101 results about "Optical correction" patented technology

There is provided a method for video encoding and decoding based on a picture of a video and a supplementary enhancement information (SEI) message which is associated with the at least one picture and indicates one or more parameters of an optical correction to be applied to the at least one picture.

A method and system for estimating dimensions of vehicle exterior defects using multiple cameras arranged in a predefined configuration. The method comprises receiving images from multiple strategically positioned image sensors including side cameras parallel to a vehicle height axis, diagonal cameras at an inclined angle, and roof top cameras perpendicular to the height axis. An angle to detected defects is computed based on image sensor parameters. Different distance calculations are applied based on vehicle section location, with specialized formulas for windshield, back window, and roof components. Defect sizes are computed by determining multiple defect dimensions, with at least one dimension being adjusted by an angular correction factor derived from the relationship between camera angle and vehicle surface orientation. The system implements comprehensive validation through cross-referencing between cameras, comparison with known specifications, and measurement consistency analysis across multiple frames.

The invention relates to the technical field of augmented reality glasses optical correction, and specifically provides an eye movement distortion detection method. The method comprises the following steps: acquiring an AR glasses playing image and identifying a visual saliency region to establish an attention priority order; detecting an eyeball movement track direction vector and an instantaneous speed in real time; determining a predicted attention target according to the motion direction and the attention priority; generating a distortion correction parameter set in combination with eyeball arrival time and spatial distribution information; performing pre-distortion compensation rendering on the candidate area in a pre-generation period before eyeballs reach the actual attention area to form a pre-corrected image buffer area; and finally, outputting a pre-corrected image matched with the actual stay area. Space-time synchronization of eyeball movement and image compensation is achieved through predictive rendering, the image distortion and color separation phenomena in the glancing process are eliminated while the low-delay characteristic is maintained, and the visual definition and comfort in a dynamic scene are remarkably improved.

The invention provides an optical correction camera lens module and an imaging method thereof. The method comprises the following steps: extracting a radial distortion parameter and a tangential distortion parameter from an original imaging image; performing target identification on the original imaging image to obtain a plurality of identification targets, performing regularized screening to obtain a regularized identification target, extracting a pixel reduction matrix of the regularized identification target based on a regularized target library, performing region reconstruction on a corresponding region of the original imaging image according to the pixel reduction matrix, and performing region reconstruction on a corresponding region of the original imaging image; extracting a radial distortion correction parameter and a tangential distortion correction parameter according to the reconstructed image area; and constructing an optical correction model based on the radial distortion correction parameter and the tangential distortion correction parameter, performing distortion correction on the original imaging image through the optical correction model to obtain a target imaging image, extracting a regularized identification target according to the original imaging image, and extracting a dynamic distortion correction parameter through the regularized identification target to obtain the target imaging image. And the real-time performance of imaging distortion correction is improved.

In a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least one image of a pattern arranged in the region of an object plane of the projection lens, using radiation from a wavelength range around a design wavelength < 260 nm, a substrate (SUB) is coated with a relatively thick radiation-sensitive photoresist layer (RS) and exposed using a projection lens (PO). This lens produces a focus at a design focus position (FOCO) at the design wavelength and, for other wavelengths outside the wavelength range, offset focus positions from an axially extended focus area (ΔFOC) around the design focus position (FOCO). The projection lens is designed as a single-waisted or double-waisted system.During an exposure time interval, different wavelengths from the wavelength range around the design wavelength are used such that the axial extent of the focus area is at least as large as the layer thickness. The projection lens is optically corrected for chromatic aberration (CHV) such that, in the region of the design wavelength, the image scale is essentially independent of the wavelength, so that a change in wavelength of 1 picometer results in a maximum variation of 2 nm between the position of an image point corresponding to an object point within an image field.

