64 results about "Optical correction" patented technology

The invention relates to the technical field of augmented reality glasses optical correction, and specifically provides an eye movement distortion detection method. The method comprises the following steps: acquiring an AR glasses playing image and identifying a visual saliency region to establish an attention priority order; detecting an eyeball movement track direction vector and an instantaneous speed in real time; determining a predicted attention target according to the motion direction and the attention priority; generating a distortion correction parameter set in combination with eyeball arrival time and spatial distribution information; performing pre-distortion compensation rendering on the candidate area in a pre-generation period before eyeballs reach the actual attention area to form a pre-corrected image buffer area; and finally, outputting a pre-corrected image matched with the actual stay area. Space-time synchronization of eyeball movement and image compensation is achieved through predictive rendering, the image distortion and color separation phenomena in the glancing process are eliminated while the low-delay characteristic is maintained, and the visual definition and comfort in a dynamic scene are remarkably improved.

The invention discloses a wavefront detection-free adaptive optical correction method and system, and the method comprises the steps: obtaining a real in-focus image and a real out-of-focus image of a to-be-corrected light beam, and outputting an updated deformable mirror control voltage through a physical information neural network; generating a predicted wavefront phase according to the deformable mirror control voltage signal and a deformable mirror voltage-phase mapping model; generating a predicted in-focus image and a predicted out-of-focus image through a derivable Fourier optical propagation model; constructing a label-free composite loss function according to the real in-focus image, the real out-of-focus image, the predicted in-focus image and the predicted out-of-focus image; performing unsupervised training updating on the physical information neural network according to the composite loss function, and performing repeated iteration to obtain an optimized deformable mirror control voltage; and driving the deformable mirror to carry out self-adaptive optical correction in real time according to the optimized deformable mirror control voltage to obtain a correction result. According to the invention, the correction efficiency and the system stability are obviously improved.

The embodiment of the invention discloses a hydroelectric slope deformation monitoring method, a hydroelectric slope deformation monitoring system and electronic equipment. The deformation monitoring method comprises the following steps: acquiring an optical image stream, a radar image sequence and a meteorological data set; performing feature extraction on the optical image, and obtaining a target displacement sequence; performing lens inclination angle distortion correction based on the target displacement sequence to obtain optical correction data; the method comprises the following steps: acquiring a permanent scatterer deformation sequence by adopting an SBAS-InSAR technology based on a radar image sequence, generating a global deformation graph sequence by adopting a spatial interpolation algorithm, carrying out space-time alignment on a target displacement correction sequence and a meteorological data set with the global deformation graph sequence, and carrying out atmospheric delay correction based on an obtained time distribution matrix. Calibrating the radar data based on the optical data to obtain corrected radar deformation data; and hydroelectric slope deformation monitoring information is output by fusing the optical displacement data and the radar deformation data. According to the invention, the precision, timeliness and environment adaptability of deformation monitoring are enhanced.

The embodiment of the invention provides an out-of-focus lens and a design method thereof. N annular optical correction areas and N annular optical out-of-focus areas are alternately arranged on the radial outer side of one circular optical correction area and are concentric. The ratio of the total area of the annular optical defocus area to the total area of the defocus lens is 0.55-0.58. The focal power of the optical correction area is first focal power, and the focal power of the optical defocus area is second focal power. The optical correction area image space focus is located on the image space of the annular optical correction area image space focus. By applying the embodiment, the plurality of optical correction areas form a clear image on the retina of the human eye to correct refractive error of the human eye, the plurality of optical defocus areas form an image in front of the retina to generate myopia defocus to delay eye axis growth, the optical correction areas and the optical defocus areas are alternately arranged, and the eye axis growth is delayed by controlling the areas of the optical correction areas and the optical defocus areas. The peripheral defocusing effect is achieved, the visual quality is improved, and the myopia progress is delayed.

A kind of telescope active optical correction system correction accuracy testing device, including laser interferometer, multidimensional adjusting table, wave aberration measurement component and plane mirror, laser interferometer is placed in the outside of optical telescope for emitting test light to the inside of optical telescope, to detect the wave aberration data of multiple fields of view;Multidimensional adjusting table is used to adjust the position, angle of optical element in optical telescope, to simulate the situation that telescope imaging quality drops;Wave aberration measurement component is set at the image plane of telescope for measuring the wave aberration after optical telescope imaging quality drops, and plane mirror is used to reflect test light.The present application relates to a kind of telescope active optical correction system correction accuracy testing method, the displacement amount and rotation angle of optical element when comparing when simulating image quality drop and when correcting judge the correction accuracy of active optical correction system, compare wave aberration before simulating image quality drop and after correction, judge whether the image quality after correction reaches the image quality before simulating image quality drop.

