1672 results about "Ion source" patented technology

The invention provides a self-adaptive error compensation method and system for focused ion beam equipment, and the method comprises the steps: obtaining a real-time error signal set generated by the focused ion beam equipment in a machining process, training a self-adaptive error compensation model according to the real-time error signal set, and generating an error compensation parameter set; inputting the error compensation parameter set into a control unit of the focused ion beam equipment, and generating a real-time compensation control instruction set; adjusting an ion source parameter and a deflection electrode voltage parameter of the focused ion beam equipment according to the real-time compensation control instruction set, and outputting an adjusted ion beam path parameter set; and performing ion beam processing on the target processing area according to the adjusted ion beam path parameter set, and monitoring morphology feature data of the processed area in real time to verify an error compensation effect. According to the invention, harmful effects caused by thermal effects, electric fields or magnetic fields can be eliminated, and the self-adaptability and long-term reliability of a compensation strategy are ensured.

The invention discloses a high-temperature ion source ion sampling interface with a built-in phase change working medium heat convection system, and relates to the technical field of high-temperature plasma source and ion or atom detection interface application. The orifice is formed in the center of the interface main body and is used for accessing high-temperature plasma; the interface center edge part is arranged on the periphery of the orifice and is used for being in direct contact with high-temperature plasma; the invention relates to a phase-change heat exchanger which comprises a connector center edge part, a heat convection system is arranged on the periphery edge part of the periphery of the connector center edge part, the heat convection system comprises one or more closed-loop cavities, the closed-loop cavities are filled with filler, and phase-change working media are injected into the closed-loop cavities. The invention aims to solve the problems of difficulty in heat dissipation, limited material selection and the like of the ion sampling interface of the high-temperature ion source.

The invention belongs to the technical field of aircraft oil leakage monitoring, and relates to an aircraft oil leakage detection method based on a high-sensitivity mass spectrometry technology, and the method comprises the steps: obtaining a time-resolved mass spectrogram of aviation kerosene molecules in a sample testing stage, and storing the time-resolved mass spectrogram in a database; then oil gas molecules are captured at leakage-prone points of an aircraft pipeline system through a gas collection probe, the captured oil gas molecules are transmitted to an ion source end of a proton transfer reaction mass spectrometer through a negative pressure transmission system to be ionized to generate ions, and the ions are analyzed by a mass analysis system to obtain a mass spectrum; comparing the mass spectrogram obtained by analysis with a time-resolved mass spectrogram in a database, and judging whether leakage occurs or not; based on the method, the problems of insufficient anti-interference capability, difficulty in sample collection and the like of a high-sensitivity mass spectrum oil gas leak detection method can be solved in a targeted manner, and the functions of environmental interference suppression, efficient collection of oil gas molecules, improvement of spatial scanning resolution and the like can be realized at the same time.

The invention discloses a plasma ion three-dimensional flow velocity distribution detection system and method, and belongs to the technical field of plasma diagnosis. The system comprises a Mach probe, a controllable voltage source, a sampling resistor and a voltage acquisition system, the Mach probe, the sampling resistor and the controllable voltage source are connected in series through wires to form a loop, and the voltage acquisition system is connected in parallel with the controllable voltage source and the sampling resistor and is used for acquiring the voltage of the controllable voltage source and the sampling resistor. According to the detection method, on the basis of the multi-axis vector synthesis principle, ion flow velocity components in different planes are obtained by inserting a Mach probe in the three-axis direction, and a three-dimensional flow velocity component is calculated through a vector synthesis algorithm. According to the invention, the local flow field structure in the ion source can be diagnosed, the spatial distribution characteristic of the ion flow velocity can be revealed, the spatial resolution is high, the velocity information of particles can be directly provided, the three-dimensional data of the ion flow velocity measurement can be synthesized without complex optical path rotation or multiple scanning, and the experimental device is simple and low in cost.

The invention discloses a pulsed neutron generator control system based on LabVIEW, and the system comprises a neutron generator industrial personal computer which operates a virtual human-computer interaction interface developed based on LabVIEW; the console core board carries a DSP main control chip and is embedded into a real-time operating system; the driving sampling board is connected with the console core board and is integrated with a signal conditioning circuit; the neutron generator industrial personal computer communicates with the console core board through a Modbus protocol, and controls and drives the sampling board to output control signals of the three independent power supply ion sources, the storage and the acceleration pole to the neutron tube; wherein the console core board generates three paths of PWM signals with the PWM frequency of 2.5 kHz and the step length of 8191, and the three paths of PWM signals are converted into analog control signals through the driving sampling board. According to the control system, the PWM control precision is greatly improved, the voltage control precision is improved to 0.012% (100% higher than that of a conventional scheme) through the combination of the 8191 step length (13-bit resolution) and the 2.5 kHz frequency, and the neutron yield fluctuation is controlled within + / -1.5%.