The invention belongs to the technical field of LED driving, and particularly relates to a software compensation color correction method for LED lamp beads. By means of a light splitting test system in a lamp bead packaging link, key parameter values such as the position and the wavelength of a light-emitting wafer of each lamp bead and a lamp bead collection temperature value are comprehensively recorded, optical correction values are measured and calculated, and the optical correction values are stored in registers in the lamp beads; the application device is powered on to output the target brightness value, and the lamp bead calls the optical correction value in the register to achieve accurate control over the color of the lamp bead. The method provided by the invention thoroughly breaks through the limitation of a traditional Bin scheme, 96% of brightness / chromaticity deviation can be eliminated, lamp beads of different batches under different working conditions have completely consistent optical characteristics, and the method is particularly suitable for scenes such as Micro-LED display, medical endoscopes and the like which have extremely strict requirements on color precision.

In a projection exposure method for exposing a substrate arranged in the area of ​​an image plane of a projection lens with at least one image of a pattern arranged in the area of ​​an object plane of the projection lens with radiation from a wavelength range around a design wavelength < 260 nm, a projection lens (PO) is used which is optically corrected such that at the design wavelength a focus is generated in a design focus position (FOC0) and for other wavelengths from the wavelength range offset focus positions are generated from an axially extended focus area (ΔFOC) around the design focus position (FOC0).The projection lens has a wavefront manipulation system (WFM) for controllably influencing the wavefront of the projection radiation extending from the object plane to the image plane, wherein the wavefront manipulation system (WFM) has at least one manipulator which, in response to control signals from a control unit within a usable setpoint range, undergoes setpoint changes that lead to changes in the wavefront. The method comprises the following steps: . Coating the substrate (SUB) with a radiation-sensitive photoresist layer (RS) having a layer thickness (SD); exposing the photoresist-coated substrate with the image of the pattern using radiation that, under the control of a control unit, has different wavelengths from a wavelength range with a spectral bandwidth around the design wavelength according to a predetermined temporal sequence; synchronizing a wavefront manipulation system (WFM) control with the temporal sequence of radiation of different wavelengths such that a lateral chromatic aberration caused by switching between different wavelengths is at least partially compensated.

The invention discloses a wavefront detection-free adaptive optical correction method and system, and the method comprises the steps: obtaining a real in-focus image and a real out-of-focus image of a to-be-corrected light beam, and outputting an updated deformable mirror control voltage through a physical information neural network; generating a predicted wavefront phase according to the deformable mirror control voltage signal and a deformable mirror voltage-phase mapping model; generating a predicted in-focus image and a predicted out-of-focus image through a derivable Fourier optical propagation model; constructing a label-free composite loss function according to the real in-focus image, the real out-of-focus image, the predicted in-focus image and the predicted out-of-focus image; performing unsupervised training updating on the physical information neural network according to the composite loss function, and performing repeated iteration to obtain an optimized deformable mirror control voltage; and driving the deformable mirror to carry out self-adaptive optical correction in real time according to the optimized deformable mirror control voltage to obtain a correction result. According to the invention, the correction efficiency and the system stability are obviously improved.

The embodiment of the invention discloses a hydroelectric slope deformation monitoring method, a hydroelectric slope deformation monitoring system and electronic equipment. The deformation monitoring method comprises the following steps: acquiring an optical image stream, a radar image sequence and a meteorological data set; performing feature extraction on the optical image, and obtaining a target displacement sequence; performing lens inclination angle distortion correction based on the target displacement sequence to obtain optical correction data; the method comprises the following steps: acquiring a permanent scatterer deformation sequence by adopting an SBAS-InSAR technology based on a radar image sequence, generating a global deformation graph sequence by adopting a spatial interpolation algorithm, carrying out space-time alignment on a target displacement correction sequence and a meteorological data set with the global deformation graph sequence, and carrying out atmospheric delay correction based on an obtained time distribution matrix. Calibrating the radar data based on the optical data to obtain corrected radar deformation data; and hydroelectric slope deformation monitoring information is output by fusing the optical displacement data and the radar deformation data. According to the invention, the precision, timeliness and environment adaptability of deformation monitoring are enhanced.

