87 results about "High numerical aperture" patented technology

The invention discloses a dielectric metasurface optical edge detection device and method based on dual-polarization-state Mie resonance, the method shows a non-local dielectric metasurface which is high in robustness and easy to prepare, and the device can achieve polarization-independent edge detection with excellent efficiency and high numerical aperture (NA). By simultaneously utilizing Mie resonance in the s polarization state and the p polarization state, isotropic two-dimensional second-order differential operation under any polarization condition (including non-polarization illumination) is realized. According to the design scheme, real-time image edge extraction can be achieved, the average peak efficiency reaches 30%, the working bandwidth of 40 nm is achieved at the center wavelength of 1064 nm, and high-quality edge detection can be kept under the numerical aperture of 0.5. The work provides a new method for realizing polarization-independent edge detection, and paves a way for practical application of an optical calculation and imaging system.

The invention relates to the technical field of semiconductor manufacturing and detection, and discloses a glass wafer through hole three-dimensional shape detection system based on machine vision, and the system comprises a multi-angle light source cooperation illumination module which is used for achieving the comprehensive illumination of a glass wafer through hole; the polarization modulation module is used for enhancing weak scattering signals and acquiring scattering field information with a high signal-to-noise ratio; the high numerical aperture optical module is used for collecting scattered field data; the Fourier diffraction region inverse scattering reconstruction module is used for realizing preliminary reconstruction of three-dimensional defect distribution; the compressed sensing iterative optimization module is used for improving the three-dimensional reconstruction precision and obtaining accurate three-dimensional defect distribution of the side wall of the through hole of the glass wafer; according to the invention, the diffraction limit of traditional optical detection is broken through, and surface and internal defects can be simultaneously detected and distinguished.

The invention relates to the technical field of optical imaging, and discloses a novel reflective dark field imaging method and system based on Fourier conjugate plane modulation, and the method comprises the steps: controlling a first spatial light modulator to load a dynamic annular illumination pattern, and projecting the dynamic annular illumination pattern to a rear focal plane of an objective lens; light field distribution formed by scattering signal light and annular reflected light is separated on a rear focal plane by using an objective lens; relaying the light field distribution to a conjugate plane where a second spatial light modulator is located through a second relay light path; and controlling the second spatial light modulator to load a dynamic blocking pattern, blocking the annular reflected light and enabling the scattered signal light to pass through, and finally imaging. According to the invention, two electronically synchronous spatial light modulators are adopted to construct a dynamic illumination light field and realize adaptive spatial filtering respectively, so that cooperative matching of an illumination pattern and a blocking pattern is realized, active compensation of optical chromatic aberration is facilitated, the problem of background leakage under wide-spectrum illumination is solved, and the illumination quality is improved. And a high-numerical aperture objective lens lacking a dark field channel is compatible.

The invention discloses a method for realizing a multi-polarization high-numerical aperture Laplace differentiator based on a metasurface, and belongs to the technical field of micro-nano photonics, optical simulation calculation and light field regulation and control. The single-layer metasurface is composed of a cylindrical array which is made of an amorphous silicon material and has a hexagonal lattice period. Geometric parameters of a silicon cylinder are designed and selected, so that the metasurface excites resonance spectrums with large-angle dispersion capability under illumination of p polarized light and s polarized light in the same working wavelength range, and an optical transfer function required by optical Laplacian differential operation with broadband and high numerical aperture is realized in a real airspace; and Laplacian operation can be executed under non-polarized light and non-coherent light conditions. And generating a processing file of the corresponding metasurface according to the determined geometric dimension of the silicon cylinder unit. And processing the dielectric metasurface by adopting a micro-nano processing technology of electron beam etching. In a working wave band, the metasurface can directly obtain two-dimensional second-order edge contour information of a target image under various illumination conditions.

