273results about How to "Reduce unevenness" patented technology

A plasma processing apparatus performs a specific plasma processing on a target substrate by disposing a first and a second electrode to face each other in a processing chamber, and supplying high-frequency electric power to at least one of the first and the second electrodes to thereby generate a plasma while introducing a processing gas onto the target substrate supported by the second electrode. The electrode for use as the first electrode includes: an electrode plate facing the second electrode; a support for supporting the electrode plate, wherein the support is in contact with a surface of the electrode plate and the surface is opposite to the second electrode; and a dielectric portion, provided on a contact surface of the support with the electrode plate, and having a shape in which a center portion thereof has a height different from that of an edge portion thereof.

A system providing three-dimensional visual navigation for a mobile unit includes a location calculation unit for calculating an instantaneous position of the mobile unit, a viewpoint control unit for determining a viewing frustum from the instantaneous position, a scenegraph manager in communication with at least one geo-database to obtain geographic object data associated with the viewing frustum and generating a scenegraph organizing the geographic object data, and a scenegraph renderer which graphically renders the scenegraph in real time. To enhance depiction, a method for blending images of different resolutions in the scenegraph reduces abrupt changes as the mobile unit moves relative to the depicted geographic objects. Data structures for storage and run-time access of information regarding the geographic object data permit on-demand loading of the data based on the viewing frustum and allow the navigational system to dynamically load, on-demand, only those objects that are visible to the user.

This invention provides a gas turbine combustor including: a main burner at a head portion of a combustor cylinder; and a pre-mixing type supplemental burner at a downstream portion of the combustor cylinder and extending through a circumferential wall thereof. The supplemental burner includes: an introducing passage configured to deflect a part of the compressed air radially inward, the compressed air flowing from an air passage between the circumferential wall of the combustor cylinder and a housing surrounding the circumferential wall toward the head portion of the combustor cylinder, and introduce the compressed air into the combustor cylinder; and a fuel nozzle configured to supply the fuel from fuel injection holes to the compressed air introduced into the introducing passage to produce a pre-mixed gas in the introducing passage.

In an active matrix EL display device, pixels which are suitable for a constant current drive are structured. The pixel includes a first switch which has one end connected to a source signal line and the other end connected to a current-voltage conversion element, a second switch which has one end connected to the current-voltage conversion element and the other end connected to a voltage holding capacitor and to a voltage-current conversion element, and a pixel electrode connected to the current-voltage conversion element and to the voltage-current conversion element.

A system and method for enhancing the plasma etch process uniformity in an ionized PVD semiconductor wafer processing system is provided. The system and method controls chamber conditions so as to produce highly uniform processing for a deposition-etch process sequence and yielding improved coverage capabilities of high aspect ratio (HAR) features when the deposition and etch steps are performed within same processing chamber. Plasma is generated and maintained by an inductively coupled plasma (ICP) source. In the deposition portions of the process, metal or other coating material is produced from a target of a PVD source. A segmented peripheral electrode surrounds the wafer at a distance from its outer edge. RF induced bias is applied to the electrode, cycling around the segment so as to subject each to a duty cycle controlled by a processor. The tendency of the etching or sputtering of the wafer surface that occurs with deposition to produce a radially selective coverage of the wafer, particularly of inside features and the flat field of the wafer, are offset by the bias electrode. A segmented biased-ring electrode is controlled to provide conditions for azimuthal improvement of etch rate and overall etch rate uniformity across the wafer.

The invention discloses a method for manufacturing dentate special-shaped ceramic components by injection molding, belonging to the technical field of high-performance ceramic preparation. The methodcomprises the following steps: evenly mixing 81wt% to 90wt% of ceramic powder and 10wt% to 19wt% of organic binders by weight percentage to obtain an injection-molding mixture, injection-molding the injection-molding mixture on an injection-molding machine with the injection temperature being 175 to 195 DEG C, to obtain a green body, and de-molding within 2 minutes after the injection, so as to obtain a molded green body; and then, subjecting the molded green body to water-extraction degreasing and thermal degreasing, sintering the degreased green body at 1,350 to 1,550 DEG C, holding for 1 to4 hours and furnace-cooling to obtain the ceramic components. The invention has the advantages of high automation degree, high molding and degreasing efficiencies, even green body, high dimensional accuracy and surface smoothness of sintered products, and environment-friendly and energy-saving manufacture.

