143 results about "Plasma" patented technology

The invention relates to a magnetron sputtering device and a sputtering cathode thereof, the sputtering cathode comprises a target material, a first magnetic field generating device and a second magnetic field generating device, and the target material is provided with a target material surface; the first magnetic field generating device is used for forming a first magnetic field parallel to the surface of the target on the surface of the target; the second magnetic field generating device is used for forming a second magnetic field perpendicular to the surface of the target on the surface of the target; wherein under the combined action of the first magnetic field and the second magnetic field, the plasma area on the surface of the target material is expanded towards the substrate, so that the incident angle distribution of sputtering particles to the substrate is changed, and the sputtering deposition of the side wall of the deep hole or the groove is improved.

The invention discloses a coil excitation Hall thruster magnetic circuit structure suitable for a krypton working medium, relates to the technical field of aerospace technology and plasma propulsion, and solves the problems of low ionization efficiency and insufficient characteristic length of an existing Hall thruster after krypton is used. A magnetic conductive inner core is arranged at one end of a bottom plate, and a magnetic conductive cover is arranged at the other end; an inner magnetic pole is arranged at the upper end of the magnetic conductive inner core; an inner coil is arranged between the inner magnetic pole and the bottom plate and corresponds to the outer side of the magnetic conductive inner core; an outer coil is arranged between the outer magnetic pole and the bottom plate and corresponds to the inner side of the magnetic conductive cover; a ceramic channel is arranged between the inner coil and the outer coil; the bottom plate comprises an inner bottom plate and an outer bottom plate, the inner bottom plate and the outer bottom plate are coaxially arranged, and a bottom plate gap is formed between the inner bottom plate and the outer bottom plate. The characteristic length of a magnetic field in a discharge channel can be remarkably prolonged, the krypton ionization efficiency is improved, and meanwhile the structure of the thruster is simplified.

This invention discloses a copper-tungsten oxide / zinc oxide heterojunction photocatalyst, its preparation method, and its application, belonging to the field of nanomaterials and photocatalysis technology. Firstly, a single-atom copper-modified plasma W-type photocatalyst is synthesized using a solution-thermal method combined with an impregnation-thermal reduction process. 18 O 49 Nanowires were first prepared; then porous ZnO nanosheets were prepared via a hydrothermal method combined with calcination; finally, single-atom copper-modified plasma W was constructed via electrostatic self-assembly. 18 O 49 Nanowire / porous ZnO nanosheet heterojunction composite material. This invention utilizes the above-described preparation method to prepare Cu-W nanowires with matched band structures. 18 O 49 / ZnO heterojunction can realize the photogenerated electrons of ZnO into the plasma Cu-W 18 O 49 Nanowire implantation stabilizes and increases the surface oxygen vacancy concentration and free electron density, thereby enhancing the surface plasmon resonance effect and promoting the continuous generation of high-energy hot electrons. Single-atom copper active sites and W 18 O 49 The synergistic effect of nanowires enables the enriched hot carriers to efficiently and selectively photocatalytically reduce CO2 to CH4.

A plasma focus system for neutron production is disclosed that includes an electrode assembly having an inner electrode extending along a pinch axis from a discharge end to a focus end, and an outer electrode surrounding the inner electrode to define a plasma channel for receiving a gas containing neutronic fusion fuel. The system also includes a power supply unit for applying a discharge driving signal to the electrodes, which causes the gas to be ionized into a plasma current sheath at the discharge end that flows along the plasma channel to reach the focus end where the sheath collapses toward the pinch axis to form a plasma pinch that generates fusion neutrons. The inner electrode has a tapered tip at the focus end that is configured to increase a speed of the sheath sufficiently to reach a pinch temperature at which the fusion neutrons are predominantly of thermonuclear origin.

