34results about How to "Reduce surface roughness" patented technology

This utility model discloses an external cylindrical grinding device, including a base, a workpiece driving mechanism, and a grinding mechanism. The grinding mechanism includes a crank mechanism, a guide rail, and a grinding block. A slider is slidably mounted on the guide rail, and the slider is connected to the crank mechanism, which drives the slider to slide along the guide rail. A vertical groove is formed on the upper side of the slider, and the grinding block is slidably mounted in the groove. A spring is provided between the grinding block and the bottom of the groove. Under the action of the spring, the upper end of the grinding block can extend out of the groove to fit tightly against the surface of the workpiece to be ground. This utility model, by employing a grinding device with a certain degree of elasticity, can adapt to different types of shaft workpieces to be ground, has good versatility, and during secondary processing, the grinding block can always be tightly fitted against the surface of the workpiece under the action of the spring, avoiding the impact of workpiece jump during secondary clamping on the original shape and position accuracy.

The application discloses a batch preparation method of a silicon diamond infrared composite material and the silicon diamond infrared composite material, and the method comprises the following steps: taking a nano-diamond suspension as a crystal seed, and performing spin coating on a plurality of silicon substrates at 200-400 r / min for 10-30 s, and then performing high-speed spin coating, wherein the spin coating liquid is a diamond suspension; adopting an HFCVD method to deposit a diamond film on one side of the plurality of silicon substrates; the process parameters of the HFCVD method comprise that the distance between hot wires is 10-15 mm, the distance between the hot wires and the silicon substrates is 8-12 mm, and the temperature of the hot wires is 1000-1200 DEG C; and the diamond film is deposited on the other side of the plurality of silicon substrates. The method can batch-prepared diamond films with high antireflection performance and low surface roughness, realizes simultaneous processing of the plurality of silicon substrates in a single deposition, and greatly reduces equipment investment and preparation cost.

The application discloses a kind of food-grade silica gel triple-sealed high-precision bearings, it is related to bearing technical field, including bearing inner ring, bearing outer ring and the sealing ring of being installed in the inner side of bearing outer ring, the outer raceway both sides of bearing inner ring are equipped with one straight angle sealing groove with the cross section of 90 ° at two ends of shoulder or baffle respectively;The sealing ring includes metal framework and food-grade silica gel rubber coating integrally formed on the metal framework;The food-grade silica gel rubber coating extends towards the inner side of bearing inner ring and forms integrated three sealing lips, including two radial sealing lips with the contact of two radial side walls of the straight angle sealing groove, and one axial sealing lip with the contact of the axial bottom surface of the straight angle sealing groove.The application has the beneficial effects of material safety, no pollution, excellent sealing performance, high processing efficiency, the processing cycle is shortened by more than 40%, the leakage rate is reduced by more than 95%, and has wide application value.

The utility model discloses a stainless steel strip polishing device capable of enhancing the surface heat dissipation efficiency, and relates to the technical field of stainless steel strip polishing. The device comprises an outer box, an inner box, a mounting frame, a first motor and a second motor, the inner box is arranged in the outer box, a stainless steel belt is conveyed in the inner box, the mounting frame is arranged in the inner box, and two sets of symmetrically-distributed transmission rollers are rotationally mounted in the mounting frame; the outer wall of the transmission roller is sleeved with a polishing belt attached to the two ends of the stainless steel belt, cooling water higher than the stainless steel belt is arranged in the inner box, stroke openings higher than the upper end of the outer box are formed in the two ends of the inner box, and the stainless steel belt penetrates through the stroke openings in a sliding mode. The outer wall of the linkage chain wheel is sleeved with a chain. The stainless steel strip polishing device is immersed in cooling water to polish a stainless steel strip, so that the problem of low cooling efficiency caused by insufficient heat carrying capacity of air is solved.

A welding method for reducing residual stress and improving surface morphology in thick steel plates is disclosed, relating to the field of welding. The method includes the following steps: applying a large-diameter impact head to the target area of ​​the weld joint on the thick high-strength steel plate using full-coverage ultrasonic impact treatment; and applying a small-diameter impact head to the target area of ​​the weld joint on the thick high-strength steel plate using full-coverage ultrasonic impact treatment. This method utilizes the deep strengthening function of the large-diameter impact head and the surface finishing function of the small-diameter impact head to achieve a synergistic effect, reducing residual stress in the thick high-strength steel plate while simultaneously lowering surface roughness.

