169results about How to "Reduce surface roughness" patented technology

The invention relates to the field of fuel cells, and particularly discloses a gas diffusion layer, a preparation method thereof and a proton exchange membrane fuel cell applying the gas diffusion layer, and the preparation method of the gas diffusion layer comprises the following steps: preparing porous substrate layer carbon paper; performing hydrophobic treatment on the porous substrate layer carbon paper to obtain hydrophobic carbon paper; a hydrophobic agent and water are mixed to obtain hydrophobic slurry A, conductive powder, a surfactant, a binder and an organic solvent are mixed and dispersed to obtain conductive powder slurry B, the hydrophobic slurry A and the conductive powder slurry B are mixed to form spraying slurry C, the spraying slurry C is sprayed on hydrophobic carbon paper while being stirred, drying and curing are conducted after spraying, and a microporous layer is formed. A gas diffusion layer is obtained; the invention further discloses the gas diffusion layer prepared by adopting the method and the proton exchange membrane fuel cell applying the gas diffusion layer. The application has the characteristics of solving the problems of dispersion uniformity of the conductive powder in the slurry and sedimentation in the coating process, improving the quality of the microporous layer and further improving the performance of the fuel cell.

The invention relates to the technical field of high-speed cable shielding materials, and discloses a manufacturing method of rolled copper foil for high-speed cable shielding. The method comprises the following steps: preparing a copper plate; performing multi-pass cold rolling on the copper plate to form an elongated grain structure oriented along the rolling direction; performing controlled annealing on the cold-rolled copper foil to recover plasticity and inhibit complete recrystallization; the target thickness is obtained through finish rolling; carrying out finishing rolling on at least one surface of the copper foil by adopting a mirror surface working roller so as to reduce the surface roughness; and performing surface smoothing or passivating treatment to inhibit oxidation and performance degradation. Therefore, the obtained rolled copper foil has good ductility, structural stability and high-frequency performance.

The invention discloses a filter and a forming method thereof, and electronic equipment, and the method comprises the steps: carrying out the thinning of a passivation material layer in a target resonance region through first thinning processing after a piezoelectric laminated structure is provided, so as to enable the thickness of a passivation layer in the target resonance region to be smaller than the thickness of passivation layers in other resonance regions, therefore, the vibration frequency of the passivation layer of the target resonance area is faster than that of the passivation layer of other resonance areas, the frequency of the resonator of the target resonance area shifts rightwards, the target resonance area is used for forming the resonator with the highest vibration frequency, the bandwidth of the corresponding filter is increased, and the bandwidth of the filter is increased. The surface roughness of the passivation layer in the target resonance area is further reduced through the first thinning treatment, which means that the thickness uniformity of the passivation layer in the target resonance area is improved, so that the right side frequency of the filter bandwidth is modulated, the uniformity of the right side frequency of the filter bandwidth is improved, and the filter performance is improved. And during measurement, more frequency points fall within the range of specification requirements, so that the yield of the filter can be improved.

The invention discloses an alkali corrosion liquid for silicon in the semiconductor industry and a corrosion method of the alkali corrosion liquid. According to the alkali corrosion liquid, a corrosion method of slow acid corrosion and sufficient alkali corrosion is adopted, the surface roughness of the silicon wafer can be effectively reduced, in addition, in the alkali corrosion liquid, a surfactant, an active additive, sodium dodecyl polyoxyethylene ether sulfate and the like are matched with alkali, so that the surface tension of the alkali is further reduced, the corrosion rate is higher, and the service life of the silicon wafer is prolonged. The surface tension can be effectively reduced, the affinity of the etching liquid and a silicon substrate is improved, the selective etching capability to silicon dioxide in the etching process can be enhanced, corrosion to the silicon substrate is reduced, and a more uniform and accurate etching effect is achieved. Through measurement, the surface roughness Ra of the silicon wafer obtained by the corrosion method is less than or equal to 0.1 mu m, and the single metal cation is lt; and the corrosion rate can reach 1-1.5 microns / minute and is stabilized within + / -5%.

