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4818 results about "In plane" patented technology

Semiconductor device

InactiveUS20090114910A1Uniform and high stabilityIncrease productionTransistorSolid-state devicesIn planeDevice material
In the present invention, a thin film transistor is formed on a plastic film substrate (1) having anisotropy of thermal shrinkage rate or coefficient of thermal expansion in in-plane directions of the substrate. A channel is formed such thatthe direction (7) in which the thermal shrinkage rate or the coefficient of thermal expansion of the substrate is largest is nonparallel tothe direction (8) of a current flowing through the channel of the thin film transistor. Then, a thin film transistor having stable and uniform electrical characteristics, which is formed on the plastic film substrate, is provided.
Owner:CANON KK

Integrated in-plane switching display and touch sensor

This relates to adding multi-touch functionality to a display without the need of a separate multi-touch panel or layer overlaying the display. Instead, embodiments of the invention can advantageously utilize existing display circuitry to provide multi-touch functionality while adding relatively little circuitry that is specific to the multi-touch functionality. Thus, by sharing circuitry for the display and the multi-touch functionalities, embodiments of the invention can be implemented at a lower cost than the alternative of superimposing additional multi-touch related layers onto an existing display panel. Furthermore, since the display and multi-touch functionality can be implemented on the same circuit, they can be synchronized so that noise resulting from the display functionality does not detrimentally affect the multi-touch functionality and vice versa.
Owner:APPLE INC

Integrated in-plane switching

This relates to adding multi-touch functionality to a display without the need of a separate multi-touch panel or layer overlaying the display. Instead, embodiments of the invention can advantageously utilize existing display circuitry to provide multi-touch functionality while adding relatively little circuitry that is specific to the multi-touch functionality. Thus, by sharing circuitry for the display and the multi-touch functionalities, embodiments of the invention can be implemented at a lower cost than the alternative of superimposing additional multi-touch related layers onto an existing display panel. Furthermore, since the display and multi-touch functionality can be implemented on the same circuit, they can be synchronized so that noise resulting from the display functionality does not detrimentally affect the multi-touch functionality and vice versa.
Owner:APPLE INC

Method for controlling in-plane uniformity of substrate processed by plasma-assisted process

A method for controlling in-plane uniformity of a substrate processed by plasma-assisted process in a reactor, includes: supplying a principal gas to a reaction space, and discharging radially the principal gas from the reaction space through an annular duct; and supplying an secondary gas to the reaction space from an area in close proximity to an outer periphery of a susceptor, outside an outer circumference of the substrate as viewed from above, so as to flow at least partially in an inward direction passing the outer circumference of the substrate, reversing the direction of the secondary gas to flow toward the annular duct in a vicinity of the outer circumference of the substrate, and discharging radially the secondary gas together with the principal gas from the reaction space through the annular duct.
Owner:ASM IP HLDG BV

Substrate processing apparatus, method of manufacturing semiconductor device, and reaction vessel

A substrate processing apparatus that affords improved uniformity to in-plane wafer and interwafer film thickness of a large number of wafers on which a film is simultaneously formed, having: a reaction tube having in an interior thereof a processing chamber in which a plurality of substrates disposed in a direction perpendicular to a substrate processing surface can be processed; and a heating device provided to surround an outer circumference of the reaction tube, a gas inlet tube being provided on a side face of the reaction tube in a region for processing a substrate inside the reaction tube, so as to reach at least an outside of the heating device; and a gas spouting port being disposed in this gas inlet tube in a slit form so as to straddle at least a plurality of the substrates in a direction perpendicular to the substrate processing surface, for spouting gas from the gas inlet tube into the processing chamber.
Owner:KOKUSA ELECTRIC CO LTD

