1143 results about "Ion source" patented technology

The invention discloses an ion source automatic beam adjusting method, a radiotherapy system and related equipment, and relates to the technical field of radiotherapy, and the method comprises the steps: monitoring and adjusting a plurality of control parameters in real time, and obtaining an optimal control parameter combination; under the optimal control parameter combination, the variable quantity of each control parameter before and after adjustment and the performance change of the proton beam are obtained; performing a pulse width charge test according to the variation of each parameter before and after adjustment and the performance change of the proton beam; obtaining an optimal adjustment parameter and an adjustment amount through a pulse width charge test result; and through the optimal adjustment parameter and adjustment amount, automatic beam adjustment is realized, stable and efficient acceleration of the proton beam in the synchrocyclotron system is realized, and the stability and consistency of the proton beam are ensured.

The invention relates to the technical field of yield control, in particular to a neutron generator yield control method and system. The method comprises the following steps: establishing a polynomial model by using historical yield data to predict a target efficiency attenuation factor; dynamically determining neutron event boundaries in the pulse integral value and the pulse width two-dimensional characteristics based on the attenuation factor, and counting the neutron event boundaries; the yield deviation and the change rate are calculated, and when the deviation exceeds a threshold value, feedforward compensation is carried out on the target yield; and selecting a three-dimensional lookup table, an input deviation, a change rate and a current high voltage according to the interval to which the attenuation factor belongs, and cooperatively determining the adjustment amount of the ion source current and the accelerator high voltage. According to the scheme, the measurement and control problems caused by aging of the target piece can be solved, and the precision, the response speed and the long-term stability of yield control are improved.

The invention belongs to the technical field of vacuum coating, and relates to an electron gun and ion source collaborative evaporation coating method, a control method and a control system. The electronic gun and ion source collaborative evaporation coating control method comprises the steps that key parameters in the coating process are continuously collected, and an electronic gun beam initial value and an ion source gas flow initial value are dynamically generated according to state diagnosis results of all the parameters; the beam current value of the electron gun and the gas flow value of the ion source are corrected in real time to inhibit the disturbance of the ion source to the beam current of the electron gun, and the electron gun and the ion source are cooperatively regulated and controlled to ensure the precise control of the coating uniformity; the invention further discloses an electron gun and ion source collaborative evaporation coating method, local hot spot compensation and global uniformity compensation are carried out by adopting a film thickness compensation mechanism so as to accurately control the film thickness. According to the invention, the cooperative control of the electron gun evaporation and ion bombardment process is realized, the film adhesion is enhanced, the evaporation coating rate is improved, and the film thickness uniformity is improved.

The invention relates to the technical field of ion characterization and preparation, in particular to a high-throughput preparation mass spectrum device and method giving consideration to high-resolution characterization. The device comprises an ion source, an ion transmission cavity, a quadrupole mass screening cavity, an ion dissociation cavity, an ion deflection cavity, an ion deceleration and deposition cavity and a high-resolution mass spectrum characterization cavity which are sequentially arranged, wherein the high-resolution mass spectrum characterization cavity is formed in one side of the ion deflection cavity in the vertical direction; soft ionization is combined with a quadrupole analyzer to screen ions, the ions are dissociated through a dissociation cavity, an ion deflection cavity is used for selecting a high-resolution characterization or high-throughput preparation function, a high-resolution mass spectrum characterization cavity is used for achieving high-resolution characterization of screened and fragmented ions, and an ion deceleration and deposition cavity is used for high-throughput preparation of the ions. According to the method, perfect compatibility of high-throughput preparation and high-resolution mass spectrum characterization is realized through ion deflection design, and the method has a wide application prospect in the fields of efficient preparation of biological macromolecules, synthetic macromolecules and the like and the like.

A Flash beam dose control method and a related device. The Flash beam dose control method comprises: obtaining a Flash beam output dose demand; controlling, by means of a Flash tuning mode, the number of pulse periods of output beam charges within a preset time; and / or controlling the pulse width of an ion source voltage by means of a pulse width mapping curve, so as to control a Flash beam output dose rate. By precisely controlling the number of pulse periods of output beam charges and the pulse width of the ion source voltage, the Flash beam output dose rate can be precisely controlled without requiring an additional shielding function for a proton therapy room, so that the dose of Flash can also be tuned in a conventional proton therapy room, thereby facilitating implementation of particle Flash radiotherapy.

