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990 results about "Abrasive" patented technology

An abrasive is a material, often a mineral, that is used to shape or finish a workpiece through rubbing which leads to part of the workpiece being worn away by friction. While finishing a material often means polishing it to gain a smooth, reflective surface, the process can also involve roughening as in satin, matte or beaded finishes. In short, the ceramics which are used to cut, grind and polish other softer materials are known as abrasives.

Gradient gradient powder material as well as preparation method and application thereof

The invention discloses a gradient gradual change type powder material as well as a preparation method and application thereof. The gradient gradual change type powder material comprises a non-metal core, a transition layer, a gradual change layer and a modification layer. The gradient powder material provided by the invention shows excellent strength-ductility synergistic effect, high fracture toughness and enhanced fatigue, wear and corrosion resistance, is good in metal wettability, can effectively reinforce a metal matrix and improve the performance of the metal matrix, can also be well dispersed in resin, and can be applied to the field of metal materials. The gradient powder material disclosed by the invention has a wide application prospect, and can be applied to the fields of heat dissipation of electronic devices, high-speed cutting tools, grinding material and grinding tool materials, high-temperature protection materials and the like.
Owner:HUNAN XINJUNENG TECHNOLOGY CO LTD

Device for testing functional coating of microcrystalline glass of induction cooker

The invention relates to the technical field of coating testing devices, and particularly discloses an induction cooker glass ceramic functional coating testing device which comprises a base and a detection box located on the base, a detection cavity is formed in the detection box, a testing table is arranged in the detection cavity, and the testing table comprises a testing execution mechanism and a testing placement seat; the test execution mechanism comprises a friction disc, an electromagnetic coil is arranged in the friction disc, and a groove which is spirally distributed is formed in the bottom of the friction disc; the test placement seat comprises a loading table of which the middle of the top is provided with a to-be-tested coating panel in a position corresponding to the friction disc, the periphery of the top of the loading table is provided with a convex check ring, the upper part of the convex check ring is provided with a nozzle corresponding to the to-be-tested coating panel, and the nozzle is communicated with a storage tank arranged at the bottom of the loading table through a pressurizing pipeline; a magnetorheological abrasive is stored in the storage tank; the device has the advantages of high test precision and real test simulation.
Owner:SICHUAN LEADING GLASS CERAMIC TECH CO LTD

High-consistency cutter passivation process and device based on flexible abrasive auxiliary force rheological polishing

The invention discloses a high-consistency cutter passivation process and device based on flexible abrasive auxiliary force rheological polishing, and relates to the technical field of cutter passivation. The process comprises the following steps: step 1, preparing a gradient grinding material; step 2, programmable fiber flow control; 3, multi-stage gradient machining; and 4, intelligent closed-loop control. The device comprises a gradient abrasive material preparation module, a programmable fiber flow control device, a multi-degree-of-freedom machining platform, an intelligent monitoring module, a polishing solution circulation module and a protection module. Through the three-stage abrasive grain grading and programmable fiber flow control technology, magnetic particles and an external magnetic field do not need to be relied on, the agglomeration state of the polishing solution is directly damaged through fiber vibration, the fluid flow speed of a complex cutting edge area is increased, abrasive grain distribution uniformity is improved, laser confocal real-time monitoring and PID algorithm dynamic adjustment are combined, the precision is remarkably improved, and the polishing effect is good. And the method is particularly suitable for precise passivation of superhard cutters such as PCD cutters and the like.
Owner:ZHEJIANG LANGCHAO PRECISION MACHINERY