Electrophoretic display with dual mode switching

The present invention relates to an improved EPD which comprises both the traditional up / down switching and the in-plane switching modes. In other words, the improved EPD has dual switching modes.The monochrome EPDs of the present invention are capable of displaying highlight color of choice which is different from the text. For example, white background, blue text, and red highlight can be shown in any selected areas of the display. Furthermore, the full color EPDs of the present invention are capable of displaying high contrast images of high color saturation. Both high quality black and white states are possible in the full color displays of the present invention. The EPDs of the present invention do not need complex circuitry design, and are compatible with low cost and high yield roll-to-roll manufacturing processes.
Owner:E INK CALIFORNIA

Electromagnetic wave resistivity tool having a tilted antenna for geosteering within a desired payzone

This invention is directed to a downhole method and apparatus for simultaneously determining the horizontal resistivity, vertical resistivity, and relative dip angle for anisotropic earth formations. The present invention accomplishes this objective by using an antenna configuration in which a transmitter antenna and a receiver antenna are oriented in non-parallel planes such that the vertical resistivity and the relative dip angle are decoupled. Preferably, either the transmitter or the receiver is mounted in a conventional orientation in a first plane that is normal to the tool axis, and the other antenna is mounted in a second plane that is not parallel to the first plane. This invention also relates to a method and apparatus for steering a downhole tool during a drilling operation in order to maintain the borehole within a desired earth formation. The steering capability is enabled by computing the difference or the ratio of the phase-based or amplitude-based responses of the receiver antennas which are mounted in planes that are not parallel to the planes of the transmitter antennas. Although this invention is primarily intended for MWD or LWD applications, this invention is also applicable to wireline and possibly other applications.
Owner:HALLIBURTON ENERGY SERVICES INC

Apparatus for manufacturing semiconductor thin film

The present invention provides an apparatus for manufacturing a semiconductor thin film that is capable of manufacturing an even thin film with substantially no adhesion of impurities, and is capable of improving in-plane evenness of a grown thin film. The invention is an apparatus for manufacturing a semiconductor thin film includes a reaction tube 12, a susceptor 20 disposed in the reaction tube 12, and a negative pressure generator, the negative pressure generator applying a negative pressure to a substrate 22A placed on the susceptor 20 to hold the substrate, and the substrate 22A is placed so that an angle of a normal line to a crystal growth face of the substrate 22A to a vertical downward direction is less than 180°.
Owner:TOYOTA JIDOSHA KK

Plasma processing apparatus

In a plasma processing apparatus; a refrigerant flow passage being formed in the sample table and constituting an evaporator of a cooling cycle and the in-plane temperature of the sample to be processed is controlled uniformly by controlling the enthalpy of the refrigerant supplied to the refrigerant flow passage and thereby keeping the flow mode in the refrigerant flow passage, namely in the sample table, in the state of a gas-liquid two-phase. If by any chance dry out of the refrigerant occurs in the refrigerant flow passage because the heat input of plasma increases with time or by another reason, it is possible to increase speed of a compressor and inhibit the dry out from occurring in the refrigerant flow passage. Further, if the refrigerant supplied to the refrigerant flow passage is liquefied, it is kept in the gas-liquid two-phase state.
Owner:HITACHI HIGH-TECH CORP

Robust multi-view face detection methods and apparatuses

Face detection techniques are provided that use a multiple-stage face detection algorithm. An exemplary three-stage algorithm includes a first stage that applies linear-filtering to enhance detection performance by removing many non-face-like portions within an image, a second stage that uses a boosting chain that is adopted to combine boosting classifiers within a hierarchy “chain” structure, and a third stage that performs post-filtering using image pre-processing, SVM-filtering and color-filtering to refine the final face detection prediction. In certain further implementations, the face detection techniques include a two-level hierarchy in-plane pose estimator to provide a rapid multi-view face detector that further improves the accuracy and robustness of face detection.
Owner:ZHIGU HLDG

