453results about How to "Uniform thickness" patented technology

There are provided methods of fabricating a silicon-doped metal oxide layer on a semiconductor substrate using an atomic layer deposition technique. The methods include an operation of repeatedly performing a metal oxide layer formation cycle K times and an operation of repeatedly performing a silicon-doped metal oxide layer formation cycle Q times. At least one of the values K and Q is an integer of 2 or more. K and Q are integers ranging from 1 to about 10 respectively. The metal oxide layer formation cycle includes the steps of supplying a metal source gas to a reactor containing the substrate, and then injecting an oxide gas into the reactor. The silicon-doped metal oxide layer formation cycle includes supplying a metal source gas including silicon into a reactor containing the substrate, and then injecting an oxide gas into the reactor. The sequence of operations of repeatedly performing the metal oxide layer formation cycle K times, followed by repeatedly performing the silicon-doped metal oxide layer formation cycle Q times, is performed one or more times until a silicon-doped metal oxide layer with a desired thickness is formed on the substrate. In addition, a method of fabricating a silicon-doped hafnium oxide (Si-doped HfO₂) layer according to a similar invention method is also provided.

A substrate processing apparatus having a support for holding a wafer, a processing chamber for accommodating the wafer, a gas supply hole for supplying desired processing gas in a parallel direction to the surface to be processed of the wafer to be accommodated in said processing chamber, an adjustment plate to be arranged with facing the surface to be processed of the wafer accommodated in the foregoing processing chamber, and an exhaust means for exhausting atmosphere in said processing chamber. A substrate processing apparatus wherein distance between the surface to be processed of wafer and the center part of the adjustment plate is narrower than distance between the surface to be processed of wafer and the circumference part and the midway part of the adjustment plate, in a direction perpendicular to a supply direction of processing gas.

A mosaic or inlaid sputter target design suitable for conventional planar magnetron deposition, RF ionized physical vapor deposition, HCM ionized PVD, ionized metal plasma (IMP) deposition, or self-ionized plasma (SIP) deposition of multi-component alloys for use in integrated circuit metallization. Inlays are inserted within a planar sputter target in the shape of wedges, wires, or buttons to achieve uniform deposition of films on semiconductor substrates during sputtering. Metal alloy strips within a three-dimensional HCM target achieve the same uniform deposition. The deposition leads to the production of CuAl, CuBe, CuB, CuCd, CuCo, CuCr, CuIn, CuPd, CuSn, CuTa, CuTi, CuZr or CuZn alloy films deposited on the wafer. Non-copper films may also be deposited. The inlay-target adjoining surfaces may be machine stepped or tapered to limit wicking from the target backing material.

An adhesive layer is formed on a substrate by printing such that the adhesive layer has a predetermined pattern. A film having a phase-difference characteristic is bonded thereon to form a divided waveplate material layer. The divided waveplate material layer is divided all at once with cutter blades disposed in a row such that the divided waveplate material layer has the predetermined pattern. Then the divided waveplate material layer remaining on portions to be removed is removed, thereby forming divided waveplates on the substrate such that the divided waveplates have the predetermined pattern.

The invention provides a hot melt adhesive membrane for bonding a bi-metallic composite plate and a preparation method of the hot melt adhesive membrane. The adhesive membrane is prepared by the following steps: adopting one or several from polyacrylate rubber, polyethylene-acrylic acid (ester) copolymer or polyvinyl chloride-vinyl acetate esters copolymer as adhesive-based resin; adopting one or several blends from polyethylene, chloridize polyethylene, polyethylene-octene copolymer, ethylene propylene rubber, polyethylene-vinyl acetate, polymethyl methacrylate, polymethyl methacrylate-butadiene-styrene copolymer, polystyrene, thermoplastic polyurethane and polyvinyl chloride as a second matrix; adding a certain amount of thickening agents, fillers and functional additives after pre-mixing; and then casting to form the membrane. The hot melt adhesive membrane has high bonding strength and lasting stability, excellent weather resistance, aging resistance of salt mist, and water resistance, and is suitable for compounding and bonding of metal materials such as stainless steel, galvanized steel, iron, aluminum, copper, titanium alloys and the like.

