36 results about "High numerical aperture" patented technology

The invention discloses a method for realizing a multi-polarization high-numerical aperture Laplace differentiator based on a metasurface, and belongs to the technical field of micro-nano photonics, optical simulation calculation and light field regulation and control. The single-layer metasurface is composed of a cylindrical array which is made of an amorphous silicon material and has a hexagonal lattice period. Geometric parameters of a silicon cylinder are designed and selected, so that the metasurface excites resonance spectrums with large-angle dispersion capability under illumination of p polarized light and s polarized light in the same working wavelength range, and an optical transfer function required by optical Laplacian differential operation with broadband and high numerical aperture is realized in a real airspace; and Laplacian operation can be executed under non-polarized light and non-coherent light conditions. And generating a processing file of the corresponding metasurface according to the determined geometric dimension of the silicon cylinder unit. And processing the dielectric metasurface by adopting a micro-nano processing technology of electron beam etching. In a working wave band, the metasurface can directly obtain two-dimensional second-order edge contour information of a target image under various illumination conditions.

The invention discloses a DUV microscope objective with high NA and long working distance. The microscope objective is sequentially composed of a first lens group with negative focal power, a second lens group with positive focal power and a third lens group with positive focal power from an image side to an object side along an optical axis. The first lens group comprises a biconcave lens and a negative meniscus lens, the second lens group contains a diaphragm and is composed of a plurality of positive lenses, and the third lens group is composed of two positive meniscus lenses with concave surfaces facing the object side. By strictly controlling the focal length proportional relation (1 < = f1 / f < = 3, 11.2 < = f2 / f < = 12.2, and 12.7 < = f3 / f < = 13.7) and key structure parameters of the three groups of lenses, and by adopting an aspheric and full single lens structure, the contradiction between a high numerical aperture and a long working distance is cooperatively solved. According to the invention, the excellent performance that NA is greater than or equal to 0.85 and the working distance is greater than or equal to 14.6 mm at the wave band of 248nm is realized, the aberration correction is good, the service life is long, and the optical system is suitable for semiconductor detection and other precise optical fields.

The present application relates to a capillary array, its manufacturing method, and use. The capillary array includes a plurality of parallel-axially arranged capillaries made of a first glass, each of which has an inner wall provided with a low-refractive-index layer whose refractive index is lower than that of a liquid scintillator, and a light-absorbing layer made of a second glass between any two adjacent capillaries. The capillary array includes a capillary region in which T1 - T2 is 30 to 50°C, where T1 is the softening point of the first glass and T2 is the softening point of the second glass, and the thermal expansion coefficient of the first glass is α1. The capillary region is made of a third glass, which is disposed outside the capillary region and in contact with the outer surface of the capillary region, and has a softening point of T3, where T2 - T3 is 50 to 100°C, and the thermal expansion coefficient of the third glass is α3, where α1 - α3 is 2×10. -7 ~10×10 -7 / °C. The technical problem to be solved by the present application is to manufacture a capillary array such that a liquid scintillator optical fiber panel manufactured using the capillary array has high spatial resolution, high hole diameter uniformity, high numerical aperture, and high coupling efficiency, and the manufacturing process is simple.

The application discloses a kind of aberration correction method and device under high numerical aperture objective lens two-photon lithography, and it is related to micro-nano manufacturing and laser processing technical field.The method comprises the following steps: establishing the two-photon lithography system parameter model for aberration correction;According to the preset target focal point distribution, the focal point phase to be loaded into spatial light modulator is calculated using GS algorithm;Calculate depth-dependent aberration and generate compensation phase;Superimpose total loading phase and generate SLM hologram;Adjust objective lens to make it align with the sample on translation stage, make immersion oil and sample surface closely contact, complete the immersion alignment of objective lens and sample;Make sample and focal point produce relative displacement, complete two-photon lithography processing under the condition of spherical aberration compensation;After processing after exposure sample, obtain three-dimensional microstructure with different depth voxel.The method can improve the consistency and forming quality of deep three-dimensional micro-nano processing.

