1292 results about "Charged particle beam" patented technology

The present disclosure provides a charged particle element and relates apparatus and methods. In one arrangement, the element comprises a beam manipulator configured to operate on a plurality of charged particle beams in a beam grid. The beam manipulator comprises a plurality of plates. Each plate has two surfaces and a plurality of apertures. The plates comprises at least one curved-surface plate with a curved surface. The curved surface faces a facing surface of an adjacent plate. Deflections are applied to beams by controlling a potential difference between the curved surface and the facing surface.

A method comprises: providing FIB and CPB columns with FIB and CPB optical axes coinciding at a wafer surface; in the coincidence arrangement, removing a cross section surface layer of a measurement site of a wafer using the FIB column to make a new cross section accessible for imaging; reducing a working distance between the CPB imaging column and the wafer surface in a direction along the axis of the CPB imaging column; imaging the new cross section at the measurement site of the wafer with the CPB imaging column at the reduced working distance and thus not in the coincidence arrangement; and increasing the working distance between the CPB imaging column and the wafer surface in the direction along the axis of the CPB imaging column until the coincidence arrangement is reached.

The invention relates to a charged particle beam scanning aberration correction method and system. The method comprises the following steps: determining a reference deflector and a deflector to be calibrated; respectively acquiring a first scanning image of the reference deflector and a second scanning image of the deflector to be calibrated; determining a first scanning deflection angle of the reference deflector according to the first scanning image, determining a second scanning deflection angle of the to-be-calibrated deflector according to the second scanning image, and determining a scanning deflection angle difference according to a difference value between the first scanning deflection angle and the second scanning deflection angle; obtaining a design angle difference between the reference deflector and the deflector to be calibrated; determining a mechanical deviation angle according to a difference value between the scanning deflection angle difference and the design angle difference; determining an imaging compensation angle according to the mechanical deviation angle, and outputting a target scanning waveform based on imaging parameters of the pattern generator adjusted according to the imaging compensation angle; and correcting the scanning signal according to the target scanning waveform. According to the invention, the scanning aberration of the charged particle beam scanning imaging system can be corrected, so that the imaging quality is improved.

The invention discloses a beam four-dimensional emittance measuring instrument and measuring method based on an orthogonal slit, and the method comprises the steps: enabling a charged particle beam to enter a slit assembly from one side, far away from a second slit plate, of a first slit plate, and enabling the charged particle beam to form a first beam cluster to the second slit plate after the charged particle beam is transmitted through the first slit; the first beam group is transmitted by the second slit to form a second beam group to the fluorescence acquisition assembly; the fluorescence acquisition assembly comprises a fluorescent screen and an image acquisition module, the fluorescent screen is used for receiving the second beam group and generating fluorescence, the image acquisition module is used for acquiring a fluorescence pattern emitted by the fluorescent screen bombarded by the second beam group, and the data processing assembly is used for calculating phase space distribution of beams according to the fluorescence image. And measuring the emittance of the charged particle beam according to the phase space distribution. According to the beam four-dimensional emittance measuring instrument provided by the invention, the beam is segmented through the slits in the orthogonal direction, so that more complete four-dimensional phase space distribution can be obtained, and the measurement integrity and precision of the beam emittance are improved.

An electron-optical projection device for projecting a plurality of charged particle beams towards a sample, the device comprising a stack of plates comprising beam directing elements configured to project the plurality of charged particle beams towards a sample location on the sample, wherein at least one plate of the stack comprises a planar optical member configured to direct stimulation light towards the sample location so that the stimulation light is coincident with the plurality of charged particle beams, desirably coincident with the paths of the plurality of charged particle beams towards the sample location, desirably in the at least one plate comprising an optical member is defined a plurality of apertures for respective paths of a plurality charged particle beams.

Apparatuses, systems, and methods for providing beams for defect detection and defect location binning associated with a sample of charged particle beam systems. A method of image analysis may include obtaining an image of a sample, identifying a feature captured in the image of the sample, generating a template image from a design layout of the identified feature, comparing 5 the image of the sample with the template image, and processing the image based on the comparison. In some embodiments, a method of image analysis may include obtaining an image of a sample, identifying a feature captured in the obtained image of the sample, mapping the obtained image to a template image generated from a design layout of the identified feature, and analyzing the image based on the mapping.

In one embodiment, a charged particle beam writing method includes transferring a substrate to a writing chamber of a charged particle beam writing apparatus by use of a transfer mechanism while maintaining each of the writing chamber and the transfer mechanism at a predetermined temperature, calculating correction amounts for charged particle beams based on correction data for charged particle beam irradiation positions each associated with a previously obtained elapsed time from a predetermined starting point in time of transfer of the substrate and the elapsed time at a point in time of irradiation with each of the charged particle beams, and applying the charged particle beams to positions corrected based on the calculated correction amounts for the charged particle beams to write a pattern on the substrate.

