1034 results about "Charged particle beam" patented technology

The present disclosure provides a charged particle element and relates apparatus and methods. In one arrangement, the element comprises a beam manipulator configured to operate on a plurality of charged particle beams in a beam grid. The beam manipulator comprises a plurality of plates. Each plate has two surfaces and a plurality of apertures. The plates comprises at least one curved-surface plate with a curved surface. The curved surface faces a facing surface of an adjacent plate. Deflections are applied to beams by controlling a potential difference between the curved surface and the facing surface.

An electron-optical projection device for projecting a plurality of charged particle beams towards a sample, the device comprising a stack of plates comprising beam directing elements configured to project the plurality of charged particle beams towards a sample location on the sample, wherein at least one plate of the stack comprises a planar optical member configured to direct stimulation light towards the sample location so that the stimulation light is coincident with the plurality of charged particle beams, desirably coincident with the paths of the plurality of charged particle beams towards the sample location, desirably in the at least one plate comprising an optical member is defined a plurality of apertures for respective paths of a plurality charged particle beams.

Apparatuses, systems, and methods for providing beams for defect detection and defect location binning associated with a sample of charged particle beam systems. A method of image analysis may include obtaining an image of a sample, identifying a feature captured in the image of the sample, generating a template image from a design layout of the identified feature, comparing 5 the image of the sample with the template image, and processing the image based on the comparison. In some embodiments, a method of image analysis may include obtaining an image of a sample, identifying a feature captured in the obtained image of the sample, mapping the obtained image to a template image generated from a design layout of the identified feature, and analyzing the image based on the mapping.

Provided is a charged particle beam device capable of shortening the acquisition time of a feature image. In this charged particle beam device, an image acquisition unit acquires a plurality of feature images by repeating: a process for selecting one mode from a plurality of modes for acquiring the feature images on the basis of the proportion of a region of a feature object in an acquired sample image in the field of view; and a process for acquiring a feature image in the selected mode, the plurality of modes including: a first mode in which a sample image is captured by scanning the sample at a first scanning speed, and the captured sample image is cut to acquire the feature image; and a second mode in which a sample image is captured by scanning the sample at a second scanning speed faster than the first scanning speed, and a feature image is captured by scanning a region of the feature object in the captured sample image at a third scanning speed slower than the second scanning speed.

There is provided a circular accelerator that accelerates a beam of charged particles circulating in a magnetic field such that a closed orbit for each energy of the beam is eccentric. The circular accelerator includes a beam extraction port for extracting beams of different energies from the closed orbit, a first bending magnet and a second bending magnet that bend the beam extracted from the beam extraction port, and a control unit that controls magnetic field strengths of the first bending magnet and the second bending magnet in accordance with the energy of the extracted beam. When the energy of the extracted beam is a designed maximum energy of the circular accelerator, the control unit excites both the first bending magnet and the second bending magnet to bend the beam.

The subject invention is a device for mounting a cassette (4) with a lamellae holder (5) and a charged particle beam device comprising a cassette (4) mounting device with a lamellae holder (5). The device with the cassette (4) with a lamellae holder (5) uses an arm (3) pivotally connected to the body (1 ), the end of which, when the arm (3) is rotated away from the body (1 ) is adapted to hold the cassette (4) with the lamellae holder (5).

A method for imaging of semiconductor samples with reduced charging effects and a multi-beam charged particle beam system configured for imaging of semiconductor samples with reduced charging effects comprises adjusting the kinetic energy of primary charged particles to a low energy transition energy, where charging of a material composition is minimized. The system and method include for example a monitoring system and optimization of the kinetic energy to minimize charging effects.

The present disclosure proposes a charged particle beam device, wherein, in order to reduce a field-of-view deviation amount when stage rotation is performed in each of θx, θy, and θz axial directions with respect to a discretionary stage rotation center: (i) the discretionary rotation center is controlled using motor thrust in a translation direction and a rotation direction of a stage device; (ii) a deviation amount from the center of the field of view in an observation image, or the trajectory of the deviation amount, is obtained on the basis of position information indicating the distance in at least one of an X-axis direction, a Y-axis direction, and a Z-axis direction between rotation center coordinates of the stage device and sample observation coordinates, and on the basis of the rotation angles of a θx axis, a θy axis, and a θz axis, during the rotation operation; and (iii) the deviation amount, or the trajectory of the deviation amount, is added to the position information pertaining to the stage when the stage device is moved, whereby the deviation amount from the center of the field of view in the observation image is corrected (see fig. 4).