The application belongs to the technical field of surface modification and relates to a system and method for preventing the inner wall of a fly ash low-temperature pyrolysis furnace from being caked, which comprises the following steps: S1, inner wall surface pretreatment: performing sand blasting polishing treatment on the inner wall of the low-temperature pyrolysis furnace to remove surface rust, residual caked substances and caking force points, then cleaning surface oil stains with an organic solvent, and then blowing dry with high-pressure air and removing residual dust; S2, hydrophobic coating spraying and curing: uniformly spraying a hydrophobic coating material on the inner wall surface treated in step S1, controlling the coating thickness to be less than 100 microns, and then putting into use after natural curing and static curing; and S3, intermittent high-pressure inert gas blowing during operation: in the operation process of the low-temperature pyrolysis furnace, the high-pressure gas blowing subsystem sprays high-pressure inert gas to the inner wall of the low-temperature pyrolysis furnace in an intermittent and instantaneous burst mode to remove the fly ash initially adhered to the inner wall and inhibit the formation and growth of caking points.

This utility model belongs to the field of fan blade technology and discloses a multi-blade noise-reducing blower fan blade, including: a fan blade assembly comprising 53 forward-curved fan blades evenly distributed along the circumference of a hub, with a motor mounting cavity at the center of the hub; the axial end face of the hub has several heat dissipation holes, arranged equidistantly along the circumference to form an annular heat dissipation channel; a motor assembly comprising a thickened silicon steel sheet frame, the silicon steel sheet thickness being 0.5-0.8mm; the ratio of the fan blade diameter D to the fan outer diameter D0 is 75%-78%; this utility model, by using 53 forward-curved fan blades with an optimized bending angle of 15°-25°, and a chord length ratio of the leading edge to the trailing edge of the blades of 1:0.8-1:0.9, effectively suppresses turbulence and eddy noise. An arc-shaped transition section with a transition radius R = 3-5mm is provided at the connection between the hub and the fan blades to reduce airflow separation noise.

The utility model discloses a kind of tensile tear-resistant reinforced CPVC cable protection pipe, it includes pipeline, the inside fixed connection of pipeline has CPVC resin, the inside fixed connection of CPVC resin has nano calcium carbonate, the inside fixed connection of nano calcium carbonate has calcium-zinc stabilizer.Through the above structure, there is a layer of CPVC resin in pipeline, the smooth surface of CPVC resin can reduce the contact area of cable and pipe wall, reduce the local temperature rise caused by heat generation due to friction, while the air gap between pipe wall and cable is more uniform, beneficial to the heat dissipation of cable operation, prolong the service life of cable, there is also a layer of nano calcium carbonate in it, nano calcium carbonate particle size is usually 10~100nm, specific surface area is large and dispersibility is good, uniformly filled in CPVC resin matrix can form "rigid particle reinforcing effect", the tensile strength of inner wall layer is improved by 20%~30%, and bending modulus is improved by 15%~25%.

The object is to provide a cover for a display device that is easy to attach and detach relative to the display device and does not cause the adhesive to adhere to and remain on the surface of the housing, and a package for a display device using the cover. The solution is that the cover (20) has a front plate portion (21) and a rear plate portion (22), and is provided with a left-side connecting tab (26) extending in the left direction from the rear plate portion (22) and a right-side connecting tab (27) extending in the right direction. The engaging inner surface of the re-peeling adhesive surface of the front plate portion (21) is adhered and engaged with the front surface of the transparent panel of the display device (1). The left-side connecting tab (26) and the right-side connecting tab (27) extend in the front direction, and the re-peeling adhesive surfaces, i.e., the engaging inner surfaces of the left-side connecting tab (26) and the right-side connecting tab (27), are adhered and engaged with the outer surface (21b) of the front plate portion (21).

The application relates to the technical field of dental implants, in particular to a trans-zygomatic implant and a processing technology thereof, and the processing technology comprises variable-distance multi-stage sand blasting and acid etching surface treatment on an anchoring part with threads of the trans-zygomatic implant and electrochemical polishing surface treatment on an extension part without threads. The trans-zygomatic implant is treated by variable-distance multi-stage sand blasting combined with acid etching, so that a uniform micron-level rough base and a multi-stage micropore structure can be formed on the titanium surface, osteoblast adhesion and differentiation are facilitated, the early bone combination speed is accelerated, the combination strength is improved, the early implant loosening risk is reduced, the extension part of the trans-zygomatic implant is treated by electrochemical polishing, a smooth surface can be obtained, plaque adhesion and bacterial colonization are greatly reduced, the implant peri-implantitis risk is reduced, and soft tissue adhesion is promoted; the dual optimization of bone anchoring and tissue adhesion is realized, and the long-term function and health of the trans-zygomatic implant under complex stress are guaranteed.

