993 results about "Glow discharge" patented technology

A method for depositing a film by plasma-enhanced subatmospheric-pressure atomic layer deposition (subatmospheric PEALD) is conducted using capacitively coupled parallel plate electrodes with a gap of 1 mm to 5 mm, wherein one cycle of subatmospheric PEALD includes: supplying a precursor in a pulse to the reaction chamber; continuously supplying a reactant to the reaction chamber; continuously supplying an inert gas to the reaction chamber; continuously controlling a pressure of the reaction chamber in a range of 15 kPa to 80 kPa; and applying RF power for glow discharge in a pulse to one of the parallel plate electrodes.

A multiple function atmospheric pressure ion source interfaced to a mass spectrometer comprises multiple liquid inlet probes configured such that the sprays from two or more probes intersect in a mixing region. Gas phase sample ions or neutral species generated in the spray of one probe can react with reagent gas ions generated from one or more other probes by such ionization methods as Electrospray, photoionization, corona discharge and glow discharge ionization. Reagent ions may be optimally selected to promote such processes as Atmospheric Pressure Chemical Ionization of neutral sample molecules, or charge reduction or electron transfer dissociation of multiply charged sample ions. Selected neutral reagent species can also be introduced into the mixing region to promote charge reduction of multiply charged sample ions through ion-neutral reactions. Different operating modes can be performed alternately or simultaneously, and can be rapidly turned on and off under manual or software control.

Endothelial cell attachment to an intravascular stent is promoted by coating the stent with an endothelial cell specific adhesion peptide. Coating is preferably carried out by activating the intravascular stent using plasma glow discharge, applying on the stent a layer or plurality of layers of a polymer such as poly(2-hydroxyethylmethacrylate), applying a tresylation solution containing pyridine and tresyl chloride, and applying a five amino acid peptide having the sequence glycine-arginine-glutamic acid-aspartic acid-valine.

A method and apparatus for generating plasma in a fluid. The fluid (3) is placed in a bath (2) having a pair of spaced electrodes (4, 6) forming a cathode and an anode. A stream of bubbles is introduced or generated within the fluid adjacent to the cathode. A potential difference is applied across the cathode and anode such that a glow discharge is formed in the bubble region and a plasma of ionized gas molecules is formed within the bubbles. The plasma may then be used in electrolysis, gas production, effluent treatment or sterilization, mineral extraction, production of nanoparticles or material enhancement. The method can be carried out at atmospheric pressure and room temperature. The electrodes may carry means to trap the bubbles in close proximity. Partitions may be present between the electrodes.

A wicking material is disclosed that exhibits a horizontal wicking velocity of at least about 1.0 millimeter per second when contacted with a physiological fluid such as blood, lymph or cellular interstitial fluid. This high wicking rate is achieved by means of treatment of a fibrous wicking material candidate with a low temperature gas plasma, particularly a glow discharge gas plasma formed in a gaseous blend made up predominantly of a mixture of oxygen with a saturated alkane chosen from the group consisting of methane, ethane and propane. Diagnostic test strips made with the surface-modified wicking material, and containing an immobilized reagent means for analysis of an analyte in a physiological fluid, show improved performance in terms of increased accuracy, finer precision of analyses, reduced time of analysis, a smaller fluid sample size requirement, and improved compliance with manufacturing standards resulting in lower manufacturing costs blood sugar determinations.

The present invention is of a glow discharge switch operating in the low pressure regime where gas breakdown is limited by the distance between electron-gas particle collisions (pseudospark discharge). The invention utilizes linear discharge apertures (length greater than width) in the electrodes. The linear apertures provide significantly higher current conduction without discharge constriction than conventional round-hole pseudospark switches. A radial version of the linear pseudospark switch also is disclosed that provides for self-canceling of the magnetic fields induced by the discharge, and thus prevents discharge constriction and provides for very high current conduction.

An electrostatic chuck to minimize an arc and a glow discharge during processing of a semiconductor substrate is provided, In one aspect, an electrostatic chuckin a processing chamber includes a body having a first hole for providing a cooling gas to a backside of a substrate to control a temperature of the substrate, an inner electrode for generating an electrostatic force and a dielectric layer. A ceramic block is tightly inserted into a first hole and has a second hole connected to the first hole. A third hole formed through the dielectric layer is connected to the first hole and the second hole. The cooling gas is provided to the backside of the substrate through the first hole or the second hole. Since the first hole is covered with the ceramic block, the generation of an arc or a glow discharge inside the first hole may be minimized, thereby preventing damage to the electrostatic chuck and improving production yields.

The invention discloses a maskless method for preparing black silicon by deep reactive ion etching, which comprises the following steps: performing initialization and plasma stability on equipment adopted by the method for preparing the black silicon so as to make plasma perform glow discharge; and controlling technological parameters for preparing the black silicon by deep reactive ion etching, and adopting etching and passivating modes to alternately process a silicon chip, wherein the parameters comprise plasma gas flow, panel etching power, panel passivating power, coil power, and etching and passivating cycle and temperature. The maskless method directly performs plasma processing on the surface of the silicon chip, and can generate large-range high-intensity nanostructures on the surface of the silicon chip in case of no nano mask by adjusting and selecting proper etching technological parameters. Meanwhile, the method for preparing the black silicon has high efficiency and low cost, and can be integrated with other micro-fabrication technology.