The embodiment of the invention provides an out-of-focus lens and a design method thereof. N annular optical correction areas and N annular optical out-of-focus areas are alternately arranged on the radial outer side of one circular optical correction area and are concentric. The ratio of the total area of the annular optical defocus area to the total area of the defocus lens is 0.55-0.58. The focal power of the optical correction area is first focal power, and the focal power of the optical defocus area is second focal power. The optical correction area image space focus is located on the image space of the annular optical correction area image space focus. By applying the embodiment, the plurality of optical correction areas form a clear image on the retina of the human eye to correct refractive error of the human eye, the plurality of optical defocus areas form an image in front of the retina to generate myopia defocus to delay eye axis growth, the optical correction areas and the optical defocus areas are alternately arranged, and the eye axis growth is delayed by controlling the areas of the optical correction areas and the optical defocus areas. The peripheral defocusing effect is achieved, the visual quality is improved, and the myopia progress is delayed.

The invention discloses a peripheral defocus principle-based progressive multi-focus optical correction method, which belongs to the technical field of vision correction and comprises the following steps of S1, collecting eye data of teenagers; s2, eye biological parameters are extracted; s3, calculating the change relation between the center defocusing amount and the peripheral defocusing amount under the dynamic change of different field angles and different pupil diameters; s4, presetting a target center defocusing amount and a peripheral defocusing amount of the progressive multi-focus lens under different field angles and different pupil diameter dynamic changes, and calculating a difference value between the target center defocusing amount and the peripheral defocusing amount under different field angles and different pupil diameter dynamic changes of eyes as a to-be-adjusted defocusing amount; s5, calculating parameters of the progressive multi-focus lens; s6, constructing a progressive multi-focus lens model; s7, optimizing the progressive multi-focus lens model; s8, performing optical correction by using the optimized progressive multi-focus lens model; the traditional Chinese medicine composition has a treatment effect and a prevention and control effect at the same time.

A kind of telescope active optical correction system correction accuracy testing device, including laser interferometer, multidimensional adjusting table, wave aberration measurement component and plane mirror, laser interferometer is placed in the outside of optical telescope for emitting test light to the inside of optical telescope, to detect the wave aberration data of multiple fields of view;Multidimensional adjusting table is used to adjust the position, angle of optical element in optical telescope, to simulate the situation that telescope imaging quality drops;Wave aberration measurement component is set at the image plane of telescope for measuring the wave aberration after optical telescope imaging quality drops, and plane mirror is used to reflect test light.The present application relates to a kind of telescope active optical correction system correction accuracy testing method, the displacement amount and rotation angle of optical element when comparing when simulating image quality drop and when correcting judge the correction accuracy of active optical correction system, compare wave aberration before simulating image quality drop and after correction, judge whether the image quality after correction reaches the image quality before simulating image quality drop.

The present invention discloses an optical measurement method for colored cotton fiber whisker tuft curves based on approximate secondary reflectivity and bulk correction. The method comprises the following steps: firstly, obtaining a fiber reflection signal and a fiber whisker transmission signal by using red, yellow and blue three-channel monochromatic light; then correcting the reflectivity of the colored cotton fiber with a fixed stacking density by using a secondary estimation optical algorithm for the monochromatic light reflectivity; then, calculating an optical linear density distribution curve of a random double-ended whisker tuft by using the light transmission signal obtained from the whisker tuft image, the corrected reflectivity signal and an optical surface density algorithm; finally, calculating a colored cotton fiber whisker tuft curve by using an optical correction algorithm for the bulkiness of combed cotton fibers or lint loose fibers. The method is applicable to measuring the lengths of cotton fibers of different colors and is more accurate than a method directly using grayscale reflectivity or ideal reflectivity. The method can also be used to measure the mass density distribution of colored cotton fibers or polymer stacking materials.