The utility model discloses a kind of high-strength high-conductivity steel-aluminum composite plate explosive welding block, it relates to explosive welding block technical field, including steel plate and aluminum plate, steel plate is located at the bottom of aluminum plate, the four corners of steel plate and the four corners of aluminum plate are all set with round angle, the upper surface of steel plate is set with multiple micron-level grooves, explosive welding connection between steel plate and aluminum plate;The bottom of steel plate is provided with buffer support plate.A kind of high-strength high-conductivity steel-aluminum composite plate explosive welding block of the utility model, by setting the several micron-level grooves of steel plate upper surface, in the fusion welding of steel plate and aluminum plate, the welding surface molten metal of aluminum plate can be infiltrated into several micron-level grooves, increase the "occlusal" force, improve welding strength, the multiple wave-shaped protrusions of aluminum plate lower surface, in explosion, can be inserted into steel plate upper surface, can form "mechanical lock catch" structure, increase interface friction, improve welding strength.

The application belongs to the technical field of heterogeneous steel additive manufacturing, and particularly relates to a kind of heterogeneous steel based on laser additive manufacturing and a preparation method of shell-like nacreous layer structure, the shell-like nacreous layer structure heterogeneous steel includes multiple layers of bionic heterogeneous structure layer, each layer of bionic heterogeneous structure layer includes multiple shell-like nacreous layer structure unit bodies, each shell-like nacreous layer structure unit body includes four square modules, each square module includes two long rectangular martensite steel regions and two long rectangular austenite steel regions which are parallel to each other, long rectangular martensite steel regions and long rectangular austenite steel regions are arranged at intervals, the direction of long rectangular martensite steel regions and long rectangular austenite steel regions in any two adjacent square modules in each layer of bionic heterogeneous structure layer is perpendicular, and the direction of long rectangular martensite steel regions and long rectangular austenite steel regions in any two adjacent square modules in any two adjacent layers of bionic heterogeneous structure layer is perpendicular, and the application realizes the synergy of strength and toughness of material.

The application relates to a CMP composition for obtaining a high-quality SiC single crystal substrate surface, which is prepared from the following raw materials in percentage by weight: 20-50 wt% of polishing abrasive, 3-5 wt% of oxidizing agent, 0.1-0.5 wt% of surfactant, 0.2-0.5 wt% of hydrogen bond regulator, 0.2-1 wt% of polishing accelerator, 0.01-0.05 wt% of defoaming agent, and the balance of water; the CMP composition is neutral. The CMP composition uses silicon oxide as the abrasive, introduces the hydrogen bond regulator, the polishing accelerator and the oxidizing agent, improves the polishing rate of the silicon carbide wafer CMP, realizes that the surface roughness Ra of the silicon surface after cleaning can reach below 0.07 nm, the surface after cleaning is free of large particles (>0.2 um), meanwhile, the silicon oxide raw material does not need to be treated, has excellent long-term storage stability, and the system does not have the phenomena of particle agglomeration and sedimentation with the prolongation of the storage time, and excellent polishing surface quality can be obtained in the subsequent polishing process.

This invention relates to the field of precision machining technology for semiconductor materials, and in particular to a chemical mechanical polishing (CMP) slurry, its preparation method, and its application. The CMP slurry comprises the following components by mass percentage: 6-12% composite abrasive, 3-7% composite oxidant, 2-5% complexing agent, 0.5-2% phosphine detoxifier, 0.3-1.5% dispersant stabilizer, 0.1-1% pH adjuster, and water as the balance. The composite abrasive is a composite material of alumina and silicon dioxide. The composite oxidant includes sodium hypochlorite solution and hydrogen peroxide solution. This invention, through the rational proportioning and synergistic effect of the composite abrasive, composite oxidant, complexing agent, phosphine detoxifier, dispersant stabilizer, and pH adjuster, is not only suitable for single substrates but also compatible with the CMP polishing of three typical third-generation semiconductor materials: indium phosphide, gallium arsenide, and germanium. It exhibits good versatility and process adaptability, helping to reduce production costs and process changeover complexity.