The invention discloses a solar cell, a photovoltaic module and a semiconductor substrate, and relates to the technical field of photovoltaics, so that a passivation layer has a good passivation effect on the semiconductor substrate. Meanwhile, the contact performance of the doped semiconductor layer and the electrode and the shaping of the electrode are improved, and the conversion efficiency of the solar cell is improved. The solar cell comprises a semiconductor substrate and a passivation layer. The semiconductor substrate has a first surface and a second surface opposite to each other. At least one of the first surface and the second surface is a target surface. The passivation layer is disposed on the target surface. And one side of the passivation layer away from the semiconductor substrate is provided with a plurality of tower footing-like texture structures which are recessed towards the passivation layer. Wherein each tower footing-like texture structure is defined by a polygon-like bottom surface and side surfaces. In the same tower footing-like texture structure, at least one corner of the polygon-like bottom surface is provided with a plurality of protrusions climbing in the extension direction of the side ridge, and the protrusions on the same corner are provided with fluctuating shapes extending in the direction parallel to the polygon-like bottom surface.

The invention provides a composite manufacturing method for improving the integrity of the side face of a 316L part manufactured through selective laser melting additive manufacturing. The composite manufacturing method comprises the following steps that S1, selective laser melting additive manufacturing is conducted on the part; in this step, each layer is divided into a boundary region and a core region, and differentiated scanning strategies are implemented. Specifically, the boundary area adopts a scanning strategy of parallel section contour lines, and the core area adopts a conventional strip or chessboard type scanning strategy, so that the surface quality is optimized; and S2, ultrasonic surface deep rolling post-treatment is conducted on the side face of the part. The method is characterized in that through the combination of partition scanning and post-treatment, the excellent surface integrity, including high surface hardness, high corrosion resistance and low surface roughness, of the side face of the additive manufacturing 316L stainless steel part is achieved. Particularly, the surface roughness reaches the precision grinding level, meanwhile, the thin-wall part manufactured through the method shows extremely high strength and plasticity at the same time, and therefore the requirement for high-performance application is met.

The invention discloses a processing method of a silicon carbide wafer, which comprises the following steps: carrying out rapid processing, grinding and polishing on the wafer by adopting an annular polishing machine to obtain sub-nanometer level surface roughness; the surface of the wafer is uniformly polished by adopting magneto-rheological polishing, and tiny deep pits on the surface after annular polishing are eliminated or broadened. In order to solve the problems of long processing period, difficulty in processing quality control and the like of the traditional single crystal SiC wafer, the invention provides a novel method for combining magneto-rheological polishing and the traditional polishing technology. According to the invention, the magneto-rheological polishing liquid suitable for polishing the single-crystal SiC is developed, and the single-crystal SiC wafer subjected to ring polishing processing is actually processed, so that the magneto-rheological polishing technology is proved to be capable of eliminating or widening wafer surface defects (such as pocks and pits) on the premise of ensuring the quality of the polished surface, and eliminating the subsurface damage of the wafer. And finally, in combination with a traditional polishing technology, high-precision and high-quality processing of the wafer is realized.

The invention discloses a preparation method of an ultra-smooth nanocrystalline tungsten coating on the surface of an emitter, the tungsten coating is prepared by adopting a magnetron sputtering method, and the specific process is as follows: pretreating an emitter workpiece, then placing the emitter workpiece in a vacuum chamber, pre-vacuumizing, then introducing inert gas, cleaning the surface of the emitter workpiece by utilizing gas ion reverse sputtering, and finally removing the surface of the emitter workpiece. And then adjusting the gas pressure, bombarding and cleaning the surface of the emitter workpiece by using metal ions, and finally sputtering and depositing to form the tungsten coating. The tungsten coating is prepared through the magnetron sputtering technology, the tungsten coating has the characteristics of being compact in structure, good in combination and uniform and smooth in surface, the mechanical property and structural stability of the tungsten coating in the high-temperature service environment can be guaranteed, the deposition technology is simple, the preparation efficiency is high, and the tungsten coating is green and free of pollution, in addition, preparation of the tungsten coating composed of different phases can be achieved, and the application prospect is wide. The application requirements in the fields of electronic industry, nuclear industry and the like are met.