The invention discloses a multi-physics-field-assisted laser micromachining method based on seed electrons, which comprises the following steps: introducing an ionized gas flow into a laser and material interaction area, and ionizing gas by the ionized gas flow through high-voltage discharge to form a high-speed gas flow containing free electrons and charged ions; free electrons are conveyed to a laser and material interaction area through ionized airflow, the free electrons serve as seed electrons to promote avalanche ionization, the phase change and ionization process after the material absorbs laser energy is accelerated, and the ablation threshold value of the material is reduced; ablated products are discharged from the machining area through high-speed airflow, and meanwhile the machining area is cooled; the ionized airflow forms a space electric field on an interface where the laser and the material interact so as to restrain plasma expansion in a machining area and enable ablation chippings to be electrified to restrain agglomeration and deposition, and therefore the quality of the machined surface of the material is improved.

The invention discloses a Beta radioactive isotope coating and magnetic confinement enhanced air-breathing electric propulsion ionization method. The method is characterized by comprising the following steps: selecting a plasma generation assembly without electrode discharge; the ionization is enhanced by adopting Beta radioactive isotope; arranging a magnetic field in the beta ray radiation direction to carry out magnetic field constraint; by dynamically adjusting the magnetic induction intensity and regulating and controlling the plasma state and the ionization rate, the Beta radioactive isotope (such as nickel-63) is creatively adopted, and the device has the advantages that the service life is long, the protection requirement is low, and mechanical compression and heating cannot induce nuclear reaction. And the requirement on the activity of the radioactive source is fundamentally reduced, so that the material cost and the safety risk are greatly reduced, and the practicability and the safety of the electric propulsion system are improved.

Embodiments herein provide a single step process for converting a mixture of gases or flue gases containing CO2, N2, and H2O to urea using a plasma as an energy source. The gas mixture is exposed to a high voltage AC or DC or pulse or subjected to a radio frequency electric field, the electrical species (ions, radicals, etc.) of the gas are introduced into electrically activated or ionized water of solvated electrons, radicals, or ions containing solvated electrons, hydrogen, and other ions or radicals in a plasma state that produces the gas mixture in the presence of a catalyst. Urea is synthesized in such a reducing water medium by co-reduction of amine ions or ions of nitrogen oxides and oxide carbon ions. Also disclosed is a method of increasing the interaction surface area between a plasma field and a gas mixture under water using the electrically activated nanoliquid drop. In addition, the single-step method disclosed by the invention can also be used for synthesizing ammonia (NH3). The disclosed methods may help reduce CO2 emissions from the industry, or may reduce the CO2 concentration in the air.

A method of metal gap filling includes depositing a metal layer on a dielectric layer present on a field and / or in a feature opening by plasma enhanced atomic layer deposition, the method using a metal halide precursor and a plasma containing hydrogen and an inert gas; and depositing a metal gap fill material directly over the metal layer over the field and in the opening, wherein the metal gap fill material fully fills the opening.

Magnetic field systems can generate dynamically varying strong magnetic fields to confine and control particles, objects, or plasmas. Coils in the magnetic field systems used to control the plasma can be used to collect energy from the expanding plasma.

The invention discloses a furnace end with high-energy plasma restrained by a magnetic field and an electric flame stove. The furnace end comprises an upper shell, a lower shell, a plurality of plasma combustors and a furnace end fan. The permanent magnet enables a magnetic field to be generated in the plasma burner, so that the plasma is restrained by magnetic induction lines, and the cathode tube is prevented from being influenced by high heat; the space distance between the two electrodes is lengthened, more chances of gas molecules to collide with electrons are increased, plasma formed after gas is ionized is restrained in the axis area of the plasma burner, then the collision probability between charged particles is increased, and the temperature of the plasma is further increased; the magnetron is installed between the upper shell and the lower shell, in the arc striking starting stage, the magnetron emits high-frequency microwaves to accelerate electrons in air molecules, the electrons impact and ionize the air molecules, low-density initial plasmas are formed, the initial plasmas shorten the conductive arc striking distance between the two electrodes, and long-distance arc striking is achieved.

