350results about How to "Large numerical aperture" patented technology

An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.

An apparatus for imaging one or more selected fluorescence indications from a microfluidic device. The apparatus includes an imaging path coupled to least one chamber in at least one microfluidic device. The imaging path provides for transmission of one or more fluorescent emission signals derived from one or more samples in the at least one chamber of the at least one microfluidic device. The chamber has a chamber size, the chamber size being characterized by an actual spatial dimension normal to the imaging path. The apparatus also includes an optical lens system coupled to the imaging path. The optical lens system is adapted to transmit the one or more fluorescent signals associated with the chamber.

A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

A system for homogenizing the intensity profile of light includes a plurality of fiber coupled light sources for emitting fiber output beams from fiber output ends, and a light pipe optically coupled to the fiber output beams for producing a uniform light pipe output beam, an interleaver that transmits a first set of fiber output beams and reflects a second set of fiber output beams so that the principal rays of the fiber output beams propagate in a common plane, a first optical element for converging the principal rays, and a second optical element for telecentrically imaging the beams into the light pipe such that the principal rays of the beams propagate parallel to each other and the beams are focused in the light pipe in a focal plane transverse to the direction of propagation.

The present invention provides for an apparatus and a method for determining a property of a fluid which flows through a biological tubular structure, such as blood flowing through a capillary vessel (112) under the skin (114). This enables in vivo non-invasive blood analysis. An objective (108) having a variable numerical aperture (116) is used to enable automatic detection of a blood vessel (112) and to provide a high signal to noise ratio of the return radiation for the purposes of the spectroscopic analysis and to provide a small detection volume that fits completely within the target region.

Catadioptric projection systems are disclosed for projecting an illuminated region of a reticle onto a corresponding region on a substrate. The systems are preferably used with ultraviolet light sources (e.g., 193 nm). The systems comprise a first imaging system, a concave mirror, and a second imaging system. The first imaging system comprises a single-pass lens group and a double-pass lens group. The single-pass lens group comprises a first negative subgroup, a positive subgroup, and a second negative subgroup. Light from the illuminated region of the reticle passes through the single-pass lens group and the double-pass lens group, and reflects from the concave mirror to pass back through the double-pass lens group to form an intermediate image of the illuminated region of the reticle. The light is then directed to the second imaging system that re-images the illuminated region of the reticle on the substrate. Alternatively, light from the single-pass lens group is reflected by a turning mirror to the double-pass lens group, wherein the light returning through the double-pass lens group continues directly to the second imaging system.

A refractive projection optical system for imaging a first object into a region of a second object comprises a plurality of lenses disposed along an imaging beam path of the projection optical system; wherein the projection optical system is configured to have a numerical aperture on a side of the second object of greater than 1 wherein the projection optical system is configured to generate an intermediate image of the first object and to image the intermediate image into the region of the second object, wherein the intermediate image is formed in between, the first and second objects.

A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108) and which has an absorber material, the mask structure (109) having a maximum thickness of less than 100 nm, preferably not exceeding a maximum thickness of 30 nm, particularly preferably 20 nm, in particular 10 nm. Also disclosed is an EUV lithography system having such a mask (105) and a method for optimising the imaging of such a mask (105).

The invention discloses a manufacturing method of a thin film transistor and a transistor manufactured by the method, wherein the method is characterized by comprising the following steps: sequentially forming a surface covering layer, a polycrystalline silicon island active layer, a grid insulating layer, a grid electrode conducting layer and an auxiliary layer on a baseplate, photoetching the auxiliary layer to form an LDD forming layer, and forming a lightly doped drain electrode region, a heavily doped source electrode, a heavily doped drain electrode and a channel on the polycrystalline silicon island active layer by utilizing the action of the LDD forming layer and through only once doped ion implantation. The method of the invention only needs once ion implantation, simplifies the manufacturing working procedures and lowers the manufacturing cost; the thin film transistor which is manufactured by adopting the method and provided with a lightly doped drain electrode has the advantages of small electrode area and large numerical aperture.

A catoptric projection optical system for projecting a reduced size of a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image between the object surface and image surface, includes six or more mirrors, wherein a position of an exit pupil with respect to the intermediate image is located between the object surface and image surface, and wherein the largest angle between principal rays and an optical axis for angles of view at the position of the exit pupil is sin⁻¹NA or smaller, where NA is a numerical aperture at the side of the image surface.