This invention relates to the field of multimedia data processing, and discloses a multimedia end-to-end optical-digital collaborative processing system and method, including an optical correction device, a discretization encoding device, and a synchronous playback device. The optical correction device monitors the status of the physical execution module, calculates the digital transformation matrix and physical limit markers, encapsulates them as correction metadata, and outputs it synchronously. The discretization encoding device extracts images based on differences between adjacent frames to generate discrete visual sequences, uses synchronization pulse markers in the audio stream to perform spatiotemporal mapping on the discrete data, and encapsulates it as a multimedia file for output. The synchronous playback device parses the file, extracts the synchronization pulse markers as a global clock to calculate timing deviations, performs rendering compensation based on the physical limit markers, and generates a reverse feedback signal based on the timing deviations, sending it to the front end to trigger closed-loop adjustment. This invention solves the problems of rendering misalignment and multi-track timing deviation accumulation caused by physical truncation, maintaining end-to-end stability.

The application relates to a high-precision optical alignment assembly method of a scanning mirror, and belongs to the technical field of laser radar manufacturing equipment, and solves the technical problems of insufficient precision, no compensation for glue shrinkage, low efficiency and high cost of special equipment in the existing scanning mirror assembly. Based on the light reflection principle, the method characterizes the included angle between the scanning mirror and the motor shaft through light path amplification offset, constructs an optical alignment system by using point laser, mirror group and scale receiving plate, completes coarse adjustment and fine adjustment by cooperating with the scanning mirror adjustment jig, makes the positions of the laser spots on the scale receiving plate coincide after the motor rotates 180 degrees, and then completes UV glue curing through the light curing device, and realizes high-precision assembly by combining the glue shrinkage compensation mechanism and the quantitative verification standard. Through the optical alignment method of light path amplification offset, the quantitative adjustment, the verification standard and the glue shrinkage compensation mechanism are combined, high-precision assembly of the scanning mirror and the motor shaft is realized, the glue shrinkage preset offset compensation scheme is established, and the angle offset problem of UV glue curing shrinkage is avoided.

The utility model discloses a LCD projection structure with aspheric reflector, which comprises an LCD screen, a Fresnel lens, a projection lens and an aspheric reflector. The LCD screen is arranged on the front side of the Fresnel lens, the projection lens is arranged on the back side of the Fresnel lens, and the aspheric reflector is arranged between the Fresnel lens and the projection lens or on the back side of the projection lens. The aspheric reflector is arranged between the Fresnel lens and the projection lens or on the back side of the projection lens. The structure design utilizes the reflection characteristics of the aspheric reflector to change the propagation path of light, provides sufficient optimization freedom for the projection lens, and makes the projection lens not need to spend energy to deal with the optical correction problem. Therefore, all optimization resources can be concentrated on the improvement of picture quality and depth of field, so as to improve the quality of the projection picture.

The invention provides a multi-site adaptive optical correction method and device applied to a mesoscopic two-photon scanning microscope, and the method comprises the steps: employing a resonance mirror and two galvanometers as a scanning module of a system, dividing a whole imaging view into a plurality of sub-regions, and carrying out the sequential scanning of the sub-regions one by one; a reflective deformable mirror is used as an aberration compensator, and an aberration compensation value is updated in real time; the whole visual field is filled with a regular hexagon, the center and vertex positions of the regular hexagon are set as aberration compensation points, and a reflective deformable mirror is used for carrying out aberration correction on the compensation points in advance; and automatically loading an optical aberration compensation value closest to the center of the sub-region according to the central coordinate position of the sub-region so as to ensure that the image resolution near the optical diffraction limit is kept in the whole view region.

The invention relates to a photomask layout correction method and system, equipment and a storage medium. The photomask layout correction method comprises the following steps: acquiring a curve type photomask optical correction layout; carrying out Manhattan processing on the curve type photomask optical correction layout, and obtaining a Manhattan optimization layout based on a photoetching model; performing electron beam proximity effect correction on the Manhattan optimization layout to obtain an electron beam correction layout, and obtaining a photomask layout based on the electron beam correction layout; obtaining the contour difference between the photomask layout and the curve-type photomask optical correction layout; and correcting the Manhattan optimization layout according to the contour difference until the contour difference between the photomask layout and the curve type photomask optical correction layout is not greater than a reference threshold value, and outputting the Manhattan optimization layout. The method is used for reducing photomask manufacturing time and manufacturing difficulty of Manhattan of the curve type photomask layout, and meanwhile, the photoetching imaging quality of the Manhattan layout on the wafer is reserved to the maximum extent.

