548results about "Grinding devices" patented technology

The cBN resin superhard grinding wheel is prepared from the following raw materials in percentage by mass: 30 to 45 percent of cBN grinding material, 1 to 3 percent of nano yttrium oxide, 2 to 3 percent of nano zirconium oxide, 2 to 4 percent of coupling agent, 1 to 3 percent of silicon dioxide compound and the balance of phenolic resin. The phenolic resin matrix is jointly modified by the nano yttrium oxide, the nano zirconium oxide and the specific silicon dioxide compound, and the prepared grinding wheel has good wear resistance, hardness and temperature resistance.

The invention relates to a photoetching ordered microcosmic fixed abrasive polishing pad and a preparation method thereof. Compared with the prior art, the method has the advantages that the to-be-photoetched surface of the substrate is photoetched according to the photoetched pattern, so that the plurality of microscopic grinding columns are orderly distributed and formed on the grinding material base according to the preset distribution and arrangement mode, the distribution shape, direction and position of the microscopic grinding columns on the grinding material base are kept unchanged, and regular distribution and uniform distribution can be presented; the distribution and the size of the micro grinding columns can be adjusted according to the photoetching pattern to meet different polishing requirements, then the micro grinding columns of the substrate are compositely filled with the filling body to keep the stability of the micro grinding columns, and the polishing pad can be suitable for the micro level to meet the requirement of the manufacturing procedure below 5nm, so that the production efficiency is improved, and the production cost is reduced. The microcosmic grinding columns are formed through photoetching to replace traditional grinding particles, the chemical stability of the polishing pad during polishing is improved, the removal rate is increased, the surface roughness is reduced, and the polishing effect of the polishing pad on a polishing product is improved.

The invention relates to a high-hydrophilicity CMP hard polishing pad, a preparation method and application thereof, the polishing pad comprises a polishing layer, a fitting layer and a buffer layer, the polishing layer is formed by mixing and pouring a component A and a component B, the component A comprises polyisocyanate, polyol, a foaming agent and a hydrophilic modifier, and the component B is an amine curing agent. The carboxylate is added into the polishing layer to serve as a hydrophilic modifier, and after dissociation, the carboxylate is combined with polar groups in a polyurethane molecular chain through coordinate bonds or ionic bonds to form a stable bonding structure, so that the carboxylate is attached to a main chain of the polyurethane molecular chain, and the overall hydrophilicity of the polyurethane structure is improved. According to the method, the surface energy and surface characteristics of the polishing pad can be changed fundamentally, the introduced hydrophilic auxiliary agent cannot reduce the mechanical property of an original formula, and the constant hydrophilicity is maintained during the polishing service life of the polishing pad.

The present invention relates to diamond abrasive grains and a manufacturing method thereof, and provides tetradecahedral diamond abrasive grains with uniform size and shape. The manufacturing method of diamond abrasive grains according to the present invention allows for shape control and minimizes impurities and crystal defects, thereby manufacturing diamond abrasive grains for ultra-precision grinding in chemical mechanical planarization (CMP) processes.

The invention discloses a double-layer foaming porous polishing pad as well as a preparation method and application thereof, and relates to a double-layer pore structure chemical mechanical polishing pad, the upper part of a polishing layer of the polishing pad is provided with closely distributed finger-shaped pores, the average inner diameter is 0.17-0.25 mm, and the pore wall thickness of the finger-shaped pores is 15-20 microns; the lower part of the polishing layer is a sponge hole layer, and the average inner diameter of the sponge hole layer is 5-10 microns; the main body structure of the polishing layer is prepared from coating slurry comprising polyurethane resin, polyvinyl chloride resin and ethyl acetate in a coagulating bath through a non-solvent phase inversion method. The rebound rate of the polishing pad can be effectively improved by controlling the relative thickness of the double-layer holes of the polishing layer, the abrasion resistance of the polishing pad is remarkably improved through resin blending, the service life is prolonged, meanwhile, the hardness of the polishing layer is moderate, and product defects are effectively reduced. The polishing pad has excellent wear resistance and moderate hardness, the service life is remarkably prolonged, particle defects in the polishing process are reduced, and the polishing pad is suitable for a high-precision polishing process.