A multilayer film including a layer of sealing film, having main top and bottom surfaces, and a layer of thermoplastic polymer film, laminated to the layer of sealing film, on at least one of the main top and bottom surfaces. The sealing film has a composition and thickness imparting gas barrier character to the multilayer film, of which the layer(s) of thermoplastic polymer film by themselves lack such gas barrier character. Such multilayer film is usefully employed to form biologically compatible therapeutic articles such as medical balloons that are constructed to be inflated in vivo.

This invention provides gradient deposition methods and systems to form libraries of combinatorial materials. The systems can include a shutter movable between alternate orientations around a substrate for deposition of gradients in different directions. Methods can include deposition of a gradient from targets illuminated by controlling target bias voltage onto a substrate past a mask or shutter movable to desired orientation coordinates.

The invention discloses a control method and device for the self-cleaning of an air conditioner indoor unit and belongs to the technical field of air conditioner cleaning. The control method comprises: controlling an air conditioner to run in a refrigerating mode and closing a fan of the indoor unit; detecting the temperature of a coiled pipe of the indoor unit, and controlling the fan to run at a first rotating speed for a first duration when the temperature of the coiled pipe is lower than a frosting critical temperature; and controlling the air conditioner to run in a heating mode, and carrying out defrosting cleaning on the indoor unit. According to the control method, by carrying out refined operation on the fan of the indoor unit, the losses of cold air before the frosting critical temperature is reached can be reduced, the flow of air in the indoor unit can also be accelerated through the running of the fan after the frosting critical temperature is reached, temperature and vapor distribution is uniform, and frosting thickness is even.

The invention discloses a surface modification method of the tungstic oxide film gas sensor. The process includes: cleaning the Al203 base sheet; spurting the interdigital electrode on the base sheet in the magnetron sputtering device using the platinum as the target and the argon gas as the working gas; spurting the tungstic oxide film on the base sheet with the interdigital electrode using the tungsten as the target and the argon, oxygen as the working gas; spurting the metal layer on the film using the Ti, Ni, Mo, Va, Platinum, Aurum or Pd as the target material and the argon gas as the working gas; heat process to the metal layer in air and get the surface modifying gas sensor. The film is uniform and high purity which is good adhesion to the base bottom and the parameter is easy to control. The gas sensor has the low working temperature and good selectivity, also the response and recovery time are shot.

A method for producing a membrane electrode assembly 1 for solid polymer electrolyte fuel cell, the membrane electrode assembly 1 including a solid polymer electrolyte membrane 2 comprising an ion exchange membrane, a first electrode 3 having a first catalyst layer 31, and a second electrode 4 having a second catalyst layer 41,the first electrode 3 and the second electrode 4 being disposed so as to be opposed to each other via the ion exchange membrane, the method including: applying a coating solution containing a catalyst onto a base film 101 to form a first catalyst layer 31; applying a coating solution containing an ion exchange resin dissolved or dispersed in a liquid onto the first catalyst layer 31 to form an ion exchange membrane; then applying a coating solution containing a catalyst onto the ion exchange membrane to form a second catalyst layer 41; and finally, peeling off the base film 101 from a resulting laminate. According to this method, it is possible to produce membrane electrode assembly 1 for high-performance solid polymer electrolyte fuel cell having catalyst layers each having a uniform thickness efficiently and continuously.

The invention provides a method for preparing molybdenum disulfide nanosheets by ultrasonic-assisted chemical intercalation and belongs to the field of preparation of molybdenum disulfide nanosheets. The method provided by the invention comprises the following steps: performing ultrasonic reaction on molybdenum disulfide powder and n-butyl lithium under the protection of high-purity argon gas to obtain lithium-intercalated molybdenum disulfide; and adding ultra-pure water into a reactant, performing chemical stripping on a molybdenum disulfide bulk material to obtain single-layer molybdenum disulfide nanosheets, adding anhydrous ethanol for washing, and performing ultra-pure water dispersion and high-speed centrifugal separation so as to obtain a single-layer molybdenum disulfide nanosheet material which can be dispersed in water. Compared with the traditional method for preparing the molybdenum disulfide nanosheets by chemical intercalation, the method for preparing the molybdenum disulfide nanosheets, provided by the invention, has the characteristics of high reaction speed, high reaction yield, good stripping effect, simple operation, mild reaction conditions and easiness in large-scale production.