The invention discloses a DUV microscope objective with high NA and long working distance. The microscope objective is sequentially composed of a first lens group with negative focal power, a second lens group with positive focal power and a third lens group with positive focal power from an image side to an object side along an optical axis. The first lens group comprises a biconcave lens and a negative meniscus lens, the second lens group contains a diaphragm and is composed of a plurality of positive lenses, and the third lens group is composed of two positive meniscus lenses with concave surfaces facing the object side. By strictly controlling the focal length proportional relation (1 < = f1 / f < = 3, 11.2 < = f2 / f < = 12.2, and 12.7 < = f3 / f < = 13.7) and key structure parameters of the three groups of lenses, and by adopting an aspheric and full single lens structure, the contradiction between a high numerical aperture and a long working distance is cooperatively solved. According to the invention, the excellent performance that NA is greater than or equal to 0.85 and the working distance is greater than or equal to 14.6 mm at the wave band of 248nm is realized, the aberration correction is good, the service life is long, and the optical system is suitable for semiconductor detection and other precise optical fields.

The invention relates to the field of quantum computing, and particularly discloses a method and device for achieving large-scale extensible neutral atom quantum computing based on a VCSEL array. A plurality of vertical emitting laser VCSEL units with working parameters capable of being independently controlled are used for constructing a high-uniformity dot matrix light source, then a focusing system for focusing laser is constructed, the dot matrix light source is focused, and an optical tweezers array with enough strength and proper size is formed and used for capturing neutral atoms. A larger-scale optical tweezers array can be achieved through the VCSEL array prefabricated through micromachining, the number of dot matrixes is not limited by a high numerical aperture NA field angle, the possibility is provided for quantum calculation to expand to more quantum bits in the future, the expandability has important significance along with continuous increasing of the quantum calculation for the number of quantum bits, and the quantum tweezers array can be applied to a large-scale optical tweezers array. Compared with a high numerical aperture NA lens, a VCSEL array and a micro lens array, the technology is relatively mature, large-scale preparation and integration are easier to realize, the cost is reduced, and popularization and application of the quantum computing technology are facilitated.

The present application relates to a capillary array, its manufacturing method, and use. The capillary array includes a plurality of parallel-axially arranged capillaries made of a first glass, each of which has an inner wall provided with a low-refractive-index layer whose refractive index is lower than that of a liquid scintillator, and a light-absorbing layer made of a second glass between any two adjacent capillaries. The capillary array includes a capillary region in which T1 - T2 is 30 to 50°C, where T1 is the softening point of the first glass and T2 is the softening point of the second glass, and the thermal expansion coefficient of the first glass is α1. The capillary region is made of a third glass, which is disposed outside the capillary region and in contact with the outer surface of the capillary region, and has a softening point of T3, where T2 - T3 is 50 to 100°C, and the thermal expansion coefficient of the third glass is α3, where α1 - α3 is 2×10. -7 ~10×10 -7 / °C. The technical problem to be solved by the present application is to manufacture a capillary array such that a liquid scintillator optical fiber panel manufactured using the capillary array has high spatial resolution, high hole diameter uniformity, high numerical aperture, and high coupling efficiency, and the manufacturing process is simple.

This document describes a method for source mask optimization using a lithographic projection apparatus. The lithographic projection apparatus includes an illumination source and projection optics configured to image a mask design layout onto a substrate. The method includes determining a multi-variable source mask optimization function using a plurality of tunable design variables for the illumination source, the projection optics, and the mask design layout. The multi-variable source mask optimization function takes into account imaging variations at different positions corresponding to different stripes of the mask design layout across an exposure slit, where the different stripes are exposed by the same slit position of the exposure apparatus. The method includes iteratively adjusting the plurality of tunable design variables in the multi-variable source mask optimization function until a termination condition is satisfied.

