The invention belongs to the technical field of mid-
infrared photoelectric detectors, and particularly relates to a mid-
infrared photoelectric
detector based on an ultra-thin metasurface and a preparation method thereof.The method comprises the steps that firstly, a substrate and an element atomic material are provided, an
ellipsometry test is conducted to obtain
dielectric functions of the substrate and the element atomic material, the
dielectric functions serve as input to be substituted into
finite element software, and the
finite element software serves as the input to obtain the ultra-thin metasurface-based mid-
infrared photoelectric
detector; theoretical modeling design is carried out on the metasurface, the metasurface is manufactured after the appropriate metasurface size is obtained, then
reflectivity and transmissivity tests under different polarizations are carried out on the metasurface through an
ellipsometry test, a
metal layer is deposited on the metasurface through a standard
electron beam
evaporation technology to serve as an
electrode, and the metasurface is manufactured. And finally, a CO2
laser is selected to irradiate the metasurface in a photoelectric detection experiment. By optimizing the structure parameters and the material performance of the metasurface, middle and
far infrared broadband absorption, efficient photo-thermal conversion and photoelectric response are achieved, and therefore the problems that in the prior art, the corresponding
wavelength is short, devices are heavy, and the detection efficiency is insufficient are solved.