Efficient precise metal material laser cutting machining device

The invention belongs to the technical field of laser cutting, and particularly relates to an efficient precise metal material laser cutting machining device which comprises a bottom plate, a conveying device, an infrared sensor and a workpiece to be machined which is fixedly mounted at the top of the bottom plate and is internally conveyed through two groups of conveying belts. Through cooperative work of a moving mechanism and an inner supporting mechanism, a stepping motor is used for precisely controlling a threaded clamping rod to rotate, a movable block drives a connecting rod to stably clamp the two ends of a to-be-machined workpiece, meanwhile, the inner supporting mechanism enables a second movable plate to expand outwards through lead screw transmission, a silica gel layer is tightly attached to the inner wall, and it is ensured that the workpiece is stably positioned before cutting; the cutting mechanism flexibly adjusts the position of an arc-shaped semi-circle plate through a guide rail I, and is combined with linkage of a stepping motor and a driving motor, so that a laser head accurately moves along the periphery of the workpiece to be machined, and efficient cutting is realized; and the auxiliary mechanism is matched with the grinding mechanism, the position of the cutting piece is automatically adjusted, a material grinding plate is used for grinding, the production efficiency is effectively improved, and manual intervention is reduced.
Owner:LUBEI TECHNICIAN COLLEGE (BINZHOU AVIATION SECONDARY VOCATIONAL SCHOOL BINZHOU ENTREPRENEURSHIP UNIV BINZHOU ENTREPRENEURSHIP INCUBATION CENT)

Cosmetic glass bottle surface polishing method and system

The invention discloses a cosmetic glass bottle surface polishing method and system, and the method comprises the steps: carrying out gradient mesh abrasive composite modification on a sand leather base material, and carrying out three-dimensional cutting according to the surface curve contour of a glass bottle through a laser cutting technology to form a composite sand leather polishing piece; the composite sand leather grinding piece is assembled at the executing end of a six-axis linkage mechanical arm, partition differentiated grinding is carried out according to the surface pollutant distribution density image recognition result, and a glass bottle rough blank obtained after preliminary grinding is obtained; performing synchronous purging on the surface of the glass bottle rough blank by adopting inert gas flow with a micro-bubble generation device, and controlling the composite sand leather polishing piece to perform micro-vibration at the same time, so as to obtain a glass bottle semi-finished blank; and the glass bottle semi-finished blank is placed in a sealed cavity to be sprayed, final polishing is carried out in cooperation with pulse type ultrasonic vibration, and a cosmetic glass bottle finished product is obtained. According to the embodiment of the invention, high-precision grinding of the curved surface of the glass bottle can be realized, and the surface cleanliness and the gloss uniformity are improved.
Owner:ZHEJIANG MEIYI PACKAGING TECH CO LTD

Grinding fluid as well as preparation method and application thereof

The invention provides a grinding fluid, the grinding fluid comprises a base fluid, a grinding material, nano-diamond and a dispersion stabilizer, the base fluid comprises polyether and silicone oil, the grinding material comprises surface modified silicon carbide particles, and the dispersion stabilizer comprises polyethylene glycol stearate and polyvinylpyrrolidone. The surface roughness of a grinding piece can be reduced, the scratch density and microcracks of the surface are reduced, damage of grinding fluid to the grinding piece is reduced or even avoided, and the service life of a cutter can be prolonged. The invention also provides a preparation method of the grinding fluid and a process method using the grinding fluid.
Owner:湖南德智新材料股份有限公司

Anti-clogging ceramic sandpaper and preparation method thereof

The present invention relates to the field of coated abrasive technology, specifically to anti-clogging ceramic sandpaper and its preparation method. The technical key features are as follows: from bottom to top, it comprises: latex paper, a base glue, abrasive, a double glue, and an anti-clogging coating. The anti-clogging coating is prepared from the following components, calculated by weight: 30-50 parts aqueous emulsion, 10-15 parts graded filler, 3-5 parts dispersant, 2-3 parts water-soluble curing agent, and 60-70 parts water. The graded filler is ceramic corundum particles with the following gradation: particle size R < 250nm, 1-3%; 250≤R < 350nm, 65-75%; 350nm≤R < 450nm, 15-19%; 450≤R < 550nm, 3-5%. The anti-clogging ceramic sandpaper and its preparation method provided by the present invention significantly enhance the anti-clogging effect of the anti-clogging coating while effectively improving the sharpness and self-sharpening properties of the sandpaper surface.
Owner:NANTONG FENGMANG COMPOSITE MATERIAL TECH CO LTD

