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472 results about "Spatially resolved" patented technology

Spatially resolved metabolic alterations hold the key to defining the dependencies of metabolism that are most limiting for cancer growth and exploring metabolic targeted strategies for better cancer treatment.

Multi-photon laser microscopy

A laser scanning microscope produces molecular excitation in a target material by simultaneous absorption of three or more photons to thereby provide intrinsic three-dimensional resolution. Fluorophores having single photon absorption in the short (ultraviolet or visible) wavelength range are excited by a beam of strongly focused subpicosecond pulses of laser light of relatively long (red or infrared) wavelength range. The fluorophores absorb at about one third, one fourth or even smaller fraction of the laser wavelength to produce fluorescent images of living cells and other microscopic objects. The fluorescent emission from the fluorophores increases cubicly, quarticly or even higher power law with the excitation intensity so that by focusing the laser light, fluorescence as well as photobleaching are confined to the vicinity of the focal plane. This feature provides depth of field resolution comparable to that produced by confocal laser scanning microscopes, and in addition reduces photobleaching and phototoxicity. Scanning of the laser beam by a laser scanning microscope, allows construction of images by collecting multi-photon excited fluorescence from each point in the scanned object while still satisfying the requirement for very high excitation intensity obtained by focusing the laser beam and by pulse time compressing the beam. The focused pulses also provide three-dimensional spatially resolved photochemistry which is particularly useful in photolytic release of caged effector molecules, marking a recording medium or in laser ablation or microsurgery. This invention refers explicitly to extensions of two-photon excitation where more than two photons are absorbed per excitation in this nonlinear microscopy.
Owner:WEBB WATT W +1

Impression tray, and method for capturing structures, arrangements or shapes, in particular in the mouth or human body

InactiveUS20120064477A1Easy, dependable and accurateImpression capsTeeth fillingSpatially resolvedHuman body
The invention relates to an impression tray, such as in particular a dental impression tray, which carries a deformable impression mass in order to prepare an impression of arrangements, shapes and / or dimensions, in particular in or on the human body, preferably in the mouth, and further preferred an impression of at least part of a tooth or of dental structures, wherein furthermore sensor devices are present, by means of which a change of at least one physical property and / or variable of the impression mass can be captured in a spatially resolved manner when preparing an impression and can be provided in a form that is suited for electronic data processing. The invention further relates to a method for capturing structures, arrangements or shapes, such as preferably for capturing dental structures, arrangements or shapes in the mouth or in the human body, whereby a deformable impression compound is brought onto or into the structures, arrangements or shapes in particular, is introduced, into the mouth or body and a change of at least one physical property and / or variable of the impression compound is transmitted there in a spatially resolved manner directly to sensor devices when preparing an impression and is captured by the sensor devices and, furthermore, provided in a form that is suitable for electronic data processing.
Owner:MEDENTIC

Method for determining the image quality of an optical imaging system

The invention is directed to a method for determining the image quality of an optical imaging system and to the use of the method according to the invention for determining the influence of samples on the amplitude distribution and phase front distribution of the illumination light, of which the amplitude distribution is known in particular. The invention comprises the following steps: adjusting the subassemblies relative to one another in such a way that it is possible to project images of a sample on the detection device; recording a plurality of images of the sample from different reference planes near the focus plane; improving the image quality by image processing, particularly to reduce noise, to compensate for local variations in sensitivity of the detection device, and to center the intensity centroids respectively on a predetermined location in the images; computational linking of the spatially resolved image information, of adjustment values and system variables relating to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wavefront deformation caused by the imaging system; and outputting the characteristic numbers and associating them with the imaging system for describing the image quality.
Owner:CARL ZEISS SMT GMBH

Method For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatus And Methods For Operating Optical Elements And Euv-Lithography Apparatus, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The Methods

The invention relates to a method for manufacturing of a multilayer system (25) with a cap layer system (30), in particular for a reflective optical element for the extreme ultraviolet up to the soft x-ray wavelength range, comprising the steps of: 1. preparing a coating design for the multilayer system (25) with cap layer system (30); 2. coating a substrate (20) with the multilayer system (25) with cap layer system (30); 3. spatially resolved measurement of the coated substrate in terms of reflectance and photoelectron current in at least one surface point; 4. comparison of the measured data with data modelled for different thicknesses of the layers (31, 32, 33) of the cap layer system (30) and/or the layers (21, 22, 23, 24) of the multilayer system (25) for determining of the thickness distribution obtained by the coating; 5. if necessary, adjusting of the coating parameters and repeating steps 2 to 5 until the coated thickness distribution coincides with the design. The invention also relates to further manufacturing methods, reflective optical elements, EUV-lithography apparatuses, and methods for operating optical elements and EUV-lithography apparatuses as well as methods for determining the phase shift, methods for determining the layer thickness, and apparatuses for carrying out the methods.
Owner:CARL ZEISS SMT GMBH

Method and apparatus for controlling wafer uniformity using spatially resolved sensors

A processing system includes a sensor, a processing tool, and an automatic process controller. The sensor has a plurality of sensing regions. The processing tool is adapted to process at least one process layer on a wafer. The process tool includes a process control device controllable by a process control variable. The sensor is adapted to measure a process layer characteristic of the process layer in a selected one of the sensing regions. The automatic process controller is adapted to receive the process layer characteristics measured by the sensor and adjust the process control variable in response to the process layer characteristic measured in one sensing region differing from the process layer characteristic measured in another sensing region. A method for controlling wafer uniformity includes processing a process layer on a wafer; measuring a characteristic of the layer in a plurality of sensing locations; and changing a process control variable of a process control device in response to the process layer characteristic measured in one sensing location differing from the process layer characteristic measured in another sensing location to affect the rate of processing the process layer in at least one of the sensing locations.
Owner:ADVANCED MICRO DEVICES INC
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