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

Provided is a stage device that suppresses vibration of a stator of a motor, and that enables high-speed positioning. The stage device comprises: a first table; a second table that is able to move within a horizontal plane in a state of magnetic levitation over the first table; a support section for supporting the second table; a first double-shaft motor provided to the support section; and a second double-shaft motor provided to the support section. The first double-shaft motor and second double-shaft motor each comprise: a yoke provided with an upper member and a lower member; and a first and a second rectangular coil which are located between the upper member and the lower member and are each fixed to the support section, and an axial direction of which is the vertical direction. On a lower surface of the upper member and an upper surface of the lower member, there are provided magnet arrays, in which magnets are arranged in square blocks arrayed in a grid so that adjacent blocks have different magnetic poles. The magnet array provided to the lower surface of the upper member and the magnet array provided to the upper surface of the lower member are configured so that magnets of blocks that face opposite in the vertical direction have different magnetic poles from one another.

A telecentric charged particle beam, which can be an electron beam, is directed through an array of apertures to divide the telecentric charged particle beam to a plurality of telecentric illumination beamlets. The telecentric illumination beamlets through an imaging lens, a field lens at an intermediate image plane, and a transfer lens. The telecentric illumination beamlets are scanned as the telecentric illumination beamlets are directed through an upper scan deflector and a lower scan deflector and directed onto a workpiece on a stage.

The invention provides a button type signal feed-through for a beam position detector. The button type signal feed-through comprises a shell, a composite unit and an insulator. The composite unit comprises a button electrode and an inner conductor, and the button electrode is suitable for sensing an electromagnetic field signal generated by charged particle beams in the vacuum cavity; the inner conductor vertically and integrally extends from the center of the button electrode, a flange is arranged near one end, close to the button electrode, of the inner conductor, and the inner conductor is suitable for transmitting beam electromagnetic field signals. The insulator is sleeved on the inner conductor and comprises a first section cylinder and a second section cylinder, and the front end face of the first section cylinder is welded and fixed with the flange of the inner conductor; the second section of cylinder body extends outwards in the radial direction from the rear end of the first section of cylinder body, the circumferential outer surface of the second section of cylinder body is welded and fixed with the shell, and the insulator is suitable for fixed support and electrical insulation, so that smooth transition of transmission impedance and vacuum sealing are realized. The invention further provides a preparation method of the charged particle beam position detector and a charged particle beam position detector structure.

A deflector for a charged particle beam device is described. And a deflector having an axis and configured to deflect the charged particle beam in a direction perpendicular to the axis, the deflector comprising a plurality of flat coils, the plurality of flat coils comprising two pairs of flat coils, where the two pairs of flat coils are arranged on opposite sides about the axis of the deflector.

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.

Provided in the present invention are a magnetic resonance guided charged particle beam radiotherapy apparatus and an electromagnetic navigation parameter debugging method for target point coordinates, belonging to the technical field of radiotherapy apparatuses. The present invention comprises a charged particle beam electromagnetic navigation apparatus. The charged particle beam electromagnetic navigation apparatus comprises a multi-stage electromagnetic navigation coil, a charged particle beam sequentially passing through the multi-stage electromagnetic navigation coil to generate a parallel charged particle beam with a direction consistent with the direction of a magnetic resonance main magnetic field; and an MR imaging apparatus, comprising an MR main magnetic field coil upper group and an MR main magnetic field coil lower group, an imaging therapy area being formed therebetween. The electromagnetic navigation parameter debugging method of the present invention comprises constructing a target cost function, optimizing electromagnetic navigation parameters based on a gradient information-free optimization algorithm, and determining and outputting optimal navigation parameters. According to the present invention, the charged particle beam parallel to the MR main magnetic field can be generated, thereby greatly reducing the influence of Lorentz force on the charged particle beam, enabling to reduce the positioning difficulty of the charged particle beam on a tumor target area under MR guidance, and improving the therapeutic accuracy.