The present disclosure relates to apparatus and methods for assessing samples using a plurality of charged particle beams. In one arrangement, at least a subset of a beam grid of a plurality of charged particle beams and respective target portions of a sample surface are scanned relative to each other to process the target portions. Signal charged particles from the sample are detected to generate detection signals. A sample surface topographical map is generated that represents a topography of the sample surface by analyzing the detection signals.

Provided is a charged particle beam device capable of shortening the acquisition time of a feature image. In this charged particle beam device, an image acquisition unit acquires a plurality of feature images by repeating: a process for selecting one mode from a plurality of modes for acquiring the feature images on the basis of the proportion of a region of a feature object in an acquired sample image in the field of view; and a process for acquiring a feature image in the selected mode, the plurality of modes including: a first mode in which a sample image is captured by scanning the sample at a first scanning speed, and the captured sample image is cut to acquire the feature image; and a second mode in which a sample image is captured by scanning the sample at a second scanning speed faster than the first scanning speed, and a feature image is captured by scanning a region of the feature object in the captured sample image at a third scanning speed slower than the second scanning speed.

An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.

Embodiments of systems, devices, and methods relate to initiating beam transport for an accelerator system. An example method includes increasing a bias voltage of one or more electrodes of the accelerator system to a first voltage level and extracting a charged particle beam from a beam source such that the beam is transported through the accelerator system. The beam has a beam current at a first beam current level that results in a first transient voltage drop of the accelerator system within a threshold. The method further includes increasing the beam current at a rate that results in one or more subsequent transient voltage drops of the accelerator system until the accelerator system has reached nominal conditions. The one or more subsequent transient voltage drops are within the threshold. Another example method includes biasing one or more electrodes of an accelerator system to a voltage level and selectively extracting, according to a duty cycle function, a charged particle beam from a beam source such that the charged particle beam is transported through the accelerator system. The duty cycle function can be linear or non-linear and can include a frequency f. The duty cycle function can include a variable pulse duration such that the variable pulse duration increases over time with each selective extraction of the charged particle beam.

There is provided a circular accelerator that accelerates a beam of charged particles circulating in a magnetic field such that a closed orbit for each energy of the beam is eccentric. The circular accelerator includes a beam extraction port for extracting beams of different energies from the closed orbit, a first bending magnet and a second bending magnet that bend the beam extracted from the beam extraction port, and a control unit that controls magnetic field strengths of the first bending magnet and the second bending magnet in accordance with the energy of the extracted beam. When the energy of the extracted beam is a designed maximum energy of the circular accelerator, the control unit excites both the first bending magnet and the second bending magnet to bend the beam.

The subject invention is a device for mounting a cassette (4) with a lamellae holder (5) and a charged particle beam device comprising a cassette (4) mounting device with a lamellae holder (5). The device with the cassette (4) with a lamellae holder (5) uses an arm (3) pivotally connected to the body (1 ), the end of which, when the arm (3) is rotated away from the body (1 ) is adapted to hold the cassette (4) with the lamellae holder (5).

A geophysical or space-based detection, interrogation, or exploration system includes a compact electric dipole driven transmitter for producing a primary electromagnetic field, and a very sensitive electromagnetic sensing receiver for detecting a secondary electromagnetic field produced by electromagnetic induction in a target responsive to the primary electromagnetic. The electromagnetic sensing receiver is configured to employ computer-controlled software that operates an inverse algorithm that processes receiver data resulting from detection by the electromagnetic sensing receiver of the secondary electromagnetic field, and that performs analysis on results of the inverse algorithm to classify the target in a manner that distinguishes material, shape, or location of the target, and that displays results of the analysis. The compact electric dipole driven transmitter can be a compact transmitting antenna according to the present invention that includes a vacuum tube, a charged particle beam gun, a beam timing controller, and a beam speed controller.

A method for imaging of semiconductor samples with reduced charging effects and a multi-beam charged particle beam system configured for imaging of semiconductor samples with reduced charging effects comprises adjusting the kinetic energy of primary charged particles to a low energy transition energy, where charging of a material composition is minimized. The system and method include for example a monitoring system and optimization of the kinetic energy to minimize charging effects.