The invention discloses an online pre-column derivatization coupled liquid chromatography-mass spectrometry amino acid detection method, and relates to the technical field of analysis and detection, and the method comprises the following steps: obtaining a to-be-detected sample, and carrying out protein hydrolysis treatment to obtain hydrolysate; mixing the hydrolysate with a derivatization reagent, carrying out on-line derivatization reaction through multiple sections of reaction zones which are connected in series, and maintaining different pH environments in the reaction zones; an online detection unit is arranged at an outlet of the reaction zone to monitor the concentration of derivative products and adjust reaction conditions in real time; performing chromatographic separation on the derivative reaction liquid; switching an ion source ionization polarity mode according to an elution time window to carry out mass spectrometry detection; and substituting the mass spectrum response signal into the standard curve to calculate the amino acid concentration value. The method realizes automatic derivation and high-sensitivity detection of amino acid, and has the advantages of simplicity and convenience in operation, controllable reaction conditions and high detection efficiency.

An ion source that includes a cathode near a first end plate and a non-planar second end plate is disclosed. The non-planar second end plate serves to counteract the effect of the plasma on the second end plate. In some embodiments, the plasma has the ability to erode the second end plate. Rather than making the entire second end plate thicker, the second end plate is only made thicker in the regions that are affected by the plasma. In this way, less material is used in the production of the second end plate, and increased lifetime is achieved. This concept may also be used in environments where the plasma serves to deposit material on the second end plate.

In a mass spectrometer (10) for gas analysis, comprising: a mass spectrometer housing (12) evacuated by a vacuum pump; an ion source (16) for ionizing gas atoms or molecules entering the mass spectrometer enclosure (12) and accelerating ions in the mass spectrometer enclosure (12); an ion trap (22) made of an electrically conductive material for collecting ions generated by the ion source (16); an electrical measurement device (24) for measuring the potential or current of the ion trap (22) and connected to the ion trap (22) for inferring the ions collected by the ion trap (22) from the measured potential or current; a magnetic or electromagnetic deflection device configured to deflect or map ions having a specific mass-to-charge ratio to the ion trap (22); an electron barrier (30) made of an electrically conductive material is provided at the ion trap (22), the electron barrier having a lower potential than the ion trap (22) and being configured to generate a reverse electric field to return electrons released from the ion trap (22) onto the ion trap (22).

The invention belongs to the technical field of coated glass, and particularly provides a deposition method of a metal seed layer in TGV metallization and magnetron sputtering equipment. The invention aims to solve the problem of serious surface discharge phenomenon caused by low adhesive force between a metal film and a glass substrate, low metal coverage rate and step rate in a through hole and high accumulated charge on the surface of glass in the existing TGV metallization process. The independent and controllable ion source is introduced to assist deposition, the ion source is started at different stages of metal film deposition, and directional and high-energy positive ion flow generated by the ion source is utilized to bombard the surface of the glass substrate so as to assist the magnetron sputtering process, so that the surface of the glass substrate is subjected to magnetron sputtering. Through shallow ion implantation, enhancement of surface migration energy of deposited metal atoms and neutralization of negative charges accumulated on the glass surface, the adhesive force between metal and a glass substrate is improved, the metal coverage rate and the step rate in a through hole are improved, surface discharge is inhibited, and therefore the process stability is improved.

The invention relates to the technical field of vacuum equipment, and discloses an ion lens assembly, an ion source, a mass spectrometer and a mass spectrometry system. The ion lens assembly includes a deflection lens assembly and a return lens assembly. The deflection lens assembly is used for focusing an ion beam in the incident particle beam and enabling the ion beam to deflect towards a first direction. And the axis-returning lens assembly is used for receiving the ion beam from the deflection lens assembly, and the axis-returning lens assembly is used for focusing the received ion beam and enabling the ion beam to deflect towards a second direction.

The invention relates to a reactive ion beam etching method of a large-size diffractive optical element and a vacuum etching machine. The method comprises the following steps: in a reactive ion beam main etching stage, a main ion source emits a high-energy main etching reactive ion beam to scan and etch the whole surface of the large-size diffractive optical element; in a selective area reaction ion beam ashing stage, an auxiliary ion source is controlled to emit a low-energy ashing reaction ion beam, and scanning ashing processing is carried out on a central effective area of the large-size diffractive optical element; in the reaction ion beam edge removal stage, the auxiliary ion source is controlled to emit edge removal reaction ion beams with set process parameters, and edge thickening photoresist of the large-size diffractive optical element is removed; and taking out the large-size diffraction optical element finished product after etching is completed. According to the technical scheme, the production cost of reactive ion beam etching of the large-size diffractive optical element can be reduced, and the production efficiency can be improved.

