94results about How to "Improve polishing efficiency" patented technology

The utility model discloses an automatic feeding mechanism for air cylinder polishing, and belongs to the field of air cylinder polishing feeding. An automatic feeding mechanism for air cylinder polishing comprises a support, guide rails are arranged on the two sides of the top of the support, a clamping mechanism is installed on a sliding block installed on the guide rails in a sliding mode, the clamping mechanism comprises a third air cylinder installed on one side of the top of the sliding block, and the output end of the third air cylinder is connected with an L-shaped connecting plate; the bottom of the side face of the section, axially parallel to the third air cylinder, of the connecting plate is connected with a third mounting plate through bolts, and a second air cylinder is fixedly mounted on one side of the third mounting plate. Through the guide rails arranged on the two sides of the top of the support and the clamping mechanisms on the guide rails, after the air cylinder is clamped through the clamping mechanisms, the air cylinder is driven by the guide rails to move, the feeding speed is increased conveniently, the polishing efficiency is improved, high stability is achieved after clamping, clamping does not need to be conducted again, and polishing is more convenient and faster.

The utility model discloses a bar surface smoothness polishing mould frame, which relates to the technical field of bar processing, and comprises a fixed base, the rear side of the upper end of the fixed base is fixedly connected with an inner side fixed frame, the upper ends of the two sides of the inner side fixed frame are fixedly connected with turnover frames, a turnover driving shaft is rotatably arranged between the turnover frames on the two sides, and the turnover driving shaft is fixedly connected with the inner side fixed frame. An indexing driver is fixedly installed on the outer side of the overturning frame on one side, an output shaft of the indexing driver penetrates through the overturning frames and then is fixedly connected with an overturning driving shaft, and bars are continuously fed into the bar clamping notches in the upper side through conveying equipment and then overturned. After being ground, the workpiece directly falls into the roll-out roller set on the lower side to be conveyed to corresponding conveying equipment to be conveyed out, continuous polishing machining can be carried out, the structure is simple, design is reasonable, operation is convenient and fast, the problem that lathe resources are occupied for a long time in a traditional polishing method can be effectively solved, normal use of other equipment is not affected, and the production efficiency is greatly improved.

This disclosure provides a polishing pad and a final polishing apparatus. The polishing pad includes: a substrate; and a deformable unit disposed on the substrate. The deformable unit is capable of switching the polishing pad between a first shape mode and a second shape mode by deformation. In the first shape mode, the polishing surface of the polishing pad has grooves, and in the second shape mode, the polishing surface of the polishing pad is flat.

This invention belongs to the field of material surface treatment technology, specifically relating to a wafer polishing slurry, its preparation method, and its application. The wafer polishing slurry comprises abrasives, oxidants, dispersants, surfactants, pH adjusters, and water. The components of the wafer polishing slurry work synergistically, shortening polishing time and improving polishing efficiency when applied to wafer polishing. Furthermore, it significantly improves the surface quality of the polished wafer, markedly reducing scratches and defects, and lowering surface roughness to below 0.15 nm, thus meeting the surface quality requirements of fields such as power electronics and radio frequency devices.

The utility model belongs to the technical field of metal pressing, in particular to a pressing device for a hydraulic coupler, which is characterized in that a middle short rod is mounted on the surface of a rack base, a front panel is mounted at the end part of the middle short rod, a movable vertical plate is vertically assembled in the middle of the front panel, and two groups of air rod mounting seats are mounted on the movable vertical plate in a penetrating manner; two sets of lifting air rods are assembled at the end of the air rod mounting seat, a base plate is mounted on the upper surface of the movable vertical plate, a set of abrasive belt tightness adjusting device is additionally mounted in the middle of a front panel of the rack, a set of movable plates are additionally mounted in the middle of the rack, and the position of a tightness wheel is adjusted through the movable air rod on one side of the rack. According to the polishing structure, the polishing abrasive belt is guaranteed not to loosen and fall off during long-time operation, the polishing efficiency and the polishing quality are improved, meanwhile, the operation safety is guaranteed, meanwhile, the outer housing is additionally arranged in the middle of the rack, the pressure borne by the polishing structure is reduced, and the service life of the device is prolonged.

