755 results about "Charged particle beam" patented technology

Provided is a charged particle beam device capable of shortening the acquisition time of a feature image. In this charged particle beam device, an image acquisition unit acquires a plurality of feature images by repeating: a process for selecting one mode from a plurality of modes for acquiring the feature images on the basis of the proportion of a region of a feature object in an acquired sample image in the field of view; and a process for acquiring a feature image in the selected mode, the plurality of modes including: a first mode in which a sample image is captured by scanning the sample at a first scanning speed, and the captured sample image is cut to acquire the feature image; and a second mode in which a sample image is captured by scanning the sample at a second scanning speed faster than the first scanning speed, and a feature image is captured by scanning a region of the feature object in the captured sample image at a third scanning speed slower than the second scanning speed.

The present disclosure proposes a charged particle beam device, wherein, in order to reduce a field-of-view deviation amount when stage rotation is performed in each of θx, θy, and θz axial directions with respect to a discretionary stage rotation center: (i) the discretionary rotation center is controlled using motor thrust in a translation direction and a rotation direction of a stage device; (ii) a deviation amount from the center of the field of view in an observation image, or the trajectory of the deviation amount, is obtained on the basis of position information indicating the distance in at least one of an X-axis direction, a Y-axis direction, and a Z-axis direction between rotation center coordinates of the stage device and sample observation coordinates, and on the basis of the rotation angles of a θx axis, a θy axis, and a θz axis, during the rotation operation; and (iii) the deviation amount, or the trajectory of the deviation amount, is added to the position information pertaining to the stage when the stage device is moved, whereby the deviation amount from the center of the field of view in the observation image is corrected (see fig. 4).

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

The invention provides a button type signal feed-through for a beam position detector. The button type signal feed-through comprises a shell, a composite unit and an insulator. The composite unit comprises a button electrode and an inner conductor, and the button electrode is suitable for sensing an electromagnetic field signal generated by charged particle beams in the vacuum cavity; the inner conductor vertically and integrally extends from the center of the button electrode, a flange is arranged near one end, close to the button electrode, of the inner conductor, and the inner conductor is suitable for transmitting beam electromagnetic field signals. The insulator is sleeved on the inner conductor and comprises a first section cylinder and a second section cylinder, and the front end face of the first section cylinder is welded and fixed with the flange of the inner conductor; the second section of cylinder body extends outwards in the radial direction from the rear end of the first section of cylinder body, the circumferential outer surface of the second section of cylinder body is welded and fixed with the shell, and the insulator is suitable for fixed support and electrical insulation, so that smooth transition of transmission impedance and vacuum sealing are realized. The invention further provides a preparation method of the charged particle beam position detector and a charged particle beam position detector structure.

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.

The invention provides a charged particle beam deflection electrostatic lens and a charged particle beam deflection method. The charged particle beam deflection electrostatic lens comprises at least one on-axis electrode, an off-axis electrode and a power distribution module, through holes are formed in the on-axis electrode and the off-axis electrode, and charged particle beams pass through the through holes; the off-axis electrode is parallel to the on-axis electrode, the central axis of the off-axis electrode is not coaxial with a preset incident optical axis, and the central axis of the on-axis electrode is coaxial with the preset incident optical axis; the power distribution module is electrically connected with the on-axis electrode, the power distribution module is electrically connected with the off-axis electrode, and the power distribution module is used for configuring different potentials for the on-axis electrode and the off-axis electrode so as to form a non-axisymmetric electric field to enable the charged particle beam to deflect. The problems that in the prior art, the structure is complex, and charged particle beams cannot be deflected and focused at the same time are solved. According to the invention, the charged particle beams are deflected and focused simultaneously by adopting a simple structure.

The present disclosure relates to a system and a non-transitory computer-readable medium for estimating the height of foreign matter, etc. adhering to a sample. In order to achieve the abovementioned purpose, proposed is a system, etc. in which data acquired by a charged particle beam device or features extracted from the data are input to a learning model, which is provided with, in an intermediate layer thereof, a parameter learned using teacher data having data acquired by the charged particle beam device or features extracted from the data as inputs and having the heights or depths of the structures of samples or of foreign matter on the samples as outputs, and height or depth information is output.