Copper and copper alloys are etched to provide uniform and smooth surface by employing an aqueous composition that comprises an oxidant, a mixture of at least one weak complexant and at least one strong complexant for the copper or copper alloy, and water and has a pH of about 6 to about 12 so as to form an oxidized etch controlling layer and to uniformly remove the copper or copper alloy; and then removing the oxidized etch controlling layer with a non-oxidizing composition. Copper and copper alloy structure, having smooth upper surfaces are also provided.

The invention provides a liquid crystal display substrate and a preparation method thereof and a liquid crystal display device, which belong to the technical field of alignment films and can be used for solving the problem of difficulty in miniaturizing and realizing narrow frame design for a liquid crystal display device due to the presence of a Halo region on the edge part of the conventional alignment film. The liquid crystal display substrate comprises a substrate and an alignment film arranged on the substrate, wherein the substrate is provided with a display region for displaying; the substrate is provided with a retaining wall positioned on the periphery of the display region; the alignment film covers the display region, and the outer edge of the alignment film is contacted with the retaining wall; and the thickness of the alignment film is smaller than or equal to the height of the retaining wall. The liquid crystal display substrate preparation method provided by the invention is used for preparing the liquid crystal display substrate. The liquid crystal display device provided by the invention comprises the liquid crystal display substrate. The liquid crystal display substrate and the preparation method can be applied to a liquid crystal display device, in particular to a thin film transistor array liquid crystal display device.

A mailer includes first and second panels that are articulated to one another along a fold line. The fold line is configured to enable the first and second panels to be separated from one another. The first panel is formed from first and second sheets. Similarly, the second panel is formed from first and second sheets that are unitary respectively with the first and second sheets of the first panel. Adhesive-backed labels are formed on the first sheet of the first panel and can be separated from the second sheet. An envelope is formed by the first and second sheets of the second panel. The second panel may also include a return card that can be inserted into the envelope. The mailer can be printed with indicia specific to a targeted recipient.

A method of forming a titanium nitride layer by an atomic layer deposition process using a batch-type vertical reaction furnace is described wherein a first source gas including a titanium precursor is provided onto substrates loaded in a process chamber for a first time period; a first purge gas is introduced into the process chamber for a second time period shorter than the first time period; a second source gas including nitrogen is provided onto the substrates for a third time period substantially identical to the first time period; and, a second purge gas is introduced into the process chamber for a fourth time period substantially identical to the second time period. Titanium nitride layers having uniform thickness and good step coverage may thus be formed while realizing a greatly reduced manufacturing time.

A conditioning process includes rotating a polishing pad about an axis of rotation, conditioning the polishing pad by sweeping an abrasive disk in a path across a surface of the polishing pad between an inner radial distance from the axis of rotation and an outer radial distance from the axis of rotation, sweeping a sensor across the polishing pad while conditioning the polishing pad, measuring a thickness of the polishing pad at a plurality of positions between the inner radial distance and the outer radial distance with the sensor, and adjusting at least one of a dwell time or a pressure of the abrasive disk against the polishing pad for a portion of the path based on measurements of the thickness by the sensor such that the polishing pad wears to a more uniform thickness than without such adjustment.

The invention provides a TPU (thermoplastic polyurethane) hot melt adhesive membrane. The TPU hot melt adhesive membrane is mainly prepared from the following raw materials in parts by weight: 100 parts of TPU, 30-50 parts of thermoplastic polyester of which the melting point is 90-105 DEG C, 10-30 parts of a tackifier, 5-25 parts of a filling material and 5-30 parts of a functional auxiliary agent. The hot melt adhesive membrane prepared by using the method provided by the invention is of a thermoplastic adhesive, is uniform in thickness and simple in bonding process, is suitable for bonding by adopting an automatic production line, is high in production efficiency and large in peeling strength after bonding, can resist water, heat and salt fog aging in an outdoor harsh environment, is durable in bonding, and can be used for significantly improving the bonding strength of the hot melt adhesive membrane adhered to fabrics.

