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5530 results about "Ion source" patented technology

An ion source is a device that creates atomic and molecular ions. Ion sources are used to form ions for mass spectrometers, optical emission spectrometers, particle accelerators, ion implanters and ion engines.

Apparatus for detecting chemical substances and method therefor

An apparatus for detecting chemical substances which is high in sensitivity and selectivity is provided. An organic acid or an organic acid salt is used to generate an organic acid gas from an organic acid gas generator 3 to be mixed with a sample gas for introduction into an ion source 4 for ionization, thereby obtaining a mass spectrum by a mass analysis region 5. A data processor 6 determines the detection or non-detection of a specific m / z of an organic acid adduct ion obtained by adding a molecule generated from the organic acid to a molecule with specific m / z generated from a target chemical substance to be detected based on the obtained mass spectrum. When there is an ion peak with the m / z of the organic acid adduct ion, the presence of the target chemical substance to be detected is determined, and an alarm is sounded. False detection can be prevented.
Owner:HITACHI LTD

Atmospheric pressure ion source for mass spectrometry

A multiple function atmospheric pressure ion source interfaced to a mass spectrometer comprises multiple liquid inlet probes configured such that the sprays from two or more probes intersect in a mixing region. Gas phase sample ions or neutral species generated in the spray of one probe can react with reagent gas ions generated from one or more other probes by such ionization methods as Electrospray, photoionization, corona discharge and glow discharge ionization. Reagent ions may be optimally selected to promote such processes as Atmospheric Pressure Chemical Ionization of neutral sample molecules, or charge reduction or electron transfer dissociation of multiply charged sample ions. Selected neutral reagent species can also be introduced into the mixing region to promote charge reduction of multiply charged sample ions through ion-neutral reactions. Different operating modes can be performed alternately or simultaneously, and can be rapidly turned on and off under manual or software control.
Owner:WHITEHOUSE CRAIG +3

Corona discharge ion source for analytical instruments

An ion mobility spectrometer comprises an ion mobility cell (10) into which molecules of a sample to be analysed are introduced. The ion mobility cell (10) is doped with ions produced by a corona discharge ionisation source (40). In one mode of operation, the corona discharge ionisation source (40) operates to produce a continual dopant stream, and in a second mode of operation, the corona discharge ionisation source (40) produces dopant ions selectively. In the non-continuous mode of operation, the ion mobility cell (10) may be doped with chemical dopant ions instead, switching between the two dopant regimes being accomplished very rapidly. The ion mobility spectrometer is particularly suitable for the detection of explosive compounds and narcotics, the ion mobility spectrum of explosives doped with ions from the corona discharge ionisation source differing from the ion mobility spectrum of such explosive compounds doped with chemical dopants.
Owner:SMITHS DETECTION WATFORD LTD

Ion source

An ion source 10 for producing a beam of ions from a plasma is disclosed. A plasma is created at the center of an anode 12 by collisions between energetic electrons and molecules of an ionizable gas. The electrons are sourced from a cathode filament 11 and are accelerated to the anode 12 by an applied electric potential. A projection of the anode and a magnetic field having an axis aligned with the axis of the anode act together to concentrate the flow of electrons to the center of the anode 12. The ionizable gas is introduced into an ionization region 13 of the ion source 10 at the point of concentrated electron flow. Ions created in the ionization region are expelled from the ion source as an ion beam centred on the axis of the magnetic field. The surfaces of the anode are coated with an electrically conductive non-oxidising layer of Titanium Nitride to prevent a build up of an insulating layer on the anode.
Owner:SAINTECH

High-current DC proton accelerator

A dc accelerator system able to accelerate high currents of proton beams at high energies is provided. The accelerator system includes a dc high-voltage, high-current power supply, an evacuated ion accelerating tube, a proton ion source, a dipole analyzing magnet and a vacuum pump located in the high-voltage terminal. The high-current, high-energy dc proton beam can be directed to a number of targets depending on the applications such as boron neutron capture therapy BNCT applications, NRA applications, and silicon cleaving.
Owner:ION BEAM APPL

Capacitively coupled plasma reactor with magnetic plasma control

A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
Owner:APPLIED MATERIALS INC

Laminated tube for the transport of charged particles contained in a gaseous medium