The Pulsed Metal Plasma Thruster (MPT) cube comprises multiple thrusters. Each thruster has a first cathode electrode, a trigger electrode separated from the first electrode by sufficient insulator to sustain an initiating plasma, and a porous anode electrode positioned a distance away from all sides of the cathode electrode. The cathode electrode can be either the inner or outer electrode. A power supply supplies a high-voltage pulse to the trigger electrode sufficient to initiate a plasma on the surface of the insulator relative to the cathode electrode. This plasma travels between the anode electrode and the cathode electrode of a selected thruster, thereby generating a thrust pulse.

Examples of a plasma compression system are disclosed. The system includes a metallic vessel configured to receive and contain a plasma. The system further includes a metallic liquid liner in the vessel and at least partially bounding a plasma compression region having a longitudinal axis, and means for moving the liquid liner inwardly towards the longitudinal axis to compress the plasma in the plasma compression region. The system further includes a plurality of electrically conductive coils outside the plasma compression region and configured to generate a poloidal magnetic field in the liquid liner and the plasma compression region. At least some of the poloidal magnetic field within the plasma compression region extends along the longitudinal axis, and at least some of the poloidal magnetic field in the liquid liner moves inwardly towards the longitudinal axis with the liquid liner as the liquid liner moves towards the longitudinal axis.

According to the insulator surface charge cleaning method based on plasma discharge provided by the invention, the surface charge of the insulator can be actively, quickly and safely neutralized and cleaned through a composite discharge mode of pulse + direct current bias under the condition that equipment is not disassembled; the method comprises the following steps; equipment connection; setting and generating parameters of a composite waveform; high-voltage amplification; the plasma discharges to sweep charges; the discharge plasma device generates a high-pulse voltage electric field to reach gas breakdown field strength, a violent ionization reaction occurs, a large number of charged particles are further generated, and when superposed voltage acts during a pulse interval, the charged particles generated during the pulse interval migrate to the surface of the insulator under the action of the electric field generated during the pulse interval, so that the charged particles are formed. When residual charges in the discharge space are swept, migrated charges are used for neutralizing charges on the surface of the insulator, so that the charges on the surface of the insulator are swept; and cleaning is finished.

This invention provides the preparation and application of a dual LSPR effect nitrogen-fixing material with increased hot electron concentration at active sites. PMoV and Ag are attached to W via electrostatic self-assembly and photodeposition. 18 O 49 On the surface, Ag / W with dual LSPR effect was successfully prepared. 18 O 49 / PMoV heterojunction, experimental data show that W 18 O 49 It can absorb photogenerated electrons produced by PMoV and Ag, and the injected photogenerated electrons are in W 18 O 49 Enrichment at OVs on the surface, thus preserving W 18 O 49 Plasma effect, Ag / W 18 O 49 The fluorescence lifetime of photogenerated carriers in PMoV is prolonged, and the loading of Ag and PMoV is Ag / W. 18 O 49 / PMoV provides a new pathway for the migration of photogenerated electrons and holes, Ag / W 18 O 49 The nitrogen fixation activity of the / PMoV heterojunction was enhanced, and the ammonia generation rate reached 118.4 µmol g. −1 h −1 , is W 18 O 49 The yield is 3.6 times higher, and the experimental parameters are easy to control in this synthetic route.

The invention relates to the technical field of spectral analysis, and discloses an injection molding machine template casting iron liquid spheroidization rate residual magnesium trace detection method, which comprises: ablating an iron liquid surface by exciting a pulse radiation unit to generate plasma, synchronously collecting signal intensities of a first wave band and a second wave band, determining a plasma transient energy level distribution parameter based on the ratio, monitoring a time domain evolution trajectory of the parameter, comparing the trajectory with a signal-to-noise ratio threshold value determined based on the background signal attenuation feature points, and triggering a gating window when the parameter reaches the threshold value to extract trace magnesium spectrum data and output an evaluation parameter; through deep correlation of energy level parameters and background attenuation characteristics, the problem of triggering time sequence drift caused by high-temperature melt surface background radiation step fluctuation is solved, covering of residual magnesium trace signals by noise random fluctuation is reduced, and detection stability under complex working conditions is ensured.