The invention discloses a preparation method of an abrasive tool, and belongs to the technical field of abrasive tools, and the preparation method comprises the following steps: S1, arranging abrasive particles on a forming surface of a mold at fixed points according to preset arrangement points; s2, a glue layer is arranged on the working face of the base body, the working face of the base body is pressed on the forming face of the mold, and the abrasive particles make contact with the working face of the base body and are bonded to the working face of the base body; s3, after pressing is completed, the base body and the mold are separated, and curing treatment is conducted on the glue layer of the base body; and S4, metallurgical bonding is conducted on the base body and the abrasive particles, and a finished abrasive tool is obtained. The abrasive particles are positioned on the mold firstly, then the mold is pressed by the base body provided with the glue layer, and after pressing is completed, the base body and the mold are separated and are not solidified on the base body together, so that the mold is not consumed while ordered arrangement of the abrasive is achieved, the time for removing the mold in the later period is omitted, and the arrangement efficiency is improved.

A system for forming an abrasive article is presented. The system includes a workspace and an abrasive material dispenser that deposits a layer of abrasive material onto the workspace. The system also includes a leveler that levels a surface of abrasive material on the workspace. The system also includes a binder jet printer that dispenses a liquid binder onto the layer of abrasive material. The workspace is on a moving surface that moves the workspace between a dispensing position under the dispenser, a leveling position under the leveler, and a printing position, under the printer.

An environment-friendly polishing disc is manufactured by a processing technology that includes: preparing a table, drying oven, cutting tools, upper and lower molds, polishing powder, a batching barrel, and a polyurethane synthetic resin comprising HC8968 and HC8552; cutting a polyester-fiber upper backsheet and a lower backsheet to match the mold profile; batching the polishing powder with the polyurethane resin and uniformly mixing with a vibrator; pouring the mixture into the lower mold over the lower backsheet, scraping the surface, overlaying the upper backsheet, and clamping with the upper mold; sequentially drying the clamped assembly at about 45° C. for about 230 min, about 92° C. for about 230 min, and about 60° C. for about 450 min; and removing the molds to form the disc. An optional central notch may be provided. The process reduces external polishing consumables and supports uniform soft-layer formation.

1. A chemical mechanical polishing pad comprising: a polishing portion including a polymer body; a plurality of polymer particles embedded within a body of the polymer body, at least a portion of the plurality of polymer particles being at least partially exposed at a surface of the polymer body; and a plurality of pores in a surface of the polymer body.

The utility model provides a centering device for grinding head production, relates to the technical field of grinding head production, and solves the problems that a grinding head rod can not be accurately inserted into a grinding head when the existing ceramic grinding head is produced, and the subsequent processing and the product quality are influenced. The grinding head clamp is arranged on a grinding head rotary table and used for clamping a grinding head body, the L-shaped motor frame is arranged on one side of the grinding head rotary table, a centering motor is installed on the motor frame, and the output end of the centering motor is fixedly connected with one end of an air cylinder seat. A pneumatic clamping jaw assembly used for clamping a grinding head rod is installed at the other end of the air cylinder base and comprises a first centering clamping jaw and a second centering clamping jaw. The tool has the advantages that the inserted grinding head rod can be centered in the grinding head rod groove of the grinding head, the installation accuracy of the grinding head rod is guaranteed, the product quality is improved, and the tool is simple in structure and easy to achieve.

The utility model provides a feeding device for grinding head production, relates to the technical field of grinding head production, and solves the problems that during production of existing ceramic grinding heads, the feeding process is uncertain, feeding is not in place easily, and follow-up machining is affected. The device comprises a discharging pipeline, a grinding head translation assembly arranged on one side of a discharging port of the discharging pipeline and used for driving a grinding head to translate to a grinding head clamp of a follow-up process, and a grinding head limiting assembly arranged above the discharging port of the discharging pipeline and used for pressing the follow-up grinding head. And the grinding head pushing assembly is arranged on one side of the grinding head limiting assembly and used for pushing the grinding head on the grinding head translation assembly into the grinding head clamp. The grinding head feeding device has the advantages of being capable of achieving feeding of grinding heads in order, stable in feeding, good in effect, high in efficiency, simple in overall structure, easy to achieve and low in cost.

An abrasive article comprises abrasive particles secured to a substrate by at least one binder material. The at least one binder material comprises a cured reaction product of components comprising: a) at least one phenolic resin; and b) an aqueous dispersion of at least one polyurethane, wherein, based on the total solids weight of components a) and b), the components comprise 56 to 91 percent by weight of component a) and 44 to 9 percent by weight of component b). Methods of making and using the abrasive articles are also disclosed.