The invention relates to a liquid crystal display panel 2 including a first base having a light shielding film 45, color filters 46R, 46G, 46B, 46, and a first display electrode 48 on a first transparent substrate 4; a second base 5 having a second display electrode 51 on a second transparent substrate 50, spacers 20 and 21 for keeping a distance between the first and the second bases 4 and 5; and a sealing member 6 for sealing a liquid crystal between the first and the second bases 4 and 5. At least one of the first and the second bases 4 and 5 includes a convex portion 43 between a display region 40 including display pixels and a sealing region 41 sealed by the sealing member 6, to enclose the display region 40 with the convex portion 43. The spacers 20 and 21 include a first spacer 20 in the display region 40 and a second spacer 21 on the convex portion.

The invention relates to a method for coating an even and controllable deposit carbon layer on the surface of LiFePO4 particles serving as lithium ion battery cathode materials for increasing the LiFePO4 conductivity. The method adopts the concrete preparation processes that: LiFePO4 powders are placed in a constant temperature zone of a chemical vapor deposition furnace, then the air in the furnace is fully discharged for inputting inert gases, after the temperature rises to the set level, a carbon source gas is input for covering a conductivity carbon film on the surface of the LiFePO4 particles evenly, the LiFePO4 coated with the carbon film has excellent conductivity which is increased by five orders of magnitude compared with the condition before coating. The chemical vapor deposition temperature ranges from 580 to 720DEG C, the deposition time is from 1 to 10 hours, and the volume percent of the carbon source gas is between 1 and 20 percent, and a sample deposited with carbon is cooled to the room temperature with a natural furnace and is then taken out. The method can cover the conductivity carbon film on the surface of each LiFePO4 particle evenly for increasing the conductivity of LiFePO4, and the thickness of the conductivity carbon film can be accurately controlled in the range of 2 to 50 nanometers through adjusting parameters (deposition temperature, deposition time and carbon source gas volume percent) of the chemical vapor deposition process.

In the invention, the sodium hypopphosphite is as the reducing agent of the bath, nickel sulfate as the main salt, with the complexing agent, accelerating agent and stabilizing agent being added. Theultrasonic chemical plating is adopted that utilizes the mechanical energy of the ultrasonic vibration, making the bath deposit nickel and phosphor under the catalysis of the metal surface and the chemical reduction method controlled. The plating procedure includes the steps of oil removal, rust removal, activation, chemical plating and post treatment. The multiple complexing, accelerating and stabilizing agents raises the stability of the bath. The plating speed is adjustable. The even, compact nickel and phosphor plating layer covers the surface of the base body of powder metallurgical material so as to increase the service life of the material and provide wide application area.

A magnetic memory device and a method of manufacturing the same, which are advantageous not only in that both the improvement of storage sensitivity and the reduction of power consumption can be achieved, but also in that a buried wiring having low resistance and high reliability can be formed in reduced time in a stable manner. Soft magnetic material layers forming the cladding structure of a word line and a bit line constituting an MRAM are formed by electroless plating, and the soft magnetic material layers are formed around main wirings (especially copper) of the word line and bit line so that the soft magnetic material layers individually have a uniform, satisfactory thickness, and further they are deposited with improved uniformity on the surface with which the electroless plating solution is in contact, and therefore the uniformity of cladding is improved at not only the bottom surface but also the sidewall of a wiring trench.

The invention discloses an ionic-electronic conductor composite film and a preparation method thereof and a lithium battery. The ionic-electronic conductor composite film comprises a base film rangingfrom 1 micron to 50 microns and a coating material ranging from 0.5 micron to 10 microns, wherein the coating material is spread on the base film or is spread on the base film and permeates into thebase film; the coating material comprises, by mass, ionic conductor materials [1wt%-99.98wt%], electronic conductor materials [0.01wt%-10wt%], coat materials [0wt%-98.98wt%], adhesives [0.01wt%-10wt%], dispersing agents [0wt%-2wt%] and auxiliaries [0wt%-2wt%]; the ionic conductor materials specifically include one or multiple mixtures of an LISCION solid electrolyte material, an NASCION solid electrolyte material, a perovskite solid electrolyte material or a garnet solid electrolyte material and a derivative material; and the electronic conductor materials include one or more of carbon black,conductive graphite, carbon fibers, carbon nano tubes, acetylene black, Ketjenblack, graphene, metallic silver, metallic gold, vapor phase growth carbon fibers VGCF, conductive graphite KS-6 and carbon black SUPER-P.