An image processing apparatus is configured to process a plurality of images acquired by sequentially capturing an object image. The image processing apparatus detects a positional shift amount between the plurality of images, generate a combined image by combining the plurality of images that have been aligned based on the positional shift amount, and acquire an optical center position of the combined image based on the positional shift amount. The optical center position is a reference position in performing optical correction processing for the combined image. A correcting amount in the optical correction processing changes according to a distance from the reference position.

The present invention provides an imaging device capable of appropriately correcting image blur when using an optical system that compresses the subject image in one direction more than in other directions. [Solution] The imaging device comprises an image sensor, an optical correction unit, an electronic correction unit, and a control unit that controls the optical correction unit and the electronic correction unit. The image sensor captures a subject image formed through the optical system and generates image data. The optical correction unit corrects image blur by moving the image sensor in a plane perpendicular to the optical axis of the optical system. The electronic correction unit corrects image blur by image processing of the image data. The optical system compresses the subject image more in a first direction perpendicular to the optical axis than in a second direction. The optical correction unit corrects rotational blur that occurs in the rotational direction around the optical axis. The electronic correction unit corrects shear strain caused by the compression of the subject image by the optical system after the rotational blur has been corrected by the optical correction unit.

This invention provides a vision-based method and system for detecting and compensating wafer particle position offset. It generates an initial imaging data set containing the surface microstructure by performing dual-view synchronous imaging on the wafer surface. Parallax matching and feature segmentation are then performed on the initial imaging data set to generate three-dimensional height information and an initial set of particle coordinates on the wafer surface. Based on the initial particle coordinate set and the charge distribution characteristics of the wafer surface, particle displacement is predicted and corrected, generating displacement compensation feature quantities for each particle. The fine-tuning optical system of the wafer inspection machine is invoked to perform optical correction on the displacement compensation feature quantities, generating corrected real-time imaging data. Coordinate registration is performed on the real-time imaging data to generate the final set of wafer particle position coordinates. This invention can improve the spatial dimensional integrity of wafer particle position detection, the comprehensiveness of multi-factor displacement prediction, and the actual physical accuracy of the detection results.

A device may be configured to signal an lens optical correction information message. In one example, the lens optical correction information message includes a syntax element specifying a string describing the applicable lens model. In one example, the lens optical correction information message includes a syntax element specifying aperture information. A device may be configured to receive the lens optical correction information message.

To provide a method of forming an object from a material.SOLUTION: The method includes directing a first beam of light toward a first target location of the material to define a first portion of the object. The method also includes, after directing the first beam of light toward the first target location, determining an optical correction to be applied by an optical system. The optical correction is based on an atmospheric change in an atmospheric distortion region proximate to the first target location due, at least in part, to interaction of the first beam of light and the material. The method further includes directing a second beam of light toward a second target location of the material to define a second portion of the object. The second beam of light is directed through at least a portion of the atmospheric distortion region while the optical correction is applied.SELECTED DRAWING: Figure 1

The application discloses a light calibration method for a light taking system with a fixed included angle with a laser expander, which adopts a novel method to adjust the light taking system, so that the light taking system on the expander is coaxial with the laser in the case that the laser and the expander have a fixed included angle, and high-precision and precise adjustment of the light calibration of the telescope light taking system is realized. The light path structure is simple, and the operation is simple, so that the light calibration efficiency is greatly improved. The light calibration method is suitable for the optical axis calibration of the edge light taking device of the laser of each wavelength, and the wavelength range depends on the wavelength range of the beam analyzer.

The invention discloses an optical correction method and device for circuit board line measurement and a storage medium, and relates to the field of image processing. Receiving a channel selection operation on the target sub-image, analyzing the pixel content of the target sub-image, and generating a binary channel image; pixel matching is carried out on the binarized channel image and the target sub-image, and the line contour fitting degree of the binarized channel image is evaluated; image color value correction is carried out on the binarized channel image when the line contour fitting degree does not reach the standard; receiving a color value correction instruction for the binarized channel graph, and regenerating a target binarized channel graph under the target color value according to the corresponding relationship between the color value and the color value curve; and when the line contour fitting degree reaches the standard, determining a channel color value parameter corresponding to the target binarization channel graph as a target parameter. By generating the binary channel graph and performing color value correction, imaging parameters of different material areas are dynamically adjusted, and the identification precision of line contours of different material areas is effectively improved, so that the accuracy of defect detection is improved.