Gallium nitride polishing method

The invention relates to the technical field of polishing, and particularly discloses a gallium nitride polishing method. The gallium nitride polishing method provided by the invention comprises the following steps: sequentially carrying out first-time polishing treatment and second-time polishing treatment on gallium nitride by using a first polishing solution, a first polishing pad, a second polishing solution and a second polishing pad to obtain polished gallium nitride. According to the method, the GaN surface is polished twice, the grinding material of the polishing solution and the type hardness trend of the polishing pad during the first polishing and the second polishing are limited, on the premise that the polishing rate is increased and the roughness of the GaN surface is reduced, the problem that micro cracks and internal cracks appear on the GaN surface after the GaN surface is treated through an existing polishing process is solved, and the quality of the GaN surface is improved. And the surface quality and the product percent of pass of GaN are greatly improved.
Owner:BEIJING SEMICORE MICROELECTRONICS EQUIPMENT CO LTD

Photoetching ordered microcosmic consolidation abrasive polishing pad and preparation method thereof

The invention relates to a photoetching ordered microcosmic fixed abrasive polishing pad and a preparation method thereof. Compared with the prior art, the method has the advantages that the to-be-photoetched surface of the substrate is photoetched according to the photoetched pattern, so that the plurality of microscopic grinding columns are orderly distributed and formed on the grinding material base according to the preset distribution and arrangement mode, the distribution shape, direction and position of the microscopic grinding columns on the grinding material base are kept unchanged, and regular distribution and uniform distribution can be presented; the distribution and the size of the micro grinding columns can be adjusted according to the photoetching pattern to meet different polishing requirements, then the micro grinding columns of the substrate are compositely filled with the filling body to keep the stability of the micro grinding columns, and the polishing pad can be suitable for the micro level to meet the requirement of the manufacturing procedure below 5nm, so that the production efficiency is improved, and the production cost is reduced. The microcosmic grinding columns are formed through photoetching to replace traditional grinding particles, the chemical stability of the polishing pad during polishing is improved, the removal rate is increased, the surface roughness is reduced, and the polishing effect of the polishing pad on a polishing product is improved.
Owner:SHANGHAI XINQIAN INTEGRATED CIRCUIT CO LTD

Complex curved surface self-adaptive abrasive jet strengthening method and system

The invention relates to a self-adaptive abrasive jet strengthening method and system for a complex curved surface. The method comprises the steps that a three-dimensional point cloud data set of a workpiece is acquired; analyzing the three-dimensional point cloud data set to obtain a first principal component vector; a section plane is set, an intersection line of the section plane and the three-dimensional point cloud data set is calculated based on the first principal component vector, and the intersection line is an initial path; a normal vector of each discrete point on the initial path is calculated, calculation is carried out based on the normal vectors and the custom viewpoints, newest unit outer normal vectors of the discrete points are obtained, and the newest unit outer normal vectors are all perpendicular to the complex curved surface on the workpiece; and calculating corresponding actual position coordinates of the nozzle relative to each discrete point based on the unit outer normal vectors of the discrete points, and forming a continuous strengthening path based on the actual position coordinates. According to the method and the device, the deviation between the CAD model and the real object can be eliminated, the strengthening path planning of the nozzle has the curved surface self-adaptive capability, and the jet flow energy distribution is uniform.
Owner:EAST CHINA JIAOTONG UNIVERSITY

Grinding process and grinding machine

In a grinding method for grinding a substantially planar workpiece surface of a workpiece, a grinding machine is used which has a grinding wheel with an abrasive side surface, wherein the grinding wheel can be rotated about a rotational axis by means of a rotational drive and can be fed by means of a feed drive in a feed direction oriented parallel to the rotational axis.To carry out a grinding operation, the workpiece is arranged in a working position, the grinding wheel is set in rotation about the axis of rotation, the abrasive side surface is brought into contact with the workpiece surface by feeding the grinding wheel; and the grinding wheel is fed from a starting position with workpiece contact to generate material removal according to a feed function. The feed of the grinding wheel takes place according to a workpiece-specific feed function depending on a material proportion curve, whereby the material proportion curve represents a distribution of workpiece material in a surface profile depending on a cutting depth measured parallel to the feed direction.
Owner:NAGEL TECHNOLOGIES GMBH