An improved tube for accepting gas-phase ions and particles contained in a gas by allowing substantially all the gas-phase ions and gas from an ion source at or greater than atmospheric pressure to flow into the tube and be transferred to a lower pressure region. Transport and motion of the ions through the tube is determined by a combination of viscous forces exerted on the ions by the flowing gas molecules and electrostatic forces causing the motion of the ions through the tube and away from the walls of the tube. More specifically, the tube is made up of stratified elements, wherein DC potentials are applied to the elements so that the DC voltage on any element determines the electric potential experience by the ions as they pass through the tube. A precise electrical gradient is maintained along the length of the stratified tube to insure the transport of the ions. Embodiments of this invention are methods and devices for improving the sensitivity of mass spectrometry or ion mobility spectrometers when coupled to atmospheric and above atmospheric pressure ionization sources. An alternate embodiment of this invention applies an AC voltage to one or more of the conducting elements in the laminate.
Owner:CHEM SPACE ASSOIATES

Memory component, memory device, and method of operating memory device

InactiveUS20110194329A1Avoid reactionImprove repetition durabilitySolid-state devicesDigital storageLow resistanceTellurium
A memory component includes: a first electrode; a memory layer; and a second electrode which are provided in that order, wherein the memory layer includes an ion source layer containing aluminum (Al) together with at least one chalcogen element selected from the group consisting of tellurium (Te), sulfur (S), and selenium (Se), and a resistance variable layer provided between the ion source layer and the first electrode and containing an aluminum oxide and at least one of a transition metal oxide and a transition metal oxynitride having a lower resistance than the aluminum oxide.
Owner:SONY SEMICON SOLUTIONS CORP

Method And System For Production Of Radioisotopes, And Radioisotopes Produced Thereby

A system and method for the production of radioisotopes by the transmutation of target isotopic material bombarded by a continuous wave particle beam. An ion source generates a continuous wave ion beam, irradiating an isotope target, which is cooled by transferring heat away from the target at heat fluxes of at least about 1 kW / cm2.
Owner:SOREQ NUCLEAR RES CENT ISRAEL ATOMIC ENERGY COMMISSION

Electrospray ionization ion source with tunable charge reduction

This invention provides methods, devices and device components for preparing ions from liquid samples containing chemical species and methods and devices for analyzing chemical species in liquid samples. The present invention provides an ion source for generating analyte ions having a selected charge state distribution, such as a reduced charged state distribution, that may be effectively interfaced with a variety of charged particle analyzers, including virtually any type of mass spectrometer.
Owner:WISCONSIN ALUMNI RES FOUND

Atmospheric pressure ion source

A non-radioactive atmospheric pressure device for ionization of analytes comprises an atmospheric pressure chamber having an inlet for carrier gas, a first electrode at one end, and a counter-electrode at the other end of the chamber for creating an electrical discharge in the carrier gas thus creating metastable neutral excited-state species. Optionally, a grid is provided to generate electrons or ions by contact with the excited-state species. The carrier gas containing the excited-state species or the electrons generated therefrom is directed at an analyte at atmospheric pressure near ground potential to form analyte ions.
Owner:JEOL USA

Front to back resistive random access memory cells

A resistive random access memory device formed on a semiconductor substrate comprises an interlayer dielectric having a via formed therethrough. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A barrier metal liner lines walls of the via. A conductive plug is formed in the via. A first barrier metal layer is formed over the chemical-mechanical-polishing stop layer and in electrical contact with the conductive plug. A dielectric layer is formed over the first barrier metal layer. An ion source layer is formed over the dielectric layer. A dielectric barrier layer is formed over the ion source layer, and includes a via formed therethrough communicating with the ion source layer. A second barrier metal layer is formed over the dielectric barrier layer and in electrical contact with the ion source layer. A metal interconnect layer is formed over the barrier metal layer.
Owner:MICROSEMI SOC

Cold-cathode ion source with a controlled position of ion beam

A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generates alternating voltage on one of the cathode parts that form the ion-emitting slit, whereas the other slit-forming part is grounded. The alternating voltage deviates the ion beam in the slit with the same frequency of the alternating voltage. In accordance with another embodiment, the aforementioned means may be an electromagnetic coil which generates a magnetic field which passes through the ion-emitting slit, thus acting on the condition of the spatial-charge formation and, hence, on concentration of ions in the ion beam. The cold-cathode ion source may be of any type, i.e., with the ion beam emitted in the direction perpendicular to the direction of drift of electrons in the ion-emitting slit or with the direction of emission of the beam which coincides with the direction of electron drift.
Owner:ADVANCED ION TECH