The invention provides a charged particle beam deflection electrostatic lens and a charged particle beam deflection method. The charged particle beam deflection electrostatic lens comprises at least one on-axis electrode, an off-axis electrode and a power distribution module, through holes are formed in the on-axis electrode and the off-axis electrode, and charged particle beams pass through the through holes; the off-axis electrode is parallel to the on-axis electrode, the central axis of the off-axis electrode is not coaxial with a preset incident optical axis, and the central axis of the on-axis electrode is coaxial with the preset incident optical axis; the power distribution module is electrically connected with the on-axis electrode, the power distribution module is electrically connected with the off-axis electrode, and the power distribution module is used for configuring different potentials for the on-axis electrode and the off-axis electrode so as to form a non-axisymmetric electric field to enable the charged particle beam to deflect. The problems that in the prior art, the structure is complex, and charged particle beams cannot be deflected and focused at the same time are solved. According to the invention, the charged particle beams are deflected and focused simultaneously by adopting a simple structure.

The present disclosure relates to a system and a non-transitory computer-readable medium for estimating the height of foreign matter, etc. adhering to a sample. In order to achieve the abovementioned purpose, proposed is a system, etc. in which data acquired by a charged particle beam device or features extracted from the data are input to a learning model, which is provided with, in an intermediate layer thereof, a parameter learned using teacher data having data acquired by the charged particle beam device or features extracted from the data as inputs and having the heights or depths of the structures of samples or of foreign matter on the samples as outputs, and height or depth information is output.

In order to compensate for undesired effects of varying elevation of a target with respect to a nominal target plane, during writing a desired pattern on the target in a charged-particle beam apparatus, the pattern is re-calculated in each of a number of segments of the target plane by: determining an elevation of the target in the segment from the nominal target plane; determining a local blur value which represents the actual value of blur corresponding to the elevation, with regard to a dependence of the blur upon the elevation of the target; calculating a convolution kernel which represents a point spreading function realizing a local blur value; and re-calculating a nominal exposure pattern by applying the kernel to the pattern. The convolution kernel corresponds to introducing an additional blur into the pattern in the segment, increasing the blur to a given target blur value which is uniform to all segments.

A multi-beam charged particle beam system includes a detection unit configured for a dynamic compensation of charging effects of a sample. The detection unit comprises a relay optical system comprising an adaptive mirror array for keeping signal beams at the position of entrance apertures of lightguides od detection elements. Thereby, beam distortions induced by charging effects can be compensated. The disclosure can be applied to, for example, wafer inspection with multi-beam charged particle beam system.

This charged particle beam device comprises: a charged particle beam optical system that irradiates a sample with an electron beam; a sample chamber that is provided with a stage on which the sample is placed; a detector that detects charged particles obtained by irradiating the sample with the electron beam; one or more computer systems that generate an image of the sample on the basis of output from the detector; a charging control component that controls charging of the sample by generating at least one of electrons, ions, and light according to a charging control condition; and an input device that receives input of an index value relating to the image. The one or more computer systems control the charging control component on the basis of the relationship between the index value and the charging control condition, and the index value.

And drift compensation of the radiation sensitive sample. In one example, a method performed via a computing device to provide support to a charged particle beam system includes calculating a drift estimate based at least in part on a first set of image frames acquired from a first portion of a sample using a charged particle beam barrel and a detector. The method further includes configuring the charged particle beam barrel and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation based at least in part on the drift estimate during acquisition of the second set of image frames.

Systems and methods taught herein utilize a single detector to provide both unidimensional data (e.g., for direct topographical imaging) and multidimensional data (e.g., for crystallographic data) for a sample that is interrogated with a charged particle beam. In some examples, unidimensional data can include signal intensity due to backscattered electrons received across the entire detector surface while multidimensional data can include signal intensity due to backscattered electrons as a function of pixel position. By obtaining unidimensional data and multidimensional data from a single detector, the unidimensional data and multidimensional data can be obtained at a same location, at a same time, or both at the same location and same time.

