5019 results about "Electron bunches" patented technology

A process and apparatus for free form fabrication of a three-dimensional work piece comprising (a) feeding raw material in a solid state to a first predetermined location; (b) depositing the raw material onto a substrate as a molten pool deposit under a first processing condition; (c) monitoring the molten pool deposit for a preselected condition; (d) comparing information about the preselected condition of the monitored molten pool deposit with a predetermined desired value for the preselected condition of the monitored molten pool deposit; (e) solidifying the molten pool deposit; (f) automatically altering the first processing condition to a different processing condition based upon information obtained from the comparing step (d); and repeating steps (a) through (f) at one or more second locations for building up layer by layer a three-dimensional work piece. The apparatus is characterized by a detector that monitors a preselected condition of the deposited material and a closed loop electronic control device for controlling operation of one or more components of the apparatus in response to a detected condition by the detector.

A high resolution and high data rate spot grid array printer system is provided, wherein an image representative of patterns to be recorded on a reticle or on a layer of a semiconductor die is formed by scanning a substrate with electron beams. Embodiments include a printer comprising an optical radiation source for irradiating a photon-electron converter with a plurality of substantially parallel optical beams, the optical beams being individually modulated to correspond to an image to be recorded on the substrate. The photon-electron converter produces an intermediate image composed of an array of electron beams corresponding to the modulated optical beams. A de-magnifier is interposed between the photon-electron converter and the substrate, for reducing the size of the intermediate image. A movable stage introduces a relative movement between the substrate and the photon-electron converter, such that the substrate is scanned by the electron beams.

A method for increasing the resolution when forming a three-dimensional article through successive fusion of parts of a powder bed, said method comprising providing a vacuum chamber, providing an electron gun, providing a first powder layer on a work table inside said vacuum chamber, directing an electron beam from said electron gun over said work table causing the powder layer to fuse in selected locations to form a first cross section of said three-dimensional article, providing a second powder layer on said work table, directing the electron beam over said work table causing said second powder layer to fuse in selected locations to form a second cross section of said three-dimensional article, reducing the pressure in the vacuum chamber from a first pressure level to a second pressure level between the providing of said first powder layer and said second powder layer.

The invention discloses equipment for manufacturing a large-size metal part in a high energy beam additive manufacturing mode and a control method of the equipment. The equipment comprises a work cavity, a worktable, a control system, a high energy beam scanning generator, a powder storage hopper, a powder laying device and a gas purification module, wherein the worktable is composed of a forming cylinder and a powder recycling cylinder, and the upper surface of the forming cylinder and the upper surface of the powder recycling cylinder are coplanar and form a work plane. The control system controls the high energy beam scanning generator and the powder laying device to move opposite to the worktable in the powder laying direction. The equipment for manufacturing the large-size metal part in the high energy beam additive manufacturing mode and the control method of the equipment largely shorten the waiting time caused by pre-installation of a powder bed when a common laser/electron beam selective melting technology is used for processing a part, thereby obviously improving the forming efficiency of high energy beam additive manufacturing. Through the application of the equipment for manufacturing the large-size metal part in the high energy beam additive manufacturing mode and the control method of the equipment, a metal part with a meter-grade size, high performance, high accuracy and a complex structure can be manufactured efficiently and rapidly.

An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.

In one aspect, the present invention relates to a microfluidic chamber. In one embodiment, the microfluidic chamber has a first sub-chamber and at least one second sub-chamber. The first sub-chamber has a first window and a second window. Both the first window and the second window are transparent to electrons of certain energies. The second window is positioned substantially parallel and opposite to the first window defining a first volume therebetween. The first window and the second window are separated by a distance that is sufficiently small such that an electron beam that enters from the first window can propagate through the first sub-chamber and exit from the second window. The at least one second sub-chamber is in fluid communication with the first sub-chamber and has a second volume that is greater than the first volume of the first sub-chamber.