A solid-state imaging device includes a color filter that selectively transmits incoming light. The color filter includes two λ/4 multilayer films, and an insulation layer sandwiched between the two λ/4 multilayer films. Here, each of the λ/4 multilayer films is constituted by a plurality of dielectric layers, and the optical thickness of the insulation layer is not λ/4. Since this color filter has a smaller thickness, the solid-state imaging device has a smaller size.

A solid-state imaging device includes a plurality of light-receiving units two-dimensionally arrayed in a semiconductor substrate, a filter unit operable to transmit incident lights of selected wavelengths to the plurality of light receiving units and a light shielding unit operable to shield incident light, the light shielding unit having a plurality of apertures, each aperture opposing a corresponding light receiving unit. Here, on a path of incident light from the light shielding unit to the plurality of light shielding units, the filter unit is disposed between the light shielding unit and the plurality of light-receiving units. The solid-state imaging device prevents color mixing caused by oblique light.

Provided is a planar lighting device having a thin shape and capable of emitting uniform illumination light with less brightness unevenness. The planar lighting device includes a first and a second light sources arranged at a given distance apart from each other and a light guide plate arranged between the first and second light sources. The light guide plate includes a light exit plane, a first light entrance plane facing the first light source and containing one side of the light exit plane, and a second light entrance plane facing the second light source and containing the opposite side to the one side, and has a shape growing thicker from the first and second light entrance planes toward the center. The light guide plate contains scattering particles for scattering light entering through the first and second light entrance planes and propagating inside by a ratio satisfying 1.1≦Φ·N_p·L_G·K_C≦8.2.

A draw forming method for drawing a blank material (15). In this method, a restraint region (98) that is an outer peripheral section (21) of the blank material is held by a first holder means (22), and then a tension region (97) inside the outer peripheral section is displaced upward by a second holder means (23) relative to the restraint region. The displacement applies tensile force to a drawing region (96) that is the central section of the blank material.

The invention provides a preparation method of a TC4ELI titanium alloy bar. The preparation method comprises the following steps of: (1) carrying out cogging forging; (2) carrying out upsetting forging; (3) carrying out precise forging; (4) carrying out shearing, straightening and annealing treatment in sequence, thereby obtaining the cylindrical TC4ELI titanium alloy bar with the cross-section diameter of 15mm-90mm. The invention also provides a preparation method of the TC4ELI titanium alloy bar. The preparation method comprises the following steps of: (1) carrying out cogging forging; (2) carrying out upsetting forging; (3) carrying out precise forging; (4) rolling; (5) carrying out shearing, straightening and annealing treatment in sequence, thereby obtaining the cylindrical TC4ELI titanium alloy bar with the cross-section diameter of 8mm-15mm. The preparation method is simple in process, strong in repeatability and suitable for large-scale industrial production; the TC4ELI titanium alloy bar prepared by adopting the preparation method is uniform and fine in structure, high in microscopic structure level and excellent in mechanical property.