The invention relates to a diamond-like carbon coating and a preparation method thereof, and belongs to the technical field of coatings. The preparation is carried out in a closed field unbalanced magnetron sputtering system, and the system is at least provided with a titanium target, a graphite target and a linear ion source; the preparation method comprises the following steps: pretreating a base material, removing surface moisture, transferring the base material into a vacuum chamber, and carrying out ion cleaning and activation; adjusting bias voltage, then turning on a titanium target power supply, cleaning a target surface, depositing a gradient layer, turning off the titanium target power supply, turning on a graphite target power supply to carry out hydrogen-free deposition, and after deposition is finished, carrying out furnace cooling in a vacuum environment. According to the diamond-like carbon coating provided by the invention, the graphite target material is adopted, under the condition that hydrogen-containing gas and a metal transition layer are not introduced, a closed field unbalanced magnetron sputtering technology is combined with linear ion source auxiliary deposition, the DLC coating with excellent biocompatibility is prepared, and the problem of biotoxicity caused by element dissolution is greatly reduced.

The invention discloses a quantitative detection method for tobacco components. The quantitative detection method comprises the following steps: extracting a tobacco sample to obtain extract liquor; performing component analysis on the extracting solution by adopting high-resolution liquid chromatography-mass spectrometry to obtain a spectrogram of the tobacco sample; the high-resolution liquid chromatography mass spectrometry adopts two ion sources of an ESI source and an APCI source for detection, and the two ion sources both adopt reversed-phase chromatographic columns for detection; in detection, under the ESI source condition, positive and negative ion modes are adopted for scanning respectively, and under the APCI source condition, a positive ion mode is adopted for scanning. According to the quantitative detection method, two different ion sources are adopted, and high coverage and detection precision are both considered; corresponding chromatographic columns are adopted for liquid phase separation, separation of tobacco metabolism components with different properties in a complex natural tobacco matrix is facilitated, and the separation efficiency and the coverage degree are improved; by combining the ultrahigh resolution and high precision of the high-resolution liquid chromatography-mass spectrometry, the to-be-detected substance and the interfering substance are effectively distinguished, and the detection accuracy of various samples is improved.

An arc chamber for an ion source provides a source of thermal radiation positioned within an interior region of the arc chamber. One or more components generally enclose the interior region of the arc chamber, defining an arc chamber environment within the interior region of the arc chamber. A thermal radiation shield is positioned between the one or more components and an external environment outside of the arc chamber and limits a transfer of the thermal radiation from the chamber environment to the external environment. The one or more components can be an extraction aperture plate having an extraction aperture defined therethrough. The thermal radiation shield is positioned proximate to, and covers at least approximately 75% of the exterior surface of the extraction aperture plate to primarily prevent thermal radiation for passing through the extraction aperture plate.

The invention discloses an ion trap mass spectrometry device and method capable of switching internal and external ion sources, and the device comprises an ion source cavity, the exterior of the ion source cavity is provided with a heating module, the side wall of the ion source cavity is provided with a sample introduction hole, and the sample introduction hole is internally provided with a chromatographic column I; the electron beam generation system is arranged at the front side position of the ion source cavity; the insulation connecting piece is communicated with the ion source cavity, and a lens I, a lens II and a lens III are sequentially arranged in the insulation connecting piece in the sample injection direction; a signal acquisition system; wherein a chromatographic column II is arranged on the ion trap. The two ionization modes inside and outside the trap are integrated, and different detection requirements can be flexibly met by switching the sample introduction path of the chromatographic column and regulating and controlling the voltage parameters of the lens I, the lens II and the lens III.

