The invention relates to the field of photovoltaic equipment, and discloses a large
vacuum chamber provided with a double-layer gas flow uniformizing structure, and the double-layer gas flow uniformizing structure comprises a pipeline box, and an upper flow uniformizing
assembly and a lower flow uniformizing
assembly which are arranged on the upper surface and the lower surface of the pipeline box. The pipeline box is located in the middle inside the cavity. The air inlet
pipe comprises an upper-layer air inlet
pipe and a lower-layer air inlet
pipe which independently control air inlet. The upper flow uniformizing
assembly sequentially comprises a first sealing ring, a
diffusion flow uniformizing plate, a second sealing ring and a net-shaped flow uniformizing plate from bottom to top.
Diffusion flow-uniformizing holes are formed in the
diffusion flow-uniformizing plate, the
diffusion flow-uniformizing holes are dispersed from the center hole to the periphery in a corrugated mode, and the farther the diffusion flow-uniformizing holes are away from the center hole, the denser the diffusion flow-uniformizing holes are. And the center of the diffusion uniform flow plate is positioned above the upper-layer air inlet. And uniformly distributed net-shaped flow uniformizing holes are formed in the net-shaped flow uniformizing plate. The vacuum breaking efficiency can be improved, the gas
distribution uniformity of the cavity can be improved, the
silicon wafer falling rate is reduced, and the yield is improved.