This invention provides a metal electroplating composition comprising: a sulfur-containing compound, a tin salt, a silver salt, an acidic electrolyte, a surfactant, a brightener, an antioxidant, a pH adjuster, and water. The sulfur-containing compound is a compound of formula (I): wherein R1 is selected from primary, secondary, and tertiary amino groups; R2 is selected from straight-chain alkyl and branched-chain alkyl groups; R3 is selected from straight-chain alkyl and branched-chain alkyl groups; and R4 is selected from hydrogen and alkyl groups. Using the above technical solution, electroplating under high current density conditions can achieve the following technical effects: no pores or defects, low impurities in the plating layer, excellent plating uniformity, dense structure, and low surface roughness. The metal electroplating composition has good plating solution stability and plating uniformity, and can obtain consistently good appearance and film thickness uniformity of the plating film. It has good industrial application value.

A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO2 as a main component, particularly, as a substrate for mask blanks used in EUVL.

The present disclosure is a kind of stator core and its manufacturing method, stator module and motor, and relates to the technical field of motor.The stator core comprises a plurality of first stator assemblies and a plurality of second stator assemblies which are alternately stacked, the first stator assembly comprises a first stator tooth and a first stator yoke, the second stator assembly comprises a second stator tooth and a second stator yoke, the second stator yoke is connected with the adjacent first stator yoke and forms a receiving part, the second stator tooth is connected with the adjacent first stator tooth, one end of the second stator tooth protrudes from the first stator tooth, and the protruding part is inserted into the receiving part, and the protruding part is connected with the first stator yoke.The connecting surfaces of the second stator yoke, the second stator tooth and the first stator assembly are all planes perpendicular to the axial direction of the stator core, these connecting surfaces are all planes with low surface roughness and good flatness, and thus the connecting strength between the first stator assembly and the second stator assembly is high, and the integrity of the stator core is good.

This invention discloses a differential centrifugation method for separating α-Al₂O₃ nanoparticles based on morphological response differences, comprising the following steps: S1: Dispersing α-Al₂O₃ nanoparticles at a concentration of 0.55 wt% in anhydrous ethanol, and continuously dispersing the particles using an ultrasonic device; S2: Centrifuging the resulting suspension at 10,000–15,000 rpm, discarding the lower precipitate, and retaining the supernatant; S3: Dispersing the supernatant again using ultrasonication under the same conditions as in step S1; S4: Centrifuging the dispersed system at 4,000–7,000 rpm at a medium speed, and collecting the lower precipitate; S5: Repeating the combined process of steps S2–S4 2–3 times, merging all precipitates obtained in the medium-speed centrifugation stage, and obtaining the target α-Al₂O₃ nanoparticles after drying. The particles obtained by this method exhibit higher polishing rates, lower surface roughness, and lower defect density in CMP, which improves density and grain uniformity in ceramic sintering. At the same time, the method has a clear process, adjustable parameters, and strong equipment versatility, and has significant potential for industrial scale-up and engineering applications.

This invention discloses a polishing slurry, its preparation method, and its application, relating to the field of polishing slurry technology. The polishing slurry of this invention comprises silica abrasive, citric acid, and sodium citrate, with a pH < 7. It effectively controls metal ion contamination during the polishing process of synthetic quartz, improves the removal rate during the polishing of quartz glass substrates, and reduces the surface roughness of the quartz. It synergistically optimizes chemical corrosion and mechanical removal, achieving an atomically smooth, scratch-free, and subsurface-damage-free quartz glass substrate surface while maintaining a high material removal rate. Furthermore, it possesses characteristics such as low contamination, easy cleaning, and environmental friendliness.

This invention discloses a method for preparing a single-component InP polishing slurry, belonging to the technical field of polishing slurry. The polishing slurry comprises the following components by mass percentage: 1%–20% modified colloidal silica, 0.01%–5% oxidant, 0.001%–1% metal corrosion inhibitor, 0.001%–0.6% surfactant, with the balance being a pH adjuster and deionized water; the pH adjuster is used to adjust the pH of the polishing slurry to 2.0–5.0. The modified colloidal silica is obtained by surface grafting modification of ordinary colloidal silica with a specific bisphosphonate-sulfonylimide silane coupling agent. The bisphosphonate groups in this structure can strongly chelate the InP surface, enhancing chemical cutting and improving the removal rate; the sulfonylimide groups ionize to provide a high negative charge, which, in synergy with steric hindrance, endows the polishing slurry with excellent long-term storage stability. This invention provides a ready-to-use, highly stable, high-removal-rate, and ultra-smooth surface-forming single-component polishing slurry.