Agglomerated ceramic abrasive and preparation method thereof

The invention relates to an agglomerated ceramic abrasive which is prepared from the following raw materials in percentage by weight: 25-30% of a ceramic bond, 65-70% of diamond micro-powder, 1-3% of titanium powder, 2.5-5% of nitrate, 0.3-0.5% of nickel sulfate and 1-3% of aluminum zirconate, and is prepared by the following steps: adding water into the raw materials, uniformly mixing, and grinding; and then carrying out spray granulation, impurity drying and sintering to obtain the agglomerated ceramic abrasive material. Compared with a common ceramic bond diamond agglomerated abrasive material, the agglomerated ceramic abrasive material prepared by the method has the advantages of high hardness, uniform particle distribution, good grinding performance and the like. When the agglomerated ceramic abrasive is used for polishing marble tiles, no obvious scratches appear on the surfaces of the tiles, the surface consistency is good, and the polishing efficiency of the marble tiles is high.
Owner:青岛瑞克尔新材料科技有限公司

Grinding surface quality prediction method based on fixed abrasive grinding pad with specific geometric structure

The invention provides a grinding surface quality prediction method based on a fixed abrasive grinding pad with a specific geometric structure, and belongs to the technical field of high-end equipment precision machining.The grinding surface quality prediction method comprises the steps that geometric structure parameters of the fixed abrasive grinding pad are obtained, and the geometric structure parameters comprise groove structure parameters and abrasive particle pattern distribution parameters; according to the groove structure parameters, flow field simulation is conducted, and first uniformity parameters representing the chip removal capacity in the grinding process are obtained; according to the abrasive particle pattern distribution parameters, track field simulation is carried out, and second uniformity parameters representing abrasive particle motion tracks are obtained; and comprehensively evaluating the quality of the grinding surface according to the first uniformity parameter and the second uniformity parameter.
Owner:KUNMING UNIV OF SCI & TECH

Ultrasonic-piezoelectric-photocatalysis assisted chemical mechanical polishing method and device

The invention belongs to the related field of ultra-precision polishing technology, and discloses an ultrasound-piezoelectricity-photocatalysis assisted chemical mechanical polishing method which comprises the following steps: mixing a basic polishing abrasive, a piezoelectric material and a photocatalyst, calcining and grinding, and processing to obtain a modified abrasive; preparing a polishing solution containing a piezoelectric catalysis carrier and a photocatalysis carrier at the same time; the polishing process is completed through a chain of mechanical stress, a piezoelectric electric field, efficient carrier separation and more active species participating in reaction. The invention further discloses a matched polishing device. Compared with the prior art, the method has the advantages that the material removal rate can be effectively increased, the polishing time can be effectively shortened, the surface quality can be further improved, the subsurface damage can be reduced, in addition, a more environment-friendly polishing solution can be used, the waste liquid treatment cost is reduced, the environment is protected, and the method is suitable for industrial production. Therefore, the polishing device is especially suitable for various high-hardness materials to realize the polishing application occasions of low-damage and ultra-smooth surfaces of the high-hardness materials.
Owner:HUAZHONG UNIV OF SCI & TECH

Surfactant mixing and ball-milling device for preparing silicon nitride ceramic substrate

The utility model is applicable to the technical field of silicon nitride ceramic substrate preparation, and provides a surfactant mixing and ball-milling device for silicon nitride ceramic substrate preparation, which comprises a ball mill, a feeding component and a driving component, the ball mill comprises a support arranged horizontally, a hollow circular ball milling barrel and a machine cover arranged in the horizontal direction. The feeding assembly is arranged at the top of the ball milling barrel and is used for injecting milling balls and grinding materials into the ball mill; the driving assembly is arranged at the end, away from the ball milling barrel, of the support and used for providing power for ball milling of the ball mill. The device solves the problems that when powder of a silicon nitride ceramic substrate is prepared in a ball milling mode, a ball mill is prone to being damaged due to the fact that the falling speed of grinding media (steel balls and ceramic balls) is too high, and powder is prone to being splashed due to the fact that the grinding media fall to hit the powder. The purpose of ensuring that the powder and the grinding medium smoothly enter the ball mill through the feeding assembly is achieved.
Owner:NANTONG XIAYUE SEMICONDUCTOR TECHNOLOGY CO LTD