The utility model provides a novel tray for manufacturing a grinding wheel, which comprises a tray body placed on a track and a placing hole arranged on the tray body, a support plate is arranged in the placing hole, and a mold is arranged on the support plate. The groove is formed in the end face of the inner side of the placing hole; the rollers are arranged in the grooves, connected with pin shafts and fixed to the tray through the pin shafts, the diameter of the containing holes is smaller than the diameter of the upper end edge of the mold and larger than the diameter of the lower end of the mold, the bottom of the mold is in contact connection with the upper end face of the supporting plate, and the grooves are of an annular structure and are concave towards the inner side of the tray. A groove is formed in the lower portion of the die, a space is formed, the roller is placed in the groove, and the outer side circle of the roller is exposed out of the groove and is in contact connection with the outer side face of the lower portion of the die, and the die has the advantages that materials can be leveled, friction force is reduced, and the die can rotate stably.

An abrasive article comprises: a substrate comprising strands forming first void spaces between strands; a laminate joined to the substrate, wherein the laminate comprises a surface opposite to the substrate; a resin composition joined to the surface of the laminate. First and second portions of the surface of the laminate have respective first and second surface free energies that are different. Another abrasive article comprises: a substrate comprising strands forming first void spaces between strands; a laminate joined to the substrate, wherein the laminate comprises a first polymer and a second polymer; a resin composition joined to the laminate; In both embodiments, abrasive particles are joined to the resin composition, and a plurality of second void spaces extends through the laminate coinciding with first void spaces in the porous substrate. A method of making abrasive articles is also disclosed.

The invention belongs to the technical field of grinding wheels, and particularly relates to an AMOLED display glass edging grinding wheel binding agent, an edging grinding wheel and a preparation method of the edging grinding wheel. The grinding wheel binding agent comprises, by mass, 50-60 parts of a Cu-Sn alloy metal phase, 20-30 parts of a hydrogenated butadiene-acrylonitrile rubber nano rubber phase, 5-10 parts of nano aluminum oxide reinforcing filler, 3-5 parts of a molybdenum disulfide lubricant and 2-3 parts of a titanium hydride sintering aid. The invention further provides a formula and a preparation method of the grinding wheel. According to the method, the defects of an existing process are overcome, a nano rubber phase of hydrogenated nitrile rubber is combined with a Cu-Sn alloy metal phase, a flexible composite binding agent with flexible buffering and rigid supporting functions is formed, and the effects of buffering grinding vibration and reducing edge cracking are achieved.

The invention discloses a preparation method of a composite stacked abrasive grinding wheel for thinning a silicon carbide wafer, which comprises the following steps: uniformly mixing a diamond abrasive, a soft abrasive and a first ceramic bond according to a first mass ratio to obtain a mixed dry material; uniformly mixing the mixed dry material with a thickening agent, a dispersing agent and purified water according to a second mass ratio to obtain slurry; continuously and uniformly mixing the slurry, granulating, drying and sintering to obtain a composite stacked abrasive material; preparing a forming material based on the composite stacked abrasive, a second ceramic bond, a pore forming agent and a wetting agent; carrying out cold press molding on the molding material and then carrying out vacuum sintering to obtain the grinding wheel grinding block; and the composite stacked abrasive grinding wheel can be obtained by adhering the grinding wheel grinding block to the grinding wheel base body. The composite stacking abrasive grinding wheel prepared according to the method is better in self-sharpening performance and lower in machining energy consumption, the grinding machining stability is improved, and meanwhile the quality of a machined wafer is improved.

The invention discloses an accurate grinding diamond resin grinding wheel and a forming method thereof, and belongs to the technical field of grinding wheel machining and forming, and equipment adopted by the forming method comprises a mold and a fixing cylinder, and further comprises a driving mechanism. According to the three-section type material filling device, three-section type material filling is adopted through cooperation of the first lifting groove, the second lifting groove, the rotating groove and the ball shaft, and after half of the material is filled, the material surface is automatically flattened through the detection rollers, and the flatness is automatically detected; the moving distances of the piston rings and the conductive contact pieces are close to each other until the adjacent conductive contact pieces are close to each other and make contact with each other, so that a complete loop is formed, and the gauze element is automatically laid through rotation of the rotating rod. Compared with a traditional technology, the device adopts synchronous operation of material laying and leveling, the flatness can be automatically detected, and the gauze element can be laid; manual operation and processing steps are reduced, and the production efficiency and the product quality are improved.

