Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

15results about "Nanostructure application" patented technology

Ferromagnetic materials with skyrmions and process for their preparation

PCT designated stageWO2025247983A1Nanostructure applicationSubstrate/intermediate layersThin membraneAlloy
The invention relates to a method for the formation of skyrmions or Néel-type spin textures in a ferromagnetic material, preferably in a ferromagnetic alloy, comprising the steps of (i) providing an underlayer material, (ii) depositing a film of a ferromagnetic material thereon in a manner that (iii) the film obtained shows a vertical strain gradient (I), where ε t is the strain along the normal to the plane of the deposited film, and further to the materials so prepared and to their use in spintronics technology.
Owner:MAX PLANCK GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN EV

Magnetic tunneling junction device and memory device including the same

ActiveEP4120375B1Nanostructure applicationDigital storage
Provided are a magnetic tunneling junction device (100a) having more stable perpendicular magnetic anisotropy (PMA) and / or increased operating speed, and / or a memory device including the magnetic tunneling junction device. The magnetic tunneling junction device includes a free layer (103) having a first surface and a second surface opposite the first surface; a pinned layer (101) facing the first surface of the free layer; a first oxide layer (102) between the pinned layer and the free layer; and a second oxide layer (104) on the second surface of the free layer. The free layer includes a magnetic material X doped with a non-magnetic metal. The second oxide layer includes ZOx which is an oxide of a metal Z. An oxygen affinity of the metal Z is greater than an oxygen affinity of the non-magnetic metal X.
Owner:SAMSUNG ELECTRONICS CO LTD

Process for producing nanoclusters of silicon and / or germanium exhibiting a permanent magnetic and / or electric dipole moment

ActiveUS12534796B2Nanostructure applicationPowder deliveryWork functionCondensed matter physics
A process for producing nanoclusters of silicon and / or germanium exhibiting a permanent magnetic and / or electric dipole moment for adjusting the work function of materials, for micro- and nano-electronics, for telecommunications, for “nano-ovens”, for organic electronics, for photoelectric devices, for catalytic reactions and for fractionation of water.
Owner:CENT NAT DE LA RECH SCI (C N R S) +1

MAGNETIC TUNNEL TRANSITION DEVICE AND STORAGE DEVICE SO THAT

ActiveDE602022024740T2Nanostructure applicationDigital storageStructural engineeringTesting Methods
Owner:SAMSUNG ELECTRONICS CO LTD

Method for producing a printed magnetic functional element, and printed magnetic functional element

A method for producing a printed magnetic functional element, in which a substrate is provided on one surface with at least one contact made of an electrically conductive material. Subsequently, a structure made of a material which has a magnetoresistive effect and is in the form of a paste, a gel, a dispersion or a suspension is printed on or onto the at least one contact and touches the contact directly, and the structure becomes electrically conductive and sensitive to magnetic fields by irradiation with electromagnetic radiation over a time period in the millisecond range.
Owner:FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV

Ferromagnetic materials with skyrmions and process for their preparation

PendingEP4687163A1Nanostructure applicationMagnetic layers
The invention relates to a method for the formation of skyrmions or Néel-type spin textures in a ferromagnetic material, preferably in a ferromagnetic alloy, comprising the steps of (i) providing an underlayer material, (ii) depositing a film of a ferromagnetic material thereon in a manner that (iii) the film obtained shows a vertical strain gradient (∇tε = ∂εt / ∂t), where εt is the strain along the normal to the plane of the deposited film, and further to the materials so prepared and to their use in spintronics technology.
Owner:MAX PLANCK GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN EV

Single crystal YIG nanofilm fabricated by a metal organic decomposition epitaxial growth process

ActiveUS12516439B2Nanostructure applicationPolycrystalline material growth
A MOD YIG epitaxial process for fabricating YIG nanofilms which, when deposited on GGG substrates, have single crystal epitaxial properties. The films may have thicknesses of 50 nm for a single layer, 100 nm for two layers, and 130 nm for three layers, and have a gyromagnetic ratio of 2.80 MHz per Oe, Gilbert damping ranges from 0.0003 to 0.001, 4πM$ values between 1650 G to 1780 G, coercivity from 1 Oe. to 5 Oe, and surface roughness of RMS 0.20 nm for up to 10 layers. Fabrication is economical and uses only a spinner, a drying station (RT to 150 C temperature control), and a quartz tube furnace that accommodates a flowing atmosphere of research grade oxygen, thereby eliminating the need for high vacuum deposition chambers.
Owner:VIDA PRODS INC

