The invention provides a liquid film oscillation mechanism and fluctuation stability calculation method and device based on a
particle method. The method provided by the invention comprises the following steps: firstly, constructing a calculation model by arranging five types of particles, namely, sole, fluid, wall, dummy and ghost; secondly, applying a net
heat flow boundary considering wall
enthalpy correction,
radiation heat dissipation and a gas injection factor based on a
virtual particle method to realize
heat transfer and
phase change calculation; then solving a
viscosity item and a
shear force by adopting a fully implicit method, and updating a particle motion state by combining a non-Newton flow power law model; then, a potent model is introduced to calculate
surface tension and overload influence; solving a pressure field through a pressure Poisson equation and iteratively updating particle positions; and finally, dynamically marking ghost particles at the outlet to optimize the calculation efficiency. According to the method, the
oscillation phenomenon of the liquid film can be accurately simulated, the generation mechanism and stability influence factors of the liquid film can be revealed, theoretical support and technical means are provided for
thermal protection design of the
silicon-based material, and the technical problem that the three-dimensional dynamic
ablation morphology cannot be analyzed through a traditional method is solved.