This invention relates to a high numerical aperture, large field-of-view total internal reflection microscope objective in the ultraviolet wide band. Along the optical axis from image to object, it comprises: a first objective consisting of a first and a second reflecting mirror arranged sequentially along the optical axis OA from image to object, used to receive parallel light and form an intermediate image plane; and a second objective consisting of a third and a fourth reflecting mirror arranged sequentially along the optical axis OA from image to object, used to image the intermediate image plane onto the object plane. The first reflecting mirror is a convex mirror with negative optical power; the second reflecting mirror is a concave mirror with positive optical power; the third reflecting mirror is a concave mirror with positive optical power; and the fourth reflecting mirror is a concave mirror with positive optical power. This invention employs a four-mirror total internal reflection structure, and by optimizing the focal length and aperture ratios of each reflecting mirror, it achieves a balance between high numerical aperture and a large field of view, overcoming the limitations of traditional total internal reflection objectives where numerical aperture and field of view are mutually constrained.

The application discloses a dynamic polarization controller based on a silicon-based optoelectronic chip, which can lock an arbitrary polarization state light field to an arbitrary required polarization state light field. The controller couples the light of the arbitrary polarization state light field from a single-mode optical fiber into the chip through a first end face coupling structure via a first high numerical aperture optical fiber; after passing through a first polarization rotation beam splitter (PRS), the TE0 mode and TM0 mode light fields entering the chip are both converted into TE0 mode light fields; after polarization locking by adopting a waveguide 0° / 45° / 0° structure, the two TE0 mode light fields are combined into one by a second polarization rotation beam splitter and are converted into TE0 mode and TM0 mode light fields, and then are output to a second high numerical aperture optical fiber via a second end face coupling structure and are relayed into a single-mode optical fiber. The waveguide 0° / 45° / 0° structure adopts an electrically controlled phase shifter, and combines an analog annealing algorithm, a gradient algorithm and other algorithms to automatically lock the polarization state of the light.

The invention provides an inclined plane four-beam lattice light sheet super-resolution microscopic imaging device and method based on spatial spectrum estimation. The device is composed of an input light beam, a cylindrical lens group, an SLM, a reflector, a lambda / 4 wave plate, a PBS, a mask, a relay lens group, a galvanometer, an objective lens, a camera and other optical elements. By utilizing four-beam interference formed by the SLM and a high-reflectivity mirror surface on the opposite side of a sample, a lattice light sheet illumination field is realized, and fluorescence excitation is finely regulated and controlled; the same objective lens with a high numerical aperture and a three-stage infinite correction microscopic system are utilized to realize fluorescence excitation and collection, the loading space limitation of a traditional light sheet microscope is broken through, and distortion caused by high axial magnification and aberration is avoided; in combination with a spatial spectrum estimation algorithm, a measurement matrix is constructed for a low-resolution image sequence, eigenvalue decomposition is carried out, an optimal signal-to-noise ratio threshold is adaptively determined, signal and noise subspaces are divided according to the threshold, spectrum peak search is carried out by using subspace orthogonality, and thus isotropic resolution improvement is realized.

Flowcells and Raman analysis systems provide improved signal collection dynamics through increased solid-angle geometries and improved numerical aperture for near-diffraction-limited performance. A combined excitation / collection beam passes through a first optical material, a sample conduit and a second optical material. A concave reflective aspheric surface focuses and re-collimates the combined beam to and from a region of the sample within the conduit. The optical materials may comprise separate windows or may integrally form sidewalls the conduit. The reflective surface may be spaced apart from the second window or may be integrally formed with the second optical material. The focused region in the sample may approximate a point or a line, and at least a portion of the interior wall of the conduit may be reflective, causing the combined beam to pass through the sample region more than once to enhance collection efficiency.

A method for multifocal energy gradient laser holographic cutting of hard and brittle materials includes the following steps: S1, determining the parameters of the incident beam and the high numerical aperture focusing objective; S2, determining the three-dimensional multifocal beam and parameters of the target hard and brittle material; S3, setting a two-dimensional linear phase distribution on the spatial light modulator plane as the initial phase for subsequent iterative calculations; S4, establishing a forward-backward propagation iterative loop based on phase optimization to calculate the multifocal holographic phase distribution; S5, superimposing a linear blazed grating phase on the multifocal holographic phase distribution, and generating a composite diffraction phase hologram using MATLAB code and inputting it into the spatial light modulator; achieving uniform holographic cutting with consistent actual absorbed energy in each layer. This invention features controllable three-dimensional focal positions, adjustable energy gradients along the depth direction at each focal point, strong deep-layer energy compensation capability, simultaneous aberration correction, and high consistency in cutting at different depths.

