chamber 14. The ion sources IS1, IS2, and IS3 are also equipped with a control device C that controls the set temperature of vaporizers C1, C2, and C3 according to the temperature of the plasma generation chamber 14 or the value of a parameter correlated with the temperature of the plasma generation chamber 14, so that the temperature of the connection part P2 between the crucibles C1, C2, and C3 and the nozzle 3 is higher than the temperature of the central part P1 of the crucibles 2 and 32 in the longitudinal direction of the crucibles 2 and 32.

Embodiments of systems, apparatuses, and methods relate to an ion beam source system. The ion source is configured to provide a negative ion beam to a tandem accelerator system downstream of the ion source, and a modulator system connected to an extraction electrode of the ion source is configured to bias the extraction electrode for a duration sufficient to maintain stability of an acceleration voltage of the tandem accelerator system.

An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons and are positioned outside the ionization volume and proximate to the anode. The at least two filaments each comprise an elliptically-shaped portion and non-elliptical portions on either end of the elliptically-shaped portion. The non-elliptically-shaped portions are configured to be mounted in a fixed position relative to the anode to maintain a constant distance between the elliptically-shaped portion and the anode. The elliptically-shaped portion extends along a plane that intersects a plane perpendicular to the axis of the anode at a non-zero angle.

In the ion source, the distribution of charged particles is appropriately controlled. [Solution] The system comprises a plurality of plasma generation units 140, each having a magnetic flux generating unit 143; an expansion chamber 160 connected to the plurality of plasma generation units 140 and emitting charged particles; and a magnetic path member 150 through which the magnetic flux generated by the magnetic flux generating units 143 passes. The magnetic flux density in the internal space of the expansion chamber 160 is defined as a first magnetic flux density B, and the magnetic flux density in the internal space of the expansion chamber 160 when the magnetic path member 150 is removed is defined as a second magnetic flux density B0. The magnetic path member 150 is formed such that the magnetic flux density ratio B / B0 at the central axis CL-P of the expansion chamber 160 is different from the magnetic flux density ratio B / B0 at the peripheral edge of the expansion chamber 160.

An ion source for forming a plasma has a cathode having a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity. A cathode shield has a cathode shield surface that at least partially surrounds the cathode surface. A cathode gap is formed between the cathode surface and the cathode shield surface, defining a tortuous path for restricting the plasma from passing through the gap. The cathode surface may have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, which are different from each other to define the cathode step. The stepped cylindrical surface may be an outer surface or an inner surface. The first cathode diameter and the second cathode diameter may be concentric or axially eccentric.

Ion extraction systems, ion extraction optics, and ion extraction methods are disclosed. In one aspect, an ion extraction optic can include an extraction plate including a first opening and a second opening, and a first beam stop extending over the first opening, and a second beam stop extending over the second opening. Each of the first beam stop and the second beam stop can include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, where the first beam stop and the second beam stop are movable to change at least one of the first distance and the second distance. As a result, extraction by the inner slit and the outer slit of ion beamlets characterized by a similar average angle can be achieved.

The present invention relates to an ion source (1), in particular an ion thruster for propelling a spacecraft, comprising a reservoir (2) for a propellant (3), a heater (4) for heating the propellant (3), an emitter (6) having one or more projections (7) for emitting ions (3') of the propellant (3), wherein the one or more projections (7) are in fluid communication with the reservoir (2), an extractor (8) facing the emitter (6) for extracting ions (3') of the propellant (3) from the emitter (6) and for accelerating the extracted ions (3') in a direction of emission (R), wherein the heater (4) comprises a projection heating unit (5) and is configured to liquefy solid propellant (3) at the one or more projections (7) by the projection heating unit (5) before the solid propellant (3) in the reservoir (2) is liquefied.