The invention relates to an
electron beam
exposure apparatus for transferring a pattern onto the surface of a target, comprising:a beamlet generator for generating a plurality of
electron beamlets;a modulation array for receiving said plurality of
electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet;a controller, connected to the modulation array for individually controlling the modulators,an adjustor, operationally connected to each modulator, for individually adjusting the
control signal of each modulator;a focusing electron optimal
system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, anda target holder for holding a target with its
exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical
system.