The utility model relates to tool changer technical field provides a machining center tool changer, including the fixed frame, the fixed frame inner surface fixed mounting has a plurality of first electric control push rod, two limit sliding slot, open in the fixed frame inner surface, two limit sliding slot sliding connection has the moving plate, and the moving plate is fixedly connected with a plurality of first electric control push rod output end, and the moving plate outer surface fixedly arranged with a plurality of rod seat, and one side two rod seat opposite surface fixedly arranged with the guide slide bar, and the other side two rod seat opposite surface rotationally connected with the screw rod, and the device sets up the structure that different outer diameter size's tool can all carry out fastening clamping and quick replacement, improves the tool adaptation range of device, improves the processing procedure flexibility, can satisfy the processing demand of many varieties, small batch or complex technology, improves the machining accuracy, reduces the surface roughness, improves the automation production efficiency and product pass rate of device, reduces the processing cost and improves equipment utilization.

The application provides a bevel edge fast-feeding turning tool, which comprises a bevel edge fast-feeding tool bar and a bevel edge fast-feeding tool piece; one side of the top corner side of the bevel edge fast-feeding tool piece is chamfered by 17.5 degrees as a rake face; the other side of the top corner side of the bevel edge fast-feeding tool piece is chamfered by 10 degrees as a relief face; the intersection of the rake face and the relief face is a cutting edge; and the outer edge of the cutting edge is a blade edge chamfering. The bevel edge fast-feeding turning tool has the advantages that the contact length of the main cutting edge of the tool piece and the chip is prolonged through the special blade edge design concept, the concentrated wear of the tool tip position is shared, the heat dissipation area of the tool tip is increased, the blade edge wear is delayed, and the service life of the tool piece is prolonged; and the bevel edge fast-feeding turning tool breaks through the limitation that the conventional tool piece takes the tool tip arc as the blade edge, and the tool bar angle is deflected and the top side of the tool piece is chamfered, so that the chip thickness is ensured, the feeding speed is increased, and the surface roughness is reduced.

This invention discloses an environmentally friendly and efficient 4H-SiC polishing slurry and its preparation method, belonging to the technical field of polishing compositions. The 4H-SiC polishing slurry of this invention comprises the following components: 1.5 wt.%~6 wt.% abrasive, 0.2 wt.%~0.4 wt.% photocatalyst, 2 wt.%~4 wt.% H2O2, an organic base pH adjuster to adjust the pH value of the 4H-SiC polishing slurry to 8~11, and the balance being water; wherein the organic base pH adjuster includes at least one of tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline hydroxide. The composition design of this invention is simple and easy to prepare. It has a high material removal rate for 4H-SiC, significantly reduces surface roughness after polishing, and is environmentally friendly and pollution-free, possessing the advantages of being environmentally friendly and efficient, and has broad application prospects in high-precision polishing of 4H-SiC.

This invention provides a grinding station for the interior cavity of shell-type products, including a mounting mechanism and a grinding mechanism. The mounting mechanism has an actuator that can move along the X, Y, and Z axes. The grinding mechanism is mounted on the actuator. The moving actuator drives the grinding mechanism to extend into the shell cavity to grind the inner wall of the shell cavity. The grinding mechanism includes a self-rotating rigid first grinding component. A secondary grinding assembly is provided on one side of the first grinding component, coaxially arranged with the first grinding component, and includes a flexible second grinding component. When unfolded, the second grinding component is flush with or protrudes from the grinding end face of the first grinding component. During processing, the inner wall of the shell cavity is first ground by the first grinding component, and then the second grinding component is unfolded for a second grinding. During the unfolding process, the grinding mechanism does not need to exit the shell cavity. The mounting mechanism can be a three-axis machine tool or a robotic arm, which moves the actuator to drive the grinding mechanism into the shell cavity.

A semiconductor photoresist composition and a method of forming a pattern using the same are provided. The semiconductor photoresist composition includes an organometallic compound; an alcohol compound substituted with at least one halogen; an alcohol compound not substituted with a halogen; and a solvent. The present application provides a photoresist pattern having excellent line edge roughness and pattern line width.