According to the method, a programmable LED lamp is installed on a microscope condenser, a light source is adjusted to the height of a sample table, then four inclined illumination modes including the upper, the lower, the left and the right are switched, part of coherent light is obliquely incident to a sample, at the moment, emergent light waves carry amplitude and phase information of the sample, and the sample can be observed in a high-resolution non-destructive mode. The sample is collected by the high magnification objective lens, the corresponding intensity image is collected by the CCD camera, and the collected original image is subjected to deconvolution by using the differential phase contrast imaging principle to obtain the biological information such as the thickness and the dry mass of the sample. A programmable annular LED is adopted as an illumination light source to enhance the phase contrast of a low-frequency space and reduce noise interference, and the illumination light source forms an angle of 15 degrees with a sample platform and directly irradiates a sample to generate a uniform illumination light source. The submicron organelle can be dynamically observed in real time through the high numerical aperture objective lens, and organelle edge extraction and 3D form reconstruction are obtained by using a deconvolution reconstruction algorithm.

The application relates to the field of optical imaging technology and discloses a reflection type dark field imaging method and system based on Fourier conjugate plane modulation, the method comprising the following steps: controlling a first spatial light modulator to load a dynamic ring-shaped illumination pattern and projecting the dynamic ring-shaped illumination pattern to a back focal plane of an objective lens; utilizing the objective lens to separate light field distribution formed by scattered signal light and ring-shaped reflected light at the back focal plane; relaying the light field distribution to a conjugate plane where a second spatial light modulator is located through a second relay optical path; and controlling the second spatial light modulator to load a dynamic blocking pattern, shielding the ring-shaped reflected light and making the scattered signal light pass through, and finally imaging. Through the adoption of two electronic synchronous spatial light modulators, dynamic illumination light field and adaptive spatial filtering are respectively constructed, the illumination pattern and the blocking pattern are matched in cooperation, optical chromatic aberration is actively compensated, the problem of background leakage under wide spectrum illumination is solved, and a high numerical aperture objective lens lacking a dark field channel is compatible.

Disclosed in this disclosure is a method for super-resolution microscopic interferometric measurement based on broadband annular radially polarized light, where a broad-spectrum light source with an extended surface is selected; uniform illumination covering a to-be-tested FOV and having a certain aperture angle is provided using a Kohler illumination system; a two-stage relay system is designed, and amplitude and polarization of a full-FOV beam is modulated by a liquid crystal spatial light modulator and a vortex waveplate; broadband annular radially polarized light is focused based on the extended surface light source and a microscopic objective lens with a high numerical aperture to implement super-resolution microscopic interference imaging of a sample; and super-resolution topography measurement directed at a surface of a microstructure is implemented combined with phase-shifting interferometry.

Embodiments of the present disclosure relate to devices, systems, and methods of compact high numerical aperture light engines, such as thin optical element based light engine systems using metasurfaces for wearable displays. One embodiment includes an optical element. The optical element includes one or more spatial light modulators, wherein each spatial light modulator is an array of pixels that can be individually controlled to output visible light. The optical element also includes a surface defining an exit pupil arranged to allow the output visible light to exit the optical element through the exit pupil. The optical element also includes one or more metasurfaces disposed between the one or more spatial light modulators and the exit pupil. The one or more metasurfaces are used to focus the visible light output by the one or more spatial light modulators.

The invention provides a high numerical aperture extreme ultraviolet lithography system and a lithography method. According to the system, through a passband confinement structure of double-pupil fractional exposure, wafer exposure dose is fused by cosine weight, and a physical dissipation device is superposed to selectively couple a pupil plane odd symmetry mode, so that spurious energy is prevented from being recharged into an imaging channel; and a dual-channel dark port interference structure is introduced to monitor and correct wafer inclination and defocus disturbance in real time, and meanwhile, a mask adopts a multi-layer phase flat reflection stack and a high-infrared-emissivity protection film to ensure that the phase of a light beam is stable. A wavefront phase monitoring structure is integrated in a wafer scribing area, image pupil phase pickup and aberration parameter collection in the exposure process are achieved, the relation between the critical dimension, the dosage and the focal length deviation of each exposure field is calibrated through a unified edge rule, the consistency of an actual exposure phase and three-dimensional electromagnetic simulation is used as an imaging constraint, only second-order internal disturbance is controlled and compensated, and the imaging precision is greatly improved. And higher-order disturbance is recorded as a residual error, so that the imaging resolution and stability of high NA extreme ultraviolet lithography are remarkably improved.