The application discloses a kind of aberration correction method and device under high numerical aperture objective lens two-photon lithography, and it is related to micro-nano manufacturing and laser processing technical field.The method comprises the following steps: establishing the two-photon lithography system parameter model for aberration correction;According to the preset target focal point distribution, the focal point phase to be loaded into spatial light modulator is calculated using GS algorithm;Calculate depth-dependent aberration and generate compensation phase;Superimpose total loading phase and generate SLM hologram;Adjust objective lens to make it align with the sample on translation stage, make immersion oil and sample surface closely contact, complete the immersion alignment of objective lens and sample;Make sample and focal point produce relative displacement, complete two-photon lithography processing under the condition of spherical aberration compensation;After processing after exposure sample, obtain three-dimensional microstructure with different depth voxel.The method can improve the consistency and forming quality of deep three-dimensional micro-nano processing.

The invention discloses a super-structure lens and a microdefect microscope lens, and relates to the technical field of optical lenses. The super-structure lens comprises a substrate and a plurality of sub-wavelength nano-column units which are arranged on the surface of the substrate and have different rotation angles, wherein the phase distribution of the sub-wavelength nano-column units on the substrate meets the following conditions; wherein the focusing phase of each sub-wavelength nano-column unit, the distance from each sub-wavelength nano-column unit to the central point of the super-structure lens and the wavelength of the incident light are respectively, and f is the focal length of the super-structure lens. The super-surface lens is simple in configuration and can replace a traditional optical lens, the high focusing efficiency can improve the imaging effect, the high numerical aperture can effectively reduce the size and weight of an optical system, and the super-surface lens is applied to a microscope lens, so that the microdefect detection capability of the microscope lens can be effectively improved.

This invention relates to a high numerical aperture, large field-of-view total internal reflection microscope objective in the ultraviolet wide band. Along the optical axis from image to object, it comprises: a first objective consisting of a first and a second reflecting mirror arranged sequentially along the optical axis OA from image to object, used to receive parallel light and form an intermediate image plane; and a second objective consisting of a third and a fourth reflecting mirror arranged sequentially along the optical axis OA from image to object, used to image the intermediate image plane onto the object plane. The first reflecting mirror is a convex mirror with negative optical power; the second reflecting mirror is a concave mirror with positive optical power; the third reflecting mirror is a concave mirror with positive optical power; and the fourth reflecting mirror is a concave mirror with positive optical power. This invention employs a four-mirror total internal reflection structure, and by optimizing the focal length and aperture ratios of each reflecting mirror, it achieves a balance between high numerical aperture and a large field of view, overcoming the limitations of traditional total internal reflection objectives where numerical aperture and field of view are mutually constrained.

The application discloses a dynamic polarization controller based on a silicon-based optoelectronic chip, which can lock an arbitrary polarization state light field to an arbitrary required polarization state light field. The controller couples the light of the arbitrary polarization state light field from a single-mode optical fiber into the chip through a first end face coupling structure via a first high numerical aperture optical fiber; after passing through a first polarization rotation beam splitter (PRS), the TE0 mode and TM0 mode light fields entering the chip are both converted into TE0 mode light fields; after polarization locking by adopting a waveguide 0° / 45° / 0° structure, the two TE0 mode light fields are combined into one by a second polarization rotation beam splitter and are converted into TE0 mode and TM0 mode light fields, and then are output to a second high numerical aperture optical fiber via a second end face coupling structure and are relayed into a single-mode optical fiber. The waveguide 0° / 45° / 0° structure adopts an electrically controlled phase shifter, and combines an analog annealing algorithm, a gradient algorithm and other algorithms to automatically lock the polarization state of the light.

A method and apparatus to maintain image focus on parts such as wafers, circuit boards, or high-density substrates as the part is being inspected. Focus performance is independent of feature and trace orientation and density. This apparatus can be easily integrated into an inspection system and can maintain focus on parts with high aspect ratio structures and or low or non-reflective insulators. It enables the inspection of high-density fine line products requiring the use of high resolution, high numerical aperture (NA) imaging optics with small depths of focus (DOF) that must be kept in focus during the inspection.