The utility model provides a combined resin coated abrasive tool, which relates to the technical field of resin coated abrasive tool processing and comprises a processing table, two fixing frames are fixedly mounted at the top of the processing table, positive and negative motors are fixedly mounted at the tops of the two fixing frames, and driving rods are fixedly mounted on one sides of the outer walls of the two positive and negative motors. And the outer surface walls of the two driving rods are fixedly sleeved with gears. According to the stirring device disclosed by the utility model, the two forward and reverse motors are simultaneously started through the controller to drive the two driving rods and the two gears to rotate, so that the two tooth rows and the strip-shaped plate can be driven to move up and down, and the driving motors, the stirring rods and the plurality of stirring blades are further driven to move up and down, so that the stirring track of the plurality of stirring blades to a mixture is changed; the combined resin coated abrasive tool raw materials can be stirred more sufficiently, the stirring effect is improved, it is guaranteed that slurry with certain viscosity and fluidity is prepared, and the production quality of the combined resin coated abrasive tool is improved.

The invention relates to the field of grinding wheel production and machining, and provides an abrasive material flattening mechanism and grinding wheel production equipment. The grinding material paving mechanism comprises a mold and a slicking assembly; the mold is used for containing the abrasive and the gridding cloth which are alternately laid in a stacked mode. The strickling assembly comprises a strickling execution unit and a strickling driving unit; the scraping execution unit comprises a scraping plate, a conveying roller and a conveying driving module; the bottom surface of the scraping plate is horizontally arranged, the scraping plate is connected with the slicking driving unit, and the slicking driving unit is used for driving the scraping plate to rotate; the conveying roller is horizontally and rotationally arranged on the scraper blade; the conveying driving module is connected with the conveying rollers and used for driving the conveying rollers to rotate. The problems that the scraping efficiency and the scraping effect of the grinding material are poor are solved.

The application discloses a reinforcing method for high-speed worm grinding wheel, which comprises the following steps: 1) a worm grinding wheel blank is prepared by using a dynamic balance forming technology, and the worm grinding wheel blank is dried and sintered; 2) a ceramic binder sol is prepared; 3) the ceramic binder sol prepared in the step 2) is uniformly impregnated around a central hole of the worm grinding wheel prepared in the step 1), and the worm grinding wheel for gear grinding is obtained after sintering. The worm grinding wheel prepared by the method has a static unbalance weight of less than or equal to 10 g, and the use linear speed of the worm grinding wheel can reach 80 m / s to 100 m / s through the impregnation reinforcement of the ceramic binder sol, so that the method has the advantages of simple production process, high grinding efficiency and high grinding precision.

The invention provides a cutting tool and a manufacturing method of the cutting tool. The cutting tool comprises a cutting edge part located on the outer edge and a fixing part located in the center. The blade part comprises a binding agent and abrasive particles, the binding agent binds and fixes the abrasive particles embedded in the binding agent to form a grinding layer, and the grinding layer is used for cutting a part to be cut; the fixing part comprises a fiber structure and a binding agent, the fiber structure is added into the binding agent, the fiber structure and the binding agent are combined to form the fixing part, and the fixing part is used for fixing the cutting tool on the cutting equipment. According to the cutting tool, the cutting edge part and the fixing part are made of different materials, the cutting edge part comprises the binding agent and the abrasive particles, and the abrasive particles are embedded and fixed into the binding agent; the fixing part is formed by combining the fiber structure and the binding agent, the fiber structure is added into the binding agent and fixed, the overall stability of the cutting tool is improved, and deflection or distortion of the cutting tool in the cutting process can be effectively avoided.

This invention belongs to the field of polyurethane materials technology, and relates to an organic piezoelectric polyurethane polishing pad and its preparation method. Preparation method: In the preparation of the polyurethane polishing pad, before the reaction of polyether polyol and isocyanate, PVDF fibers are added to the polyether polyol in batches, and stirred until the PVDF fibers are uniformly dispersed in the polyether polyol. The resulting polyurethane polishing pad is the organic piezoelectric polyurethane polishing pad. The prepared organic piezoelectric polyurethane polishing pad includes a polyurethane matrix and PVDF fibers. The polyurethane matrix has a porous structure, and the PVDF fibers are distributed in the polyurethane matrix in a network structure. The method of this invention is simple, and the obtained organic piezoelectric polyurethane polishing pad has good polishing effect and polishing efficiency.