The invention relates to a multi-region detection system for the partial discharge decomposition components of insulating gas and a method thereof, which belong to the technical field of on-line gas-insulated equipment insulation monitoring. The system comprises a voltage regulator, an isolation transformer, a corona-free test transformer, a partial discharge-free protective resistor, a capacitive divider, an insulating gas discharge decomposition device, an ultrahigh-frequency antenna, an oscillograph, a gas chromatograph-mass spectrometer and the like, and the insulating gas discharge decomposition device comprises a housing, insulating sleeves, connecting rods, electrodes, valves, a vacuum meter, a gas pressure meter, a vacuum pump, an SF6 gas bottle, a pure compressed air bottle and the like. The method utilizes the system to respectively detect the discharge decomposition components of multiple regions in the insulating gas discharge decomposition device. The invention can accurately detect the components and component contents of the decomposed gas of a main gas chamber, a glow discharge region and an electron drift region and provide a standard. The invention can be widely applied to the on-line monitoring of gas-insulated equipment insulation, in particular to the on-line monitoring of GIS (gas-insulated switchgear) insulation.

The present invention provides system, method and apparatus for creating an electric glow discharge that includes a first and second electrically conductive screens having substantially equidistant a gap between them, one or more insulators attached to the electrically conductive screens, and a non-conductive granular material disposed within the gap. The electric glow discharge is created whenever: (a) the first electrically conductive screen is connected to an electrical power source such that it is a cathode, the second electrically conductive screen is connected to the electrical power supply such that it is an anode, and the electrically conductive fluid is introduced into the gap, or (b) both electrically conductive screens are connected to the electrical power supply such they are the cathode, and the electrically conductive fluid is introduced between both electrically conductive screens and an external anode connected to the electrical power supply.

A method of making an active gas by generating a glow discharge, non-thermal plasma, in a gas mixture of a carrier gas and a more readily ionisable gas. The gas mixture is exposed to water vapour at or downstream from the generator to form the active gas. The gas mixture includes helium as the carrier gas and up to 40% by volume of at least one noble gas such as argon, krypton, or xenon as the more readily ionisable gas. The gas mixture is ejected at a temperature between 5° C. to 42° C. The active gas may be used for oral treatment such as cosmetic whitening of teeth, medical or non-clinical cleaning of teeth or for cleaning laundry or dishwashing items.

The invention discloses a preparation method of an abrasion-resistant and oxidation-resisting nanometer composite TiAlSiN superhard coating. The preparation method is characterized in that a basal body is pretreated and placed in electrical arc and magnetron sputtering composite deposition equipment, a pillar arc Ti target is used as a Ti source, and the power supply current of the pillar arc controls the sputtering rate of the pillar arc Ti target; a flat surface Si target and a flat surface Al target are used as sources of corresponding elements, the flat surface Si target and the flat surface Al target are placed on the inner wall of a furnace body in an opposite manner, and the sputtering rates of the targets are controlled by adjusting the power of a medium-frequency pulse power supply; high-purity Ar is adopted as a main ionization gas, and an effective glow discharge process is guaranteed; and high-purity N2 is adopted as a reacting gas, is ionized and combined with the Ti, Si and Al elements so as to deposit on the surface of the basal body to form a TiAlSiN coating. The thickness of the prepared TiAlSiN coating is 3.5 micrometers, and the microhardness of the coating is 40 GPa; and the friction factor is 0.7, the antioxidation temperature of the TiAlSiN coating achieves 1000 DEG C, and the TiAlSiN coating has good antioxidation property and abrasion-resistant property.

The invention relates to a liquid cathode glow discharge emission spectrum detection metal ion apparatus, which comprises a light source generation part used for generating glow discharge, a splitting system used for performing light splitting treatment on glow discharge emission spectrum generated by the light source generation part, a detection apparatus used for detecting the emission spectrum after light splitting treatment, and a data process system used for analyzing and processing the signals of the detection apparatus; wherein, the light source generation part comprises a metal anode connected to the anode of high voltage supply, a liquid pool filled with an electrolyte connected to the cathode of the high voltage supply; and a sample introduction unit, which comprises a sample introduction pipe which is vertically passed through the liquid pool, and the top of the sample introduction pipe is positioned below the metal anode; the sample introduction unit enables a solution to be measured to escape from the top of the sample introduction pipe, thereby the solution to be measured overflowed from the top of the sample introduction pipe and the metal anode form a glow discharge area.

A method for making a polymer layer with a selected index of refraction. The method includes flash evaporating a polymer precursor material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma, forming a polymer having the selected index of refraction.

In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dt−dVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.

A microcrystalline semiconductor film with high crystallinity is manufactured. In addition, a thin film transistor with excellent electric characteristics and high reliability, and a display device including the thin film transistor are manufactured with high productivity. A deposition gas containing silicon or germanium is introduced from an electrode including a plurality of projecting portions provided in a treatment chamber of a plasma CVD apparatus, glow discharge is caused by supplying high-frequency power, and thereby crystal particles are formed over a substrate, and a microcrystalline semiconductor film is formed over the crystal particles by a plasma CVD method.

This invention provides a method for coating a ceramic film on a metal, which can form dense films on various bases of metals such as magnesium alloys. The formed ceramic film has excellent abrasion resistance, causes no significant attack against a counter material, and has excellent corrosion resistance. The method comprises electrolyzing a metallic base in an electrolysis solution using the metallic base as a working electrode while causing glow discharge and/or arc discharge on the surface of the metallic base to form a ceramic film on the surface of the metallic base. The electrolysis solution contains zirconium oxide particles having an average diameter of not more than 1 μm, satisfies the following formulae (1) to (3): 0.05 g/L≦X≦500 g/L (1), 0 g/L≦Y≦500 g/L (2), and 0≦Y/X≦10 (3); and has a pH value of not less than pH 7.0. In the formulae (1) to (3), X represents the content of zirconium oxide particles in the electrolysis solution; and Y represents the content of a compound of at least one element selected from the group consisting of Mg and the like, other than zirconium oxide.