The invention provides an inclined plane four-beam lattice light sheet super-resolution microscopic imaging device and method based on spatial spectrum estimation. The device is composed of an input light beam, a cylindrical lens group, an SLM, a reflector, a lambda / 4 wave plate, a PBS, a mask, a relay lens group, a galvanometer, an objective lens, a camera and other optical elements. By utilizing four-beam interference formed by the SLM and a high-reflectivity mirror surface on the opposite side of a sample, a lattice light sheet illumination field is realized, and fluorescence excitation is finely regulated and controlled; the same objective lens with a high numerical aperture and a three-stage infinite correction microscopic system are utilized to realize fluorescence excitation and collection, the loading space limitation of a traditional light sheet microscope is broken through, and distortion caused by high axial magnification and aberration is avoided; in combination with a spatial spectrum estimation algorithm, a measurement matrix is constructed for a low-resolution image sequence, eigenvalue decomposition is carried out, an optimal signal-to-noise ratio threshold is adaptively determined, signal and noise subspaces are divided according to the threshold, spectrum peak search is carried out by using subspace orthogonality, and thus isotropic resolution improvement is realized.

The present invention relates to a method for generating a long focal depth super-resolution light needle and a high aspect ratio laser direct writing system. The method adopts the characteristic of multi-focal point splicing to extend the focal depth, combines with a genetic algorithm to break the contradiction between the numerical aperture and focal depth of a traditional lens, and regulates the incident light field through a super-oscillating lens to realize a long focal depth light field under a high numerical aperture, thereby obtaining an ultra-long focal depth super-resolution light needle light field that exceeds the diffraction limit. Ultimately, the ultra-long focal depth super-resolution light needle light field that exceeds the diffraction limit is used to realize high aspect ratio laser direct writing processing, thereby realizing the processing of micro-nano structures with a line width less than the diffraction limit and with certain processing depth requirements. In addition, the ultra-long focal depth super-resolution light needle light field generated by the present invention can be directly acquired in real time without any bulky and complex mechanical structure, thereby making the architecture of the high aspect ratio laser direct writing system simpler and facilitating the miniaturization design of the system.

The invention relates to a metasurface differentiator design method for quickly realizing isotropy, which comprises the following steps: S1, initializing position coordinates and related parameters of a particle swarm, the position coordinates corresponding to structural geometric parameters of a metasurface unit; s2, position coordinates of a particle swarm are updated according to a particle swarm optimization algorithm; s3, on the basis of the updated position coordinates, a wavelength set G0 with the transmission coefficient T close to 0 under normal incidence is calculated through an electromagnetic simulation algorithm; s4, screening the G0 by adopting a compromise method, selecting an optimal transfer function, and calculating the goodness of fit F of the optimal transfer function; s5, iteratively updating the individual optimal position Pbest and the global optimal position Gbest; and S6, repeating the steps S2 to S5, and carrying out the next iteration process until all iterations are completed. According to the method, scanning points are efficiently selected by adopting a compromise method, ergodic operation is not needed, isotropy can be realized, and the method has relatively high numerical aperture and spatial resolution.

Flowcells and Raman analysis systems provide improved signal collection dynamics through increased solid-angle geometries and improved numerical aperture for near-diffraction-limited performance. A combined excitation / collection beam passes through a first optical material, a sample conduit and a second optical material. A concave reflective aspheric surface focuses and re-collimates the combined beam to and from a region of the sample within the conduit. The optical materials may comprise separate windows or may integrally form sidewalls the conduit. The reflective surface may be spaced apart from the second window or may be integrally formed with the second optical material. The focused region in the sample may approximate a point or a line, and at least a portion of the interior wall of the conduit may be reflective, causing the combined beam to pass through the sample region more than once to enhance collection efficiency.