Preparation method of mixed ceramic corundum abrasive

The invention belongs to the field of abrasive material preparation, and particularly relates to a preparation method of a mixed ceramic corundum abrasive material, which is characterized by comprising the following steps: 1) putting alumina powder into a ball milling tank, adding water with the same mass as the alumina powder, and carrying out ball milling until the particle size of powder d50 is 8-12 microns to obtain slurry A; (2) mixing boehmite powder, phosphoric acid with the mass concentration of 20-30% and water according to the mass ratio of 1: 4.5: 4.5, and stirring to a sol state to obtain slurry B, the particle size of particles d50 in the slurry B being less than 1 mu m; 3) mixing the slurry A, the slurry B and white corundum particles with d50 particle size of 25-35 [mu] m according to a mass ratio of 2.8-3.2: 4.5-5.5: 3, adding a shrinkage binder and a sintering aid, mixing again, and drying the mixed slurry in a drying chamber at 80 DEG C. 4) calcining to obtain a blocky abrasive material, and 5) crushing and grading The method has the advantages of simple process, less equipment investment, low production cost, good microcosmic compactness and high density of the abrasive material.
Owner:淄博四砂泰益研磨有限公司 +1

Diamond electroplating grinding wheel with directionally-arranged magnetic field and preparation method and application of diamond electroplating grinding wheel

The invention belongs to the technical field of grinding materials and grinding tools, and particularly relates to a diamond electroplated grinding wheel directionally arranged in a magnetic field and a preparation method and application thereof. Firstly, electroplating liquid is added into an electroplating bath, then 30%-40% of magnetic diamond abrasive materials are added into the electroplating liquid, directional magnetic sanding is carried out with the grinding wheel base body A as a cathode and a nickel plate as an anode, the magnetic field intensity is controlled to be 0.1-1 T, the cathode current density is controlled to be 0.4 A / dm < 2 >-0.6 A / dm < 2 >, the electroplating time is 10-20 min, and a grinding wheel base body B is obtained; removing floating sand from the grinding wheel base body B to obtain a grinding wheel base body C; and the grinding wheel base body C is thickened to obtain a grinding wheel base body D, and the grinding wheel base body D is modified to obtain the grinding wheel. The grinding rate of the manufactured grinding wheel is reduced by 10%-25%, the service life is prolonged by 30%-50%, the machined surface roughness (Ra) can reach 0.3 micrometer or below, and the machined surface precision is reduced by 10%-25%. The grinding wheel is applied to nanoscale grinding of optical glass, sapphire and silicon carbide wafers and forming machining of turbine blade mortises and ceramic matrix composites, and the precision and roughness of the grinding wheel can be effectively guaranteed.
Owner:BAIGE ABRASIVES CO LTD

Efficient grinding fluid for MPO connector as well as preparation method and application of efficient grinding fluid

PendingCN121293940AOther chemical processesLapping machinesPerfluoropolyetherEthylene-maleic anhydride copolymer
The invention relates to the technical field of grinding fluid, in particular to efficient grinding fluid for an MPO connector, a preparation method and application of the efficient grinding fluid for the MPO connector. 27%-44% of alpha-aluminum oxide; 8%-15% of a styrene-maleic anhydride copolymer; 2%-5% of a modified polyurea solution; 0.05% to 0.3% of perfluoropolyether; 0.5%-2% of citric acid; 0.5%-1.5% of a polyether modified polysiloxane defoaming agent; by adopting a composite abrasive material system of the nano-diamond and the alpha-aluminum oxide, the grinding efficiency and the surface quality are improved in a breakthrough manner.
Owner:NANJING JINRUI LIFENG HARD MATERIAL TECH CO LTD