The utility model relates to a cleaning and polishing device for processing a crystallizer copper pipe, which effectively solves the problems of low efficiency, poor polishing effect, incapability of well polishing and cleaning corners of the inner wall of the copper pipe and inconvenience in cleaning scraps of the conventional polishing equipment. According to the cleaning and polishing device for crystallizer copper pipe machining, through the arrangement of the first transverse moving mechanism, the second transverse driving mechanism, the polishing mechanism and the air blowing structure, an electric push rod can drive the polishing mechanism to well polish all parts and corner parts of the inner wall of a copper pipe, and the polishing effect is greatly improved; the first transverse moving mechanism and the second transverse moving mechanism can drive the polishing mechanism to rapidly move to the position above the corresponding copper pipe, the polishing efficiency can be effectively improved, the air blowing structure can conduct high-pressure air blowing on the portion polished by the polishing mechanism, and therefore metal chippings adsorbed to the interior of the copper pipe can be effectively removed. And the device is more beneficial to polishing and cleaning the interior of the copper pipe for use.

The invention relates to the technical field of chemical mechanical polishing of semiconductors, in particular to a preparation method of low-specific-surface-area silica sol, which comprises the following steps: adding pure water into crude silica sol prepared by taking alkoxy silane as a silicon source, and stirring at low vacuum degree to obtain the low-specific-surface-area silica sol, the mass ratio of the added pure water is w, the vacuum degree is v / MPa, the temperature is T / DEG C, the stirring duration is t / h, and the following relational expression is met: 0.02 < = 300 * w * v / (t * logT) < = 0.04; wherein the mass ratio w of the added pure water is 6-35%, w = the mass of the pure water / the mass of the crude silica sol * 100%, the vacuum degree v is 0.005-0.03 MPa, the temperature T is 70-95 DEG C, and the stirring time t is 8-12 h. The post-treatment process is added, and the mass ratio w of the added pure water, the vacuum degree v, the temperature T and the stirring duration t are controlled to meet a certain relationship, so that the alcohol content of the system can be reduced on the basis of reducing the specific surface area of the silicon dioxide particles, and the silica sol with higher polishing efficiency and better polishing effect is obtained.

The application discloses a kind of high-precision double-sided polishing equipment for hard and brittle material processing, and relates to the technical field of hard and brittle material polishing, comprising: fixed frame body;Lifting device is symmetrically distributed with two groups, respectively fixed on fixed frame body, and each group lifting device is symmetrically distributed with two;Positioning frame, corresponding to each group lifting device, both sides are fixedly connected with the same group lifting device;Polishing device, adjustable setting is in positioning frame;Mobile adjusting device, between polishing device, and side with positioning frame fixed connection;Conveying fixing device, symmetrically distributed with two groups, respectively fixed on the both sides of fixed frame body, and located between two groups lifting device.The application sets up two polishing devices, effectively and quickly double-sided polishing work is carried out to hard and brittle material, and through the adjustment of polishing surface or movement, accurate point polishing is carried out, and hard and brittle material is fixed and buffered, which helps to improve polishing efficiency.

The invention belongs to the technical field of industrial automation and intelligent manufacturing, and particularly relates to a robot ultrasonic polishing method, device and system.The robot ultrasonic polishing method comprises the steps that a robot ultrasonic polishing tool is calibrated, a polishing workpiece is positioned, and the position of the polishing workpiece under robot base coordinates is determined; based on the model information of the to-be-polished workpiece, a polished workpiece model is constructed and analyzed; based on the to-be-polished workpiece model analysis information, a polishing area is divided, and an ultrasonic polishing path of the robot is planned; interference analysis of the path points is carried out on the planned polishing path, and robot ultrasonic polishing of the workpiece is carried out according to the interference analysis result of the path points; and the polishing effect of robot ultrasonic polishing is evaluated, closed-loop feedback of robot ultrasonic polishing is conducted in combination with the polishing effect evaluation result, and robot ultrasonic polishing technological parameters are adjusted in real time according to the feedback result.

The invention discloses an environment-friendly high-performance titanium alloy polishing composition as well as a preparation method and application thereof, and relates to the technical field of metal material surface treatment. According to the environment-friendly high-performance titanium alloy polishing composition, the pH value of a basic system is adjusted to 9.5-10.0 through a pH adjusting agent; the base system comprises the following components in percentage by mass: 10-30% of silica sol, 3-4% of an anti-gel stabilizer (urea or methylurea), 2-3% of a heat transfer improvement and surface defect inhibitor (ethylene glycol or propylene glycol), 0.1-0.2% of a wetting leveling agent, 1-2% of an alcohol amine complexing agent and 0.5-1% of an aminopolycarboxylic acid chelating agent besides water. According to the environment-friendly high-performance titanium alloy polishing composition, on the premise that an oxidizing agent is completely abandoned, perfect balance of high stability, high polishing rate and excellent surface quality is achieved through unique formula design, and the environment-friendly high-performance titanium alloy polishing composition has the advantages of being environmentally friendly and high in safety.