The invention provides an inclined plane three-beam lattice light sheet super-resolution microscopic imaging device and method based on spatial spectrum estimation. The device comprises a light source, a cylindrical lens group, a reflector, an SLM, a lambda / 4 wave plate, a polarization splitting prism, a mask, a relay lens group, a galvanometer, a dichroscope, an objective lens, an sCMOS camera and other optical components. The SLM is used for enabling the three light beams to interfere to form a lattice light sheet so as to realize periodic illumination of the sample; the same high numerical aperture objective lens is used for exciting and collecting fluorescence, and the limitation of a traditional light sheet fluorescence microscope on sample loading is broken through; a three-stage infinite correction microscopic system is used for imaging and de-magnifying an intermediate image surface, so that distortion caused by high axial magnification and spherical aberration is avoided; a measurement matrix is constructed for a low-resolution image sequence based on a spatial spectrum estimation algorithm, singular value decomposition is performed, a signal threshold is adaptively determined by combining a noise model, fluorescence probe positioning is realized by using orthogonality of a signal and a noise subspace, and finally a high-resolution image is obtained.

SOLUTION: When a rectangular region surrounded by four sides positioned at an inner central portion of four sides parallel to the four sides of the main surfaces is set, the rectangular region having a 5mm at an intersection of diagonal lines of the rectangular main surfaces of 152mm or more and * 152mm or more, the flatness of the rectangular region is 100nm or less, when the smaller one of a difference PVx between the maximum height and the minimum height of Sx and a difference PVy between the maximum height and the minimum height of Sy is defined as PVmin and the larger one is defined as PVmax, PVmin / PVmax is ≤ 1 / 3.EFFECT: It is possible to provide a photomask in which the influence of the flatness of the substrate due to the directionality of the reduction ratio on the IPE is suppressed in the exposure by the high NA generation EUVL using a photomask, particularly in the exposure using an optical system employing an anamorphic lens, and which has a wide exposure area on the main surface and good transfer performance.SELECTED DRAWING: Figure 1

To provide an objective lens with a long working distance, a high numerical aperture, and good aberration performance. [Solution] The objective lens 1 consists of, in order from the object side, a first lens group G1 having positive refractive power and containing three or more lens components, a second lens group G2 moving along the optical axis where the ray height is highest, a third lens group G3 containing a lens component with a concave surface facing the image side at the image side of the third lens group G3, and a fourth lens group G4 containing a lens component with a concave surface facing the object side at the object side of the fourth lens group G4. The first lens group G1 includes a cemented lens on the image side of the lens component on the object side of the first lens group G1.

The embodiment of the invention provides a diamond surface planarization system and method.The system comprises a laser system assembly, a machining platform assembly and a numerical control module, specifically, the laser system assembly is used for forming a long-strip-shaped flat-topped light beam by means of modulation of a spatial light modulator and improving the light gathering capacity by combining a high numerical aperture (NA) objective lens; the focal depth is reduced; the machining platform assembly is used for driving the to-be-machined diamond to do reciprocating motion in the X-axis direction and the Y-axis direction according to the shape of the long-strip-shaped light spot formed through modulation in the machining process, so that the initial highest point of the surface of the diamond is gradually smoothed; the numerical control module is used for calculating a target displacement amount needing to be fed downwards when monitoring that the initial highest point is flattened, and sending an operation regulation and control instruction for immediately adjusting the target displacement amount to the laser system assembly; and when the laser system assembly obtains the operation regulation and control instruction, the laser system assembly vertically moves downwards according to the target displacement amount, so that the laser beam is focused on the highest point on the new machining surface again.