Numerical control abrasive belt polishing device

The utility model discloses a numerical control abrasive belt polishing device, and relates to the technical field of metal polishing, the numerical control abrasive belt polishing device comprises a bottom plate and an abrasive belt body, a metal piece is clamped in an auxiliary cavity, two polishing rollers are attached to one side of the metal piece, the metal piece is arranged below an L-shaped adjusting plate, and the metal piece is arranged between two side plates. Through the arrangement of the two polishing rollers, the L-shaped adjusting plate and the two side plates, a metal piece is placed in the auxiliary cavity, then the guiding effect on the metal piece can be achieved, the phenomenon that the metal piece deviates during polishing can be avoided, the metal piece is placed between the two polishing rollers, then the blocking effect on the metal piece can be achieved, and therefore the metal piece can be effectively polished. According to the metal part polishing device, the inclination phenomenon of a metal part can be prevented, the grinding and polishing quality of the metal part is effectively improved, a protection structure composed of the L-shaped adjusting plate and the side plates encloses a polishing area, sparks generated in the polishing process can be prevented from splashing all around, and safety accidents are effectively avoided.
Owner:GUANGZHOU DEHENG METAL PROD CO LTD

A hybrid abrasive system and method for immersion microfluidic machining of RB-SiC ceramic microstructures.

A mixed abrasive synergistic enhancement immersion microjet processing system and method for RB-SiC ceramic microstructures is characterized by: the micro-abrasive air jet nozzle is driven by an active rack and driven gear, and one end is connected to a precision sandblasting machine containing micron-sized abrasive particles; its output end is immersed in a slurry tank containing submicron / nano-sized abrasive particles; the micro-abrasive air jet nozzle ejects a gas-solid two-phase flow and generates a large number of microbubbles; the driving effect of the microbubbles effectively mixes the submicron / nano-sized abrasive particles in the slurry tank with the gas-solid two-phase flow ejected by the micro-abrasive air jet nozzle, thereby obtaining a mixed abrasive synergistic enhancement immersion microjet; the waste liquid passes through a primary filter particle recovery outlet, a secondary filter particle recovery outlet, and a tertiary filter particle recovery outlet in real time, where the micron-sized abrasive particles and erosion debris are screened, dried, and classified for collection, ultimately achieving efficient and high-quality processing of RB-SiC ceramic microstructures.
Owner:SHANDONG UNIV OF TECH

Inner circle surface cluster magnetic jet polishing device and method

The invention discloses an inner circle surface cluster magnetic jet polishing device and method, and belongs to the technical field of polishing equipment.The magneto-rheological polishing and jet polishing are combined, that is, magneto-rheological polishing liquid is jetted out of a liquid outlet of a cluster magnetic jet polishing head at a high speed under the high-pressure effect, efficient jet rough polishing is conducted on the inner circle surface of a workpiece, and the inner circle surface is polished. And meanwhile, under the action of the magnetic field, the magnetorheological polishing liquid is converted into a magnetorheological polishing pad and a flexible clamping abrasive for secondary fine polishing, so that the problems of workpiece deformation and poor surface quality easily caused by traditional honing and polishing are solved, the defect of low efficiency of single magnetorheological polishing is overcome, and the polishing efficiency and the surface quality are improved. Besides, the device can adapt to workpieces with different diameters by replacing cluster magnetic jet polishing heads and workpiece discs with different sizes, and the machining requirements of the workpieces made of different materials are met by matching with adjustable polishing liquid pressure, flow and rotating speed parameters; due to the expanded double-station design, the machining efficiency is improved, and the machining requirements of high-quality inner circle surface parts are met.
Owner:NANCHANG HANGKONG UNIVERSITY

Rotary floor buffing pad with agitator insert

A floor cleaning / refurbishment pad that includes a support layer, the support layer having a central region and an outer peripheral edge defining an outer support layer dimension, a loft material layer overlaying the support material layer and connected thereto, the loft material composed of at least one loft material and the microfiber loft material layer having a height HL and an outwardly facing surface and an agitator / abrasive strip overlaying a portion of the support material layer and connected thereto, the agitator strip having a height HA and an outwardly facing surface.
Owner:TUWAY AMERICAN GROUP INC

Terrace machine non-standard abrasive grinding track uniformity evaluation method based on discrete coefficient