The invention discloses a mass spectrometer and an ion processing device.The mass spectrometer comprises an ion source, the ion processing device, a transmission device and a detection device.The ion source is used for generating charged ions, the ion processing device is arranged at the output end of the ion source, and the ion processing device comprises a first base body, a second base body, a connecting piece and a heating assembly; the first base body is close to the ion source and is provided with an ion inlet, the second base body is provided with an ion outlet, the first base body and the second base body are arranged in a spaced mode to form a containing space, and the first base body and the second base body are connected with a power source so that an electromagnetic field can be formed between the first base body and the second base body; the electromagnetic field can be used for providing kinetic energy for the charged ions in the accommodating space, so that the charged ions can be transmitted through the ion transmission channel; the heating assembly is used for heating the medium in the accommodating space, the transmission channel is used for transmitting the charged ions processed by the ion processing device, and the detection device is used for analyzing the charged ions transmitted by the transmission device.

The invention discloses a method for reducing metal pollution and improving white pixels of an image sensor, and the method at least comprises the steps: providing an ion implanter which comprises a reaction chamber and an ion source reaction chamber; a substrate is provided, the substrate comprises a pixel area, and the substrate is arranged in the reaction chamber; introducing doped gas and diluent gas into the ion source reaction cavity, wherein the doped gas and the diluent gas are dissociated into ions in the ion source reaction cavity; the flow of the diluent gas is greater than that of the doped gas; injecting the ions into the pixel region of the substrate through an ion injection process; wherein the doping gas is halogen-containing gas, and the diluent gas at least comprises inert gas. According to the method, metal pollution can be reduced, and white pixels of the image sensor are reduced.

The invention relates to the technical field of analysis and detection, in particular to a method for determining residual epichlorohydrin in dihydroxypropyl theophylline. The residual epoxy chloropropane in the dihydroxypropyl theophylline is detected by adopting GC-MS (Gas Chromatography-Mass Spectrometer); chromatographic conditions are as follows: a chromatographic column is VF-624ms, 30m * 0.25 mm * 1.4 mu m; the carrier gas is helium, the column flow velocity is 0.95-1.05 ml / min, and the split ratio is 10: 1; the temperature of a sample inlet is 230-250 DEG C; the sample injection volume is 1 microliter; mass spectrum conditions are as follows: an ion source: EI; the temperature of the ion source is 220-240 DEG C; the temperature of a quadrupole rod is 140-160 DEG C; and the temperature of the auxiliary heater is 250-270 DEG C. Compared with the prior art, the analysis method provided by the invention has the advantages of high sensitivity, strong separation capability and rapidness, and can accurately quantify epichlorohydrin in the test sample.

The invention relates to the technical field of vacuum etching, in particular to an ion beam etching method and device, a vacuum etching machine, computer equipment and a medium, and the method comprises the steps: obtaining the target geometrical shape and processing demand information of sample etching, and the processing demand information comprises the target etching depth, the incident angle range and the uniformity error information; obtaining target etching process parameters according to the processing demand information; wherein the target etching process parameters comprise a target incident angle, a target working distance and an etching uniformity parameter; planning a movement track of an ion source and / or a sample table according to the target geometrical shape, the target etching process parameters and a movement control function; controlling the ion source and / or the sample table to move according to the movement track in the scanning etching process; according to the technical scheme, high-uniformity etching processing can be realized.

The invention discloses an electrolysis process based on a high-entropy electrolyte and application of the electrolysis process, and belongs to the technical field of electrolytic metallurgy, an electrolyte metal salt ion source comprises Zn < 2 + >, Mn < 2 + > and Cu < 2 + >, an electrolyte anion source comprises Cl <->, NO3 <->, SO4 < 2-> and OTf <-> / TFSI <->, and the specific proportion is adjusted according to electrolyzed substances. Compared with a traditional electrolyte, the electrolyte has the advantages that dendritic crystals can be inhibited through anion synergism, the efficiency is improved to 95% or above, the metal deposition uniformity is improved, dendritic crystal growth is inhibited, the current efficiency is improved, the hydrogen evolution side reaction is reduced by 50%-60%, the current efficiency reaches 92% or above, an ethylene glycol-water mixed solvent is adopted for cyclic utilization, the consumption of an organic solvent is reduced, and compared with a traditional lead anode, the time is only 500 hours, and the cost is reduced. And the service life of the anode is prolonged to 2000 hours, the operation and maintenance frequency is reduced, the deposition sequence is regulated and controlled by regulating and controlling the proportion of anions such as Cl <-> / NO3 <->, and different alloy requirements are met.