The invention relates to a deep ultraviolet microscope objective lens which comprises a first lens group G1, a second lens group G2, a third lens group G3 and an optical observation window mirror C1 which are sequentially arranged along a direction from an image space to an object space, the first lens group G1 has weak negative focal power and is composed of one or more negative meniscus lenses, and the equivalent focal length range is-10 mm to-30 mm; the second lens group G2 has weak positive focal power and is composed of one or more positive and negative alternating lenses, and the equivalent focal length range is 50-100 mm; the third lens group G3 has strong positive focal power and is composed of one or more meniscus lenses, and the equivalent focal length range is 10 mm to 25 mm; and the two surfaces of the optical observation window mirror C1 are parallel and vertical to the direction of the optical axis. The invention has the advantages of single material construction, high numerical aperture, long working distance and self-adaptive window thickness compensation capability.

A method for multifocal energy gradient laser holographic cutting of hard and brittle materials includes the following steps: S1, determining the parameters of the incident beam and the high numerical aperture focusing objective; S2, determining the three-dimensional multifocal beam and parameters of the target hard and brittle material; S3, setting a two-dimensional linear phase distribution on the spatial light modulator plane as the initial phase for subsequent iterative calculations; S4, establishing a forward-backward propagation iterative loop based on phase optimization to calculate the multifocal holographic phase distribution; S5, superimposing a linear blazed grating phase on the multifocal holographic phase distribution, and generating a composite diffraction phase hologram using MATLAB code and inputting it into the spatial light modulator; achieving uniform holographic cutting with consistent actual absorbed energy in each layer. This invention features controllable three-dimensional focal positions, adjustable energy gradients along the depth direction at each focal point, strong deep-layer energy compensation capability, simultaneous aberration correction, and high consistency in cutting at different depths.

The application discloses a small ultraviolet wide-band high numerical aperture microscopic objective optical system, and relates to the technical field of optical imaging. The system comprises a front group and a rear group coaxially arranged in sequence from an image side to an object side along an optical axis; the front group comprises first to fourth lenses, and the rear group comprises an aperture, a fifth lens, a sixth lens and a seventh lens; the fifth lens and the sixth lens form a cemented lens; the seventh lens is a Mangin mirror, a half-reflective and half-transmissive film is at least partially coated on the front surface of the seventh lens, a reflective film is coated on the rear surface of the seventh lens except a central circular area, and the central circular area is used for transmitting light. The application realizes ultraviolet wide-band (such as 260-450 nm) imaging by using only seven lenses, the numerical aperture is greater than or equal to 0.8, the field of view is greater than or equal to 0.6 mm, the system length is less than 30 mm, the structure is simple, the volume is small, and the system is easy to assemble and adjust, and can be used in the fields of semiconductor wafer detection, gene sequencing and life science.

According to the method, a programmable LED lamp is installed on a microscope condenser, a light source is adjusted to the height of a sample table, then four inclined illumination modes including the upper, the lower, the left and the right are switched, part of coherent light is obliquely incident to a sample, at the moment, emergent light waves carry amplitude and phase information of the sample, and the sample can be observed in a high-resolution non-destructive mode. The sample is collected by the high magnification objective lens, the corresponding intensity image is collected by the CCD camera, and the collected original image is subjected to deconvolution by using the differential phase contrast imaging principle to obtain the biological information such as the thickness and the dry mass of the sample. A programmable annular LED is adopted as an illumination light source to enhance the phase contrast of a low-frequency space and reduce noise interference, and the illumination light source forms an angle of 15 degrees with a sample platform and directly irradiates a sample to generate a uniform illumination light source. The submicron organelle can be dynamically observed in real time through the high numerical aperture objective lens, and organelle edge extraction and 3D form reconstruction are obtained by using a deconvolution reconstruction algorithm.