An electric fan system for a vehicle including two electric fans (10, 20) arranged in parallel in a vehicle width direction so as to blow cooling air to a radiator (100) and a condenser (110), wherein the electric fans are driven by a brushless motor (12) and a brush motor (22), a first drive voltage V1 for driving the brushless motor is set so as to increase in accordance with an increase of a water temperature (Tw) of the radiator or a coolant pressure (Pc) of the condenser, and simultaneously a second drive voltage V2 for driving the brush motor is set so as to increase monotonously as a value lower than the first drive voltage, whereby the two electric fans can operate simultaneously at all times, unevenness of the distribution of the flow rate can be reduced, and the drive voltage of the brush motor is reduced, so the lifetime can be extended and, further, provision is made of an electronic control unit (40a) for preferentially operating the electric fan (10) driven by the brushless motor over the electric fan (20) driven by the brush motor based on the temperature of the engine cooling water and the electric fan (10) driven by the brushless motor is designed to cool by cooling air other vehicle-mounted parts besides the radiator (100) and the condenser (110), specifically for example the ECU box (410).

the invention discloses a marine exploiting platform steel of erosion property of sea water resistance, which comprises the following parts: 0.03-0.09% C, 0.90-1.60% Mn, 0.10-0.50% Si, 0.006-0.020% P, 0.004-0.100% Cr, 0.02-0.40% Cu, 0.010-0.060% Als, 0.005-0.060% Nb, 0.005-0.030% Ti, Fe and impurity. the manufacturing method comprises the following steps: desulfurizing; blowing; disposing through vacuum; casting continually; rolling.

In an image drawing apparatus and an image drawing method for multiple-overlay image drawing, uneven density and resolution caused by an error of installation angle of an image drawing head and by pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the scanning direction, facing an exposure surface. Slits and photo detectors detect in the exposure surface an actual installation angle of a representative light-spot column near the center of the pixel array. Active pixels in the pixel array are selected so as to realize multiple-overlay exposure ideally by causing overexposure and underexposure to be minimal in an area near the representative light-spot column, based on the measured angle. Exposure is carried out by causing only the active pixels to operate.

The invention relates to a manufacturing method for superlow shrinkage type PET industrial yarn, which is characterized in that the superlow shrinkage type PET industrial yarn is manufactured through selecting and controlling cooling conditions, and the technological process is as follows: hyperviscous melting to polyester raw materials, metering, spanning, cooling, oil supplying, stretching, hot shaping, and reeled forming. For lowing the irregularity and shrinkage percentage of fiber, a slow cooling device is arranged in the production of industrial yarn, a precooling device adopted is a hollow stepped ring-shaped belt comprising an upper part and a lower part, through holes with the diameters of 5 to 7 mm are uniformly distributed in the upper part of the ring-shaped belt, through holes with the diameters of 3 to 4 mm are uniformly distributed in the lower part, and the hole arrangement densities are the same. The natural target of the PET industrial yarn is as follows: the fracture strength is equal or greater than 7.0 cN/dtex, the breaking elongation is 20.0 plus or minus 1.5 percent, and the dry heat shrinkage percentage under the test conditions of 170 DEGC, 0.05cN/dtex reaches 1.9 plus or minus 0.25 percent.

Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.

An approach to correcting non-uniformity of critical dimension (CD) in a semiconductor wafer includes measuring 0^th-order light transmitted through or reflected from a photomask in a plurality of regions of the photomask. The photomask is altered to equalize the 0^th-order light from the photomask such that the wafer CD is uniform. The photomask can be altered such as by forming a phase grating on the back side of the photomask or by introducing shadowing elements into the photomask to alter the transmittance of the photomask.

A light guide member, a flat light source device and a display device using the light guide member, by which a white light having a high color rendering property can be obtained without using luminescent devices of a plurality of colors are provided.

A plurality of luminescent devices that emit a light of a violet to blue color are arrayed on a substrate, and a light guide member is disposed upward thereof that includes a first area that consists of a transparent resin and composed of the resin independently, a second area in which there is dissolved in the resin a luminescent substance that generates a second color having a radiation peak wavelength at a wavelength different from a radiation peak wavelength of a luminescent device of the first color by an excitation due to a light emitted from the luminescent device of the first color, and a third area in which there is dissolved in the resin a luminescent substance that generates a third color having a radiation peak wavelength at a wavelength different from the radiation peak wavelengths of luminescent devices of the first and second colors by an excitation due to a light emitted from the luminescent device of the first color.