The application relates to a casting mold, a method and a polishing pad for forming an ordered abrasive polishing pad. Compared with the prior art, the grinding columnar body of the application extends from the bottom plate, the plurality of grinding columnar bodies are orderly distributed on the bottom plate, the grinding columnar body and the bottom plate are made of grinding materials such as silicon dioxide, cerium dioxide or aluminum oxide, the bottom plate is placed in a mold cavity, the bayonet element is clamped to the bottom plate by a moving part to fix the position of the bottom plate, the mold is vacuumized through a vacuum exhaust hole, polyurethane prepolymer is poured through a pouring inlet of the mold cavity, a negative pressure is formed, the polyurethane prepolymer fills the gap between the grinding columnar bodies on the bottom plate, the polyurethane prepolymer is solidified to form a filling body which is flush with the grinding columnar bodies on the bottom plate, the filling body is in close contact with the grinding columnar body, the filling body is prevented from being separated from the grinding columnar body during polishing to cause the fracture of the grinding columnar body, and the polishing pad with the stable and orderly fixed distribution of the grinding columnar body is formed.

The application discloses an optical waveguide device structure and a forming method thereof, and comprises the following steps: forming a waveguide functional layer, a hard mask layer and a photoresist pattern on a substrate; performing first etching on the hard mask layer through the photoresist pattern to form a hard mask pattern; using a first free radical to perform first processing on a first sidewall of the hard mask pattern with the photoresist pattern, so as to reduce the surface roughness of the first sidewall; performing second etching on the waveguide functional layer through the hard mask pattern after the photoresist pattern is removed to form a waveguide pattern; using a second free radical to perform second processing on a second sidewall of the waveguide pattern with the hard mask pattern, so as to reduce the surface roughness of the second sidewall; and removing the hard mask pattern. The application can significantly improve the smoothness of the sidewall of the waveguide pattern, thereby improving the key performance of the device.

This invention discloses a method for live pipeline leak sealing based on in-situ metal growth and its application, belonging to the field of online repair technology for pressurized pipelines. The method includes: pre-treatment of the leaking area; forming a repair layer consisting of a metal transition layer and a metal-ceramic composite layer in the leaking area using low-temperature solid-state deposition technology without interrupting pipeline operation; and finally, post-treatment of the repair layer by shot peening and low-temperature laser polishing to improve its density and surface properties. This invention employs low-temperature processes such as cold spraying, completely avoiding the risks of hot work operations and achieving safe and efficient repair under pressurized pipeline conditions. The gradient functional repair layer formed by this invention has high bonding strength with the pipeline substrate and excellent corrosion resistance and erosion resistance, making it particularly suitable for repairing pressurized pipeline leaks in the power, chemical, and marine engineering fields where continuous production is required.

The invention relates to a CO2 laser atomic-scale defect repairing method based on a densification effect, which is characterized in that microsecond CO2 laser is used for inducing a material to generate the densification effect for atomic-scale defects which are difficult to repair in a fused quartz element, so that thermally induced relaxation and rearrangement of an atomic network are promoted, and low-stress repairing of various defects is realized. The method comprises the following steps: carrying out multi-modal characterization on a to-be-repaired area to obtain the type and distribution information of an atomic-scale defect; based on finite element simulation, determining an optimization process window capable of triggering uniform densification and having thermal stress lower than material strength; laser scanning repair is carried out in a controllable atmosphere environment according to optimized parameters, and infrared thermal image online monitoring and feedback control are assisted; and the repairing effect is evaluated through multi-dimensional collaborative characterization and laser damage threshold testing. According to the method disclosed by the invention, the effective repair of atomic-scale processing induction defects, intrinsic ring cluster defects and polluting impurities is realized by utilizing the densification effect on the premise of not triggering large-range melting and mass migration, and the laser damage resistance threshold of the fused quartz element is greatly improved.

The utility model relates to the field of cooling equipment discloses a kind of MPP power pipe is formed after spray cooling box, including cooling box, the inside fixedly connected with partition of cooling box, the inside rear side wall of cooling box is fixedly connected with support plate, the bottom of partition is provided in support plate, the top of support plate is fixedly connected with pump, the input end of pump is fixedly connected with first water inlet pipe, the output end of pump is fixedly connected with connecting pipe.The utility model is provided with pump, first water inlet pipe, conveying pipe, can solve the problem that uneven surface is caused to pipe material, influence the overall service life and safety of pipe material, by connecting pipe, conveying pipe, cooling water is sent to spray ring, to effectively ensure that pipe material entire circumferential surface can be simultaneously, uniformly received cooling water, improve the appearance quality of pipe material, make pipe material surface more smooth and flat, reduce surface roughness.