Magnetoresistive element and magnetic memory

A magnetoresistive includes a first magnetic reference layer having a fixed magnetization direction, a magnetic free layer having a magnetization direction which is changeable by being supplied with spin polarized electrons, a second magnetic reference layer having a fixed magnetization direction, a first intermediate layer provided between the first magnetic reference layer and the magnetic free layer, and a second intermediate layer provided between the magnetic free layer and the second magnetic reference layer. The magnetic free layer and the first magnetic reference layer have directions of easy magnetization perpendicular or parallel to an in-plane direction. The first magnetic reference layer and the second magnetic reference layer have directions of easy magnetization perpendicular to each other.
Owner:KK TOSHIBA

Dry etching apparatus, etching method, and method of forming a wiring

An etching apparatus is provided, in which a plurality of electrodes are disposed for placing a substrate, high-frequency power sources as many as electrodes are provided, and the electrodes and the high-frequency power sources are connected to each other independently. Among a plurality of electrodes, a high-frequency power applied to an electrode disposed below the central portion of the substrate and a high-frequency power applied to electrodes disposed below comer portions of the substrate are controlled respectively, whereby in-plane uniformity of etching can be enhanced.
Owner:SEMICON ENERGY LAB CO LTD

Plasma processing apparatus

The present invention provides a temperature control unit for an electrostatic adsorption electrode that is capable of controlling the wafer temperature rapidly over a wide temperature range without affecting in-plane uniformity while high heat input etching is conducted with high wafer bias power applied. A refrigerant flow path provided in the electrostatic adsorption electrode serves as an evaporator. The refrigerant flow path is connected to a compressor, a condenser, and a first expansion valve to form a direct expansion type refrigeration cycle. A second expansion valve is installed between the electrostatic adsorption electrode and the compressor to adjust the flow rate of a refrigerant. This makes it possible to compress the refrigerant in the refrigerant flow path of the electrostatic adsorption electrode and adjust the wafer temperature to a high level by raising the refrigerant evaporation temperature. Further, a thin-walled cylindrical refrigerant flow path is employed so that the thin-walled cylinder is deformed only slightly by the refrigerant pressure.
Owner:HITACHI HIGH-TECH CORP

Optical off-chip interconnects in multichannel planar waveguide devices

The multichannel waveguide device includes an array of waveguides located in a plane. Each waveguide channel has a redirecting element for redirecting a guided wave out of said plane, or vice versa. The redirecting elements are staggered in the direction of the waveguides so as to transform a one-dimensional array of in-plane waves into a two-dimensional array of out-of-plane waves, or vice versa.
Owner:NAT RES COUNCIL OF CANADA

Image guided radiosurgery method and apparatus using registration of 2D radiographic images with digitally reconstructed radiographs of 3D scan data

An image-guided radiosurgery method and system are presented that use 2D / 3D image registration to keep the radiosurgical beams properly focused onto a treatment target. A pre-treatment 3D scan of the target is generated at or near treatment planning time. A set of 2D DRRs are generated, based on the pre-treatment 3D scan. At least one 2D x-ray image of the target is generated in near real time during treatment. The DRRs are registered with the x-ray images, by computing a set of 3D transformation parameters that represent the change in target position between the 3D scan and the x-ray images. The relative position of the radiosurgical beams and the target is continuously adjusted in near real time in accordance with the 3D transformation parameters. A hierarchical and iterative 2D / 3D registration algorithm is used, in which the transformation parameters that are in-plane with respect to the image plane of the x-ray images are computed separately from the out-of-plane transformation parameters.
Owner:ACCURAY

Plasma processing apparatus and plasma processing method

There is provided a means for uniformly controlling the in-plane temperature of a semiconductor wafer at high speed in a high heat input etching process. A refrigerant channel structure in a circular shape is formed in a sample stage. Due to a fact that a heat transfer coefficient of a refrigerant is largely changed from a refrigerant supply port to a refrigerant outlet port, the cross sections of the channel structure is structured so as to be increased from a first channel areas towards a second channel areas in order to make the heat transfer coefficient of the refrigerant constant in the refrigerant channel structure. Thereby, the heat transfer coefficient of the refrigerant is prevented from increasing by reducing the flow rate of the refrigerant at a dry degree area where the heat transfer coefficient of the refrigerant is increased. Further, the cross section of the channel structure is structured so as to be reduced from the second channel areas towards a third channel areas, and thereby the heat transfer coefficient of the refrigerant is prevented from decreasing. Accordingly, the heat transfer coefficient of the refrigerant can be uniformed in the channel structure.
Owner:TANDOU TAKUMI +2