In order to compensate for undesired effects of varying elevation of a target with respect to a nominal target plane, during writing a desired pattern on the target in a charged-particle beam apparatus, the pattern is re-calculated in each of a number of segments of the target plane by: determining an elevation of the target in the segment from the nominal target plane; determining a local blur value which represents the actual value of blur corresponding to the elevation, with regard to a dependence of the blur upon the elevation of the target; calculating a convolution kernel which represents a point spreading function realizing a local blur value; and re-calculating a nominal exposure pattern by applying the kernel to the pattern. The convolution kernel corresponds to introducing an additional blur into the pattern in the segment, increasing the blur to a given target blur value which is uniform to all segments.

A multi-beam charged particle beam system includes a detection unit configured for a dynamic compensation of charging effects of a sample. The detection unit comprises a relay optical system comprising an adaptive mirror array for keeping signal beams at the position of entrance apertures of lightguides od detection elements. Thereby, beam distortions induced by charging effects can be compensated. The disclosure can be applied to, for example, wafer inspection with multi-beam charged particle beam system.

And drift compensation of the radiation sensitive sample. In one example, a method performed via a computing device to provide support to a charged particle beam system includes calculating a drift estimate based at least in part on a first set of image frames acquired from a first portion of a sample using a charged particle beam barrel and a detector. The method further includes configuring the charged particle beam barrel and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation based at least in part on the drift estimate during acquisition of the second set of image frames.

Systems and methods taught herein utilize a single detector to provide both unidimensional data (e.g., for direct topographical imaging) and multidimensional data (e.g., for crystallographic data) for a sample that is interrogated with a charged particle beam. In some examples, unidimensional data can include signal intensity due to backscattered electrons received across the entire detector surface while multidimensional data can include signal intensity due to backscattered electrons as a function of pixel position. By obtaining unidimensional data and multidimensional data from a single detector, the unidimensional data and multidimensional data can be obtained at a same location, at a same time, or both at the same location and same time.

The invention relates to an isotropic thermal neutron radiation field angle distribution uniformity control device and method, and the device is characterized in that a particle accelerator is used for emitting a high-energy charged particle beam with a beam position; the beryllium target is placed along the emission line of the high-energy charged particle beam, and the high-energy charged particle beam bombards the beryllium target to generate charges; the insulation isolation gasket is wound on the outer side of the beryllium target and prevents the charges from being led out from the outside through the beryllium target; and the adjusting assembly is connected with the beryllium target and used for acquiring the electric charge quantity on the beryllium target, and is connected with the particle accelerator and used for adjusting the angle of the high-energy charged particle beam irradiating to the beryllium target. According to the invention, the purposes of preventing the charges from being exported outwards based on the insulation isolation gasket and obtaining the charge quantity by the adjusting assembly to adjust the particle accelerator are achieved, so that after the insulation isolation gasket with low cost is used for isolation, the charge quantity is detected to adjust the particle accelerator, and the technical effect of effectively saving the cost is achieved.

Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a charged-particle source configured to generate primary charged particles, the primary charged particles forming a primary charged-particle beam along a primary optical axis, and a charged-particle detector comprising a plurality of con-centric segments of a charged-particle sensitive material configured to detect charged particles emitting from a sample after interaction of the primary charged-particle beam with the sample, wherein each segment of the plurality of concentric segments is configured to collect the emitted charged particles having a range of energy levels and a dominant energy level.

A charged-particle beam microscope is provided for imaging a sample. The microscope has a housing to enclose a first volume at a first predefined vacuum pressure. A motorized stage is provided to hold and move a sample inside the first volume of the housing. A charged-particle beam module is provided in the housing, the charged-particle beam module including a chamber comprising one or more walls to enclose a second volume at a second predefined vacuum pressure, the second predefined vacuum pressure being substantially less than the first predefined vacuum pressure. The walls of the chamber are adapted to separate the second volume from the first volume and to maintain a pressure differential between the first and second volumes. A charged-particle beam source is provided inside the second volume to generate a charged-particle beam. One or more beam optical components are provided inside the second volume to converge the charged-particle beam onto the sample. One or more beam scanners are provided outside the charged-particle beam module to scan the electron beam across the sample. One or more detectors are provided outside the charged-particle beam module to detect radiation emanating from the sample. A controller analyzes the detected radiation.

In one example, a method performed via a computing device for providing support to a charged particle beam system includes computing a drift estimate based at least in part on a first set of image frames acquired with a charged particle beam column and a detector from a first portion of a sample. The method also includes configuring the charged particle beam column and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation during acquisition of the second set of image frames based at least in part on the drift estimate.