To provide a thin light box employing a light source of strong directivity such as an LED, or a light box in which occurrence of unevenness in surface illuminance is suppressed even when the number ofLEDs is reduced by a factor of 4-9 as compared with prior art. ¢MEANS FOR SOLVING PROBLEMS! The light box (1) comprises a plurality of spot light sources (4), and a light reflector (21) having recesses (22) surrounding the spot light sources (4), respectively. The spot light sources are inserted into insertion holes (23) formed in the bottom of the containing recesses (22), respectively. When theincident angle of light exiting the spot light source (4) is 0 DEG and the spot light sources (4) are spaced apart by 350 mm, the illuminance is 15000 cd/m<2> or less and the light exiting the spotlight source (4) is reflected partially or entirely on the inner surface of the containing recesses (22) before offering illumination.

There is provided an ink jet printing apparatus and a printing method capable of reducing unevenness due to a time lag. An ink jet printing apparatus comprise a printing head including a first and a second eject port array. The second eject port array is shorter than said first eject port array in said conveying direction of the printing medium. The first eject port array has a first a second. The first eject port group is disposed parallel to said second eject port array. The second eject port group is not disposed parallel to the second eject port array. In an identical printing area of the printing medium, a printing ratio of the first eject port group is lower than that of the second eject port group. The second ink contains a component that reduces dispersion stability of the first ink.

The present invention provides an illuminating device for a display device in which unevenness of luminance on an information display surface is prevented by securing a position accuracy of a light source lamp, light leakage from a lamp supporting member, lower luminance or unevenness of luminance is reduced, and excellent display quality may be provided. The illuminating device for a display device, of the present invention is an illuminating device for a display device, the illuminating device comprising a light source lamp and a lamp supporting member and having (1) A configuration in which the lamp supporting member comprises a fixing pin provided at a position other than a position substantially just under the light source lamp, (2) A configuration in which the lamp supporting member is formed of a reflective material, or a configuration in which the above-mentioned configurations are combined.

The invention discloses a system and a method for continuous extrusion production of a fine-grain magnesium alloy strip. The system comprises a decoiling emptying device, an on-line straightening device, an on-line heating device, a continuous extrusion device, a cooling device and a winding displacement collection device. Through control of a temperature of a rod, a good extrusion driving force is produced between the rod and an extrusion wheel groove. Through an expansion mold cavity and a flow-blocking mold, magnesium alloy expansion flowing in a width direction is realized. In order to extrude a plate having larger width, the system adopts a two/three rod feeding-type extrusion mode so that joining and intermetallic welding of multiple rods in a corresponding multi-rod mold cavity are realized. The system and the method have the advantages that a process route is short; production efficiency is high; a grain refinement degree of a product microstructure is high; plate formability is good; and a continuous production line provided by the invention is suitable for industrial application.

A liquid crystal display device has a fluorescent lamp and a driving circuit as a back light. A closed container, a discharge gas sealed in the closed container, first discharge electrodes, and second discharge electrodes are included in the fluorescent lamp. The driving circuit repeats a first step of causing electric discharge in first discharge areas by applying a voltage having a negative polarity to the first discharge electrodes and a voltage having a positive polarity to the second discharge electrodes, and a second step of causing electric discharge in second discharge areas which are different from the first discharge areas by applying a voltage having a positive polarity to the first discharge electrodes and a voltage having a negative polarity to the second discharge electrodes.

The planar lighting device includes a light guide plate having the light exit plane, two pairs of light entrance planes formed at the four sides of the light exit plane, and rear planes formed opposite to the light exit plane and inclined such that the light guide plate grows thicker toward the center thereof, a pair of main light sources and a pair of auxiliary light sources disposed opposite their respective light entrance planes to emit light to the respective light entrance planes, and illuminance distribution control unit to adjust the amount of light emitted by the main and auxiliary light sources to form a designated local illuminance distribution for any position desired in the light exit plane. The planar lighting device performs area control and line control to adjust illuminance at a light exit plane for any area desired and along any line desired, respectively.