The utility model discloses a back contact cell and a photovoltaic assembly, and the back contact cell comprises a silicon substrate which is provided with a front surface and a back surface which are opposite to each other; the first doped crystalline silicon region and the second doped crystalline silicon region are both arranged on the back surface of the silicon substrate, and a first surface, far away from the silicon substrate, of the first doped crystalline silicon region and a second surface, far away from the silicon substrate, of the second doped crystalline silicon region are both polished surfaces; the isolation groove is used for separating the first doped crystalline silicon region from the second doped crystalline silicon region, the bottom of the isolation groove is provided with a pyramid-like first suede structure, and the distribution density of spire of the pyramid-like structure is 25 / 100 square micrometers to 80 / 100 square micrometers; and the back surface of the silicon substrate comprises overlapping areas corresponding to the first doped crystal silicon area and the second doped crystal silicon area, and the overlapping areas are polished surfaces. In the embodiment of the utility model, the flatness of the first surface and the second surface is high, the surface roughness is low, passivation is facilitated, and the passivation effect of a polished surface is obviously higher than that of a suede surface.

A megasonic auxiliary polishing device for a large-diameter gallium antimonide wafer relates to the technical field of wafer surface polishing and comprises a wafer carrier head, a polishing disc and a megasonic generator. The polishing solution containing device is arranged above the megasonic generator, a high-frequency oscillation signal sent by the megasonic generator is converted into high-frequency mechanical oscillation to be transmitted into the polishing solution, an agglomerated colloidal solution formed by an abrasive part in the polishing solution is scattered, aggregation of nanoscale micelles is inhibited, and then the uniform distribution of the polishing solution colloidal solution on the polishing disc is promoted. The consistency of the roughness of the surface of the wafer in the polishing process is high; the polishing disc is in a circular ring shape, the wafer carrying heads are evenly distributed on the circumference of the polishing disc, the portion, between the adjacent wafer carrying heads, of the polishing disc is provided with a washing cover, washing pipes are evenly arranged in the washing cover, and liquid discharged from the lower ends of the washing pipes washes the polishing disc to wash away scraps on the surface of the polishing disc. And an adverse influence factor on the polishing quality of the wafer is reduced by one, so that the controllability of the polishing quality is improved.

The invention provides a thermal environment barrier coating for a small-thickness ceramic matrix composite as well as a preparation method and application of the thermal environment barrier coating, and belongs to the field of high-temperature protective coating materials, and the thermal environment barrier coating can sequentially comprise a Si-HfO2-X bonding layer with the thickness of 20-40 microns, a Yb2Si2O7 environmental barrier layer with the thickness of 30-50 microns and a (RE1mRE21-m) 2Zr2O7 thermal barrier surface layer with the thickness of 40-60 microns from a matrix to the outside. The bonding layer and the environmental barrier layer are prepared mainly by adopting an atmospheric plasma spraying technology, and the thermal barrier surface layer is prepared by adopting an electron beam physical vapor deposition technology. The small-thickness thermal environment barrier coating disclosed by the invention has excellent corrosion resistance and relatively high bonding strength, and is expected to reduce the weight of a part and reduce the influence of the coating on the throat area of the part while guaranteeing the service life of the ceramic-based composite material hot end part.

The application provides a ceria / yttria composite stabilized zirconia grinding medium and a preparation method. The method comprises the following steps: step one, mixing zirconia, ceria, yttria and kaolin, and then adding an appropriate amount of dispersant and water to obtain a slurry; step two, performing centrifugal spray drying on the slurry to obtain ceria / yttria composite stabilized zirconia powder; step three, adding the ceria / yttria composite stabilized zirconia powder into a binder, and then rolling to form a green body of spherical grinding medium; and step four, sintering and polishing the green body of spherical grinding medium to obtain the ceria / yttria composite stabilized zirconia grinding medium. The method can obtain low particle size and high specific surface area through high-temperature ball milling, and can also promote the solid solution of the stabilizer into the zirconia crystal lattice through heat treatment, so as to improve sintering activity, reduce sintering temperature and reduce production cost.