This invention relates to the technical field of magnetorheological polishing, and discloses a magnetorheological polishing device and method with adjustable magnetic field strength. The device includes a polishing worktable, a first mounting groove with multiple mounting rings distributed from top to bottom on its inner wall, and multiple magnetic sheets fixed at equal intervals on the inner wall of each mounting ring. A toothed ring is fixed on the outer wall of a chuck, and a gear is rotatably connected to the inner wall of a second mounting groove. This invention uses a limiting mechanism to compress a container, thereby compressing and raising / lowering the support assembly within the first mounting groove. This increases the number of mounting rings surrounding the container, and consequently, the number of magnetic sheets surrounding the container and inducing magnetofluidity with the magnetic needles within it. This allows for appropriate adjustment of the magnetic field strength during the magnetorheological polishing process. This design, by changing the number of magnetic sheets surrounding the container to adjust the magnetic field strength of the magnetorheological polishing device, not only improves the polishing quality of workpieces made of different materials but also reduces the manufacturing cost of the polishing device.

This utility model relates to the field of PVC smart card production technology and discloses a polishing and deburring device for PVC smart card production. The device includes a base, a polishing mechanism at the top of the base, and a recycling mechanism at the bottom of the polishing mechanism. The polishing mechanism includes a polishing component and a conveying component. The polishing component is located at the top of the base. In use, when polishing is required to remove burrs from the surface of the PVC smart card, a cylinder drives a clamping plate to clamp the PVC smart card. A hydraulic cylinder then moves the water reservoir and nozzles left and right, achieving stable and precise polishing. The multi-directional first nozzle and the inclined second nozzle can rinse and polish the smart card surface from different angles, effectively removing burrs, improving polishing efficiency and quality, and ensuring the smoothness and gloss of the product surface. The combination of a high-pressure pump and an overflow valve can stably control the water supply pressure and flow rate.

This invention relates to the field of polishing machine technology and discloses a double-sided polishing integrated machine, comprising a base, a top seat fixed to the base by a support column, a gantry frame sliding on the base, and a polishing disc mounted on the gantry frame. The top seat and base are respectively equipped with symmetrically arranged clamping plate assemblies. Each clamping plate assembly includes two supports symmetrically sliding on the mounting frame, a mounting plate sliding on the supports, and a flipping mechanism mounted on the supports to drive the mounting plate to flip up and down. Air jets and pressure plates are respectively mounted at the upper and lower ends of the mounting plate. Two sets of clamping plate assemblies are provided on both the top seat and the base. A lifting cylinder is mounted on the base between the two sets of clamping plate assemblies. A lifting platform is fixed to the output end of the lifting cylinder. A shifting mechanism for driving the supports to move is mounted on the mounting frame. This invention has the following advantages and effects: it can achieve comprehensive double-sided polishing of materials while avoiding material wear, further improving polishing quality and efficiency.

The shielding case polishing machine comprises a polishing table, a polishing disc is rotationally connected to the polishing table, the polishing disc is in transmission connection with a servo motor, an adjusting assembly is arranged on the side face of the upper portion of the polishing table, a first motor is fixedly connected to the top of the adjusting assembly, and an output shaft of the first motor is in transmission connection with a polishing wheel; the adjusting assembly is used for adjusting the relative position of the polishing wheel and the polishing table. Conveying assemblies are symmetrically arranged on the two sides of the polishing table, and mechanical arm assemblies are arranged at the ends, close to the polishing disc, of the conveying assemblies. According to the device, the polishing machining efficiency can be effectively improved in an assembly line type machining mode, a shielding case containing assembly of the device can conduct polishing machining on a plurality of shielding cases at a time, and in addition, polishing machining can be conducted only when the shielding cases are in place and a signal receiver located at the bottom of a first motor is in a triggered state; resource waste caused by idling of the polishing disc is avoided, and economic benefits are improved.