A liquid discharge recording head comprising a recording head main body provided with a plurality of liquid flow paths communicated with a plurality of discharge ports for discharging liquid, respectively, and energy generating means for generating energy utilized for discharging the liquid filled in the liquid flow paths from the discharge ports, and an orifice plate provided with a discharge port array having the plurality of discharge ports aligned in one straight line, and bonded to the front face of the recording head main body having openings of the plurality of discharge ports formed therefor, wherein the orifice plate is provided with the extended portion in the alignment direction of the discharge port array or in the direction orthogonal to the alignment direction, being extended more than the width of the front face of the recording head main body, and the extended portion is fixed to the adjacent face of the front face of the recording head main body.

In the BB transfer, or so called electrochemical delamination process, a transfer film is firstly spray-coated on a stack formed by two graphene sandwiching a metal (Cu or Cr) foil as a protection layer. Then, direct current (dc) voltage is applied to the first stack as a cathode and an anode (from be a platinum wire, a carbon rod, or others) in an electrolyte aqueous solution. With application of the electrolysis potential, hydrogen bubbles appear at the graphene/metal foil interfaces, while oxygen bubble appear at the anode due to the reduction of water. These H₂ bubbles provide a gentle but persistent force to detach the graphene film from the copper foil at its edges, and the process is aided by the permeation of the electrolyte solution into the interlayers as the edges delaminate.

A plasma etching apparatus includes a processing chamber in which a specimen is subjected to plasma processing, a specimen holder for holding the specimen, the specimen holder including a temperature controller for controlling temperatures at at least 2 positions of the specimen, at least two gas supply sources for supplying processing gases, at least two gas inlets for introducing the processing gases into the processing chamber, a regulator for independently controlling the compositions or the flow rates of the processing gases introduced from the at least two gas inlets and the temperatures controlled with at least two temperature controllers in the specimen holder, and an electromagnetic wave supply unit for sending an electromagnetic wave into the processing chamber, wherein the compositions or the flow rates of the processing gases introduced from the gas inlets and the temperature controlled with the temperature controllers in the specimen holder are independently controlled.

Provided is a light emitting device having a phosphor layer on a surface of a semiconductor light emitting element and reducing unevenness in light distribution color, and a method of manufacturing the same. A light emitting device 100 includes a light emitting element 20 with a supporting body which is composed of a semiconductor light emitting element 1 and a supporting body 10, and a phosphor layer 7 which continuously covers an upper surface and side surfaces of the semiconductor light emitting element 1, and side surfaces of the supporting body 10. The phosphor layer 7 is configured such that at least a lower portion of the side surface of the supporting body 10 is thinner than the upper surface and the side surface of the semiconductor light emitting element 1. Such a configuration of the phosphor layer can be formed by applying a spray-coating of a slurry containing phosphor particles and a thermosetting resin in a solvent on the semiconductor light emitting element 1 side of the light emitting element 20 which has the supporting body.

Disclosed are a radiation image conversion panel, which provides high luminance, an image without white or black defects, an image free from cracks and an image with reduced unevenness, and its manufacturing method. Also disclosed is an X-ray radiographic system employing the radiation image conversion panel. The radiation image conversion panel of the invention comprises a substrate and provided thereon, a reflection layer, a phosphor layer and a protective layer in that order, wherein the phosphor layer is composed of a phosphor crystal in the form of column, and the reflection layer is formed by vapor phase deposition of two or more kinds of metals.

A backlight assembly includes a circuit substrate, a light source arranged on the circuit substrate, a light guide plate having a first surface configured to receive light emitted from the light source and a second and different surface to emit light, a wavelength converting unit arranged between the light source and the light guide plate and a spacer arranged around the light source. The spacer is spaced apart from the light source in a direction perpendicular to the light-emitting direction of the light emitted from the light source.