2399results about "Beam/ray deflecting arrangements" patented technology

A synchrocyclotron comprises a resonant circuit that includes electrodes having a gap therebetween across the magnetic field. An oscillating voltage input, having a variable amplitude and frequency determined by a programmable digital waveform generator generates an oscillating electric field across the gap. The synchrocyclotron can include a variable capacitor in circuit with the electrodes to vary the resonant frequency. The synchrocyclotron can further include an injection electrode and an extraction electrode having voltages controlled by the programmable digital waveform generator. The synchrocyclotron can further include a beam monitor. The synchrocyclotron can detect resonant conditions in the resonant circuit by measuring the voltage and or current in the resonant circuit, driven by the input voltage, and adjust the capacitance of the variable capacitor or the frequency of the input voltage to maintain the resonant conditions. The programmable waveform generator can adjust at least one of the oscillating voltage input, the voltage on the injection electrode and the voltage on the extraction electrode according to beam intensity and in response to changes in resonant conditions.

The invention concerns a device (10) for regulating the intensity of a beam extracted from a particle accelerator, such as a cyclotron, used for example for protontherapy, said particles being generated from an ion source. The invention is characterized in that it comprises at least: a comparator (90) determining a difference ε between a digital signal IR representing the intensity of the beam measured at the output of the accelerator and a setpoint value IC of the beam intensity: a Smith predictor (80) which determines on the basis of the difference ε, a correct value of the intensity of the beam IP; an inverted correspondence table (40) supplying, on the basis of the corrected value of the intensity of the beam IP, a setpoint value IA for supply arc current from the ion source (20).

A rotating gantry includes a link frame for supporting a plurality of rollers which rotatably support the rotating gantry, a brake for releasing a braking force applied to at least one of the rollers upon supply of air and applying the braking force to the one roller upon discharge of air, and a solenoid valve for sealing the supplied air in the brake when closed, and discharging the air from the brake when opened. The solenoid valve is supported by a solenoid valve support member mounted to the link frame such that the solenoid valve is positioned just near the brake. The rotating gantry can be more quickly braked and stopped while maintaining high irradiation accuracy.

To ensure irradiation accuracy and safety, even when an irradiation device employing a different irradiation method is used, disclosed is herein a charged particle beam irradiation apparatus that irradiates an irradiation target with charged particle beams includes:a charged particle beam generator for generating the charged particle beams; a passive scattering irradiation device and a scanning irradiation device, both for irradiating the irradiation target with the charged particle beams; a beam transport system for transporting the charged particles beam extracted from the charged particle beam generator, to selected one of the two irradiation devices; and a central controller that modifies operating parameters on the charged particle beam generator, according to the irradiation method adopted for the selected irradiation device.

Disclosed is a medical particle irradiation apparatus comprising a rotating gantry 1 including an irradiation unit 4 emitting particle beams; an annular frame 16 located within and supported by the rotating gantry 1 such that it can rotate relative to the rotating gantry 1; an annular frame 15 fixedly located opposite the annular frame 16; an anti-corotation mechanism 34 being in contact with both the annular frames 16 and 15 to prevent the annular frame 16 from rotating together with the rotating gantry 1 during rotation of the rotating gantry 1; and a flexible moving floor 17 interposed between the annular frames 15 and 16, the flexible moving floor 17 being engaged with the annular frames 15 and 16 in such a manner as to move freely such that its bottom is substantially level and that it moves as the rotating gantry rotates.

An irradiation apparatus for irradiating by scanning a target volume according to a predetermined dose profile with a scanning beam of charged particles forming an irradiation spot on said target volume, said apparatus comprising:a beam generating device,a reference generator for computing, from said predetermined dose profile, through a dynamic inverse control strategy, the time evolution of commanded variables, these variables being the beam current I(t), the spot position settings x(t),y(t) and the scanning speed settings vx(t), vy(t),a monitor device having means for detecting at each time (t), the actual spot position as a measured position defined by the values xm(t),ym(t) on the target volume,characterised in that said irradiation apparatus further comprises means for determining the differences ex(t), ey(t) between the measured values xm(t), ym(t) and the spot position settings x(t) and y(t), and means for applying a correction to the scanning speed settings vx(t) and vy(t) depending on said differences ex(t), ey(t). The present invention is also related to a monitor for determining beam position in real-time.

An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.

A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.

A system for treating target cells with both positive and negative ions comprises a bi-polar beam delivery system configured to create and deliver both positive ion beams and negative ion beams. The bi-polar beam delivery system comprises a bi-polar accelerator configured to accelerate positive and negative ions in the same direction making such a bi-polar beam delivery system practical.

The invention comprises an ion beam focusing method and apparatus used as part of an ion beam injection system, which is used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The ion beam focusing system includes two or more electrodes where one electrode of each electrode pair partially obstructs the ion beam path with conductive paths, such as a conductive mesh. In a given electrode pair, electric field lines, running between the conductive mesh of a first electrode and a second electrode, provide inward forces focusing the negative ion beam. Multiple such electrode pairs provide multiple negative ion beam focusing regions.

A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.