Remote plasma source for controlling plasma skew

A plasma source is provided including a core element extending from a first end to a second end along a first axis. The plasma source further includes one or more coils disposed around respective one or more first portions of the core element. The plasma source further includes a plasma block having one or more interior walls at least partially enclosing an annular plasma-generating volume that is disposed around a second portion of the core element. The annular plasma-generating volume includes a first region that is symmetrical about a plurality of perpendicular axes that are perpendicular to a first point positioned on the first axis, the first region having a width in a direction parallel to the first axis and a depth in a direction perpendicular from the first axis. The first region has a width that is at least three times greater than the depth of the first region.
Owner:APPLIED MATERIALS INC

Remote reagent chemical ionization source

An improved ion source and portable analyzer for collecting and focusing dispersed gas-phase ions from a reagent source at atmospheric or intermediate pressure, having a remote source of reagent ions generated by direct or alternating currents, separated from a low-field sample ionization region by a stratified array of elements, each element populated with a plurality of openings, wherein DC potentials are applied to each element necessary for transferring reagent ions from the remote source into the low-field sample ionization region where the reagent ions react with neutral and / or ionic sample forming ionic species. The resulting ionic species are then introduced into the vacuum system of a mass spectrometer or ion mobility spectrometer. Embodiments of this invention are methods and devices for improving sensitivity of mass spectrometry when gas and liquid chromatographic separation techniques or probes containing samples are coupled to atmospheric and intermediate pressure photo-ionization, chemical ionization, and thermospray ionization sources.
Owner:CHEM SPACE ASSOCS

Collector for EUV light source

A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and / or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
Owner:ASML NETHERLANDS BV

Personal Care Compositions Providing Enhanced Cooling Sensation

Disclosed are personal care compositions for use on hair, skin, oral cavity, throat and other mucosal surfaces containing a flavor / perfume system comprising one or more coolants, wherein the pleasant cool and refreshing sensation provided by the coolant is enhanced in terms of quicker onset, greater intensity or impact and / or longer duration, thereby improving appeal and acceptability of the compositions to consumers. In one embodiment the invention provides oral care compositions comprising(a) a flavor composition comprising one or more non-menthol coolants and optionally one or more additional flavor ingredients,(b) a calcium ion source and / or a calcium transport agent sufficient to potentiate and / or modulate the cooling and refreshing sensation provided by the coolant(s), and(c) an orally-acceptable carrier.Upon application to the oral cavity, the compositions provide an immediate onset of cooling sensation which lasts longer than about 15 minutes thereby providing long-lasting clean and fresh mouth impression and encouraging user compliance and repeated use of the compositions.
Owner:THE PROCTER & GAMBLE COMPANY

Metal-mediated viscosity reduction of fluids gelled with viscoelastic surfactants

Fluids viscosified with viscoelastic surfactants (VESs) may have their viscosities reduced (gels broken) by the direct or indirect action of a composition that contains at least one metal ion source and optionally at least one second source. An optional second source may be a chelating agent where at least one reducing agent source may be additionally optionally used. Another optional component with the metal ion source includes a second, different metal ion source. The breaking composition is believed to directly attack the VES itself, possibly by disaggregating or otherwise attacking the micellar structure of the VES-gelled fluid, and / or possibly by changing the chemical structure of the VES to give two or more products.
Owner:BAKER HUGHES INC

Gas-target neutron generation and applications

Described herein are integrated systems for generating neutrons to perform a variety of tasks including: on-line analysis of bulk material and industrial process control (as shown in FIG. 1), security interrogation (as shown in FIG. 2), soil and environmental analysis, and medical diagnostic treatment. These systems are based on novel gas-target neutron generation which embodies the beneficial characteristics of replenishable fusible gas targets for very long lifetime, stability and continuous operation, combined with the advantageous features common to conventional accelerator neutron tubes including: on / off operation, hermetically sealed operation, and safe storage and transport. Innovative electron management techniques provide gas-target neutron production efficiencies that are comparable or surpass existing sources. The high-pressure high-resistance gaseous discharge is presented as a favorable gas-target neutron generator embodiment, combining ion source regions, accelerator regions, gas-target regions and electron management components within a single simple cost-effective device that is adaptable to various geometric configurations that provide specific neutron emission profiles for greater analysis capacity.
Owner:STARFIRE INDS MANAGEMENT