The invention discloses an n-type lead selenide-based thermoelectric material and a preparation method and application thereof, and belongs to the technical field of energy material preparation. The chemical formula of the n-type lead selenide-based thermoelectric material is Pb < 1-x > CrxSe < 0.998 > Cl < 0.002 > (x is more than or equal to 0.002 and less than or equal to 0.006); according to the material, high-purity raw materials are mixed according to the molar ratio in the chemical formula, and the target lead selenide-based thermoelectric material is prepared by combining a high-temperature smelting method with a discharge plasma sintering method. Through double doping of Cr and Cl elements, the conductivity of the n-type lead selenide-based thermoelectric material is greatly improved and the thermal conductivity of the n-type lead selenide-based thermoelectric material is reduced through the synergistic effect of the Cr and Cl elements, the prepared Pb0. 996Cr0. 04Se0. 998Cl0. 002 material has a high thermoelectric figure of merit at the high temperature of 723 K, and the average thermoelectric figure of merit at the medium and low temperature of 300-673 K reaches 1.037. The thermoelectric figure of merit of the n-type lead selenide-based thermoelectric material can be greatly improved, the conversion efficiency of a thermoelectric power generation device can be improved, and the industrial application of the thermoelectric power generation device can be expanded.

Disclosed is an apparatus for controlling a composition of a plasma, comprising a pair of electrodes having a dielectric barrier therebetween, the apparatus further comprising: a temperature control unit in thermal contact with one of the electrodes or the dielectric barrier; a sensor configured to measure a temperature of one of electrodes or the dielectric barrier; a detector configured to determine a concentration of a primary chemical species of the plasma; and a processor configured to control the temperature control unit based on the measured temperature and the determined concentration.

The invention provides a plasma current profile distribution reconstruction method and system based on a high-precision magnetic field inclination angle. The method comprises the following steps: injecting a neutral beam to a specified point direction of a plasma core; a plurality of polarizers with different polarization directions are used for receiving polarized light beams transmitted from the plasma direction; measuring the intensity of polarized light penetrating through the polarizers, and calculating the inclination angle of a specified point magnetic field of the plasma core based on the intensity ratio of polarized light corresponding to each polarizer; acquiring magnetic measurement input data; and performing plasma core current profile distribution inversion based on the inclination angle of the magnetic field of the specified point of the plasma core and magnetic measurement input data. The system comprises a high-precision magnetic field inclination angle measurement system, a data acquisition system and a plasma configuration inversion system. By accurately measuring the inclination angle of the plasma core magnetic field, more accurate data support is provided for reconstruction of plasma current profile distribution, feedback control is optimized, and the stability and constraint efficiency of plasma are improved.

The application relates to a device for improving the deposition rate of a magnetic filtering arc ion plating, which comprises a filter, the filter is composed of multiple head-to-tail connected pipe sections, the pipe sections are straight pipe sections, and the number of the pipe sections is greater than or equal to 3. The above scheme provided by the application can effectively filter out micro-particles in plasma by changing the structure of the filter, is suitable for filtering and purifying plasma of various metal, alloy and graphite cathode target materials, and the resistance of the plasma in the magnetic filter is reduced when the plasma travels in the magnetic filter, so that the deposition rate is improved.

The application discloses a kind of gas processing structure and magnetic plasma engine, it is related to magnetic plasma engine technical field, to solve the problem of reducing the probability that plasma in the discharge chamber main body flows back into working medium supply conduit.The gas processing structure is applied to magnetic plasma engine, gas processing structure includes: supply conduit and discharge chamber.Supply conduit has opposite first end and second end, and discharge chamber includes input pipeline and discharge chamber main body connected in sequence;The first end of supply conduit is communicated with the free end of input pipeline;Supply conduit is used to transport working medium gas for discharge chamber;Discharge chamber main body is used to ionize working medium gas into plasma.The working medium gas pressure in input pipeline is greater than the plasma pressure in discharge chamber main body;And / or, the gas processing structure further includes adsorption component, and the adsorption component is at least arranged in input pipeline;Adsorption component is used to adsorb plasma.