The invention discloses a mid-infrared large-aperture all-silicon super-structure lens and a design method thereof, and belongs to the field of silicon-based super-lenses, the mid-infrared large-aperture all-silicon super-structure lens comprises a super-unit array composed of a plurality of super-units, the plurality of super-units comprise the same silicon substrate and a silicon nano-column vertically grown at the center of the silicon substrate, and the change range of the diameter D of the silicon nanorods of the plurality of super units is 440-1350nm, and the step length is 10nm, so that the full coverage of the phase delay # imgabs0 # of incident mid-infrared light is realized by adjusting the diameter D of the silicon nanorods, and the transmission coefficient txx of a single super unit is greater than 0.7. By adopting the mid-infrared large-aperture all-silicon metamaterial lens and the design method thereof, high-precision phase regulation and control are realized by constructing a dense phase sampling unit library of 40 super units, the mid-infrared all-silicon metamaterial lens with the aperture of about 10mm is formed by combining a large-scale array design, and the mid-infrared large-aperture all-silicon metamaterial lens has the advantages of high focusing precision, large numerical aperture and good broadband adaptability; the problems that a traditional metamaterial lens is large in phase fitting error and small in caliber are solved.

The inventive concept relates to a method and apparatus for training a machine learning model for constructing a digital image depicting a sample. The method (30) comprises: receiving (S300) a digital image training set of a training sample (1080), where the digital image training set is acquired (S310) using a first microscope objective (104) by illuminating (S312) the training sample (1080) with a plurality of illumination modes and capturing (S314) a digital image for each of the plurality of illumination modes; receiving (S320) real data comprising a digital image depicting the training sample (1080), where the digital image of the real data is acquired (S330) using a second microscope objective (204) and by irradiating (S332) the training sample with a conventional microscopy illumination mode, and capturing (S334) the digital image while illuminating the training sample (1080) with the conventional microscopy illumination mode; and training (S340) the machine learning model using the received training set of digital images and the received real data for constructing a digital image depicting the training sample (1080); and wherein the second microscope objective (204) has a higher numerical aperture than the first microscope objective (104), whereby the resolution of the digital image of the real data is higher than the resolution of at least one digital image in the training set of digital images. The inventive concept further relates to a method and a microscope device for constructing a digital image depicting a sample.

The invention relates to an MRAM (Magnetic Random Access Memory) detection method of an objective lens integrating optical angle resolution and a high numerical aperture, and belongs to the technical field of memory detection. The method comprises the following steps: (1) system preparation; (2) sample preparation; (3) optical angle resolution observation; (4) collecting optical signals; (5) optical detector and signal processing; and (6) result analysis and evaluation. According to the invention, an optical angle resolution technology is utilized, and an objective lens system with a high numerical aperture is combined, so that high-resolution observation and analysis of the MRAM unit can be realized, and information such as a microstructure, a magnetization state and magnetic characteristics of the MRAM unit can be obtained by using a proper optical detector and a signal processing technology.

The invention discloses an intelligent wafer defect detection system and method and a readable storage medium, and the system comprises an EUV light source illumination module, an aspheric high-numerical aperture composite optical lens group, a super-resolution image collection and reconstruction module, a defect recognition and classification module and an illumination uniformity adjustment feedback module. The EUV light source illumination module comprises a light source, a relay lens group, an adjustable reflector array and a uniformity adjustment algorithm, and is used for providing high-intensity and uniform EUV illumination; the aspheric high-numerical aperture composite optical lens group is used for realizing high-precision imaging of submicron defects; the super-resolution image acquisition and reconstruction module is used for improving the resolution of an original image to a submicron level. According to the invention, the system resolution is effectively improved to be less than 0.1 mu m, real-time online detection of defects such as submicron scratches, particle pollution and crystal edge breakage is realized, light intensity distribution is optimized through a self-adaptive illumination uniformity adjustment algorithm, and the detection signal-to-noise ratio is improved.

