7498 results about "Tectorial membrane" patented technology

A protective enclosure for a personal electronic device having a shell that is capable of enclosing and substantially surrounding the electronic device disposed to make the shell substantially watertight, substantially rigid and substantially crush-resistant. The enclosure has a transparent protective membrane that is attached to the shell so that the protective membrane is positioned over the touch screen of the electronic device when the electronic device is enclosed in the shell.

A component (10) for a semiconductor processing apparatus includes a matrix (10a) defining a shape of the component, and a protection film (10c) covering a predetermined surface of the matrix. The protection film (10c) consists essentially of an amorphous oxide of a first element selected from the group consisting of aluminum, silicon, hafnium, zirconium, and yttrium. The protection film (10c) has a porosity of less than 1% and a thickness of 1 nm to 10 μm.

A method of making a showerhead for a semiconductor processing apparatus is disclosed. In one embodiment, the method includes providing a substrate; forming first holes in the substrate; forming a protective film on the substrate, where the protective film covers sidewalls of the first holes; and forming second holes in the substrate, where a part of the protective film within the first holes is removed. In another embodiment, the method includes providing a substrate; forming islands on the substrate; forming a protective film on the substrate, where the protective film does not cover the tops of the islands; and forming holes in the islands.

A composite solid electrolyte include a monolithic solid electrolyte base component that is a continuous matrix of an inorganic active metal ion conductor and a filler component used to eliminate through porosity in the solid electrolyte. In this way a solid electrolyte produced by any process that yields residual through porosity can be modified by the incorporation of a filler to form a substantially impervious composite solid electrolyte and eliminate through porosity in the base component. Methods of making the composites is also disclosed. The composites are generally useful in electrochemical cell structures such as battery cells and in particular protected active metal anodes, particularly lithium anodes, that are protected with a protective membrane architecture incorporating the composite solid electrolyte. The protective architecture prevents the active metal of the anode from deleterious reaction with the environment on the other (cathode) side of the architecture, which may include aqueous, air and organic liquid electrolytes and/or electrochemically active materials.

In an active matrix display device, each pixel is provided with a pixel electrode, an organic semiconductor film deposited on the upper layer side of the pixel electrode, and a thin film luminescent element provided with an opposing electrode formed on the upper layer side of the organic semiconductor film. A protective film covering almost the entire surface of a substrate is formed on the upper layer of the opposing electrode. The protective film prevents the entry of moisture or oxygen to inhibit the deterioration of the thin film luminescent element.

In a semiconductor device, via holes are formed around a chip buried in a package, and conductor layers are respectively formed to be connected to one end and another end of the conductor filled in the individual via hole. Portions (pad portions) of the conductor layers which correspond to the conductors are exposed from protective films, or external connection terminals are bonded to the pad portions. The chip is mounted with flip-chip technology so that at least some of electrode terminals thereof are electrically connected to the conductor layers.

A semiconductor laser device have, on a substrate, a semiconductor layer including an active layer sandwiched between an n-type layer and a p-type layer, the semiconductor layer having a sonator face formed by etching and a projection projecting out in an emission direction relatively to the resonator face, wherein a protective film is formed to extend from the resonator face to an end face of the projection, and, an emission critical angle, which is the largest angle at which light emitted from the resonator face can be radiated without being blocked by the projection and the protective film formed on the projection, is larger than an emission half-angle of an emission distribution in a vertical direction of a laser beam emitted from the resonator face.

The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamber 1 for subjecting a processing substrate 4 to plasma processing, gas supply means 17, 16 and 11 for feeding gas to the processing chamber 1, and an antenna electrode 10 for supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower plate 11 having gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductor 10 exposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film 12.

A polarizing film comprising a polarizer (A) and a protection film (B) prepared on at least one face of the polarizer (A), wherein the protection film (B) is adhered to the polarizer (A) without using adhesives, is induced problems by use of adhesives.

Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.

A laser beam processing machine comprising a chuck table for holding a workpiece and a laser beam application means for applying a laser beam to the workpiece held on the chuck table, wherein the machine further comprises a protective film forming means for forming a protective film on the to-be-processed surface of the workpiece before laser beam processing.

The invention provides a marking method in which marking is performed on a protective film formed on a work with a high accuracy while suppressing a warpage and, also, a sheet for both protective film forming and dicing which is advantageously used in the method. The marking method comprises irradiating laser light to a laminated structure comprising a support film tensely supported by a ring frame, a protective film releasably laminated on the support film and a work fixed to the protective film, wherein the protective film is irradiated laser light from a side of the support film, to thereby mark the protective film.

The present invention relates to a method for forming a graphene protective film having gas and moisture barrier properties, to a graphene protective film formed by the method, and to the use thereof. A single-layer or multi-layer graphene protective film can be used as a material for a barrier coating or bags, and improves the gas and moisture barrier properties of a variety of devices in a wide array of industrial fields to thereby maintain the electrical characteristics of devices over a long period of time.

An optical film in which a retardation film is laminated on one side of a polarizing plate, in which a transparent protective film is laminated on both sides of a polarizer, so that an absorbing axis of the polarizing plate and a slow axis of the retardation film may be perpendicular or may be parallel to each other, wherein a value Nz represented by Nz=(nx1-nzi)/(nx1-ny1) satisfies a range of 0.4 through 0.6, and an in-plane retardation Re1=(nx1-ny1)xd1 is 200 through 350 nm, where, a direction of the retardation film in which an in-plane refractive index within the film surface concerned gives a maximum is defined as X-axis, a direction perpendicular to X axis is defined as Y-axis, a thickness direction of the film is defined as Z-axis, refractive indexes in axial direction are defined as nx1, ny1, nz1, respectively, and a thickness of the film is defined as d1 (nm), and the transparent protective films comprise a thermoplastic saturated norbornene resin, may realize an easily viewable display with high contrast ratio in a wide range when applied to a display system and that may provide a retardation value stabilized under conditions of high temperature or high humidity.

A process for producing an electrode for an alkali metal battery, comprising: (a) Continuously feeding an electrically conductive porous layer to an anode or cathode material impregnation zone, wherein the conductive porous layer has two opposed porous surfaces and contain interconnected conductive pathways and at least 70% by volume of pores; (b) Impregnating a wet anode or cathode active material mixture into the porous layer from at least one of the two porous surfaces to form an anode or cathode electrode, wherein the wet anode or cathode active material mixture contains an anode or cathode active material and an optional conductive additive mixed with a liquid electrolyte; and (c) Supplying at least a protective film to cover the at least one porous surface to form the electrode.

A protective film includes an adhesive material configured for “dry” application to a surface that is to be protected, such as the surface of an electronic device. An installation assembly that includes the protective film is configured to minimize or eliminate contact with the protective film as it is applied to the surface that is to be protected. Methods for manufacturing a protective film and an installation assembly that includes the protective film may be effected in contaminant-free conditions. Methods for applying the protective film are also disclosed, as are device (e.g., electronic devices, etc.) with at least one surface covered with a protective film.