The invention provides an ion beam polishing multi-working-condition removal function obtaining method which comprises the steps that according to a to-be-machined optical surface shape and a planned movement track of an ion source relative surface shape, the change range of an ion beam incident angle and the change range of a machining distance in a polishing machining task are determined; carrying out limited times of single-point etching experiments, and detecting the surface shape of the workpiece after the single-point etching experiments; calculating a processing amount distribution, and calculating a removal function considering the incident angle of the ion beam and the processing distance based on the processing amount distribution data and the processing time; training an artificial neural network by taking the removal function as training data; and on the basis of the trained neural network, obtaining a removal function fitting parameter pair according to the actual processing task requirement, and performing inverse processing on the removal function fitting parameter pair to obtain a removal function of the actual processing point. According to the removal function obtained through the method, the influence under multiple working conditions is considered, and the current high-precision machining requirement for the high surface slope or various non-planar optical surface shapes can be better met.

The invention discloses an ignition control method of a remote plasma source in the technical field of remote plasma sources, which comprises the following steps: S1, setting a gas current excitation threshold value, and introducing excitation gas; s2, judging whether an ignition signal is received or not, and if yes, closing a relay and entering a constant current stage; s3, whether system ignition is normal or not is judged, and if not, the ignition voltage is adjusted through a self-learning type ignition threshold value calibration method; s4, the output power is improved, and the ignition voltage is adjusted through an ignition threshold calibration method during the period; s5, entering a constant power stage when the output power reaches the full-load power; according to the self-learning type ignition threshold value calibration method, gas flow, gas pressure and cavity temperature are collected in real time, a current load impedance value is predicted through an LSF-BP model, and an ignition voltage threshold value is updated according to the current load impedance value. According to the method, the ignition threshold is dynamically adjusted according to the operation condition, the ignition stability can be effectively improved, and equipment damage and maintenance cost are reduced.

The invention discloses an ion source automatic beam adjusting method, a radiotherapy system and related equipment, and relates to the technical field of radiotherapy, and the method comprises the steps: monitoring and adjusting a plurality of control parameters in real time, and obtaining an optimal control parameter combination; under the optimal control parameter combination, the variable quantity of each control parameter before and after adjustment and the performance change of the proton beam are obtained; performing a pulse width charge test according to the variation of each parameter before and after adjustment and the performance change of the proton beam; obtaining an optimal adjustment parameter and an adjustment amount through a pulse width charge test result; and through the optimal adjustment parameter and adjustment amount, automatic beam adjustment is realized, stable and efficient acceleration of the proton beam in the synchrocyclotron system is realized, and the stability and consistency of the proton beam are ensured.

The invention relates to the technical field of yield control, in particular to a neutron generator yield control method and system. The method comprises the following steps: establishing a polynomial model by using historical yield data to predict a target efficiency attenuation factor; dynamically determining neutron event boundaries in the pulse integral value and the pulse width two-dimensional characteristics based on the attenuation factor, and counting the neutron event boundaries; the yield deviation and the change rate are calculated, and when the deviation exceeds a threshold value, feedforward compensation is carried out on the target yield; and selecting a three-dimensional lookup table, an input deviation, a change rate and a current high voltage according to the interval to which the attenuation factor belongs, and cooperatively determining the adjustment amount of the ion source current and the accelerator high voltage. According to the scheme, the measurement and control problems caused by aging of the target piece can be solved, and the precision, the response speed and the long-term stability of yield control are improved.