The invention discloses a preparation method of a standardized sheet for a thermoelectric test of minerals or mineral materials and alloys, belongs to the technical field of mineralogy, material science and prospecting prediction, and establishes a preparation process of a universal mineral or mineral material and alloy thermoelectric sheet. Covering all semiconductor mineral types or mineral material types such as pyrite, magnetite, graphite and sintered ore; accurate thickness control is achieved through a double-face polishing-loading sheet supporting structure, in-situ testing of the thermoelectricity of minerals or mineral materials and alloys is achieved, and the testing precision is improved; by adopting a conductive adhesive-copper plate composite structure, the interface resistance is reduced, the supporting strength is met, and the requirement of eliminating detection interference is met; residual colloid is thoroughly removed through ultrasonic cleaning, and the insulation effect is avoided; according to the standardized sheet, the hollow aminated phenolic resin nanosphere is used as a conductive substrate and is used for bonding a sample and a copper plate, the contact resistance between the sample and an electrode can be greatly reduced, and the accuracy of test data is improved.

The utility model relates to the technical field of papermaking mesh production, and discloses a drying device for monofilament papermaking mesh production, which comprises a shell, a cavity is arranged in the middle of an inner cavity of the shell, a motor is fixedly mounted on the rear portion of the inner cavity of the cavity, and a rotating handle is fixedly connected onto an output shaft of the motor through a coupler. The front portion of the rotating handle is movably connected with a traction rod through a shaft, the bottom end of the traction rod is movably connected with a lifting rod through a shaft, the lifting rod is movably connected with the bottom of an inner cavity of the cavity in a sleeved mode, a connecting block is fixedly installed at the bottom end of the lifting rod, and the bottom of the connecting block is movably connected with a stretching roller through a shaft. The stretching roller is driven by the motor to stretch and shake the monofilament papermaking mesh, material shrinkage stress is counteracted, mesh hole blockage and deformation caused by monofilament winding or adhesion are avoided, surface roughness or protrusions are reduced through mesh piece tensioning, the flatness requirement is met, water in the material is migrated through shaking, the water content is reduced, and therefore the needed drying time is shortened. The device working efficiency is improved.

This utility model discloses an external cylindrical grinding device, including a base, a workpiece driving mechanism, and a grinding mechanism. The grinding mechanism includes a crank mechanism, a guide rail, and a grinding block. A slider is slidably mounted on the guide rail, and the slider is connected to the crank mechanism, which drives the slider to slide along the guide rail. A vertical groove is formed on the upper side of the slider, and the grinding block is slidably mounted in the groove. A spring is provided between the grinding block and the bottom of the groove. Under the action of the spring, the upper end of the grinding block can extend out of the groove to fit tightly against the surface of the workpiece to be ground. This utility model, by employing a grinding device with a certain degree of elasticity, can adapt to different types of shaft workpieces to be ground, has good versatility, and during secondary processing, the grinding block can always be tightly fitted against the surface of the workpiece under the action of the spring, avoiding the impact of workpiece jump during secondary clamping on the original shape and position accuracy.

The invention belongs to the technical field of material science and engineering, and relates to a method for preparing a high-orientation high-reflectivity graphene film through vapor pressure assisted stretching reduction, and the method comprises the following steps: carrying out isotropic stretching and vapor treatment on a graphene oxide film at the same time, namely heating a mixed solution of a hydrogen iodide aqueous solution and ethanol until the mixed solution is vaporized, and carrying out heat preservation at 90-120 DEG C for 6-24 hours, the volume ratio of the hydrogen iodide aqueous solution to the ethanol is 1: (2-5). According to the method, the graphene film is subjected to isotropic tensile stress in the reduction process, so that wrinkles and ripples generated by thermal fluctuation and interlayer spacing change are effectively eliminated, and the flatness of the graphene sheet layer is improved.