This invention relates to the field of multimedia data processing, and discloses a multimedia end-to-end optical-digital collaborative processing system and method, including an optical correction device, a discretization encoding device, and a synchronous playback device. The optical correction device monitors the status of the physical execution module, calculates the digital transformation matrix and physical limit markers, encapsulates them as correction metadata, and outputs it synchronously. The discretization encoding device extracts images based on differences between adjacent frames to generate discrete visual sequences, uses synchronization pulse markers in the audio stream to perform spatiotemporal mapping on the discrete data, and encapsulates it as a multimedia file for output. The synchronous playback device parses the file, extracts the synchronization pulse markers as a global clock to calculate timing deviations, performs rendering compensation based on the physical limit markers, and generates a reverse feedback signal based on the timing deviations, sending it to the front end to trigger closed-loop adjustment. This invention solves the problems of rendering misalignment and multi-track timing deviation accumulation caused by physical truncation, maintaining end-to-end stability.

The application relates to a high-precision optical alignment assembly method of a scanning mirror, and belongs to the technical field of laser radar manufacturing equipment, and solves the technical problems of insufficient precision, no compensation for glue shrinkage, low efficiency and high cost of special equipment in the existing scanning mirror assembly. Based on the light reflection principle, the method characterizes the included angle between the scanning mirror and the motor shaft through light path amplification offset, constructs an optical alignment system by using point laser, mirror group and scale receiving plate, completes coarse adjustment and fine adjustment by cooperating with the scanning mirror adjustment jig, makes the positions of the laser spots on the scale receiving plate coincide after the motor rotates 180 degrees, and then completes UV glue curing through the light curing device, and realizes high-precision assembly by combining the glue shrinkage compensation mechanism and the quantitative verification standard. Through the optical alignment method of light path amplification offset, the quantitative adjustment, the verification standard and the glue shrinkage compensation mechanism are combined, high-precision assembly of the scanning mirror and the motor shaft is realized, the glue shrinkage preset offset compensation scheme is established, and the angle offset problem of UV glue curing shrinkage is avoided.

A system is disclosed for determining optical correction information of optical equipment. The system includes a camera system for capturing at least one camera image, a target, toward which the camera system is directed, a detection area between the camera system and the target for receiving the optical equipment including at least one lens, and a processing system with a searching routine for determining at least one center of the at least one lens based on the at least one camera image of the target via the optical equipment.

The utility model discloses a LCD projection structure with aspheric reflector, which comprises an LCD screen, a Fresnel lens, a projection lens and an aspheric reflector. The LCD screen is arranged on the front side of the Fresnel lens, the projection lens is arranged on the back side of the Fresnel lens, and the aspheric reflector is arranged between the Fresnel lens and the projection lens or on the back side of the projection lens. The aspheric reflector is arranged between the Fresnel lens and the projection lens or on the back side of the projection lens. The structure design utilizes the reflection characteristics of the aspheric reflector to change the propagation path of light, provides sufficient optimization freedom for the projection lens, and makes the projection lens not need to spend energy to deal with the optical correction problem. Therefore, all optimization resources can be concentrated on the improvement of picture quality and depth of field, so as to improve the quality of the projection picture.

There is provided a method for video encoding and decoding based on a picture of a video and a supplementary enhancement information (SEI) message which is associated with the at least one picture and indicates one or more parameters of an optical correction to be applied to the at least one picture.

The invention provides a multi-site adaptive optical correction method and device applied to a mesoscopic two-photon scanning microscope, and the method comprises the steps: employing a resonance mirror and two galvanometers as a scanning module of a system, dividing a whole imaging view into a plurality of sub-regions, and carrying out the sequential scanning of the sub-regions one by one; a reflective deformable mirror is used as an aberration compensator, and an aberration compensation value is updated in real time; the whole visual field is filled with a regular hexagon, the center and vertex positions of the regular hexagon are set as aberration compensation points, and a reflective deformable mirror is used for carrying out aberration correction on the compensation points in advance; and automatically loading an optical aberration compensation value closest to the center of the sub-region according to the central coordinate position of the sub-region so as to ensure that the image resolution near the optical diffraction limit is kept in the whole view region.