The invention provides a method for judging the grinding track uniformity of a non-standard grinding tool of a floor machine based on a discrete coefficient, which comprises the following steps of: observing the morphological characteristics of abrasive particles on the surface of the non-standard grinding tool to obtain characterization parameters of the abrasive particles, and simulating the randomness of the quantity of the abrasive particles with different particle sizes on the surface of the abrasive material through a distribution theory to obtain the uniformity of the grinding track of the non-standard grinding tool. Calculating the number of abrasive particles with different particle sizes so as to establish an abrasive surface abrasive particle distribution model; according to a motion transmission structure of the floor machine, a grinding disc kinematics model is established, a grinding track equation of a grinding disc is deduced, and therefore a grinding track curve of all grinding particles is drawn; and grid division is carried out on the ground area, and the average value of the number of track points of a grid, the standard deviation of track uniformity and the discrete coefficient CV of the track uniformity are calculated so as to judge the uniformity of the track in the whole area. The method can be used for judging the uniformity of the grinding track of the non-standard grinding material, and a reasonable basis is provided for kinematics design of a grinding disc of a floor machine.
Owner:FUZHOU UNIV +1

Composite abrasive part, application, preparation method and machining tool

The invention provides a composite abrasive part, application, a preparation method and a processing machine tool, the composite abrasive part can be used for inner hole processing and grinding wheel processing, and the composite abrasive part is formed by mixing and pressing multi-granularity composite abrasive particles and a metal-resin binding agent. According to the multi-granularity composite abrasive particles, small-granularity particles are used for filling gaps among large-granularity particles, so that the number of effective abrasive particles participating in material removal on the surface of an abrasive layer is increased, the material removal depth of a single abrasive particle is reduced, and the surface roughness is improved; the composite grinding material piece comprises a rigidity grinding and polishing composite section, and the rigidity grinding and polishing composite section comprises rigidity grinding areas and flexible polishing areas which are sequentially and alternately combined in the axial direction or the circumferential direction of the composite grinding material piece, so that the material removal process is discretized, the possibility of generating machining cracks is reduced, and efficient mirror surface machining is achieved.
Owner:XIAMEN UNIV

Manufacturing method of high-uniformity grinding wheel easy to sharpen and grind single crystal diamond cutter

The invention discloses a manufacturing method of a grinding wheel for a high-uniformity and easy-to-sharpen grinding single crystal diamond cutter, and belongs to the field of superhard materials and products in machining, the manufacturing method mainly comprises the steps of wet mixing, tape casting, laser cutting, lamination, matrix surface treatment, integrated sintering, size processing, sharpening and the like, and finally the grinding wheel with the total thickness of an abrasive layer being 7-15 mm is formed. The grinding wheel layer is formed by intersecting and laminating a piece a and a piece b, the height of diamonds at the junction of the piece a and the piece b tends to be consistent, the diamond exposure height and smoothness are better compared with direct feeding sintering, meanwhile, the piece a can be designed to be of a porous structure through proper binder selection, and therefore the dressing efficiency is further improved, and the dressing effect is better. And higher processing quality and efficiency of the diamond cutter are indirectly improved.
Owner:ZHENGZHOU RES INST FOR ABRASIVES & GRINDING CO LTD

Composite abrasive material polishing tool for surface treatment of drill rod of ultra-deep well and use method of composite abrasive material polishing tool

The invention relates to the technical field of drill rod surface composite abrasive polishing, and discloses a composite abrasive polishing tool for ultra-deep well drill rod surface treatment and a using method.The composite abrasive polishing tool comprises a platform, two bases are symmetrically and fixedly connected to the bottom end of the platform, and grooves are formed in the connecting positions of the outer sides of the two bases and the platform; two supporting pieces are symmetrically arranged on the upper portion of the platform, the two supporting pieces can oppositely slide on the upper portion of the platform and support the inner wall of the drill rod, and polishing pieces are connected to the two sides of the platform in the extending direction of the platform in a sliding mode. The inner walls of drill rods of different sizes can be positioned through the supporting piece, the drill rods of different specifications can be conveniently positioned, grinding operation is conducted in cooperation with the polishing piece, and the grinding efficiency of the drill rods can be effectively improved; and under the action of the grinding belt formed by mixing the composite grinding materials, the drill rod grinding device can adapt to grinding of drill rods with different diameters, and after single-time grinding operation is completed, the drill rod can be rotated under the cooperation of the polishing piece, so that all-directional grinding of the drill rod is achieved.
Owner:JIANGSU SHUGUANG HUAYANG DRILLING TOOL