The invention provides a core column and magnetic pole structure of an endogenous cyclotron, the core column is symmetrically arranged in central areas at two sides of a central plane of the accelerator, the core column is a big-end-down circular truncated cone-shaped core column, a pair of core column concave platforms is arranged on the circular truncated cone, and the core column concave platforms are used for arranging ion sources; according to the magnetic pole structure, a main magnetic pole and a core column are integrally manufactured, and the core column in the middle of the integrated magnetic pole structure is of a big-end-down circular-truncated-cone-shaped structure; chamfers are arranged at the junctions of the two side faces and the upper surface of each magnetic pole of the integrated magnetic pole structure, and four slopes inclining towards the central point of the central area are designed in the head area of the fan-shaped magnetic pole, so that transition from a circular truncated cone in the central area to a peripheral magnetic field is smoother; on the basis that the radial size of the upper surface of the core column is not increased, the head magnetic field is still improved by increasing the volume, close to the lower surface, of the core column; the two symmetrical concave platforms are designed on the circular truncated cone type core column, so that the symmetry of a magnetic field is reserved, and meanwhile, a sufficient installation space is reserved for an ion source.

A rotating target high yield compact D-D neutron generator disclosed by the present invention comprises an ion source unit, a vacuum main body unit and a target unit, the ion source unit generates a deuterium ion beam, the deuterium ion beam is introduced into a vacuum chamber and passes through a leading-out accelerating electrode for acceleration, and the accelerated deuterium ion beam bombards the circumferential target surface of a molybdenum target to generate a deuterium ion beam. And deuterium-deuterium fusion reaction with deuterium nuclei injected into the molybdenum target in advance is carried out, fast neutrons are released, and the neutron yield is improved. The rotating driver of the target unit drives the molybdenum target of the cylindrical structure to rotate through the insulating rotating shaft, the molybdenum target rotates to distribute beam power to the circumferential target surface of the molybdenum target, a cooling medium is conveyed to one side of the inner side wall of the molybdenum target in combination with the cooling channel, the molybdenum target is cooled, and the service life of the target unit can be effectively prolonged. The leading-out accelerating electrode is located in the vacuum cavity, operation of the vacuum main body unit is not affected by external humidity and temperature environment conditions, high-voltage ignition discharge can be effectively restrained, and the safety performance of a high-voltage electric field is improved.

A workpiece processing system with an ion source that includes two or more extraction apertures, each producing two beamlets at different extraction angles, is disclosed. The ion source includes blockers disposed within the ion source that manipulate the plasma sheath to allow extraction of ions at different extraction angles. The ion source may include at least two blockers, each proximate to a respective extraction aperture. These blockers may be different sizes or have different offsets relative to their respective extraction aperture. These differences result in ion beamlets of different extraction angles being extracted through the different extraction apertures. In another embodiment, the heights of the extraction apertures may differ. The blockers associated with these different sized extraction apertures may be identical, or may differ. Further, in some embodiments, the blockers may be electrically biased at different voltages to produce ion beamlets of different extraction angles.

The invention discloses a detection control device, a detection control method and a petroleum logging neutron tube system. The detection control device comprises a radio frequency power supply, an impedance matching module, a filtering module, a current detection module and a control module, the radio frequency power supply is used for providing radio frequency energy for the radio frequency electrode, so that working gas in an ion source in the neutron generator generates plasma; the current detection module is used for providing direct current voltage for the radio frequency electrode and detecting information of direct current flowing through the radio frequency electrode; the filtering module is used for preventing radio frequency energy from entering the current detection module and preventing direct current from entering the radio frequency power supply; the control module is used for controlling the output power of the radio frequency power supply according to the direct current information. According to the detection control device, the detection control method and the petroleum logging neutron tube system, the density of plasma in the neutron generator can be obtained in real time, a stable and reliable feedback signal is provided for output power control of a radio frequency power supply, and the stability of neutron output is ensured.

Methods and systems for multi-beam, parallel-beam, deterministic, or super mass spectrometry that include an ion source that produces ions, and two or more ion trapping devices or mass spectrometers, each having an independent sampling inlet. The two or more ion trapping devices or mass spectrometers receive the ions from the ion source via the sampling inlet of each of the ion trapping devices or mass spectrometers such that each sampling inlet provides an ion beam to each corresponding ion trapping device or mass spectrometer.

