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3385 results about "Charged particle beam" patented technology

A charged particle beam is a spatially localized group of electrically charged particles that have approximately the same position, kinetic energy (resulting in the same velocity), and direction. The kinetic energies of the particles are much larger than the energies of particles at ambient temperature. The high energy and directionality of charged particle beams make them useful for applications (see Particle Beam Usage and Electron beam technology).

Charged particle beam irradiation apparatus and method of irradiation with charged particle beam

A charged particle beam irradiation apparatus includes two electromagnets arranged in series along a direction of an incident axis of a charged particle beam, for deflecting the charged particle beam in opposite directions, an energy modulator including a cylindrical member having a length and a distribution of wall thickness in a circumferential direction, a first rotational drive for rotating the cylindrical member around a rotation axis, and a detector for detecting the angular position of the cylindrical member. The energy modulator is disposed at a downstream side of the scanning electromagnets so that the deflected charged particle beam passes through the rotation axis. The apparatus includes an energy degrader for limiting energy of the charged particle beam, and a second rotational drive for rotating the scanning electromagnets and the energy modulator together around the incident axis of the charged particle beam.
Owner:MITSUBISHI ELECTRIC CORP

Apparatus for generating a plurality of beamlets

The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
Owner:ASML NETHERLANDS BV

Charged particle beamlet exposure system

The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising:a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet;a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens;a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, anda second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.
Owner:ASML NETHERLANDS BV

Charged particle beam apparatus and method for operating the same

A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
Owner:ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUER HALBLEITERPRUEFTECHNIK GMBH

Inspection system by charged particle beam and method of manufacturing devices using the system

InactiveUS20020028399A1Efficiently and accurately inspecting objectAccurately inspect an objectMaterial analysis using wave/particle radiationElectrode and associated part arrangementsBeam sourceSecondary electrons
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
Owner:EBARA CORP +1

Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device

The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.
Owner:HITACHI LTD

Method for inspecting substrate, substrate inspecting system and electron beam apparatus

The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.
Owner:EBARA CORP

Particle therapy system

A particle therapy system is provided which can simply and quickly correct a beam orbit. In a particle therapy system provided with an irradiation facility comprising a first beam transport system for receiving a beam and transporting the beam to the patient side, and an irradiation nozzle for forming an irradiation field of the beam, the particle therapy system comprises first beam position monitors for detecting a position upstream of the irradiation nozzle at which the beam passes, second beam position monitors for detecting a position downstream of the irradiation nozzle at which the charged-particle beam passes, and first and second steering magnets. Correction bending amounts for causing the beam to be coincident with a predetermined orbit after the correction are determined in accordance with detected results from the first and second beam position monitors, and first and second steering magnets are excited under control so that the determined correction bending amounts are obtained.
Owner:HITACHI LTD

Charged particle beam irradiation system

A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) 100 disposed in a course of a beam transport line 4 through which an ion beam is extracted from a charged-particle beam generator 1. The beam dump device 100 is provided with dose monitoring devices 105, 106 for measuring a dose of an ion beam applied to a beam dump 104 so that the intensity of the ion beam can be measured without transporting the ion beam to irradiation nozzles 15A through 15D. Thus, the system is capable of adjusting the intensity of an ion beam extracted from a synchrotron without operating each component of a beam transport line, and an irradiation nozzle.
Owner:HITACHI LTD

Particle beam irradiation system

It is an object of the present invention to provide a charged particle beam extraction method and particle beam irradiation system that make it possible to exercise intensity control over an extracted ion beam while a simple device configuration is employed. To accomplish the above object, there is provided a particle beam irradiation system comprising: a synchrotron for accelerating and extracting an charged particle beam; an irradiation apparatus for extracting the charged particle beam that is extracted from the synchrotron; first beam intensity modulation means for controlling the beam intensity of the charged particle beam extracted from the synchrotron during an extraction control period of an operation cycle of the synchrotron; and second beam intensity modulation means for controlling the beam intensity during each of a plurality of irradiation periods contained in the extraction control period of the operation cycle.
Owner:HITACHI LTD

Particle beam irradiation system

A particle beam irradiation system capable of ensuring a more uniform dose distribution at an irradiation object even when a certain time is required from output of a beam extraction stop signal to the time when extraction of a charged particle beam from an accelerator is actually stopped. The particle beam irradiation system comprises a synchrotron, an irradiation device including scanning magnets and outputting an ion beam extracted from the synchrotron, and a control unit. The control unit stops the output of the ion beam from the irradiation device in accordance with the beam extraction stop signal, controls the scanning magnets to change an exposure position in a state in which the output of the ion beam is stopped, and after the change of the exposure position, starts the output of the ion beam from the irradiation device again. The control unit further outputs a next beam extraction stop signal when an increment of dose integrated from the time of a preceding beam extraction stop signal as a start point reaches a setting dose stored in advance.
Owner:HITACHI LTD