The utility model relates to a hardware product surface polishing device, include: mounting bracket, install the object table in mounting bracket, and the object table is equipped with the through slot, and the pivot rotation is connected in mounting bracket, and the pivot is wrapped with the polishing wheel, and mounting bracket installs power assembly, is used for driving pivot rotation, and mounting bracket installs push assembly, is used for promoting product movement, through starting servo motor, makes the polishing wheel high -speed rotation, when the staff puts the product on the object table, pushes the handle and push rod, promotes the push plate and product together to the polishing wheel direction movement, after the product passes two polishing wheels, can realize the two -sided synchronous polishing of product, and when promoting product close to the polishing wheel, the clamping plate also will be close to the polishing wheel, provides the take -up operation for taking up the product after polishing, to improve product polishing efficiency.

The utility model provides polishing equipment for heavy-duty truck wheel check ring production, and relates to the technical field of wheel accessory machining, the polishing equipment comprises a machining table, one side of the top end of the machining table is provided with a semi-arc machining frame, and the top end of the machining table is provided with a supporting driving mechanism along the circle center of the semi-arc machining frame; a semicircular limiting frame is arranged on the inner wall of the semicircular machining frame, an air cylinder with the output end facing the fixed semicircular limiting frame is installed at the position, located on the inner wall of the semicircular machining frame, of the top end of the semicircular limiting frame, and an upper polishing roller is installed at the position, away from the other end, of the bottom of the semicircular limiting frame in a semicircular mode. A lower polishing roller corresponding to the upper polishing roller is mounted at the top end of the processing table; by designing the structure of the semicircular arc machining frame, the semicircular limiting frame, the upper polishing roller and the lower polishing roller, it can be guaranteed that the wheel check ring is comprehensively and evenly treated in the polishing process, and the inner surface and the outer surface of the check ring can be effectively polished through cooperation of the upper polishing roller and the lower polishing roller.

The utility model discloses a kind of rotor commutator polishing devices, including rack, installation plate is equipped on the rack, installation plate is equipped on for the pay-off assembly of being used to release polishing tape and for the winding assembly of being used to wind polishing tape;The fixture for placing rotor commutator is equipped on the side of installation plate;The fixture is drivingly connected with rotary drive assembly, and the rotary drive assembly drives rotor commutator to rotate;The polishing compression assembly for polishing and compressing rotor commutator is equipped on the side of fixture, movement plate is also equipped on installation plate, the first follower wheel of being equipped with polishing tape is equipped on movement plate, and the first follower wheel is distributed on both sides of fixture, and movement plate is drivingly connected with linear drive, and movement plate moves transversely under the action of linear drive, drives the polishing tape on first follower wheel, approaches or away from rotor commutator;The utility model provides a kind of rotor commutator automatic polishing equipment with high production efficiency.

The utility model provides a stainless steel shell polishing device, which belongs to the technical field of stainless steel polishing and comprises a base, a polishing component for quickly polishing a stainless steel shell is arranged at the top of the base, and a lubricating component for lubricating the polished stainless steel shell is arranged at the top of the base. According to the stainless steel shell polishing device, the multi-angle efficient polishing effect of a stainless steel shell is achieved through the arranged polishing assembly, the contour and position information of the stainless steel shell is transmitted to the controller through the high-definition camera, then the first servo motor is controlled, the supporting plate is moved to the position above stainless steel, and the second servo motor is matched with the polishing wheel; and a second electric push rod pushes a fixing frame, so that a polishing wheel can be attached to the stainless steel with different curved surfaces, the polishing efficiency is improved, and the stainless steel with different shapes is subjected to self-adaptive polishing.

The present application relates to a kind of RB-SiC surface femtosecond laser modification pretreatment method, by femtosecond laser to the preset Si powder on RB-SiC surface is modified and handled, to improve the polishing efficiency of RB-SiC surface.The present application can directly carry out surface modification to the cutting surface of RB-SiC, Si powder prepositioned on the surface of RB-SiC is rapidly oxidized under the action of the high peak power of femtosecond laser, and with the deepening of the depth of oxidation, so that the modified layer after oxidation forms bonding with RB-SiC matrix, obtains a modified coating with high adhesion strength, high quality.The method has the advantages of simple operation, low requirement to RB-SiC matrix and working environment, can be directly carried out in air, etc., can be applied to the surface modification of RB-SiC with complex surface shape, can significantly improve its polishing efficiency.