The present invention discloses a nitrogen isotope determination method for nitrogen in a gas sample, and relates to the technical field of isotope analysis, the method comprises: instrument performance pretreatment: before sample determination, determining that an instrument is in a stable working state by checking the vacuum degree, detecting the interference peak, tuning an ion source, and testing the stability and linearity of reference gas; according to the method, a glass sample bottle is adopted to collect a gas sample, and before collection, a bidirectional inert gas replacement-vacuumizing coupling sampling process is adopted to treat the sample bottle. Residual air in the sample bottle and air attached to the bottle wall are effectively removed, and the sample pollution risk is remarkably reduced; the CO2 adsorption trap adopts a gradient filling structure and is matched with a constant-temperature heating sleeve, so that the contact time of CO2 and an adsorption material is prolonged, meanwhile, the influence of adsorption heat release on the adsorption efficiency is avoided, and the CO2 removal rate is improved.

The utility model provides an ion source cavity structure, an ion source and an ion implanter. The cavity structure comprises a first arc chamber, a second arc chamber, a first cathode unit, a second cathode unit and a switch. One end of the first arc chamber away from the second arc chamber is provided with an air inlet, and one end of the second arc chamber away from the first arc chamber is provided with an ion outlet; the first cathode unit is arranged on one side of the first arc chamber, and the first cathode unit and the first arc chamber are electrically insulated from each other; the switch is connected in series with the first cathode unit; the second cathode unit is arranged on one side of the second arc chamber, and the second cathode unit and the second arc chamber are electrically insulated from each other. According to the utility model, the gas dissociation efficiency can be effectively improved, so that the size of an ion beam can be effectively improved, the whole process circulation time during the running of goods on a machine table is reduced, and the production efficiency of the machine table is improved.

The invention discloses a normal-pressure open ion source tandem mass spectrometry detection method for surface residual drugs, which comprises the following steps: collecting object surface residues by using a wetted adsorption material to obtain a sample adsorption material; placing the sample adsorption material in an excitation area of a normal-pressure open ion source, ionizing the residue by adopting a first normal-pressure open ion source, introducing the ionized residue into a tandem mass spectrometer for analysis, and outputting first mass spectrum data; according to the charge ratio characteristic of the first mass spectrum data, switching to a second normal-pressure open ion source to ionize the residue, introducing the ionized residue into a tandem mass spectrometer for analysis, and outputting second mass spectrum data; and matching the second mass spectrum data, and outputting a detection result corresponding to the mass spectrum data. According to the method, preliminary detection is carried out through the first normal-pressure open ion source, then according to the preliminary detection result, the second normal-pressure open ion source suitable for the preliminary detection result is specifically adopted for result verification, and the accuracy of the detection result is guaranteed.

The utility model provides an IBE ion beam etching device convenient to maintain, which comprises a cavity body, a target material is connected in the cavity body, a carrying table mechanism is arranged above the target material, the carrying table mechanism is connected with the cavity body through a rotary driving mechanism, a wafer substrate to be coated is arranged on the carrying table mechanism, one side of the cavity body is connected with a first access door, and the other side of the cavity body is connected with a second access door. The other side of the cavity body is connected with a second access door and located on the opposite side of the first access door, the first access door and the second access door are both hinged to the cavity body through hinges, a first installation opening is formed in the lower portion of the first access door, the first ion source is connected with the first installation opening, and a second installation opening is formed in the upper portion of the second access door. The second ion source is connected with the second mounting port, and when the first ion source or the second ion source breaks down, maintenance is carried out by opening the corresponding first access door or second access door; and by arranging the first access door and the second access door, the maintenance efficiency is greatly improved, and the maintenance is very convenient.

The present invention relates to a cyclotron comprising first and second internal ion sources configured to form first and second beams of identical charged particles wherein the cyclotron is further configured to generate a local asymmetry of an accelerating electric and / or magnetic field, the first beam and the second beam are combined to form a combined beam and the combined beam passes through a single extraction outlet. The invention also relates to an acceleration system comprising N cyclotrons, where M cyclotrons are the cyclotrons according to the invention, Mgt; 0. The invention also relates to a device for treating a patient by BNCT, comprising: an acceleration system according to the invention; a target configured to emit an epithermal neutron beam when bombarded with the proton or deuteron multi-combination beam; and a treatment region configured to hold a patient to be treated within the treatment region.