The invention discloses an astigmatism correction type asymmetric peripheral defocusing corneal contact lens which comprises an optical correction area, a peripheral defocusing area, a transition area, an off-axis positioning area and an astigmatism axis position mark. The optical correction area provides optical imaging and astigmatism correction; the peripheral defocusing area provides asymmetric peripheral defocusing to realize hyperopia asymmetric defocusing of the marginal area of the retina; the transition area is a transition area between the outside of the peripheral defocusing area and the positioning area; the upper side and the lower side of the off-axis positioning area are different in thickness and are used for wearing and positioning the contact lens; different areas of the corneal contact lens are designed, an enforceable algorithm is provided, the optical correction area provides correction of astigmatism ametropia, the peripheral defocus area provides asymmetric hyperopia defocus, hyperopia asymmetric defocus of the marginal area of the retina is achieved, and the optical correction area and the peripheral defocus area are integrated into the corneal contact lens. The upper side and the lower side of the off-axis positioning area are different in thickness, and the off-axis positioning design of ergonomics is better met.

The invention provides a reflector bracket adjusting mechanism, and relates to the field of optical correction equipment, and the reflector bracket adjusting mechanism comprises a pedestal, a lens support, a rotation driving member, and a transmission member. Wherein the base is provided with an abutting position, the lens support is installed on the base through a revolute pair, the rotary driving part is vertically installed on one side of the lens support, the transmission part is connected with the output end of the rotary driving part, the transmission part is configured to abut against the abutting position through the side face contour of the transmission part, and in the process that the transmission part is driven by the rotary driving part to rotate, the transmission part rotates. According to the reflector bracket adjusting mechanism, the rotating driving part, the transmission part, the base and the lens bracket are matched, the adjusting angle of the lens bracket is designed within a controllable range, and the adjusting angle of the lens bracket can be adjusted within a controllable range through the rotating driving part, the transmission part, the base and the lens bracket. Equipment damage caused by too large amplitude during automatic adjustment can be avoided, the adjustment accuracy and precision can be improved, and the correction effect is improved.

The invention relates to a photomask layout correction method and system, equipment, a storage medium and a program product. The photomask layout correction method comprises the following steps: acquiring a curve type photomask optical correction layout; performing Manhattan treatment on the photomask optical correction layout to obtain a Manhattan correction layout; performing electron beam proximity effect correction on the Manhattan correction layout to obtain an electron beam correction layout; carrying out photoetching imaging verification on the electron beam correction layout; judging whether a verification result of the photoetching imaging verification meets a preset condition or not; if yes, outputting a Manhattan correction layout; and if not, carrying out edge movement iterative optimization on the Manhattan correction layout until a verification result of photoetching imaging verification of the electron beam correction layout corresponding to the Manhattan correction layout meets a preset condition. The method and the device are used for improving the Manhattan level of the curve type photomask layout so as to improve the imaging quality of the curve type photomask layout to the greatest extent.

The invention discloses a fissure-vuggy reservoir gas-water synergistic displacement flow field visualization experiment device based on a fluorescent PIV technology and an evaluation method. The device comprises a transparent fracture-cavity model, an immersion tank, external matching liquid, an injection fluid pump, a double-pulse laser, a sheet light shaping unit, a high-speed camera, a temperature control assembly, an outlet back pressure and output metering assembly and a data acquisition and processing assembly, and is used for acquiring a liquid phase image sequence and calculating a liquid phase velocity field under the gas-water synergistic displacement condition. The method comprises the steps of establishing an optical correction visualization experiment platform, calculating flow state self-adaptive injection parameters, carrying out gas-water cooperative displacement and multi-dimensional data acquisition, carrying out data processing and flow field calculation, and realizing macro-micro cooperative quantitative evaluation based on a vortex oil displacement efficiency index SEIV.

The disclosure provides an optical correction method for spectral calibration of a hyperspectral imager, including generating a measurement abnormality signal based on a comparative deviation degree value ZXj; acquiring an abnormal signal occurrence proportion BJ; generating a suspected wavelength shift signal; marking a measured spectral curve as an abnormal measured spectral curve based on a shift determination value CV; acquiring a quantity proportion value JK of abnormal measured spectral curves, and determining whether wavelength has shifted; obtaining data point transmission fluctuation parameters FG based on analysis of transmission data of data points; determining the data point transmission stability during a measurement of a standard light source by the hyperspectral imager; acquiring a period overlap degree value AS; comparing the period overlap degree value AS with a period overlap degree threshold, and determining whether the cause for the wavelength shift is poor data point transmission stability base on a comparison result.