The invention relates to a multi-mode hyperspectral microscope imaging system and a use method, the multi-mode hyperspectral microscope imaging system comprises a multi-mode illumination assembly, a spectral imaging assembly and a control analysis assembly, the multi-mode illumination assembly comprises a high numerical aperture condenser, a second polarizer illumination channel, an illumination light source and a multi-path fluorescence excitation light source module; a light path of the illumination channel is composed of a turning reflector, a light path beam shrinking lens group and an illumination collimating lens, wherein the light path turning reflector, the illumination collimating lens and a stepping motor form a bright field and dark field switching module; the illumination light source is arranged on a coaxial light path of the illumination collimating lens; the spectral imaging assembly comprises a hyperspectral spectral imaging module arranged on a high-precision electric displacement table; the control analysis assembly comprises a work station and a controller. According to the invention, the accuracy of spectrum marking and sample analysis is improved; the system size is effectively reduced; continuity and integrity of spectrum acquisition can be realized; the experiment time is effectively shortened; and the applicability of the instrument is improved.

The application relates to the field of optical imaging technology and discloses a reflection type dark field imaging method and system based on Fourier conjugate plane modulation, the method comprising the following steps: controlling a first spatial light modulator to load a dynamic ring-shaped illumination pattern and projecting the dynamic ring-shaped illumination pattern to a back focal plane of an objective lens; utilizing the objective lens to separate light field distribution formed by scattered signal light and ring-shaped reflected light at the back focal plane; relaying the light field distribution to a conjugate plane where a second spatial light modulator is located through a second relay optical path; and controlling the second spatial light modulator to load a dynamic blocking pattern, shielding the ring-shaped reflected light and making the scattered signal light pass through, and finally imaging. Through the adoption of two electronic synchronous spatial light modulators, dynamic illumination light field and adaptive spatial filtering are respectively constructed, the illumination pattern and the blocking pattern are matched in cooperation, optical chromatic aberration is actively compensated, the problem of background leakage under wide spectrum illumination is solved, and a high numerical aperture objective lens lacking a dark field channel is compatible.

Disclosed in this disclosure is a method for super-resolution microscopic interferometric measurement based on broadband annular radially polarized light, where a broad-spectrum light source with an extended surface is selected; uniform illumination covering a to-be-tested FOV and having a certain aperture angle is provided using a Kohler illumination system; a two-stage relay system is designed, and amplitude and polarization of a full-FOV beam is modulated by a liquid crystal spatial light modulator and a vortex waveplate; broadband annular radially polarized light is focused based on the extended surface light source and a microscopic objective lens with a high numerical aperture to implement super-resolution microscopic interference imaging of a sample; and super-resolution topography measurement directed at a surface of a microstructure is implemented combined with phase-shifting interferometry.

Embodiments of the present disclosure relate to devices, systems, and methods of compact high numerical aperture light engines, such as thin optical element based light engine systems using metasurfaces for wearable displays. One embodiment includes an optical element. The optical element includes one or more spatial light modulators, wherein each spatial light modulator is an array of pixels that can be individually controlled to output visible light. The optical element also includes a surface defining an exit pupil arranged to allow the output visible light to exit the optical element through the exit pupil. The optical element also includes one or more metasurfaces disposed between the one or more spatial light modulators and the exit pupil. The one or more metasurfaces are used to focus the visible light output by the one or more spatial light modulators.

To provide a semiconductor device with high numerical aperture, or to provide a semiconductor device with low power consumption, or to provide a semiconductor device with low wiring resistance.SOLUTION: A semiconductor device comprises: a substrate having an insulation surface; a first electrode provided on the substrate and having light transmissivity; a second electrode provided on the substrate and having light transmissivity; a semiconductor layer that is provided so as to be electrically connected with the first electrode and the second electrode, and that has light transmissivity; first wiring electrically connected with the first electrode; an insulating layer provided so as to cover at least the semiconductor layer; a third electrode provided on the insulating layer in a region overlapped with the semiconductor layer and having light transmissivity; and second wiring electrically connected with the third electrode.SELECTED DRAWING: Figure 1