This utility model discloses a quick-release tool polishing device, including a worktable. A hydraulic rod is installed at the rear of the worktable, and the output end of the hydraulic rod is connected to a mounting bracket. A sliding rod is connected to the rear side of the mounting bracket, and a motor is installed at the end of the mounting bracket. The output end of the motor is connected to a polishing roller. A mounting plate is installed on the upper left side of the worktable, and a rotating shaft is installed on the side of the mounting plate. A pressure plate is connected to the end of the rotating shaft. A hydraulic rod is installed on the right side of the worktable, and a sliding plate is connected to the output end of the hydraulic rod. A fixing cover is installed on the upper end of the sliding plate, and a motor is installed on the right end of the fixing cover. This quick-release tool polishing device allows for rapid release of the tool by simply driving the fixing cover to move the mounting cover away from the pressure plate, enabling quick tool removal and replacement of the tool to be polished, thus improving the polishing efficiency.

The utility model discloses a knife tool module is changed with chopping board polishing, relates to chopping board polishing technical field, include: the frame, be located the assembly component of frame top, and the switching tool of staggered and symmetrically installed opposite of frame, the switching tool includes two pivot, two the opposite end of pivot fixed with two cross installation frame of staggered distribution, two cross installation frame through the opposite end rotation of a plurality of groups of pin shaft and a plurality of polishing module one -one assembly. The utility model discloses through always with horizontal state switching position's a plurality of polishing module, collocation different kinds of polishing mould, can realize the different polishing requirement of chopping board or the polishing of different kinds chopping board, and polishing mould operating end always faces down and horizontally, not only can ensure that polishing effect is uniform, surface quality is high, secondly reduces the time of adjustment and rework, guarantees the fluency of polishing, improves polishing efficiency.

This utility model discloses a polishing device for energy storage cabinet processing, specifically relating to the technical field of plate polishing devices. It includes a processing frame with two polishing wheels inside for processing energy storage cabinet plates. Both polishing wheels are connected to the processing frame via a moving mechanism. Each moving mechanism includes two transverse linear modules, with a longitudinal linear module connected between them. A first electric push rod is fixedly mounted on the longitudinal linear module, and a servo motor is fixedly mounted on one end of the piston rod of the first electric push rod. The output shaft of the servo motor is fixed to the polishing wheel. This utility model effectively improves polishing efficiency by using two sets of polishing wheels simultaneously and adjusting the position of the polishing wheels using the moving mechanism. The polished surface is flat and of high quality. Furthermore, the positioning component is used to position and fix the energy storage cabinet plates, improving their stability and facilitating rapid loading and unloading, further enhancing polishing efficiency.

This utility model relates to the field of clamping technology and provides a clamp for synchronous polishing of multiple curved door handles. The clamping body includes a fixed clamping plate, a movable clamping plate, and multiple sets of clamping components. The clamping components are used to move the movable clamping plate closer to or away from the fixed clamping plate. Each clamping component includes a fixed handle, a curved bridge, and a movable handle. Compared to existing technologies, the user can adjust the distance between the movable and fixed clamping plates using the movable handle. The movable and fixed clamping plates are wider, allowing for the simultaneous clamping of multiple curved door handles. The user only needs to pull the movable handle to move the movable and fixed clamping plates closer or further apart, enabling the multiple curved door handles to be clamped or released synchronously. The clamp is simple to operate and compact and lightweight, effectively improving polishing efficiency.

The utility model discloses a stainless steel kitchen utensil production polishing device, kitchen utensil production equipment technical field, including support frame, work board, inner grinding subassembly and outer grinding subassembly, its characterized in that work board is fixedly connected with the inner wall of support frame, and inner grinding subassembly and outer grinding subassembly are all connected with support frame, and inner grinding subassembly and outer grinding subassembly are used for polishing the inner wall and the outer wall of workpiece respectively, when polishing the inner wall of workpiece, outer grinding subassembly clamps workpiece, and inner grinding subassembly is inserted into workpiece inside and is contacted with the inner wall of workpiece and rotates and polishes workpiece, when polishing the outer wall of workpiece, outer grinding subassembly is contacted with the outer surface of workpiece, and inner grinding subassembly fixes workpiece inner support and drives workpiece to rotate. Inner and outer grinding subassembly work cooperatively, realize the efficient, even polishing of the inner wall and the outer wall of workpiece. The device can realize the switching of inner and outer wall polishing mode through simple operation, adapts to different workpieces, improves the versatility and flexibility of the device.