The invention relates to a photomask layout correction method and system, equipment and a storage medium. The photomask layout correction method comprises the following steps: acquiring a curve type photomask optical correction layout; carrying out Manhattan processing on the curve type photomask optical correction layout, and obtaining a Manhattan optimization layout based on a photoetching model; performing electron beam proximity effect correction on the Manhattan optimization layout to obtain an electron beam correction layout, and obtaining a photomask layout based on the electron beam correction layout; obtaining the contour difference between the photomask layout and the curve-type photomask optical correction layout; and correcting the Manhattan optimization layout according to the contour difference until the contour difference between the photomask layout and the curve type photomask optical correction layout is not greater than a reference threshold value, and outputting the Manhattan optimization layout. The method is used for reducing photomask manufacturing time and manufacturing difficulty of Manhattan of the curve type photomask layout, and meanwhile, the photoetching imaging quality of the Manhattan layout on the wafer is reserved to the maximum extent.

An image processing apparatus is configured to process a plurality of images acquired by sequentially capturing an object image. The image processing apparatus detects a positional shift amount between the plurality of images, generate a combined image by combining the plurality of images that have been aligned based on the positional shift amount, and acquire an optical center position of the combined image based on the positional shift amount. The optical center position is a reference position in performing optical correction processing for the combined image. A correcting amount in the optical correction processing changes according to a distance from the reference position.

The present invention provides an imaging device capable of appropriately correcting image blur when using an optical system that compresses the subject image in one direction more than in other directions. [Solution] The imaging device comprises an image sensor, an optical correction unit, an electronic correction unit, and a control unit that controls the optical correction unit and the electronic correction unit. The image sensor captures a subject image formed through the optical system and generates image data. The optical correction unit corrects image blur by moving the image sensor in a plane perpendicular to the optical axis of the optical system. The electronic correction unit corrects image blur by image processing of the image data. The optical system compresses the subject image more in a first direction perpendicular to the optical axis than in a second direction. The optical correction unit corrects rotational blur that occurs in the rotational direction around the optical axis. The electronic correction unit corrects shear strain caused by the compression of the subject image by the optical system after the rotational blur has been corrected by the optical correction unit.

The invention discloses a photolithographic dense array micro lens fused soft light myopia prevention lens, which comprises a lens main body, a functional region is arranged in the lens main body, and the functional region comprises a central optical correction region and a photolithographic ultramicro multifunctional structure region which are arranged on the inner side, the photoetching ultramicro multifunctional structure area is located on the outer side of the central optical correction area, an annular blank area is arranged on the outer side of the photoetching ultramicro multifunctional structure area, and the photoetching ultramicro multifunctional structure area comprises an inner side annular microstructure area, a middle spoke-shaped microstructure area and an outer side densely-arranged microstructure array area. And a dot-matrix soft light structure region is manufactured in a gap of the photoetching ultramicro lens through a nano-scale photoetching process. Compared with the prior art, the method has the advantages that 1, significant attenuation of the prevention and control effect along with time is reduced; 2, the excellent comfort is almost non-inductive; 3, multi-mechanism cooperation is realized, and the prevention and control effect is maximized.

This invention provides a vision-based method and system for detecting and compensating wafer particle position offset. It generates an initial imaging data set containing the surface microstructure by performing dual-view synchronous imaging on the wafer surface. Parallax matching and feature segmentation are then performed on the initial imaging data set to generate three-dimensional height information and an initial set of particle coordinates on the wafer surface. Based on the initial particle coordinate set and the charge distribution characteristics of the wafer surface, particle displacement is predicted and corrected, generating displacement compensation feature quantities for each particle. The fine-tuning optical system of the wafer inspection machine is invoked to perform optical correction on the displacement compensation feature quantities, generating corrected real-time imaging data. Coordinate registration is performed on the real-time imaging data to generate the final set of wafer particle position coordinates. This invention can improve the spatial dimensional integrity of wafer particle position detection, the comprehensiveness of multi-factor displacement prediction, and the actual physical accuracy of the detection results.