A device may be configured to signal an lens optical correction information message. In one example, the lens optical correction information message includes a syntax element identifying a type of vignetting model. The syntax element may identifying a type of vignetting model as a polynomial sixth order model. A device may be configured to receive the lens optical correction information message.

The application discloses a marker-free anti-occlusion ventricle and intracranial hematoma puncture AR navigation method and system based on monocular vision, and belongs to the technical field of medical augmented reality. The method comprises the following steps: acquiring a preoperative three-dimensional medical image model of a patient; collecting a video in real time by using a monocular camera of a consumer-level device, and constructing a three-dimensional model of the body surface of the patient by using a three-dimensional reconstruction algorithm such as neural rendering; eliminating visual interference such as a surgical drape and strong light reflection by using an optical correction technology; adopting a time sequence hybrid registration mechanism comprising a global locking period, an inertial maintenance period and a local correction period, so as to accurately align the reconstructed model with the image model, and realize continuous tracking when the visual signal is lost; and finally generating an augmented reality view for navigation. The method does not need an external tracker and a surgical marker, and can realize high-precision, anti-occlusion and real-time navigation by using a portable device, so that the cost and use threshold of surgical navigation are significantly reduced, and the method has a very high clinical application value.

The application discloses an optical proximity correction method, system and computer readable storage medium, comprising: obtaining a first design layout, a second design layout and a first mask layout of the first design layout, wherein the first mask layout is obtained by converting first design layout data; performing XOR comparison between the first design layout and the second design layout to generate to-be-corrected region information, wherein the to-be-corrected region information comprises region coordinate information; performing optical proximity correction on the second design layout according to the to-be-corrected region information and the first mask layout to obtain a correction result; and performing replacement processing on the first mask layout according to the region coordinate information and the correction result to obtain a second mask layout. In the embodiment of the application, the difference between the second design layout and the first design layout can be automatically compared, and the optical correction efficiency is improved.

A device may be configured to signal an lens optical correction information message. In one example, the lens optical correction information message includes a syntax element identifying a type of vignetting model. The syntax element may identifying a type of vignetting model as a polynomial sixth order model. A device may be configured to receive the lens optical correction information message.

This disclosure provides a method for correcting a mask pattern, comprising: acquiring a target pattern, the target pattern including at least a first pattern and a second pattern, the first pattern and the second pattern being close to each other; forming an auxiliary pattern near the position where the first pattern and the second pattern are close to each other, and using the target pattern and the auxiliary pattern together as an initial mask pattern; performing a preprocessing operation on the target pattern to obtain a preset target pattern, the area of ​​which is smaller than the sum of the areas of the target pattern and the auxiliary pattern; and performing an optical correction operation based on the preset target pattern and the initial mask pattern.

An ophthalmic lens including an anterior surface and a posterior surface meeting at a lens edge, a central optic zone providing optical correction for a user, a peripheral zone extending from said optic zone radially to said lens edge, and at least a first patterned zone positioned within the peripheral zone including a plurality of circumferential grooves or ridges.

The present disclosure is directed to contact lenses for the correcting a refractive error, particularly astigmatism, and other corneal irregularities. An exemplary lens comprises an inner portion, a peripheral portion, and a juncture therebetween. The inner portion provides optical correction for an eye. The peripheral portion conforms to a corneal surface of the eye. The juncture is a structurally flexible portion of the ophthalmic lens such that deformation of the peripheral portion in response to conforming to an astigmatism or higher order aberration of the corneal surface does not substantially deform the inner portion. When the lens is placed on the eye, the inner portion vaults over the corneal surface to form a lenticular volume. The optical correction is provided by a combination of the inner portion and the lenticular volume.

The invention discloses a carbon isotope fingerprint spectrum analysis method of an atmospheric pollution source, a thermal / optical carbon analysis method is optimized by adjusting a heating program, optical correction and other technologies so as to realize accurate separation of OC and EC, optimization and transformation are performed by combining low-temperature enrichment-normal-temperature purging, an analyzer interface, a connecting device and the like, and the carbon isotope fingerprint spectrum analysis method of the atmospheric pollution source is obtained. And automatic, continuous and accurate measurement of carbon components delta 13CEC and delta 13COC in tail gas of fossil fuel and biomass fuel is realized.