Tools for chemical planarization

Examples are disclosed that relate to planarizing substrates without use of an abrasive. One example provides a method of chemically planarizing a substrate, the method comprising introducing an abrasive-free planarization solution onto a porous pad, contacting the substrate with the porous pad while moving the porous pad and substrate relative to one another such that higher portions of the substrate contact the porous pad and lower portions of the substrate do not contact the porous pad, and removing material from the higher portions of the substrate via contact with the porous pad to reduce a height of the higher portions of the substrate relative to the lower portions of the substrate. In some examples, linear motion may be used for chemically planarizing.
Owner:CHEMPOWER CORP

Measuring abrasive flow rates in a conduit

The present disclosure relates to abrasive material delivery systems for liquid jet cutting systems. The abrasive material delivery systems can include a valve configured to adjust an inflow of abrasive material into the abrasive material delivery system from a source of abrasive material. The systems can include a chamber downstream of the valve and configured to receive the inflow of abrasive material from the valve. The systems can include a metering component configured to control an outflow of abrasive from the chamber to a cutting head of the liquid jet cutting system. In some embodiments, the systems include a sensor configured to monitor movement of a top surface of a portion of abrasive material within the chamber as the top surface moves through the chamber; and a processing device operably connected to the sensor and configured to determine an abrasive flow rate through the metering component based on a speed of the top surface as monitored by the sensor.
Owner:HYPERTHERM INC

Single-layer core-shell structure polishing abrasive for silicon carbide wafer polishing, polishing solution, preparation method and polishing method

The invention provides a single-layer core-shell structure polishing abrasive for silicon carbide wafer polishing, a polishing solution, a preparation method and a polishing method, and relates to the technical field of chemical mechanical polishing, the single-layer core-shell structure polishing abrasive takes silicon dioxide with the particle size of 300-800 nm as an inner core and aluminum oxide with the particle size of 10-150 nm as an outer shell, the particle size ratio of the inner core to the outer shell is 2: 1-10: 1, and the polishing solution is prepared from silicon dioxide with the particle size of 300-800 nm and aluminum oxide with the particle size of 10-150 nm. And single-layer coating is realized through cationic polyelectrolyte assisted electrostatic adsorption. The polishing solution comprises the following components in parts by weight: 3-15 parts of a polishing abrasive with a single-layer core-shell structure, 0.2-8 parts of an oxidizing agent, 0.1-8 parts of a dispersing agent and the balance of deionized water, and the pH value is adjusted to 8-11. The hardness of the inner core abrasive material of the prepared polishing abrasive material with the core-shell structure is smaller than that of the outer shell abrasive material, the polishing abrasive material with the core-shell structure has high dispersity and low agglomeration rate, in the final polishing process of SiC wafers, the surface roughness Ra smaller than or equal to 0.15 nm can be obtained, meanwhile, the material removal rate is kept to be larger than or equal to 1500 nm / h, the scratch density is remarkably reduced, and the polishing abrasive material is suitable for batch finish machining of high-end power device substrates.
Owner:DALIAN UNIV OF TECH

Magnetorheological abrasive flow nano-finishing (RR-MRAFNF) machine

An apparatus and a polishing system for rotational magnetorheological abrasive flow nano-finishing are described. The apparatus includes an upper cylinder with coupled upper piston and a lower cylinder with coupled lower piston. A first motor drives synchronized reciprocating motion of both pistons via respective slider crank mechanisms. A magnet fixture positioned between the cylinders includes permanent magnets arranged in a ring configuration with a central hole for workpiece placement. A second motor rotates the magnet fixture to manipulate magnetic field orientation. The cylinders, pistons and magnet fixture define a space for containing magnetorheological (MR) fluid including ferromagnetic particles, abrasive particles and carrier fluid. The configuration enables controlled fluid flow through the hole while maintaining direct workpiece contact, with ferromagnetic particles exhibiting both rotational and reciprocal movement patterns. This dual-motion finishing approach enables material removal through magnetic field-controlled abrasive action, achieving nano-scale surface quality on complex geometries.
Owner:IMAM MOHAMMAD IBN SAUD ISLAMIC UNIV