A method of generating an image of a region of a semiconductor sample including a plurality of channels extending substantially perpendicular to a sample surface of the semiconductor sample based on a focused charged particle beam hitting a surface of the semiconductor sample along scanning lines, the method comprising at a charged particle beam imaging system the step of controlling the scanning lines of the focused charged particle beam in such a way that the scanning lines cross an interface between the semiconductor surface and each of the channels only with an angle greater or equal to 45°. The image is generated based on the scanning lines.

In one embodiment, a multiple charged-particle beam irradiation apparatus includes a correction map generation unit calculating, for each pixel, a beam modulation rate for the pixel and a beam modulation rate for at least one of pixels surrounding the pixel, based on an amount of displacement of a beam emitted toward the pixel and a position of a pattern placed within the pixel and generating a correction map in which modulation rates are defined, and an irradiation dose correction unit calculating, for each pixel, a corrected irradiation dose by adding a value obtained by multiplying the beam modulation rate for the pixel defined in the correction map by the beam irradiation dose for the pixel and a value obtained by multiplying the beam modulation rate for the at least one pixel by a beam irradiation dose for a pixel serving as an associated destination of the at least one pixel.

A system and method for increasing a gas flow across a substrate in a charged particle beam apparatus are disclosed. The apparatus may include a vacuum chamber comprising: a first gas inlet fluidly connected to a charged particle beam optical element array and configured to guide a first gas flow downstream toward a substrate within the charged particle beam optical element array at a first flow rate; and a second gas inlet configured to guide a second gas flow toward the substrate at a second flow rate. The first and second gas flows are merged to form a transverse gas flow across the top surface of the substrate, the transverse gas flow having a flow rate higher than either the first or second flow rate.

A method for operating a multi-beam particle microscope which operates using a plurality of individual charged particle beams, wherein the method includes the following steps: measuring the beam current; determining a deviation of the measured beam current from a nominal beam current; decomposing the determined deviation into a drift component and into a high-frequency component; and controlling the high-frequency component of the beam current via a first closed-loop beam current control mechanism and / or compensating an effect of the high-frequency component on a recording quality of the multi-beam particle microscope using different mechanism than a closed-loop beam current control mechanism. An electrostatic control lens arranged in the beam generating system between extractor and anode can be used as first closed-loop beam current control mechanism. Adapting an extractor voltage of the beam generating system can be avoided.

A method for operating a charged particle optical device, the method comprising: scanning, with a charged particle optical device, a sample comprising a series of positions with a charged particle beam so as to generate scan data; changing a setting of at least one charged particle optical parameter of the charged particle optical device from position to position, wherein the at least one charged particle optical parameter affects a charged particle optical grid distortion of the scan data; and compensating for charged particle optical grid distortion based on the changed setting of the at least one charged particle optical parameter.

A dual beam device for three-dimensional volume image generation of semiconductor objects within a wafer and a method of operating the dual beam device are provided. The dual beam device comprises a closed loop monitoring system between a focus point of a charge-particle beam imaging system and an inspection site on a wafer mounted on a wafer stage. Thereby, drifts between a charge-particle beam imaging system and the wafer stage are mitigated.

The invention provides a magnetic resonance guided charged particle beam radiotherapy device and an electromagnetic navigation parameter debugging method for target coordinates, and belongs to the technical field of radiotherapy devices. The system comprises a charged particle beam electromagnetic navigation device which comprises multiple stages of electromagnetic navigation coils, charged particle beams sequentially pass through the multiple stages of electromagnetic navigation coils, and parallel charged particle beams consistent with a magnetic resonance main magnetic field in direction are generated; the MR imaging device comprises an MR main magnetic field coil upper group and an MR main magnetic field coil lower group, and an imaging treatment area is formed between the MR main magnetic field coil upper group and the MR main magnetic field coil lower group. The electromagnetic navigation parameter debugging method comprises the steps of constructing a target cost function, optimizing electromagnetic navigation parameters based on an optimization algorithm without gradient information, and determining and outputting optimal navigation parameters. According to the invention, the charged particle beam parallel to the MR main magnetic field can be generated, the influence of Lorentz force on the charged particle beam is greatly reduced, the difficulty of positioning a tumor target region by the charged particle beam under the guidance of MR can be reduced, and the treatment accuracy is improved.

There is provide a circular accelerator and a particle beam therapy system that can improve the beam extraction efficiency. A circular accelerator that accelerates and extracts charged particle beams circulating in a magnetic field includes a first magnetic field region in which closed trajectories of the beams with different energies are eccentric and which has a magnetic field gradient decreasing in the magnetic field toward an outer peripheral side and a second magnetic field region having a magnetic field gradient increasing in the magnetic field toward the outer peripheral side. A border between the first magnetic field region and the second magnetic field region is located on a downstream side in a traveling direction of the beam with respect to a predetermined region in which an interval between the closed trajectories of the beams with the different energies is narrowest.