The invention relates to the field of mass spectrometry, and describes a mass spectrometer based on multi-electrode coordination of a Jooden well. A multi-port ion source configured for multi-port input of electrons of ionization of gas molecules in a well and ions in an ion source outside the well, the ports being autonomously usable, comprising two external electrodes and four internal electrodes configured to excite periodic movement of ions in the well along an axis of symmetry and to detect signals caused by ions of secondary potential oscillation in the well, wherein ions are introduced into the trap from an external source with a slot, and ion movement is excited by applying an alternating voltage or the like to the electrodes. Or using a slot to introduce ions from an external source into a well in an external electrode, applying a potential to an internal electrode to create an electric field, the size of which is in a quadratic relationship with the coordinates, the electrodes having a specific equipotential surface geometry. Pulsed potentials can be applied to capture ions, multiple external ion sources can be equipped, and if the ion sources are not combined, each can be provided with a separate port. The mass spectrometer is uniquely designed in the aspects of ion input, excitation, detection, ion source configuration and the like.

The invention discloses a novel ion transmission focusing device, and belongs to the technical field of ion transmission. The flow limiting device comprises a flow limiting hole and an octupole rod device, each flow limiting hole is a metal plate with a small hole in the center, the two flow limiting holes form a vacuum differential cavity, and certain direct-current voltage is applied to the flow limiting holes. The octupole rod device comprises two insulating positioning rings and eight conical electrode rods which are arranged at equal intervals to form a cone shape, the eight conical electrode rods are fixed through the insulating positioning rings, and the two ends of the octupole rod are connected with an ion source outlet and a mass selector inlet respectively; every four adjacent electrodes are connected through a copper sheet to form two electrodes, and the two electrodes apply two radio frequency voltages with the same amplitude and opposite phases through a power supply. The ion transmission system can be used for focusing and transmission of cluster beams, and effectively improves the beam density in a low vacuum environment. The whole device is simple in structure, easy to machine and low in cost.

An ion implantation system includes an ion source, a beamline that extracts and shapes an ion beam from the ion source, a deceleration stage that reduces the energy of the ion beam while focusing the ion beam in the direction of a workpiece. A workpiece support has a structure that determines an implant plane position, which is the position of a workpiece surface that receives the ion beam. The workpiece support is configured to translate the implant plane along a path of the ion beam so as to shorten or lengthen the path without changing the tilt angle of the workpiece. The beam optics may be fixed and the focal point of the ion beam may be allowed to vary with a decel ratio. The workpiece support may translate the implant plane to a focal point of the ion beam or to some fixed offset from that focal point.

The invention provides an ion beam etching system with an etching rate in-situ monitoring function and an etching method, the ion beam etching system is provided with an objective table which can deflect by 90 degrees and an electrical test detection element which can move close to or far away from the objective table, and by the etching method, an ion source is not closed, a sample is not taken out, and the etching rate can be accurately measured. The etching depth can be accurately monitored by measuring the surface resistance of the sample in situ, the etching rate can be reduced in time, and the method is more suitable for the tape-out process. According to the ion beam etching system and the etching method, sputter spectrum monitoring is replaced by sample surface resistance detection, so that the test sensitivity is higher, the system cost is lower, the etching precision in magnetic tunnel junction preparation is greatly improved, the sample is prevented from being excessively etched, the thickness of a sample layer can be kept consistent, the resistance distribution is uniform, and the quality of the magnetic tunnel junction is improved. And the high success rate preparation of the SOT-MRAM memory with large capacity and small size is realized.

The invention discloses a layered liquid crystal electrolyte based on a dynamic self-assembly strategy and a preparation method and application thereof, and belongs to the technical field of new energy materials, and the preparation method comprises the following steps: uniformly mixing dodecyl non-glycol ether and n-decanol according to a mass ratio, heating and centrifuging to a homogeneous phase to obtain a mixed element; dropwise adding a zinc chloride aqueous solution into the mixed element, carrying out vortex mixing, and centrifuging to remove bubbles; placing the sample in a constant-temperature environment for standing, and screening a phase region with anisotropic characteristics through a polarizing microscope; and continuously carrying out constant-temperature self-assembly on the screened sample, and representing the lamellar liquid crystal structure through a polarized optical microscope and small-angle X-ray scattering. A two-dimensional layered liquid crystal structure is constructed through synergistic self-assembly of the surfactant and the solvent, a zinc ion source is provided in combination with the zinc chloride aqueous solution, and the ion transmission efficiency and the thermal stability are remarkably improved.