Catheter with biased planar deflection

An improved steerable catheter with biased, in-plane bi-directional deflection has an elongated catheter body, a deflectable intermediate section having a tubing with at least a first and a second off-axis opposing lumens for puller wires that define a plane of deflection, and a control handle at a proximal end of the catheter body. The deflectable intermediate section includes at least two elongated bias members that extend along the length and lie on a plane perpendicular to the plane of deflection so as to resist flexure outside of the plane of deflection. In a more detailed embodiment, the deflectable intermediate section has an integrated tubular construction that includes an inner layer, a braided mesh surrounding the inner layer and an outer layer, where the bias members can be situated between the inner layer and the braided mesh, or between the braided mesh and the outer layer.
Owner:BIOSENSE WEBSTER INC

Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium

InactiveUS20090221151A1Uniformity of intensity can be improvedHigh in-plane uniformityElectric discharge tubesSemiconductor/solid-state device manufacturingDielectricIn plane
The present invention provides an upper electrode used in an etching apparatus and the etching apparatus including the upper electrode, both of which can properly reduce intensity of electric field of plasma around a central portion of a substrate to be processed, thus enhancing in-plane uniformity of a plasma process. In this apparatus, a recess, serving as a space for allowing a dielectric to be injected therein, is provided around a central portion of the upper electrode. A dielectric supply passage configured for supplying the dielectric into the space and a dielectric discharge passage configured for discharging the dielectric from the space are connected with the space, respectively. With such configuration, the dielectric can be controllably supplied into the recess, such that in-plane distribution of the intensity of the electric field can be uniformed, corresponding to in-plane distribution of the intensity of the electric field of the plasma generated under various process conditions, such as a kind of each wafer that will be etched, each processing gas that will be used, and the like.
Owner:TOKYO ELECTRON LTD

Computed tomography with increased field of view

A volumetric computed tomography system with a large field of view has, in a forward geometry implementation, multiple x-ray point sources emitting corresponding fan beams at a single detector array. The central ray of at least one of the fan beams is radially offset from the axis of rotation of the system by an offset distance D. Consequently, the diameter of the in-plane field of view provided by the fan beams may be larger than in a conventional CT scanner. Any number of point sources may be used. Analogous systems may be implemented with an inverse geometry so that a single source array emits multiple fan beams that converge upon corresponding detectors.
Owner:AIRDRIE PARTNERS I LP +1

Magnetic stack having assist layer

A magnetic memory cell having a ferromagnetic free layer and a ferromagnetic pinned reference layer, each having an out-of-plane magnetic anisotropy and an out-of-plane magnetization orientation and switchable by spin torque. The cell includes a ferromagnetic assist layer proximate the free layer, the assist layer having a low magnetic anisotropy less than about 500 Oe. The assist layer may have in-plane or out-of-plane anisotropy.
Owner:SEAGATE TECH LLC

Liquid crystal display panel

The comb like electrodes to drive the orientation of the liquid crystal through the lateral electric field in the IPS (In plane Switching) LCD panel has a construction that the comb like electrodes are optically reflective, are projections in the gap area and have curved surfaces in the cross section of the electors.
Owner:PANASONIC LIQUID CRYSTAL DISPLAY CO LTD +1