Remote reagent chemical ionization source

An improved ion source for collecting and focusing dispersed gas-phase ions from a reagent source at atmospheric or intermediate pressure, having a remote source of reagent ions separated from a low-field sample ionization region by a stratified array of elements, each element populated with a plurality of openings, wherein DC potentials are applied to each element necessary for transferring reagent ions from the remote source into the low-field sample ionization region where the reagent ions react with neutral and / or ionic sample forming ionic species. The resulting ionic species are then introduced into the vacuum system of a mass spectrometer or ion mobility spectrometer. Embodiments of this invention are methods and devices for improving sensitivity of mass spectrometry when gas and liquid chromatographic separation techniques are coupled to atmospheric and intermediate pressure photo-ionization, chemical ionization, and thermospray ionization sources.
Owner:CHEM SPACE ASSOIATES

Laser desorption - electrospray ion (ESI) source for mass spectrometers

An ion source is disclosed for forming multiply-charged analyte ions from a solid sample. A beam of pulsed radiation is directed onto a portion of the sample to desorb analyte molecules. A retaining structure holding a solvent volume is positioned proximate the sample. Desorbed analyte molecules contact a free surface of the solvent and pass into solution. The solution is then conveyed through an outlet passageway to an electrospray apparatus, which introduces a spray of charged solvent droplets into an ionization chamber.
Owner:THERMO FINNIGAN

Remote reagent chemical ionization source

An improved ion source for collecting and focusing dispersed gas-phase ions from a reagent source at sub-atmospheric or intermediate pressure, having a remote source of reagent ions separated from a low-field sample ionization region by a barrier, comprised of alternating laminates of metal and insulator, populated with a plurality of openings, wherein DC potentials are applied to each metal laminate necessary for transferring reagent ions from the remote source into the low-field sample ionization region where the reagent ions react with neutral and / or ionic sample forming ionic species. The resulting ionic species are then introduced into the vacuum system of a mass spectrometer or ion mobility spectrometer. Embodiments of this invention are methods and devices for improving sensitivity of mass spectrometry when gas and liquid chromatographic separation techniques are coupled to sub-atmospheric and intermediate pressure photo-ionization, chemical ionization, and thermal-pneumatic ionization sources.
Owner:CHEM SPACE ASSOCS

Method and apparatus for extracting ions from an ion source for use in ion implantation

Thermal control is provided for an extraction electrode of an ion-beam producing system that prevents formation of deposits and unstable operation and enables use with ions produced from condensable vapors and with ion sources capable of cold and hot operation. Electrical heating of the extraction electrode is employed for extracting decaborane or octadecaborane ions. Active cooling during use with a hot ion source prevents electrode destruction, permitting the extraction electrode to be of heat-conductive and fluorine-resistant aluminum composition. The service lifetime of the system is enhanced by provisions for in-situ etch cleaning of the ion source and extraction electrode, using reactive halogen gases, and by having features that extend the service duration between cleanings, including accurate vapor flow control and accurate focusing of the ion beam optics. A remote plasma source delivers F or Cl ions to the de-energized ion source for the purpose of cleaning deposits in the ion source and the extraction electrode. These techniques enable long equipment uptime when running condensable feed gases such as sublimated vapors, and are particularly applicable for use with so-called cold ion sources and universal ion sources. Methods and apparatus are described which enable long equipment uptime when decaborane and octadecaborane are used as feed materials, as well as when vaporized elemental arsenic and phosphorus are used, and which serve to enhance beam stability during ion implantation.
Owner:SEMEQUIP

Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample

An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
Owner:HITACHI HIGH-TECH CORP

Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing

A method for creating and transporting low-energy ions for use in plasma processing of a semiconductor wafer is disclosed. In an exemplary embodiment of the invention, the method includes generating plasma from a gas species to produce a plasma exhaust. The plasma exhaust is then introduced into a processing chamber containing the wafer. The ion content of the plasma exhaust is enhanced by activating a supplemental ion source as the plasma is introduced into the processing chamber, thereby creating a primary plasma discharge therein. Then, the primary plasma discharge is directed into a baffle plate assembly, thereby creating a secondary plasma discharge exiting the baffle plate assembly. The strength of an electric field exerted on ions contained in the secondary plasma discharge is reduced. In so doing, the reduced strength of the electric field causes the ions to bombard the wafer at an energy insufficient to cause damage to semiconductor devices formed on the wafer.
Owner:LAM RES CORP
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