The invention belongs to the technical field of vacuum coating, and relates to an electron gun and ion source collaborative evaporation coating method, a control method and a control system. The electronic gun and ion source collaborative evaporation coating control method comprises the steps that key parameters in the coating process are continuously collected, and an electronic gun beam initial value and an ion source gas flow initial value are dynamically generated according to state diagnosis results of all the parameters; the beam current value of the electron gun and the gas flow value of the ion source are corrected in real time to inhibit the disturbance of the ion source to the beam current of the electron gun, and the electron gun and the ion source are cooperatively regulated and controlled to ensure the precise control of the coating uniformity; the invention further discloses an electron gun and ion source collaborative evaporation coating method, local hot spot compensation and global uniformity compensation are carried out by adopting a film thickness compensation mechanism so as to accurately control the film thickness. According to the invention, the cooperative control of the electron gun evaporation and ion bombardment process is realized, the film adhesion is enhanced, the evaporation coating rate is improved, and the film thickness uniformity is improved.

The invention discloses a multi-source driving radio frequency ion source for improving plasma distribution uniformity, and belongs to the technical field of plasma generation devices. Comprising an ion diffusion cavity and a plurality of ion sources communicated with the ion diffusion cavity, cylindrical coils are wound around the peripheries of the ion sources, and planar coils are arranged between the adjacent ion sources and located on the outer top wall of the diffusion cavity. The device has the beneficial effects that the design of the auxiliary planar coil is added, active modulation of plasma uniformity is carried out by adjusting the driving current passing through the planar coil, and the distribution uniformity of plasmas in the diffusion cavity is optimized.

The invention belongs to the technical field of remote plasma sources, and provides a remote plasma source load impedance disturbance protection control method and device. The method comprises the following steps: collecting gas flow, gas pressure and reaction chamber temperature of a reaction chamber; obtaining a load impedance prediction value according to the load impedance prediction model; and controlling the system to work in a constant power stage or a constant current stage according to whether the load impedance predicted value F is in a fluctuation stable interval. According to the method, the load impedance value F can be predicted by using the load impedance prediction model under different gas flows, pressures and cavity temperatures, whether the working state is stable or not is determined according to the load impedance value, and the system is controlled to work in a constant power stage or a constant current stage. Gas load fluctuation and plasma dynamic real-time cooperative regulation and control are achieved, mixing disturbance during gas switching is effectively restrained, and the problem of plasma instability is solved; the situation that a power device is damaged due to overlarge current caused by gas load fluctuation is avoided, and the service life of the remote plasma source is prolonged.

The invention discloses a gas mass spectrometer ion source performance testing device, and belongs to the technical field of mass spectrometer testing, the ion source performance testing device comprises an ion source testing assembly, the ion source testing assembly is used for fixing and testing a to-be-tested ion source and converting ions into ion beams, and the ion source testing assembly is connected with an adjustable flight tube assembly. The adjustable flight tube assembly provides a flight channel for the ion beam, the adjustable flight tube assembly can stretch and retract relative to the ion source test assembly to adjust the flight distance of the ion beam, one end, far away from the ion source test assembly, of the adjustable flight tube assembly is connected with an adjustable observation assembly, and the adjustable observation assembly can slide relative to the ion source test assembly. Therefore, the observation position and the ion beam flight distance are adjusted. According to the invention, the installed to-be-detected ion source can be rapidly detected in a high-vacuum environment, the detection time is shortened from two days to half an hour aiming at complex operation of an existing ion source on an instrument, and the installation and detection efficiency of the ion source is greatly improved.

The invention relates to the technical field of ion characterization and preparation, in particular to a high-throughput preparation mass spectrum device and method giving consideration to high-resolution characterization. The device comprises an ion source, an ion transmission cavity, a quadrupole mass screening cavity, an ion dissociation cavity, an ion deflection cavity, an ion deceleration and deposition cavity and a high-resolution mass spectrum characterization cavity which are sequentially arranged, wherein the high-resolution mass spectrum characterization cavity is formed in one side of the ion deflection cavity in the vertical direction; soft ionization is combined with a quadrupole analyzer to screen ions, the ions are dissociated through a dissociation cavity, an ion deflection cavity is used for selecting a high-resolution characterization or high-throughput preparation function, a high-resolution mass spectrum characterization cavity is used for achieving high-resolution characterization of screened and fragmented ions, and an ion deceleration and deposition cavity is used for high-throughput preparation of the ions. According to the method, perfect compatibility of high-throughput preparation and high-resolution mass spectrum characterization is realized through ion deflection design, and the method has a wide application prospect in the fields of efficient preparation of biological macromolecules, synthetic macromolecules and the like and the like.