The invention relates to a cable flexible joint surface layer finishing device and a surface layer finishing method, a main body part is provided with a containing space, the containing space is used for containing a target object, a rolling part is movably assembled on the main body part, the rolling part is provided with a rolling surface, and the rolling surface of the rolling part is used for being in rolling contact with the surface layer of the target object in the containing space. Therefore, rolling pressure is applied to the surface layer of the target object. On the basis of the synergistic effect of temperature and pressure, the adhesive force between semiconductive particles generated by polishing and a shielding layer of a recovery conductor can be enhanced, migration of semiconductive powder scraps in the extrusion molding process of an insulating material can be effectively reduced, the risk that the semiconductive powder scraps are mixed into an insulating layer is reduced, and meanwhile the surface roughness is effectively reduced on the premise that the forming period is remarkably shortened. The temperature field acts on the outer surface of the recovered conductor shielding layer in the circumferential direction, the size details of the recovered conductor shielding layer can be reserved, and meanwhile roughness caused by polishing is reduced. Due to the design of a plurality of circumferential roller type rolling parts, the problem that a joint line is formed at a parting surface of a traditional mold is solved.

The invention relates to the technical field of PET copper foil preparation, in particular to a method for preparing a PET copper foil through an ionic liquid additive photo-reduction method. The method comprises the following steps: performing surface cleaning treatment on a PET film to obtain a pretreated PET film; the pretreated PET film is subjected to micro roughening treatment, and the PET film subjected to micro roughening treatment is obtained; the PET film subjected to micro roughening treatment is placed in a photoreduction solution, the PET copper foil is obtained after illumination, washing and drying, and the photoreduction solution is composed of copper sulfate pentahydrate, an ionic liquid additive, ethyl alcohol and a photoinitiator. According to the preparation method, the PET copper foil can be prepared in an environment-friendly and stable manner by using the ionic liquid additive to carry out the photo-reduction method, and the prepared PET copper foil has relatively high tensile strength and ductility and also has relatively low surface roughness.

A problem to be addressed by the present invention is to enable a plating layer having excellent surface smoothness to be formed without compromising the various excellent properties inherent in polyphenylene sulfide resins, and to provide a plated molding which is excellent in adhesiveness of the plating layer and ensures high plating quality even in severe environmental degradation tests such as thermal shock cycle tests as well as a method of producing thereof. To solve the above problem, a main object of the present invention is to provide plated molding having a plating layer formed on a part or all of the surface of the molding that is molded with a polyphenylene sulfide resin composition including 30 to 200 parts by weight of a fibrous filler (B) based on 100 parts by weight of a polyphenylene sulfide resin (A), wherein an arithmetic mean roughness of the surface of the plating layer of the plated molding is 1.5 µm or less.

The utility model discloses a polishing mechanism for blade support welding, and relates to the technical field of blade support polishing, the polishing mechanism comprises a workbench and a first slide rail, the first slide rail is arranged on the top of the workbench, a supporting strip is arranged in the first slide rail, and two ends of the top of the supporting strip are provided with turnover motors; a plurality of supporting blocks are further arranged at the tops of the supporting strips, rotating shafts are arranged at the output ends of the two overturning motors, the two rotating shafts are rotationally connected to the interiors of the supporting blocks, placing grooves are formed in one sides of the two rotating shafts, a conveying assembly is arranged at the top of the workbench, and a moving assembly is arranged on the conveying assembly. Through the moving assembly, the effect of driving the blade support to reciprocate on the grinding roller is achieved, it is ensured that the grinding roller can make full contact with all the surfaces of the blade support, abrasive particles can also evenly act on the whole surface of the blade support, the surface roughness is effectively reduced, and the smoother and smoother surface is obtained.

The application discloses a batch preparation method of a silicon diamond infrared composite material and the silicon diamond infrared composite material, and the method comprises the following steps: taking a nano-diamond suspension as a crystal seed, and performing spin coating on a plurality of silicon substrates at 200-400 r / min for 10-30 s, and then performing high-speed spin coating, wherein the spin coating liquid is a diamond suspension; adopting an HFCVD method to deposit a diamond film on one side of the plurality of silicon substrates; the process parameters of the HFCVD method comprise that the distance between hot wires is 10-15 mm, the distance between the hot wires and the silicon substrates is 8-12 mm, and the temperature of the hot wires is 1000-1200 DEG C; and the diamond film is deposited on the other side of the plurality of silicon substrates. The method can batch-prepared diamond films with high antireflection performance and low surface roughness, realizes simultaneous processing of the plurality of silicon substrates in a single deposition, and greatly reduces equipment investment and preparation cost.