Particle beam processing system

A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.
Owner:HBAR TECH LC

Particle beam irradiation equipment and particle beam irradiation method

Particle beam irradiation equipment and a method of adjusting irradiation nozzle, which can ensure a long range and high dose uniformity at any field size are provided. The particle beam irradiation equipment comprises charged particle beam generation equipment and an irradiation nozzle for irradiating a charged particle beam extracted from the charged particle beam generation equipment to an irradiation target. The irradiation nozzle comprises a first scatterer device including a first scatterer for spreading out the charged particle beam into a Gaussian-like distribution, and multiple stages of second scatterer devices including second scatterers for producing a uniform intensity distribution of the charged particle beam having been spread out into a Gaussian-like distribution by the first scatterer. For forming irradiation fields having sizes different from each other, the second scatterer devices are disposed downstream of the first scatterer device in the direction of travel of the charged particle beam at the spacing depending on the difference in the field size.
Owner:HITACHI LTD

Rotating irradiation therapy apparatus

A rotating irradiation therapy apparatus used for particle beam therapy includes a rotating gantry equipped with a charged particle beam irradiation device beam transport devices for guiding a charged particle beam to the irradiation device and a roller in contact with a ring member included in the rotating gantry and supporting the gantry. A front ring is disposed in contact with the roller of a rotating body support device at one end in the axial direction of the rotating gantry, and a rear ring is disposed in contact with the roller at the other end in the axial direction of the rotating gantry. At least one intermediate ring is disposed in a position different in the axial direction of the gantry between the front and rear rings and in contact with the roller.
Owner:HITACHI LTD

Charged particle beam irradiation equipment and control method thereof

A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD

Device for irradiation therapy with charged particles

The present invention is related to a device for irradiating a patient with a charged particle beam, comprising a number of beam channels attached to a vertical wall, wherein a deflection magnet is present at the end of each channel. This deflection magnet is able to deflect the beam in the vertical plane over a given angle range. The couch whereon the patient is reclining is mobile in the vertical plane, so that the combined movement of the patient, and the variable deflection of the beam allow one point in the patient to be irradiated from several angles in the vertical plane.
Owner:ION BEAM APPL

Elongated lifetime x-ray method and apparatus used in conjunction with a charged particle cancer therapy system

The system uses an X-ray imaging system having an elongated lifetime. Further, the system uses an X-ray beam that lies in substantially the same path as a charged particle beam path of a particle beam cancer therapy system. The system creates an electron beam that strikes an X-ray generation source located proximate to the charged particle beam path. By generating the X-rays near the charged particle beam path, an X-ray path running collinear, in parallel with, and / or substantially in contact with the charged particle beam path is created. The system then collects X-ray images of localized body tissue region about a cancerous tumor. Since, the X-ray path is essentially the charged particle beam path, the generated image is usable for precisely target the tumor with a charged particle beam.
Owner:BALAKIN ANDREY VLADIMIROVICH +1

Charged particle beam irradiation equipment having scanning electromagnet power supplies

A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
Owner:HITACHI LTD

Charged particle irradiation system

ActiveUS7838855B2Improving the accuracy in irradiation position of a charged particle beamReduce the possibilityElectrode and associated part arrangementsMaterial analysis by optical meansExcitation currentParticle physics
A charged particle irradiation system that positions the beam at a target position to avoid irradiation of normal tissue includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signals received from the charged particle beam position monitors 26 and 27, the control unit 70 calculates a beam position at a target position and then controls the scanning magnets 24 and 25 so that the charged particle beam is moved to a desired irradiation position at the target position. The control unit 70 corrects the value of an excitation current applied to each of the scanning magnets 24 and 25 on a specified cycle basis on the basis of information about the position and the angle of the charged particle beam.
Owner:HITACHI LTD

Charged particle beam extraction system and method

A charged particle beam extraction system and method capable of ensuring higher safety when extraction of an ion beam is on / off-controlled during irradiation of the ion beam for treatment. The charged particle beam extraction system comprises a charged particle beam generator including a synchrotron, a range modulation wheel (RMW) for forming a Bragg peak width of a charged particle beam extracted from the charged particle beam generator, a gate signal generator for controlling start and stop of extraction of the charged particle beam from the charged particle beam generator in accordance with a rotational angle of the RMW, and an irradiation control / determination section for determining whether the start and stop of extraction of the charged particle beam is controlled at desired timing by the gate signal generator.
Owner:HITACHI LTD
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