The invention belongs to the technical field of optical microscopic imaging, and discloses a microscopic imaging system and a stimulated radiation loss microscope. The microscopic imaging system comprises an illumination mechanism used for providing a first light beam and a second light beam which are coaxially incident; the annular partition phase modulation element comprises a first phase modulation area and a second phase modulation area connected to the peripheral side of the first phase modulation area, the first phase modulation area is circular, and the second phase modulation area is annular; the first phase modulation area and the second phase modulation area are configured to perform phase modulation and convergence on a first light beam and a second light beam which are vertically incident respectively, so that a first light spot and a second light spot which are in one-to-one correspondence and coincide in center are formed on the focal plane of the stimulated radiation loss microscope respectively. According to the technical scheme, light energy loss caused when the microscope adopts a high-numerical-aperture illumination objective lens is improved, miniaturization of the system is facilitated, and the imaging quality is improved.

The present invention provides a microscope objective which realizes a high numerical aperture and a long working distance at an appropriate magnification. The microscope objective (1) comprises: a positive first lens group (G1) comprising a plurality of meniscus lenses with a concave surface toward an object side; a second lens group (G2) comprising, on the most object side, a first cemented lens composed of a positive lens and a negative lens; a third lens group (G3) composed of a positive single lens; a fourth lens group (G4) comprising a first cemented meniscus lens with a concave surface toward the object side; a fifth lens group (G5) comprising a second cemented meniscus lens with a concave surface toward an image side composed of a positive lens and a negative lens; and a sixth lens group (G6) comprising a third cemented meniscus lens with a concave surface toward the object side composed of a positive lens and a negative lens, and satisfies the following conditional expression 0 < |f / f5| < 0.15... (1) where f is a focal length of the microscope objective (1) and f5 is a focal length of the fifth lens group (G5).

The invention provides a high numerical aperture illumination photoetching mask and a preparation method and application thereof, and the photoetching mask comprises a mask substrate which comprises a first surface and a second surface which are oppositely arranged; the light incident part is located on the first surface of the mask substrate, and the light incident part comprises a plurality of light incident units which are arranged at intervals; wherein the light incident unit is provided with a sawtooth structure in the direction perpendicular to the first surface, the width of the sawtooth structure in the first direction is gradually reduced in the direction from the first surface to the second surface, each sawtooth structure at least comprises a first inclined plane and a second inclined plane which are connected with each other, and a first included angle is formed between the first inclined plane and the first surface; a second included angle is formed between the second inclined plane and the first surface and is greater than the first included angle; the light incident part further comprises first reflecting films, the first reflecting films cover the second inclined face, and the first reflecting films are arranged at intervals. The photolithographic mask disclosed by the invention is beneficial to improving the imaging contrast and the photolithographic pattern quality, and the preparation method is simple.

The present application relates to a kind of multi-polarization incident microscopic raman spectrum stress detection method, belong to optical microscopic measurement technical field;The present application utilizes radial polarized light under high numerical aperture (NA) objective lens incidence to realize the simultaneous excitation and acquisition of longitudinal optical (LO) phonon and transverse optical (TO) phonon in conjunction with polariscope, utilizes angular polarized light under high NA objective lens incidence to realize the independent excitation and acquisition of LO phonon in conjunction with polariscope.Independent excitation LO peak under angular polarized light incidence is used as prior signal, the effective separation of TO peak and LO peak excited by radial polarized light incidence is realized, and then the principle error introduced in the TO peak difficult to excite or difficult to separate from LO peak in the traditional raman spectrum stress detection method is eliminated, and the accurate measurement of microscale three-axis principal stress is realized;The present application effectively improves the stress detection precision of silicon material and gallium arsenide material semiconductor device under complex stress condition.

The utility model relates to the technical field of optical fibers. The densely-arranged optical fiber bundle based on the photonic crystal optical fibers comprises a plurality of photonic crystal optical fibers with polygonal cross sections, each photonic crystal optical fiber comprises a fiber core and a wrapping layer wrapping the outer side of the fiber core, and a plurality of air holes penetrating through the wrapping layer in the axial direction of the wrapping layer are further formed in the wrapping layer. And on the cross section of the optical fiber bundle, at least one side of the cladding of one photonic crystal fiber is in contact with one side of the cladding of the other photonic crystal fiber, so that the plurality of photonic crystal fibers are densely arranged to form the optical fiber bundle. The photonic crystal fiber has the characteristics of relatively high numerical aperture and relatively high transmission efficiency, and has excellent performance in scenes such as illumination, image transmission and energy transmission. In addition, the photonic crystal fibers are densely arranged to form the fiber bundle, and the cladding of the photonic crystal fibers is polygonal, so that the photonic crystal fibers can be in direct contact through the edges of the cladding, seamless dense arrangement is facilitated, and the structural stability and the space utilization rate of the fiber bundle are improved.