The invention discloses a composite ion source device for coupling atmospheric pressure interface orbitrap mass spectrometry, which belongs to the field of mass spectrometry detection and comprises a photo ionization / photo-induced association ionization ionization and ion transmission mechanism, a gas sample introduction mechanism, a high-flux radio frequency vacuum ultraviolet light source mechanism and an ion source and mass spectrometry interface mechanism. By adopting the composite ion source device for coupling the atmospheric pressure interface orbitrap mass spectrum, organic components with different polarities, ionization energy and ion affinity in a complex mixture can be efficiently ionized, and through reasonable structural design, the organic components are coupled with the high-resolution orbitrap mass spectrum with the atmospheric pressure interface, so that the high-resolution orbitrap mass spectrum is obtained. The detection range of complex organic components is widened, and the resolution capability and the detection sensitivity of low-abundance or high-molecular-weight organic components are improved.

A Flash beam dose control method and a related device. The Flash beam dose control method comprises: obtaining a Flash beam output dose demand; controlling, by means of a Flash tuning mode, the number of pulse periods of output beam charges within a preset time; and / or controlling the pulse width of an ion source voltage by means of a pulse width mapping curve, so as to control a Flash beam output dose rate. By precisely controlling the number of pulse periods of output beam charges and the pulse width of the ion source voltage, the Flash beam output dose rate can be precisely controlled without requiring an additional shielding function for a proton therapy room, so that the dose of Flash can also be tuned in a conventional proton therapy room, thereby facilitating implementation of particle Flash radiotherapy.

The invention discloses an online pre-column derivatization coupled liquid chromatography-mass spectrometry amino acid detection method, and relates to the technical field of analysis and detection, and the method comprises the following steps: obtaining a to-be-detected sample, and carrying out protein hydrolysis treatment to obtain hydrolysate; mixing the hydrolysate with a derivatization reagent, carrying out on-line derivatization reaction through multiple sections of reaction zones which are connected in series, and maintaining different pH environments in the reaction zones; an online detection unit is arranged at an outlet of the reaction zone to monitor the concentration of derivative products and adjust reaction conditions in real time; performing chromatographic separation on the derivative reaction liquid; switching an ion source ionization polarity mode according to an elution time window to carry out mass spectrometry detection; and substituting the mass spectrum response signal into the standard curve to calculate the amino acid concentration value. The method realizes automatic derivation and high-sensitivity detection of amino acid, and has the advantages of simplicity and convenience in operation, controllable reaction conditions and high detection efficiency.

An ion source that includes a cathode near a first end plate and a non-planar second end plate is disclosed. The non-planar second end plate serves to counteract the effect of the plasma on the second end plate. In some embodiments, the plasma has the ability to erode the second end plate. Rather than making the entire second end plate thicker, the second end plate is only made thicker in the regions that are affected by the plasma. In this way, less material is used in the production of the second end plate, and increased lifetime is achieved. This concept may also be used in environments where the plasma serves to deposit material on the second end plate.

In a mass spectrometer (10) for gas analysis, comprising: a mass spectrometer housing (12) evacuated by a vacuum pump; an ion source (16) for ionizing gas atoms or molecules entering the mass spectrometer enclosure (12) and accelerating ions in the mass spectrometer enclosure (12); an ion trap (22) made of an electrically conductive material for collecting ions generated by the ion source (16); an electrical measurement device (24) for measuring the potential or current of the ion trap (22) and connected to the ion trap (22) for inferring the ions collected by the ion trap (22) from the measured potential or current; a magnetic or electromagnetic deflection device configured to deflect or map ions having a specific mass-to-charge ratio to the ion trap (22); an electron barrier (30) made of an electrically conductive material is provided at the ion trap (22), the electron barrier having a lower potential than the ion trap (22) and being configured to generate a reverse electric field to return electrons released from the ion trap (22) onto the ion trap (22).

The invention relates to the technical field of PVD coating, in particular to a PVD vacuum coating machine which comprises a vacuum machine pump set, the top end of the vacuum machine pump set is fixedly connected with a fixing table, and the top end of the fixing table is fixedly connected with a vacuum coating tank; and the workpiece placing and rotating mechanism comprises a motor fixedly connected to the inner top wall of the vacuum machine pump set, the output end of the motor is fixedly connected with a rotating plate, and a supporting frame is detachably arranged at the top end of the rotating plate. In the detection assembly, when gas containing plating materials passes through a detection box, light rays emitted by a lamp panel can be shielded and absorbed, a photoresistor board detects the light ray intensity change, converts the light ray intensity change into electric signals and transmits the electric signals to a PLC, the PLC controls the power of an evaporation source, a motor and a vacuum arc ion source according to the signals, and therefore self-adaptive adjustment of parameters is achieved. And parameters are adaptively adjusted according to actual conditions, so that plating material supply is accurately matched with actual requirements.