To provide a polishing pad which reduces the size of debris while maintaining various physical properties and performance of the polishing pad in excellent states by adjusting a chlorine content to be within a specific range, and can minimize generation of defects and scratches in a CMP process.SOLUTION: A polishing pad includes a polishing layer and a support layer, wherein the polishing layer contains a urethane-based prepolymer, a foaming agent and a curing agent, and a chlorine (Cl) content obtained by analyzing the polishing layer on the basis of IEC 62321-3-2 standard is 10,000 ppm or less.SELECTED DRAWING: Figure 1

The invention discloses a rapid grinding wheel for urban rail transit steel rails and a preparation method thereof, and belongs to the technical field of grinding wheels. The grinding wheel comprises a rotating shaft, a bearing, a grinding wheel base body and a grinding body. The rotating shaft is mounted on the bearing; the bearing is installed in the grinding wheel base body, the base body is embedded in the grinding body, and the bonding strength of the base body and the grinding body is improved through grooves and protrusions on the base body. The grinding body can be used for steel rail grinding, and the main effective grinding material is fused alumina zirconia. The steel rail grinding wheel disclosed by the invention is simple and reasonable in preparation process and short in period, has the characteristics of high strength, impact resistance, good high-temperature deformation resistance, good self-sharpening property and environmental protection and small pollution in the working process, can provide a longer and sharper cutting edge, and meets the requirements of high cutting efficiency, good wear resistance and long service life of the steel rail grinding wheel.

The invention discloses a preparation method of ultra-soft coating abrasive cloth, and particularly relates to the technical field of abrasive cloth preparation, the preparation method comprises the following steps: S1, pretreatment of a base material; s2, primer coating is carried out; s3, electrostatic sand planting; s4, coating and curing surface glue; s5, preparing and curing a multifunctional coating; and S6, carrying out finished product post-treatment. According to the invention, through targeted modification of the pure polyester gray fabric, the adhesive force of the coating is greatly improved while the super-soft fitting property is maintained; by means of the sand planting technology, both coarse grinding materials and fine grinding materials can achieve high and uniform sand planting density, so that the excellent cutting efficiency is obtained, meanwhile, the nanometer aluminum oxide enhanced surface glue is combined, the grinding material falling-off rate is extremely low, and the product durability is greatly improved; through a compound coating of nano silicon dioxide, magnesium hydroxide and polytetrafluoroethylene micro powder, the functions of high temperature resistance, high flame retardance and blockage resistance are synchronously achieved, and the problems that a traditional product is single in performance and limited in scene are solved.

The invention provides a polishing pad for a silicon wafer fine polishing process as well as a preparation method and application of the polishing pad. The polishing pad comprises a porous polyurethane skin layer and an elastic impregnation layer, the elastic impregnated layer is a non-woven fabric impregnated and cured with polyurethane; the porous polyurethane skin layer is formed on the elastic impregnated layer by adopting polyurethane slurry through wet film forming and has a pore structure extending from the surface to the elastic impregnated layer, the pore diameter of an opening in the surface of the skin layer is 40-80 [mu] m, the side wall of the pore is provided with a microporous channel for a polishing solution to pass through, and the size of the microporous channel is 0.1-10 [mu] m. According to the product, the storage amount of the polishing solution is increased in the silicon wafer fine polishing process, so that the pressure distribution is more uniform in the polishing process, the polishing solution distribution efficiency is improved, and scratches are avoided while the polishing rate is ensured.

This invention discloses a three-dimensional ordered abrasive grain arrangement device, method, and additive manufacturing equipment, belonging to the field of high-performance abrasive tool manufacturing technology for semiconductors, stone, ceramics, and optical crystal materials. The device comprises three main parts: an abrasive grain arranger, a feeding mechanism, and a transfer mechanism. The abrasive grain arranger achieves ordered arrangement through negative pressure adsorption; the feeding mechanism employs a circular roller design to achieve continuous feeding of diamond abrasive grains; and the transfer mechanism achieves precise transfer of diamond abrasive grains through the cooperation of an electric cylinder and a lifting platform. This invention effectively solves the problems of scattered and uneven abrasive grain distribution leading to rapid tool wear and poor processing quality in traditional diamond abrasive tool manufacturing. Combining this device with laser additive manufacturing (SLM) equipment can achieve additive manufacturing with ordered abrasive grain agglomeration, significantly improving the sharpness, cooling characteristics, grinding performance, wear resistance, and service life of diamond abrasive tools.

A method for providing abrasive grains (CG1, CG2, CG3, CG4) comprises: - providing first input material (FEED1), which comprises abrasive grains (G0) adhered to a combustible substrate (BASE0), and - separating the abrasive grains (G0) from the substrate (BASE0) by at least partly combusting the substrate (BASE0) in a fluidized bed (BED1).