Magnetic tunneling junction device and memory device including the same

PendingEP4618119A3Nanostructure applicationDigital storage
Provided are a magnetic tunneling junction device having more stable perpendicular magnetic anisotropy (PMA) and / or increased operating speed, and / or a memory device including the magnetic tunneling junction device. The magnetic tunneling junction device includes a free layer having a first surface and a second surface opposite the first surface; a pinned layer facing the first surface of the free layer; a first oxide layer between the pinned layer and the free layer; and a second oxide layer on the second surface of the free layer. The free layer includes a magnetic material X doped with a non-magnetic metal. The second oxide layer includes ZOx which is an oxide of a metal Z. An oxygen affinity of the metal Z is greater than an oxygen affinity of the non-magnetic metal X.
Owner:SAMSUNG ELECTRONICS CO LTD

Magnetic tunneling junction with synthetic free layer for sot-mram

PendingUS20260130121A1Nanostructure applicationDigital storageMagnetic memoryCrystal structure
A magnetic memory device includes a spin-orbit torque (SOT) induction spin Hall electrode and a free layer of a magnetic tunnel junction (MTJ) stack disposed on the spin Hall electrode which is a synthetic anti-ferromagnetic structure. The free layer has a magnetic moment which is askew of the long axis of the MTJ stack and askew the direction of current flow through the spin Hall electrode. The MTJ stack internally generates a magnetic field to switch the state of the free layer.The free layer includes a first layer separated from a second layer by a spacer layer, where the first layer and the second layer may have the same or different crystalline structures.
Owner:TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

Magnetoresistive sensor element having a wide linear response and robust nominal performance and manufacturing method thereof

ActiveEP3992655B1Nanostructure applicationNanomagnetism
The present disclosure concerns a magnetoresistive element (10) for a magnetic sensor, the magnetoresistive element (10) comprising a tunnel barrier layer (22) included between a reference layer (21) having a fixed reference magnetization (210) and a sense layer (23) having a free sense magnetization (230), wherein the sense magnetization (230) comprises a stable vortex configuration. The magnetoresistive element (10) further comprises a reference pinning layer (24) in contact with the reference layer (21) and pining the reference magnetization (210) by exchange-bias at a first blocking temperature (Tb1). The magnetoresistive element (10) further comprises a sense pinning layer (25) in contact with the sense layer (23) and pining the sense magnetization (230) by exchange-bias at a second blocking temperature (Tb2) lower that the first blocking temperature (Tb1). The present disclosure concerns a method for manufacturing the magnetoresistive element.
Owner:CROCUS TECHNOLOGY

Method for producing a printed magnetic functional element, and printed magnetic functional element

ActiveEP4010913B1Nanostructure applicationAdditive manufacturing apparatus
The present invention relates to a method for producing a printed magnetic functional element, in which a substrate (1) is provided on one surface with at least one contact (2) made of an electrically conductive material. Subsequently, a structure (3) made of a material which has a magnetoresistive effect and is in the form of a paste, a gel, a dispersion or a suspension is printed on or onto the at least one contact (2) and touches the contact directly, and the structure (3) becomes electrically conductive and sensitive to magnetic fields by irradiation with electromagnetic radiation over a time period in the millisecond range.
Owner:FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV +1

Preparation method of ferromagnetic metal and magnetoelectric transport device

PendingCN121781078ANanostructure applicationMaterial nanotechnologyNanoparticleElectro conductivity
The invention provides a preparation method of ferromagnetic metal and a magnetoelectric transport device. The preparation method of the ferromagnetic metal comprises the steps that a low-energy cluster beam deposition method is adopted, nanoclusters formed by CoFe are deposited on a substrate to form a nano-particle film, and the nano-particle film does not contain doping elements. According to the method, a series of low-conductivity ferromagnetic pure metal nanoparticle films with different cluster sizes are successfully prepared by utilizing the disordered characteristic and the size adjustable characteristic of the nanocluster structure of a cluster assembly project, and the disadvantage that low-conductivity ferromagnetic pure metal cannot be obtained in the prior art is made up.
Owner:INNER MONGOLIA UNIVERSITY