The invention relates to the field of trace element detection, in particular to a system for detecting the concentration of trace elements in water. The gas chamber is connected with the atomization device, is internally provided with a light path capable of dynamically adjusting the White cell, and is used for enhancing a spectral absorption signal of the low-concentration trace elements; the light path modulation module is mounted on the side wall of the gas chamber; the temperature control module is used for adjusting the temperature of the optical element and the air chamber; the spectrum detection module is arranged behind the light outlet of the gas chamber and is used for detecting a spectrum signal after the aerosol is absorbed; the ionization and mass spectrum module comprises an ionization source and a mass spectrometer, the ionization source is used for ionizing the aerosol in the gas chamber into ions, and the mass spectrometer is used for separating the ions according to the mass-to-charge ratio and detecting the ions. According to the invention, a spectrum and mass spectrum combined technology is adopted, a water sample to be detected is atomized into aerosol water drops, and high-sensitivity detection of trace elements in water is realized by enhancing a spectrum absorption signal of low-concentration trace elements.

The invention discloses a compact high-energy gamma generator for special nuclear material checking and a checking method.The gamma generator comprises a shell and an ion source, the shell is internally provided with a high-pressure vacuum cavity, the ion source is arranged at the left end of the high-pressure vacuum cavity, the right end of the high-pressure vacuum cavity is provided with a high-pressure connector system, and the left end of the high-pressure connector system is connected with a leading-out accelerating electrode; a target holder is arranged in the extraction accelerating electrode, and a boron target sheet is mounted on the target holder; negative high voltage is fed into the extraction accelerating electrode through the high-voltage connector system, an electric field is formed between the extraction accelerating electrode and the anode of the ion source, the proton beam is extracted and accelerated by the electric field and then bombarded on the boron target sheet, 11B (p, gamma) 12C resonance radiation capture reaction is carried out, and high-energy gamma rays are released; the gamma ray and the special nuclear material are subjected to a photofission reaction to emit instant neutrons and delayed neutrons, and the detection of the special nuclear material is realized by measuring the instant neutrons and the delayed neutrons. The device is compact in structure, high in detection sensitivity, short in detection time, low in interference and long in service life, and has very high application value.

The invention belongs to the technical field of coated glass, and particularly provides a deposition method of a metal seed layer in TGV metallization and magnetron sputtering equipment. The invention aims to solve the problem of serious surface discharge phenomenon caused by low adhesive force between a metal film and a glass substrate, low metal coverage rate and step rate in a through hole and high accumulated charge on the surface of glass in the existing TGV metallization process. The independent and controllable ion source is introduced to assist deposition, the ion source is started at different stages of metal film deposition, and directional and high-energy positive ion flow generated by the ion source is utilized to bombard the surface of the glass substrate so as to assist the magnetron sputtering process, so that the surface of the glass substrate is subjected to magnetron sputtering. Through shallow ion implantation, enhancement of surface migration energy of deposited metal atoms and neutralization of negative charges accumulated on the glass surface, the adhesive force between metal and a glass substrate is improved, the metal coverage rate and the step rate in a through hole are improved, surface discharge is inhibited, and therefore the process stability is improved.

The invention relates to the technical field of vacuum equipment, and discloses an ion lens assembly, an ion source, a mass spectrometer and a mass spectrometry system. The ion lens assembly includes a deflection lens assembly and a return lens assembly. The deflection lens assembly is used for focusing an ion beam in the incident particle beam and enabling the ion beam to deflect towards a first direction. And the axis-returning lens assembly is used for receiving the ion beam from the deflection lens assembly, and the axis-returning lens assembly is used for focusing the received ion beam and enabling the ion beam to deflect towards a second direction.

An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator including a beam tube for transmitting the ion beam, the beam tube having at least five adjoining sidewalls, at least one resonator coupled to the beam tube, and at least one turbomolecular pump coupled to the beam tube, wherein at least one of the at least five adjoining sidewalls of the beam tube has an opening formed therein for providing access to an interior of the beam tube.