The utility model belongs to the technical field of cell phone shell processing, disclose a cell phone shell polishing device, including setting up in the motor, disk, stainless steel bar, polishing bucket in the casing, the output shaft of motor installs disk, sets up polishing bucket above disk, installs sound absorption board on the outer wall of polishing bucket, is provided with sound absorption hole on sound absorption board, installs the damping foot pad of shock absorption of casing bottom surface, sets up the polishing convex on the inner wall of polishing bucket, the inner wall of polishing bucket sprays lubricating layer, sets up gland on the top edge of polishing bucket, sets up sealing groove on the bottom surface of gland, sets up sealing strip in sealing groove, sets up sealing concave on sealing strip, sealing concave holds the top edge of polishing bucket, sets up air hole on the gland, sets up stainless steel bar in polishing bucket. The utility model effectively reduces the noise, and the structure is relatively simple, and the polishing operation is convenient.

The utility model discloses efficient leather polishing equipment, which belongs to the technical field of polishing equipment and comprises a box body, a floating component, a translation driving component, a polishing component and a clamp, and the floating component used for driving leather to reciprocate left and right to improve the polishing effect when the leather moves back and forth is mounted on the box body; a translation driving assembly for driving leather to move back and forth is mounted on the box body; the floating assembly is connected with the translation driving assembly; a polishing assembly used for polishing leather is further installed on the box body. A clamp used for clamping leather is installed at the end, away from the polishing assembly, of the floating assembly. By means of the mode, leather can move left and right to be polished while moving front and back, the polishing efficiency and the polishing effect are improved, and efficient polishing is achieved.

This utility model relates to the field of chopstick processing and discloses a chopstick polishing machine. The utility model includes a support frame, with two support frames symmetrically distributed left and right. The support frames are plate-shaped, and base plates are fixedly connected between the front and rear ends of the bottom of the two support frames. Support legs are fixedly connected to both ends of the bottom of the two base plates. Several support shafts pass through the middle of the support frames, and the support frames are rotatably connected to the support shafts. The support shafts are equidistantly distributed, and the foremost support shaft passes through the middle of a second connecting rod, which is fixedly connected to the middle of the second connecting rod. This utility model uses the rapid extension and retraction of a cylinder to drive the polishing box, ensuring full contact between the chopsticks and polishing abrasive, greatly improving polishing efficiency.

The utility model belongs to the technical field of titanium bar polishing, particularly relates to a titanium bar abrasive belt polishing machine, and aims to solve the problems that the existing titanium bar polishing equipment adopting friction force between a high-speed rotating grinding wheel and a titanium bar for polishing is uneven in polishing and easy to damage the surface of the titanium bar. A shell is fixedly arranged at the top of the base, and a clamping box is fixedly arranged at the position, located on one side of an opening of the shell, of the top of the base. According to the titanium bar polishing device, the two polishing assemblies for abrasive belt polishing are adopted, the polishing effect is better, the polishing efficiency of titanium bars is greatly improved, and the labor intensity of operators is reduced; by arranging the two groups of adjustable symmetrical polishing assemblies, the titanium bar can be comprehensively and uniformly polished, the consistency of the polishing quality is ensured, and the distance-adjustable limiting block and the second abrasive belt wheel on the distance-adjustable limiting block not only can adjust the tension degree of the abrasive belt, but also are convenient to replace the abrasive belt.

This invention relates to the field of silicon carbide wafer polishing technology, and discloses a silicon carbide wafer polishing apparatus and method, including a control cabinet. A transparent glass panel is fixedly connected to the surface of the control cabinet, and a cabinet door is hinged to the surface of the control cabinet. A drain valve is connected to the lower surface of the control cabinet, and a fixing component is installed inside the control cabinet. The fixing component includes a precision cylinder, the top of which is fixedly connected to the inner wall of the control cabinet, and a fixing ring is fixedly connected to the lower surface of the precision cylinder. The invention utilizes an electric actuator to push a protective frame upwards. As the protective frame moves, it pushes the polishing ring upwards, providing sufficient space between the polishing ring and the polishing disc for the operator to load and unload the silicon carbide wafer. The operator can then install the silicon carbide wafer inside the fixing component, using the fixing component to secure the silicon carbide wafer and improving the convenience of loading and unloading the silicon carbide wafer.