A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.

Samples and methods for determining beam spot size include scanning a pattern on a sample with a charged particle beam to generate an image. The pattern can include at least one sloped side edge and a top surface. The at least one sloped side edge can have a slope angle controlled during fabrication of the sample to be between about 40 to 80 degrees. The beam spot size can be determined based on an imaged profile of the at least one sloped side edge, the imaged profile being derived based on the image.

A charged particle-optical module (200) for a plurality of charged particle-optical devices configured to direct charged particle beams along respective beam paths towards a sample location, the charged particle-optical module comprises: a plurality of emitters (21) configured to emit respective source beams of charged particles along respective source paths; and a plurality of charged particle-optical plate elements (24-26) configured to operate on the source beams and in which are defined a plurality of beam apertures (266) configured for passage of the source beams, wherein at least one of the charged particle-optical plate elements are common to a plurality of the emitters, wherein the charged particle-optical plate elements comprise an extractor arrangement (25) configured to operate on the source beams individually.

The invention discloses an electric field deflector, a preparation method thereof and an electric field deflection control system, relates to the field of semiconductors, and is used for realizing high-precision control of electron beams. The electric field deflector comprises a substrate, a dielectric layer arranged on one side of the substrate, a first signal interconnection lead connected with the ground electrode, a second signal interconnection lead connected with the signal electrode, a first deflection electrode and a second deflection electrode, wherein the first signal interconnection lead and the second signal interconnection lead are located in the dielectric layer and are connected with the ground electrode, and the first deflection electrode and the second deflection electrode are oppositely arranged. The first deflection electrode is electrically connected with the first signal interconnection lead, and the second deflection electrode is electrically connected with the second signal interconnection lead; the first shielding layer is connected with the first deflection electrode; the particle beam channel penetrates through the area between the first deflection electrode and the second deflection electrode, the part, located between the first signal interconnection lead and the second signal interconnection lead, of the dielectric layer, the first shielding layer and the substrate in the second direction; the second direction is vertical to the substrate; the electric field deflector is used for electric field deflection control of the charged particle beam.

Provided is a focused charged particle beam device including: a support portion that supports a processed substrate; and a focused energy beam columnar body that includes a differential exhaust device and is capable of relative movement in correspondence with an arbitrary region of a processed surface of the processed substrate, wherein the support portion supports only a peripheral portion of the processed substrate in a state in which the processed substrate is horizontally disposed, a positive pressure chamber is disposed below the processed substrate supported by the support portion, the positive pressure chamber applies positive pressure throughout the entirety of a processed region of the processed substrate, prevents deflection of the processed substrate due to gravity, includes a local negative pressure mechanism within the positive pressure chamber, the local negative pressure mechanism applies negative pressure while maintaining a state in which the local negative pressure mechanism does not contact a lower surface of the processed substrate, counteracts suction force of the differential exhaust device, maintains a state in which the local negative pressure mechanism opposes the differential exhaust device across the processed substrate, and is capable of relative movement with respect to the processed substrate in following the differential exhaust device.

Systems, devices, and techniques for heating a sample are described. A heating assembly can include a membrane. The membrane can include carbon nanotube material. The heating assembly includes a support, mechanically coupled with the membrane. The support can be configured to integrate with a charged particle beam system. The heating assembly also includes a heating circuit, electrically coupled with the membrane. The heating circuit can be configured to direct an electrical current through the membrane.

The invention relates to a laser device, a laser control method and a charged particle beam detection system. The laser device comprises a controller, a multi-wavelength laser light source and a first dimming module. The controller is configured to match the working height of the working table and generate a wavelength selection instruction; wherein the working table is used for placing a semiconductor structure to be tested, and the working height of the working table is adjustable. The multi-wavelength laser light source is connected with the controller and is configured to respond to a wavelength selection instruction and emit a laser beam of a target wavelength. The first dimming module is located on the light emitting side of the multi-wavelength laser light source and is configured to adjust the transmission light path of the laser beam so that the laser beam can irradiate the semiconductor structure to be measured according to a first target angle. Wherein the laser beams with different target wavelengths correspondingly have different first target angles. The method and the device are used for assisting in charged particle detection so as to improve the comprehensiveness and the accuracy of semiconductor defect detection.