The application relates to a flame ionization device and a mass spectrometry method, which comprises a combustion chamber, an ionization assembly, an electrode and a fairing, the combustion chamber is provided with an opening and an ionization outlet, the ionization outlet is communicated with an inlet of a mass spectrometer, the ionization assembly comprises an ionization flame, the ionization flame can be combusted in the combustion chamber, the ionization flame can generate plasma, the electrode is installed in the combustion chamber and is oppositely arranged with the ionization outlet, the fairing is oppositely arranged with the opening, so that a plasma area is formed between the ionization flame and the fairing, and the plasma area ionizes and gasifies a sample to be detected. The combustion chamber and the fairing are arranged, so that the ionization flame is prevented from being affected by the environment, and a high-density plasma area is formed; the electrode is oppositely arranged with the ionization outlet, so that the plasma area is in an electric field generated by the electrode, positive and negative charge particles in the plasma move in opposite directions, neutralization is prevented, the quantity of the plasma is improved, the ionization efficiency is improved, the detection signal is more stable, and the detection result repeatability is improved.

The invention relates to a preparation method of a copper seed layer, and the preparation method comprises self-ionization plasma sputtering, and when the copper seed layer is deposited, the argon flow is 1sccm to 10sccm, the direct current sputtering power is 10kW to 20kW, the radio frequency bias power is 150W to 250W, and the initial temperature is 20 DEG C to 30 DEG C. The preparation method provided by the invention is carried out under the condition of relatively low initial temperature, so that damage and stress accumulation of high temperature to silicon dioxide are avoided; the method is carried out under the condition of high direct-current sputtering power, sputtering particle energy can be balanced, and compact deposition of Cu atoms is promoted. Due to the arrangement of radio frequency bias power, Ar atom bombardment can be enhanced, Cu atoms are migrated to low-energy crystal lattice sites, and surface protrusions are reduced; plasma can be stabilized by setting the argon flow, and uniform deposition of the copper seed layer is ensured. Therefore, according to the preparation method provided by the invention, the TSV electroplating quality can be improved, and the SIP interconnection reliability is improved.

The present disclosure relates to a plasma device and method. The plasma device includes an inner electrode and an outer electrode. The inner electrode includes a wall defining a first cavity, the opening of the first cavity being configured to receive a first gas. The outer electrode surrounds the inner electrode. The inner electrode has a through-hole extending through the wall of the inner electrode, and the first cavity is in fluid communication with a plasma generation region between the inner electrode and the outer electrode via the through-hole. The inner electrode is rotatable about a first rotation axis, the first rotation axis extending through the first cavity. In particular, some embodiments of the present disclosure relate to a plasma device and method for decomposing gases.

This invention discloses a method for improving the high-energy radiation detection performance of powdered scintillators, comprising the following steps: pulverizing and grinding scintillator material to obtain scintillator particles; completely or partially coating the surface of the scintillator particles with a metal layer having a surface plasmon effect; and then mixing with an organic polymer material to form a scintillator sheet. This invention rationally coats or partially covers the surface of the scintillator particles with a metal material. Based on the plasmon effect of the metal material, it can effectively increase the light yield of the scintillator and reduce its decay lifetime, thereby improving the scintillator's high-energy radiation detection performance. Moreover, the entire operation process is simple, convenient, and easy to implement, applicable to scintillator materials of various powder shapes, and has a wide range of applications, such as nuclear medicine imaging, security inspection, industrial detection, and high-energy physics.

SOLUTION: In particular embodiments, anomalous plasma events, which may include formation of an electric arc in a semiconductor processing chamber 102, may be detected and mitigated. In particular embodiments, a method may include: detecting an optical signal emitted by a plasma; converting the optical signal to a voltage signal; and forming a regulated voltage signal. In response to determining that a change associated with the regulated voltage signal exceeds a threshold, an output power of an RF signal coupled to the chamber may be adjusted.EFFECT: Such adjustment can mitigate formation of the anomalous plasma event occurring within the chamber.SELECTED DRAWING: Figure 1