The present invention discloses an oxide target material, an oxide film, and a preparation method and application thereof. The oxide target material of the present invention contains In2O3, SnO2 and ZnO, wherein, in terms of atomic molar ratio, In:Sn:Zn=9.7711:(A+N):N; wherein, 0<N<4.386, 0.3<A≤1.2, and the density of the oxide target material is greater than 99%. The oxide target material of the present invention has high density, uniform color, and will not form nodules after continuous use. The oxide film prepared by using the oxide target material of the present invention has low surface roughness, good conductivity and light transmittance, and has wide application value.

This invention belongs to the field of transparent conductive film technology, specifically relating to a flexible transparent conductive film with ordered silver nanowires and its preparation method. The preparation method includes the following steps: preparing AgNW conductive ink; coating a first layer of silver nanowires onto a substrate surface, and drying the resulting monolayer silver nanowire wet film; coating a second layer of silver nanowires onto the surface of the monolayer silver nanowire film along a coating direction perpendicular to the first coating; drying the resulting bilayer orthogonal silver nanowire wet film and then cold rolling it to obtain a flexible transparent conductive film with ordered silver nanowires. This flexible transparent conductive film with silver nanowires exhibits high light transmittance, low sheet resistance, and low surface roughness.

The invention provides a glass cover plate, a processing method, a flexible display screen assembly and foldable electronic equipment. The processing method of the glass cover plate provided by the embodiment of the invention comprises the following steps: providing a glass substrate, wherein the glass substrate is provided with a to-be-treated edge part; carrying out numerical control processing on the to-be-processed edge part of the glass substrate; and carrying out numerical control polishing on the to-be-processed edge part of the glass substrate subjected to numerical control processing. According to the processing method of the glass cover plate, provided by the embodiment of the invention, the edge part of the glass cover plate has relatively low roughness and relatively good mechanical strength.

The utility model relates to the technical field of circuit board processing, and provides an aluminum substrate producing and processing device which comprises a numerical control cutter changing and milling mechanism, a diamond coating milling cutter and an aluminum substrate, the numerical control tool changing and milling mechanism comprises a rack, a three-coordinate moving assembly, a supporting base, a servo motor, a main shaft, a milling cutter automatic clamp, a workpiece positioning assembly, an MCU and a timer. The diamond coating milling cutter is fixedly arranged on the milling cutter automatic clamp; the aluminum substrate is fixedly arranged on the workpiece positioning assembly. The diamond coating milling cutter has the advantages that the diamond coating milling cutter has the characteristic of low friction coefficient, the milling heat is effectively reduced when the diamond coating milling cutter is used for milling an aluminum substrate, alcohol does not need to be sprayed to cool the milling cutter in the production process, the single milling working time of the milling cutter is prolonged, and the production efficiency is improved. The numerical control tool changing milling mechanism regularly changes the diamond coating milling cutter, prevents the diamond coating milling cutter from accumulating excessive heat, prolongs the service life of the milling cutter, reduces the labor amount of workers, and improves the production efficiency.

The invention relates to the technical field of fibers, in particular to a modified polylactic acid chopped fiber suitable for spunlace non-woven fabric and a manufacturing method of the modified polylactic acid chopped fiber. The modified polylactic acid chopped fiber comprises 90 to 95 wt% of polylactic acid, 5 to 8 wt% of epoxy grafted polylactic acid, 1 to 2 wt% of polyphosphate, 0.2 to 0.5 wt% of an external lubricant, 0.1 to 0.2 wt% of a heat stabilizer and 0.3 to 0.4 wt% of an anti-hydrolysis agent. According to the invention, the heat stability of the polylactic acid is improved, the thermal degradation of the polylactic acid in the melting processing heat process is inhibited, the viscosity of the polylactic acid melt tends to be consistent, the spinning stability is improved, and the consistency of the fiber diameter is ensured; the hygrothermal aging performance of the polylactic acid is improved. The crystallinity of the polylactic acid in the spinning process is reduced, but the tensile strength of the polylactic acid is still kept.