Electrophoretic display with dual mode switching

The present invention relates to an improved EPD which comprises both the traditional up / down switching and the in-plane switching modes. The monochrome EPDs of the present invention are capable of displaying highlight color of choice which is different from the text. For example, white background, blue text, and red highlight can be shown in any selected areas of the display. Furthermore, the full color EPDs of the present invention are capable of displaying high contrast images of high color saturation. Both high quality black and white states are possible in the full color displays of the present invention. The EPDs of the present invention do not need complex circuitry design, and are compatible with low cost and high yield roll-to-roll manufacturing processes. The EPD cells of the present invention may have opaque partition walls, or a black matrix top surface of the partition walls or a combination thereof.
Owner:E INK CALIFORNIA

Geometric correction of rough wireframe models derived from photographs

Geometric correction of rough wireframe models derived from photographs may include rectification of either a 2D or 3D original wireframe model of a roof structure, derivation of metadata from the original wireframe, in-plane normalization of the wireframe, extrusion into a “rough” 3D wireframe based on the normalized wireframe, and correction of the “rough” 3D wireframe. The correction and normalization may be an iterative process based on initial pitch values, metadata derived from the original or corrected wireframe models and defined constraints regarding relationships between roof portions or segments. The iterative process may repeat adjusting the wireframe model until the adjusting converges to a stable state according to the various defined constraints.
Owner:EAGLEVIEW TECH

Grating trim retarders

A grating trim retarder fabricated from a form-birefringent multi-layer dielectric stack including at least one anti-reflection coating and supported on a transparent substrate is provided. The form-birefringent dielectric stack includes an axially-inhomogeneous element in the form of a −C-plate grating and a transversely-inhomogeneous element in the form of an A-plate grating. Each of the −C-plate and the A-plate gratings are fabricated with dimensions to form a zeroth order sub-wavelength grating structure. Fabricating the grating trim retarder with anti-reflection coatings and / or a segment where the −C-plate and A-plate grating overlap enables the in-plane and out-of-plane retardances to be tailored independently according to the desired application.
Owner:VIAVI SOLUTIONS INC

Plasma processing apparatus

The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber 1, means 13 and 14 for supplying processing gas into the processing chamber, evacuation means 25 and 26 for decompressing the processing chamber 1, an electrode 4 on which an object 2 to be processed such as a wafer is placed, and an electromagnetic radiation power supply 5A, wherein at least two kinds of processing gases having different composition ratios of O2 or N2 are introduced into the processing chamber through different gas inlets so as to control the in-plane uniformity of the critical dimension while maintaining the in-plane uniformity of the process depth.
Owner:HITACHI HIGH-TECH CORP +1

Magnetic tape device and magnetic reproducing method

The magnetic tape device includes a TMR head (reproducing head); and a magnetic tape including a magnetic layer including ferromagnetic hexagonal ferrite powder, a binding agent, and fatty acid ester, in which an XRD intensity ratio obtained by an X-ray diffraction analysis of the magnetic layer by using an In-Plane method is 0.5 to 4.0, a vertical direction squareness ratio is 0.65 to 1.00, Ra measured regarding a surface of the magnetic layer is equal to or smaller than 2.0 nm, full widths at half maximum of spacing distribution measured by optical interferometry regarding the surface of the magnetic layer before and after performing a vacuum heating with respect to the magnetic tape are greater than 0 nm and equal to or smaller than 7.0 nm, and a difference between spacings before and after the vacuum heating is greater than 0 nm and equal to or smaller than 8.0 nm.
Owner:FUJIFILM CORP

Magnetoresistive random access memory cell design

A magnetic memory cell comprises in-plane anisotropy tunneling magnetic junction (TMJ) and two fixed in-plane storage-stabilized layers, which splits on the both side of the data storage layer of the TMJ. The magnetizations of the said fixed in-plane storage-stabilized layers are all normal to that of the reference layer of TMJ but point to opposite direction. The existing of the storage-stabilized layers not only enhances the stability of the data storage, but also can reduce the critical current needed to flip the data storage layer via some specially added features.
Owner:GE YI +4
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