The intermittent coating apparatus which includes a nozzle 1 which applies a paint 6 to a base material, a feeding side two-way valve 10 which repeats feeding of the paint 6 to the nozzle 1 and stop of the feeding, a return side two-way valve which 11 repeats discharge of the paint 6 to a return side and stop of the discharge, a paint flow path 12, means to feed the paint 6 into the flow path 12, and paint returning means 5 which repeats suction and return of the paint 6 out of and into the nozzle 1, and is characterized in that switching of the feeding side two-way valve 10 is carried out earlier than that of the return side two-way valve 11 within a range not shorter than 5 msec and not longer than 100 msec at least at a coating start time.

The invention provides an aluminum alloy wheel coating process, which ensures that wheels produced with the coating process have the characteristics of uniform thickness of paint films and good corrosion resistance. The coating process comprises the following steps of: front surface treatment, powder spraying, powder curing, paint spraying, paint curing and cooling, wherein the chromium-free passivation is utilized, an electrostatic rotary bell spray gun is used to spray paint on work-pieces, the construction voltage of a rotary bell is controlled between -50kV and -60kV, the rotation number of the electrostatic rotary bell is controlled at 25-32 kr/min, the paint spraying quantity of the rotary bell spray gun is 70-100cc/min, the pressure of forming air is controlled at 0.1-0.5MPa, and the distance from the spray gun to the work-piece is between 150mm and 180mm. Because of the optimization of the technological parameters of the processes of chromium-free passivation, curing and paint spraying, the coating performance of the wheels is improved, the unilateral corrosion in a salt spray test does not exceed 2mm, and the thickness of the paint film is uniform.

Polishing apparatus and related methods employ aligned first and second magnetic field sources to adjust the compressive force and/or pressure applied by a carrier head against a target workpiece (such as a wafer) by selectively and controllably generating a repellant or attractive force between the two magnetic field sources.

The invention relates to magnesium and its alloy surface chemical copper plating method. It combines film coating with chemical copper plating to do composite protection. The film coating is after de-oiling, acid and alkaline cleaning. The film coating agent includes organic silicon heat resistant paint, organic titanium heat resistant paint WT61-1 and WT61-2, water glass base paint JN-801 silicate inorganic coating, silicone resin SF-7406 three proofing varnish, silane coupling agent KH550. After film coating it is processed sensitization, activation, and chemical copper plating. The formed chemical copper plating layer is uniform and has the appearance of metallic copper. The coating film has good ware, acid, and alkaline resistance. The cost and use level of copper sulfate are much less than chemical nickel plating. Thus the cost of invention is low; and its operation is simple; and suitable for industrialization production.

Provided is a light emitting device having a phosphor layer on a surface of a semiconductor light emitting element and reducing unevenness in light distribution color, and a method of manufacturing the same. A light emitting device 100 includes a light emitting element 20 with a supporting body which is composed of a semiconductor light emitting element 1 and a supporting body 10, and a phosphor layer 7 which continuously covers an upper surface and side surfaces of the semiconductor light emitting element 1, and side surfaces of the supporting body 10. The phosphor layer 7 is configured such that at least a lower portion of the side surface of the supporting body 10 is thinner than the upper surface and the side surface of the semiconductor light emitting element 1. Such a configuration of the phosphor layer can be formed by applying a spray-coating of a slurry containing phosphor particles and a thermosetting resin in a solvent on the semiconductor light emitting element 1 side of the light emitting element 20 which has the supporting body.

The LCD panel includes the first substrate, one liquid crystal layer, one adhesive frame and the second substrate. The first substrate and the second substrate are set oppositely, and the adhesive frame adheres the first substrate and the second substrate to form one closed space to surround the liquid crystal layer. The adhesive frame separates the first substrate into one central part and one peripheral part, the central part includes one color filter with light spacer in the surface, and the peripheral part has also light spacer.

A separation membrane-porous material composite 1 being improved influx and selectivity, which comprises a porous material and a separation membrane formed on the porous material, wherein a composite layer 65 having a thickness of 1 mm or less is provided at the interface between the porous material 61 as a dense layer 64 and the separation membrane 66 being formed as a carbonaceous film.

A film forming composition comprising: at least one of a compound represented by formula (I) as defined in the specification, a hydrolysate of the compound represented by formula (I) and a polycondensate of the compound represented by formula (I); and a silicon surfactant, a production process of an insulating film by using the composition and the insulating film.