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1075results about How to "Uniform deposition" patented technology

High performance flow battery

High performance flow batteries, based on alkaline zinc/ferro-ferricyanide rechargeable (“ZnFe”) and similar flow batteries, may include one or more of the following improvements. First, the battery design has a cell stack comprising a low resistance positive electrode in at least one positive half cell and a low resistance negative electrode in at least one negative half cell, where the positive electrode and negative electrode resistances are selected for uniform high current density across a region of the cell stack. Second, a flow of electrolyte, such as zinc species in the ZnFe battery, with a high level of mixing through at least one negative half cell in a Zn deposition region proximate a deposition surface where the electrolyte close to the deposition surface has sufficiently high zinc concentration for deposition rates on the deposition surface that sustain the uniform high current density. The mixing in the flow may be induced by structures such as: conductive and non-conductive meshes; screens; ribbons; foam structures; arrays of cones, cylinders, or pyramids; and other arrangements of wires or tubes used solely or in combination with a planar electrode surface. Third, the zinc electrolyte has a high concentration and in some embodiments has a concentration greater than the equilibrium saturation concentration—the zinc electrolyte is super-saturated with Zn ions.
Owner:APPLIED MATERIALS INC

Process for PECVD of silicon oxide using TEOS decomposition

A high pressure, high throughput, single wafer, semiconductor processing reactor is disclosed which is capable of thermal CVD, plasma-enhanced CVD, plasma-assisted etchback, plasma self-cleaning, and deposition topography modification by sputtering, either separately or as part of in-situ multiple step processing. The reactor includes cooperating arrays of interdigitated susceptor and wafer support fingers which collectively remove the wafer from a robot transfer blade and position the wafer with variable, controlled, close parallel spacing between the wafer and the chamber gas inlet manifold, then return the wafer to the blade. A combined RF/gas feed-through device protects against process gas leaks and applies RF energy to the gas inlet manifold without internal breakdown or deposition of the gas. The gas inlet manifold is adapted for providing uniform gas flow over the wafer. Temperature-controlled internal and external manifold surfaces suppress condensation, premature reactions and decomposition and deposition on the external surface. The reactor also incorporates a uniform radial pumping gas system which enables uniform reactant gas flow across the wafer and directs purge gas flow downwardly and upwardly toward the periphery of the wafer for sweeping exhaust gases radially away from the wafer to prevent deposition outside the wafer and keep the chamber clean. The reactor provides uniform processing over a wide range of pressures including very high pressures. A low temperature CVD process for forming a highly conformal layer of silicon dioxide is also disclosed. The process uses very high chamber pressure and low temperature, and TEOS and ozone reactants. The low temperature CVD silicon dioxide deposition step is particularly useful for planarizing underlying stepped dielectric layers, either alone or in conjunction with a subsequent isotropic etch. A preferred in-situ multiple-step process for forming a planarized silicon dioxide layer uses (1) high rate silicon dioxide deposition at a low temperature and high pressure followed by (2) the deposition of the conformal silicon dioxide layer also at high pressure and low temperature, followed by (3) a high rate isotropic etch, preferably at low temperature and high pressure in the sane reactor used for the two oxide deposition steps. Various combinations of the steps are disclosed for different applications, as is a preferred reactor self-cleaning step.
Owner:APPLIED MATERIALS INC

Method for preparing N-type crystalline silicon solar cell with aluminum-based local emitters on back side

The invention provides a method for preparing an N-type crystalline silicon solar cell with aluminum-based local emitters on the back side. The method comprises the following steps: firstly, selecting N-type silicon wafers to carry out the surface-textured etching process; further forming a front surface field through phosphorous diffusion; depositing a passivating film on the front surface after the phosphorosilicate glass is formed during the removal of diffused phosphorous; carrying out the back-side chemical polishing process on the silicon wafers to remove the N+ layer formed on the back side during the phosphorous diffusion; then, sequentially printing an aluminum layer or a silver-aluminum layer through the passivating film deposited on the back side, local holes or grooves on the back side and screens on the back side; then, printing silver paste on the front surface; and finally, carrying out the one-step sintering process to form a local P+ layer on the back side and allowing the P+ layer to coming into ohmic contact with the electrodes on the front and back surfaces. By using the N-type substrate, forming local aluminum-based P-N junctions on the back side and further using the back-side chemical polishing process to remove the edge junctions, the invention can substitute for the conventional stacking-type plasma etching process, simplify the technological procedures and further bring a series of performance improvement to cells.
Owner:JA YANGZHOU SOLAR PHOTOVOLTAIC ENG

Zinc negative electrode with zinc ion conductivity interface modification layer, battery and preparation method

The invention provides a zinc negative electrode with a zinc ion conductivity interface modification layer, a battery and a preparation method, and belongs to the field of aqueous zinc battery metal zinc cathodes. The preparation method comprises: in air atmosphere, pre-constructing an interface modification material M on a base membrane; in a soaking environment by a wetting liquid, the interfacemodification material M layer on the base film being in close contact with the metal zinc to form the short-circuit primary battery, and the contacted interface modification material M and the metalzinc having spontaneous redox reaction, to make the interface modification material convert to ZnxM with zinc ion conductivity from M, meanwhile, transferring the interface modification material layerto the surface of the metal zinc negative electrode from the base film, and finally, obtaining the metal zinc negative electrode with the ZnxM interface modification layer with zinc ion conductivityon the surface. The ZnxM interface modification layer with the zinc ion conductivity can effectively inhibit dendritic crystal growth of a zinc negative electrode during charging and discharging of azinc battery, so that the interface stability of a metal zinc negative electrode is improved, and meanwhile, the cycling stability of a water-based zinc battery is improved. The method is simple and has a good actual effect.
Owner:HUAZHONG UNIV OF SCI & TECH

Self-heating type alcohol reforming hydrogen production micro channel reactor with micro-lug boss array structure

The invention discloses a self-heating type alcohol reforming hydrogen production micro channel reactor with the micro-lug boss array structure. Three layers of platy reaction carriers are all provided with micro-lug boss array structures; an upper layer and a lower layer are single-side micro-lug boss array structures; a middle layer is a double-side micro-lug boss array structure; the micro-lug bosses are arranged in the mode of parallel array; the three layers are cascaded to form a reaction channel with an inlet of 90 degrees; both ends of the channel are respectively provided with connector lugs; the gas inlet is provided with a detachable adapter and an outlet is provided with a fixed-type adapter. An upper layer channel is a catalytic reforming hydrogen production channel, and a lower layer channel is a combustion channel. The two layers of channel structures both adopt an open structural type being beneficial for the sediment of the catalytic coating. Fuel gases such as hydrogen and the like are combusted in the combustion channel and generate lot of heat which is transferred into the catalytic reforming hydrogen production channel by the middle layer of the reactor so as to meet the requirement of the steam reforming hydrogen production reaction; the reactor can produce hydrogen in a self-heating type. The invention increases the specific volume of the reactor and increases the yield of the alcohol reforming hydrogen production.
Owner:ZHEJIANG UNIV
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