The invention relates to a preparation method of a metal cluster-based infrared electroluminescent device, and belongs to the field of electronic device manufacturing. The preparation method comprises the following steps: taking methylbenzene containing Me2SAuCl, adding 4-tBuPhC = CH and Et3N, stirring, adding Cu (MeCN) 4BF4 powder, adding an ethanol solution of new BH3.tBuNH2, reacting, stirring and rotationally evaporating the mixture to obtain a solid, dissolving the solid in a mixture of dichloromethane and methylbenzene, centrifuging, filtering precipitate, collecting filtrate, standing and crystallizing to obtain dark red blocky crystal Au16Cu6, and then adding a main body material composed of mCP and PO-T2T, and preparing through a spin coating and evaporation process. The method has the advantages that the metal nanocluster Au16Cu6 and the host materials mCP and PO-T2T are utilized to construct a host-guest material system for preparing the metal cluster infrared LED, and the introduction of the host materials improves the electrical parameters of the device and ensures the smoothness of the cluster film.

The application discloses a kind of surface micro-arc oxidation dense ceramic film aluminum alloy and its preparation method.After annealing treatment of aluminum alloy base material, it is in turn treated by oil and grease removal, micro-arc oxidation and drying, and obtained;The conditions of the annealing treatment are as follows: temperature is 200-300 DEG C, time is 50-80 min;The conditions of the micro-arc oxidation are as follows: current density is 8-10 A / dm 2 , time is 15-20 min;The method forms dense ceramic film on the surface of alloy base material through the synergistic effect of annealing and maintenance oxidation, which can effectively improve the comprehensive performance of the material;The aluminum alloy obtained by the technical scheme of the application has excellent corrosion resistance and wear resistance, and solves the corrosion problem of aluminum alloy welding structure in high temperature, high humidity and high salt mist environment.

The application discloses a kind of food-grade silica gel triple-sealed high-precision bearings, it is related to bearing technical field, including bearing inner ring, bearing outer ring and the sealing ring of being installed in the inner side of bearing outer ring, the outer raceway both sides of bearing inner ring are equipped with one straight angle sealing groove with the cross section of 90 ° at two ends of shoulder or baffle respectively;The sealing ring includes metal framework and food-grade silica gel rubber coating integrally formed on the metal framework;The food-grade silica gel rubber coating extends towards the inner side of bearing inner ring and forms integrated three sealing lips, including two radial sealing lips with the contact of two radial side walls of the straight angle sealing groove, and one axial sealing lip with the contact of the axial bottom surface of the straight angle sealing groove.The application has the beneficial effects of material safety, no pollution, excellent sealing performance, high processing efficiency, the processing cycle is shortened by more than 40%, the leakage rate is reduced by more than 95%, and has wide application value.

The invention discloses a steel ball surface polishing device for steel ball production, and relates to the technical field of steel ball surface polishing. A mounting structure is fixedly connected to the middle of the upper end face of the bottom plate, a storage structure is arranged in an inner cavity of the mounting structure, a limiting structure is fixedly connected to the upper portion of the rear end face of the storage structure, a driving structure is rotatably connected to the upper end face of a lifting structure, and an adjusting structure is located below the limiting structure and located on the upper portion of the front end face of the storage structure. Through the lifting structure on the upper end face of the bottom plate, the driving structure is installed and placed in the using process, then the inclination angle of the storage structure is adjusted through rotation of a threaded rod, and the effects of adopting the automatic technology, conducting batch polishing, improving the production efficiency, reducing the labor cost and keeping the consistency of the polishing quality in the using process are achieved. And rolling polishing is carried out through the storage structure, so that the cleanliness and brightness of the surfaces of the steel balls are consistent, the polishing yield of the steel balls is improved, and environmental pollution caused by use of chemical polishing traditional Chinese medicines is avoided.