The invention discloses an optical correction model and an acquisition method thereof, and a mask pattern correction method, and the mask pattern correction method comprises the steps: providing a to-be-corrected layout which comprises a first to-be-corrected pattern and a second to-be-corrected pattern; providing an optical correction model; performing first optical proximity effect correction on the first to-be-corrected graph by adopting a first correction model to obtain a first corrected graph; performing second optical proximity effect correction on the second to-be-corrected graph by adopting a second correction model to obtain a second corrected graph; a correction layout is obtained, the correction layout comprises a first correction graph and a second correction graph, the first correction graph is in one-to-one correspondence with the first to-be-corrected graph, and the second correction graph is in one-to-one correspondence with the second to-be-corrected graph. According to the correction method, the correction result accuracy of optical proximity correction can be improved, so that the size precision of the semiconductor structure is improved.

A device may be configured to signal an lens optical correction information message. In one example, the lens optical correction information message includes a syntax element specifying a string describing the applicable lens model. In one example, the lens optical correction information message includes a syntax element specifying aperture information. A device may be configured to receive the lens optical correction information message.

To provide a method of forming an object from a material.SOLUTION: The method includes directing a first beam of light toward a first target location of the material to define a first portion of the object. The method also includes, after directing the first beam of light toward the first target location, determining an optical correction to be applied by an optical system. The optical correction is based on an atmospheric change in an atmospheric distortion region proximate to the first target location due, at least in part, to interaction of the first beam of light and the material. The method further includes directing a second beam of light toward a second target location of the material to define a second portion of the object. The second beam of light is directed through at least a portion of the atmospheric distortion region while the optical correction is applied.SELECTED DRAWING: Figure 1

In a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least one image of a pattern arranged in the region of an object plane of the projection lens with radiation from a wavelength range around a design wavelength of < 260 nm, a substrate (SUB) is coated with a relatively thick radiation-sensitive photoresist layer (RS) and exposed with the aid of a projection lens (PO) which produces a focus in a design focus position (FOC0) at the design wavelength and offset focus positions from an axially extended focus region (ΔFOC) around the design focus position (FOC0) for other wavelengths from the wavelength range. The projection lens is configured as a single-waist system or two-convexity system. During an exposure time interval, different wavelengths from the wavelength range around the design wavelength are used in such a way that an axial extent of the focus region is at least equal to the magnitude of the layer thickness. The projection lens is optically corrected with regard to the transverse chromatic aberration CHV in such a way that in the region of the design wavelength, the imaging scale is substantially independent of the wavelength such that in the case of a change in the wavelength by 1 picometre, a position of an image point associated with an object point varies by at most 2 nm for all image points within an image field.

The present application provides a kind of fog sand multi-point defocus lens and glasses, it is related to lens technical field, the fog sand multi-point defocus lens includes lens, optical correction area is provided on the lens, defocus area and fog sand area, optical correction area is arranged in the middle position of the lens, defocus area and fog sand area are sequentially annularly arranged outside optical correction area from inside to outside, the glasses includes the fog sand multi-point defocus lens;The optical correction area of the present application is located in the middle, has good visual correction effect, defocus area is located in the outside, adopts multi-point defocus structure, on the basis that visual correction effect is not affected, myopia multi-point positive defocus can inhibit eye axis elongation, so as to play the effect of inhibiting myopia deepening, hyperopia multi-point negative defocus can stimulate eye axis elongation, so as to play the effect of inhibiting hyperopia deepening, fog sand area is located in the periphery, can reduce retinal imaging contrast and brightness, fog sand area and defocus area cooperate with each other, also have the effect of stabilizing eye position and preventing strabismus.

The application discloses a light calibration method for a light taking system with a fixed included angle with a laser expander, which adopts a novel method to adjust the light taking system, so that the light taking system on the expander is coaxial with the laser in the case that the laser and the expander have a fixed included angle, and high-precision and precise adjustment of the light calibration of the telescope light taking system is realized. The light path structure is simple, and the operation is simple, so that the light calibration efficiency is greatly improved. The light calibration method is suitable for the optical axis calibration of the edge light taking device of the laser of each wavelength, and the wavelength range depends on the wavelength range of the beam analyzer.