A laser assembly includes a vertical cavity surface emitting laser and a resonant cavity extension. The resonant cavity extension is defined by two separate portions. A first portion may be formed from gallium arsenide and can define a microlens. A silicon dioxide layer can be disposed over the first portion and may be polished to a flat, planar surface. Reflective layers may interpose the first portion and second portion of the resonant cavity extension, and a reflective layer may be disposed over the planar surface. As a result of this construction, an extended cavity vertical surface emitting laser can be defined that is resistant to mode hopping and exhibits improved coherence length, beam divergence (high numerical aperture), and beam quality.

This utility model relates to the field of lens technology, specifically to an optical microscope objective. Compared with similar designs, this objective has an ultra-long working distance (working distance greater than 6.10 mm) and a large numerical aperture (numerical aperture greater than or equal to 0.75), and is simple to manufacture, which can greatly reduce the actual production cost of the objective. The first group uses two sets of cemented doublet lenses and one set of lenses, which is beneficial for controlling field curvature and eliminating chromatic aberration; the second group uses two sets of cemented doublet lenses and two sets of cemented triplets lenses, which is beneficial for eliminating axial chromatic aberration of the system; the third group has at least three meniscus single lenses, which can be used to significantly increase the numerical aperture.

The invention discloses a laser-induced fluorescence spectrum rare earth element detection method and system based on light field regulation and control, and belongs to the technical field of spectral analysis and optical precision detection. According to the method, a super-continuum spectrum light source is matched with an acousto-optic tunable filter to achieve rapid and accurate tuning of excitation wavelength, excitation light is converted into an angular or radial polarized vector light beam through a vortex wave plate, then the vector light beam is tightly focused through a high-numerical-aperture objective lens, remarkable local enhancement of a longitudinal electric field or magnetic field component is formed in a focus area, and the high-frequency laser is obtained. Therefore, electric dipole or magnetic dipole transition fluorescence signals of the rare earth ions are selectively enhanced, and the fluorescence signals are collected and analyzed by a spectrograph. The method has the advantages of high signal-to-noise ratio, strong specificity and flexible operation, and is suitable for trace detection and spatial distribution imaging of rare earth elements in geological, material and environmental samples.

The objective lens provided by the invention has the advantages of long working distance, high numerical aperture and good aberration performance. An objective lens 1 includes, in order from the object side: a first lens group having a positive refractive power and including three or more lens components; a second lens group which has the highest light height and moves on the optical axis; a third lens group including a lens component having a concave surface facing the image side at a position closest to the image side of the third lens group; and a fourth lens group including a lens component having a concave surface facing the object side at a position closest to the object side of the fourth lens group, the first lens group including a cemented lens at a position closer to the image side than the lens component closest to the object side of the first lens group.

A four-lens optical system is provided which is capable of minimizing a total length of an optical system while having a high numerical aperture (NA), and, more particularly, to an optical system including a first lens, a second lens, a third lens, and a fourth lens that are sequentially arranged from an object side to an image side of the four-lens optical system, in which the first lens and the second lens continuously disposed in front of the optical system are each configured to have positive refractive power and in which the first lens is a lens is made of a plastic material, and the fourth lens is a lens made of a glass material.

Provided herein is an ultrahigh vacuum cell for cold atom experiments with high-numerical aperture lenses and cavity mirrors integrated into the vacuum cell. A device for generating a phase stable cavity may include: a cavity spacer comprising one or more mirrors affixed to the cavity spacer; wherein the mirrors are oriented to form a three-dimensional trapping potential within the cavity spacer; wherein the cavity spacer comprises glass having a coefficient of thermal expansion of at most about 400+ / −30 ppB / ° C. at an operating temperature. A method for generating a phase stable cavity may include: providing a cavity spacer comprising one or more mirrors affixed to the cavity spacer; wherein the mirrors are oriented to form a three-dimensional trapping potential within the cavity spacer; wherein the cavity spacer comprises glass having a coefficient of thermal expansion of at most about 400+ / −30 ppB / ° C. at an operating temperature.