The invention relates to a method for optically detecting at least one entity which is arranged on a substrate. The at least one entity is scanned with a measuring volume using at least one radiation source and a confocal optic. During a scanning process an auxiliary focus is generated by means of at least one second radiation source and a second optic. Radiation generated by the first radiation source is collimated by a first optic and radiation generated by the second radiation source is collimated by a second optic. A retroreflection from the auxiliary focus is detected by at least one detector and is used to measuring the position of an interface and, thus, for indirectly positioning the measuring volume. The position of the auxiliary focus relative to the measuring volume is adjustable in a defined manner.

An optical fiber having a length can include a core and at least one cladding disposed about the core, where the one cladding can comprise at least first volumetric regions having a first refractive index n₁ and second volumetric regions having a second refractive index n₂, different from n₁, and the first and second volumetric regions in any cross-section taken through the fiber can be randomly intermingled with one another, where the random intermingling of the first and second volumetric regions changes with changes in the location of the cross-section along the length of the fiber.

The planar lens of the invention having a flat glass substrate, in which a refractive index distribution is formed by diffusing a refractive index-increasing component into the flat glass substrate in a substantially hemispherical form or semicylinder form, wherein the refractive index-increasing component is silver, and the flat glass substrate comprises Li as an alkali metal that is subject to an ion exchange with the silver.

An optical detection system for a microfluidic device and a dry-focus microfluidic device compatible with the compact optical detection system are described. The system includes an LED; means for collimating light emitted by the LED; an aspherical, fused-silica objective lens; means for directing the collimated light through the objective onto a microfluidic device; and means for detecting a fluorescent signal emitted from the microfluidic device. The working distance between the objective and the device allows light from an external LED or laser to be brought in along a diagonal path to illuminate the microfluidic device. The dry-focus microfluidic device includes multiple channels and multiple closed optical alignment marks having curved walls. At least one of the channels is positioned between at least two of the marks. The marks are illuminated for alignment and focusing purposes by light brought in on a diagonal path from an external white LED.

An optical fiber coupling part capable of reducing coupling loss while maintaining a large operating distance, and having a good module assembling property. AT least one GRIN lens having numerical aperture NA that is larger than numerical aperture NAs of a light-emitting source (such as a semiconductor laser) is fusion-spliced with one end of the optical fiber. All lights emitted from the light-emitting source can enter the GRIN lens, and the loss of the light can thereby be reduced. In addition, a second GRIN lens having numerical aperture NA₂ is fusion-spliced with one end of the optical fiber having numerical aperture NA_f, and further a first GRIN lens having numerical aperture NA₁, which is larger than numerical aperture NA₂, is fusion-spliced with the other end of the second GRIN lens. Thereby, the light emitted from the light-emitting source can efficiently enter the optical fiber, and loss of the light can thereby be reduced. In this case, the formula expressed by NA_f≦NA₂<NA_s≦NA₁ is desirable.

A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.

A solid immersion lens 11 has an inclined portion 4 formed on at least a part thereof from the tip end portion of the objective side to a spherical portion and an inclination angle θ is expressed as θ≧i where θi represents the angle of incidence of light incident on the solid immersion lens 11. There are provided a solid immersion lens capable of increasing a tilt margin between a lens and an optical recording medium and so on and which can decrease a diameter of a lens and a method for forming a solid immersion lens.

To measure or exert optically-induced forces on at least one particle in the focus of an optical cage, the following steps are taken:

• • a) the focus is positioned in a microelectrode arrangement with a three-dimensional electrical field that has a field gradient which forms an electrical capture area, and the focus is at a distance from the capture are and
  • b) the amplitude of the electrical field, the light power of the light beam forming the optical cage, and/or the distance of the capture area from the focus are varied to detect which varied field property moves the particle from the focus to the capture area or vice versa, or at least to temporarily move the particle into the capture area.

An imaging optical system includes a first imaging structure having a first optical axis and a first field of view, wherein the first imaging structure forms an image on a common focal plane, and a second imaging structure having a second optical axis parallel to the first optical axis and a second field of view different from the first field of view, wherein the second imaging structure forms an image on the common focal plane. The imaging structures preferably contain identical lens modules, most preferably identical Petzval lenses, and achromatic or apochromatic prisms of different spatial orientations. A planar sensor structure lies in the common focal plane, wherein the first optical axis and the second optical axis pass through the planar sensor structure.