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329 results about "Accelerated particle" patented technology

A particle accelerator is a machine that uses electromagnetic fields to propel charged particles to nearly light speed and to contain them in well-defined beams.

Manufacturing method of superconductor cavity

The invention belongs to the technical field of particle accelerators and particularly relates to manufacture of a radio frequency superconductor cavity. A manufacturing method of the superconductor cavity mainly comprises the following steps: (1) using superconductor materials as raw materials, (2) utilizing CAD software to generate a superconductor cavity model, and adopting layering software to layer the superconductor cavity model, (3) using an atmosphere control system to provide argon for a forming chamber, (4) laying powder of superconductor materials in the step (1) on a forming table of the forming chamber, (5) using a scanning control system to print laser energy onto a powder layer according to the description of a software model of a superconductor cavity slicing layer so as to generate a superconductor material slicing layer entity. The entity is a part of the superconductor cavity. A next slicing layer is processed continually on the first slicing layer entity until the whole superconductor cavity processing process is finished. Finally, mechanical polishing, chemical washing, high-temperature annealing, high-pressure super-pure water washing and super-clean chamber assembly are conducted. The method shortens the development cycle of the superconductor cavity, improves the finished product rate of the development of the superconductor cavity due to the fact that the whole superconductor cavity is free of welding joints, is free of restriction of stamping forming conditions and capable of improving the performance of the superconductor cavity, and reduces product cost due to the fact that surplus superconductor material powder can be used repeatedly.
Owner:INST OF MODERN PHYSICS CHINESE ACADEMY OF SCI

Method for reducing metal secondary electron yield by utilizing regular array structure

The invention provides a method for inhibiting a metal surface SEY (Secondary Electron Yield) by utilizing a regular array structure. The regular array structure is realized by utilizing an image photolithography process of a semiconductor device field. A typical array structure can adopt a circular hole or a rectangular groove structure; and the size of the structure ranges from several microns to dozens of microns. The shape of the regular array structure is determined by a designed mask, and the depth/width ratio of a regular trap is determined by etching time. Under the condition of the same depth/width ratio and porosity, the inhibiting effect of a circular hole trap surface SEY is better than that of a rectangular groove trap surface; with the regard to the same array structure, the porosity is greater when the depth/width ratio is greater, and the SEY inhibiting effect is better. The technology disclosed by the invention has the potential application value on inhibiting a micro-discharging effect of a metal microwave part in a satellite load and a particle accelerator, namely the surface SEY is reduced through a surface imaged photolithography under the precondition of not changing a surface metal material of the part, so that the micro-discharging effect can be inhibited in a greater extent. Meanwhile, the technology is also applicable to various special application fields needing to carry out metal surface SEY inhibition, such as a traveling wave tube collection electrode and the like; and the method has certain universality.
Owner:XI AN JIAOTONG UNIV +1
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