The invention relates to an isotropic thermal neutron radiation field angle distribution uniformity control device and method, and the device is characterized in that a particle accelerator is used for emitting a high-energy charged particle beam with a beam position; the beryllium target is placed along the emission line of the high-energy charged particle beam, and the high-energy charged particle beam bombards the beryllium target to generate charges; the insulation isolation gasket is wound on the outer side of the beryllium target and prevents the charges from being led out from the outside through the beryllium target; and the adjusting assembly is connected with the beryllium target and used for acquiring the electric charge quantity on the beryllium target, and is connected with the particle accelerator and used for adjusting the angle of the high-energy charged particle beam irradiating to the beryllium target. According to the invention, the purposes of preventing the charges from being exported outwards based on the insulation isolation gasket and obtaining the charge quantity by the adjusting assembly to adjust the particle accelerator are achieved, so that after the insulation isolation gasket with low cost is used for isolation, the charge quantity is detected to adjust the particle accelerator, and the technical effect of effectively saving the cost is achieved.

Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a charged-particle source configured to generate primary charged particles, the primary charged particles forming a primary charged-particle beam along a primary optical axis, and a charged-particle detector comprising a plurality of con-centric segments of a charged-particle sensitive material configured to detect charged particles emitting from a sample after interaction of the primary charged-particle beam with the sample, wherein each segment of the plurality of concentric segments is configured to collect the emitted charged particles having a range of energy levels and a dominant energy level.

A charged-particle beam microscope is provided for imaging a sample. The microscope has a housing to enclose a first volume at a first predefined vacuum pressure. A motorized stage is provided to hold and move a sample inside the first volume of the housing. A charged-particle beam module is provided in the housing, the charged-particle beam module including a chamber comprising one or more walls to enclose a second volume at a second predefined vacuum pressure, the second predefined vacuum pressure being substantially less than the first predefined vacuum pressure. The walls of the chamber are adapted to separate the second volume from the first volume and to maintain a pressure differential between the first and second volumes. A charged-particle beam source is provided inside the second volume to generate a charged-particle beam. One or more beam optical components are provided inside the second volume to converge the charged-particle beam onto the sample. One or more beam scanners are provided outside the charged-particle beam module to scan the electron beam across the sample. One or more detectors are provided outside the charged-particle beam module to detect radiation emanating from the sample. A controller analyzes the detected radiation.

In one example, a method performed via a computing device for providing support to a charged particle beam system includes computing a drift estimate based at least in part on a first set of image frames acquired with a charged particle beam column and a detector from a first portion of a sample. The method also includes configuring the charged particle beam column and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation during acquisition of the second set of image frames based at least in part on the drift estimate.

An apparatus for detecting defects in a sample includes a memory storing a set of instructions and at least one processor configured to execute the set of instructions to cause the apparatus to perform: acquiring a plurality of images, wherein each image is a location to be examined; segmenting each of the plurality of images; stacking the plurality of segmented images into a three-dimensional (3D) volume; calculating a medial axis of the 3D volume; generating a medial axis skeleton of the 3D volume based on the calculated medial axis; and evaluating the medial axis skeleton to determine whether there are any detected defects in the sample.

The present disclosure provides a charged particle element and relates apparatus and methods. In one arrangement, the element comprises a beam manipulator configured to operate on a plurality of charged particle beams in a beam grid. The beam manipulator comprises a plurality of plates. Each plate has two surfaces and a plurality of apertures. The plates comprises at least one curved-surface plate with a curved surface. The curved surface faces a facing surface of an adjacent plate. Deflections are applied to beams by controlling a potential difference between the curved surface and the facing surface.

A method of generating an image of a region of a semiconductor sample including a plurality of channels extending substantially perpendicular to a sample surface of the semiconductor sample based on a focused charged particle beam hitting a surface of the semiconductor sample along scanning lines, the method comprising at a charged particle beam imaging system the step of controlling the scanning lines of the focused charged particle beam in such a way that the scanning lines cross an interface between the semiconductor surface and each of the channels only with an angle greater or equal to 45°. The image is generated based on the scanning lines.

In one embodiment, a multiple charged-particle beam irradiation apparatus includes a correction map generation unit calculating, for each pixel, a beam modulation rate for the pixel and a beam modulation rate for at least one of pixels surrounding the pixel, based on an amount of displacement of a beam emitted toward the pixel and a position of a pattern placed within the pixel and generating a correction map in which modulation rates are defined, and an irradiation dose correction unit calculating, for each pixel, a corrected irradiation dose by adding a value obtained by multiplying the beam modulation rate for the pixel defined in the correction map by the beam irradiation dose for the pixel and a value obtained by multiplying the beam modulation rate for the at least one pixel by a beam irradiation dose for a pixel serving as an associated destination of the at least one pixel.