The present disclosure proposes a charged particle beam device, wherein, in order to reduce a field-of-view deviation amount when stage rotation is performed in each of θx, θy, and θz axial directions with respect to a discretionary stage rotation center: (i) the discretionary rotation center is controlled using motor thrust in a translation direction and a rotation direction of a stage device; (ii) a deviation amount from the center of the field of view in an observation image, or the trajectory of the deviation amount, is obtained on the basis of position information indicating the distance in at least one of an X-axis direction, a Y-axis direction, and a Z-axis direction between rotation center coordinates of the stage device and sample observation coordinates, and on the basis of the rotation angles of a θx axis, a θy axis, and a θz axis, during the rotation operation; and (iii) the deviation amount, or the trajectory of the deviation amount, is added to the position information pertaining to the stage when the stage device is moved, whereby the deviation amount from the center of the field of view in the observation image is corrected (see fig. 4).

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

Provided is a stage device that suppresses vibration of a stator of a motor, and that enables high-speed positioning. The stage device comprises: a first table; a second table that is able to move within a horizontal plane in a state of magnetic levitation over the first table; a support section for supporting the second table; a first double-shaft motor provided to the support section; and a second double-shaft motor provided to the support section. The first double-shaft motor and second double-shaft motor each comprise: a yoke provided with an upper member and a lower member; and a first and a second rectangular coil which are located between the upper member and the lower member and are each fixed to the support section, and an axial direction of which is the vertical direction. On a lower surface of the upper member and an upper surface of the lower member, there are provided magnet arrays, in which magnets are arranged in square blocks arrayed in a grid so that adjacent blocks have different magnetic poles. The magnet array provided to the lower surface of the upper member and the magnet array provided to the upper surface of the lower member are configured so that magnets of blocks that face opposite in the vertical direction have different magnetic poles from one another.

A charged particle beam system is disclosed, comprising:a charged particle beam generator for generating a beam of charged particles;a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;a source for providing a cleaning agent;a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;wherein the charged particle optical element comprises:a charged particle transmitting aperture for transmitting and / or influencing the beam of charged particles, andat least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

A telecentric charged particle beam, which can be an electron beam, is directed through an array of apertures to divide the telecentric charged particle beam to a plurality of telecentric illumination beamlets. The telecentric illumination beamlets through an imaging lens, a field lens at an intermediate image plane, and a transfer lens. The telecentric illumination beamlets are scanned as the telecentric illumination beamlets are directed through an upper scan deflector and a lower scan deflector and directed onto a workpiece on a stage.

An imaging device is provided with a sample stage configured to be capable of transferring a sample by at least two drive shafts, and shifting an imaging field of view corresponding to positional information of the sample, the positional information being obtained by a computer system. The computer system includes a classifier which outputs, in response to input of image data of a tilt image where the sample is imaged in an inclined state with respect to a charged particle beam, positional information of one or more feature parts existing on the tilt image. The classifier is trained in advance by using training data in which input is image data of the tilt image, and output is positional information of the feature part. The computer system executes, with respect to new tilt image data inputted into the classifier, a processing to output positional information of the feature part.

The invention provides a button type signal feed-through for a beam position detector. The button type signal feed-through comprises a shell, a composite unit and an insulator. The composite unit comprises a button electrode and an inner conductor, and the button electrode is suitable for sensing an electromagnetic field signal generated by charged particle beams in the vacuum cavity; the inner conductor vertically and integrally extends from the center of the button electrode, a flange is arranged near one end, close to the button electrode, of the inner conductor, and the inner conductor is suitable for transmitting beam electromagnetic field signals. The insulator is sleeved on the inner conductor and comprises a first section cylinder and a second section cylinder, and the front end face of the first section cylinder is welded and fixed with the flange of the inner conductor; the second section of cylinder body extends outwards in the radial direction from the rear end of the first section of cylinder body, the circumferential outer surface of the second section of cylinder body is welded and fixed with the shell, and the insulator is suitable for fixed support and electrical insulation, so that smooth transition of transmission impedance and vacuum sealing are realized. The invention further provides a preparation method of the charged particle beam position detector and a charged particle beam position detector structure.

A charged particle beam microscope system directs a charged particle beam to a sample to produce a plurality of images for a plurality of areas of the sample. Respective first sets of one or more aberration predictor values are acquired for each of the plurality of images. During the image acquisition, an aberration measurement and a corresponding second set of aberration predictor values are periodically acquired. An aberration model is obtained using the aberration measurements the corresponding second sets of aberration predictor values, wherein the model takes a set of aberration predictor values as an input and outputs predicted aberration data. The model is applied to the first sets of aberration predictor values to obtain respective aberration data, which is used to reduce or at least partially correct for aberration in the charged particle microscope images. A sample reconstruction is obtained using the acquired charged particle microscope images.

A method of operating a charged particle beam apparatus is described. The method includes guiding a primary charged particle beam through an opening of an on-axis detector, through an intermediate lens, through an objective lens, and onto a specimen, wherein the intermediate lens is disposed between the on-axis detector and the objective lens; focusing the primary charged particle beam with the objective lens onto the specimen; in a first mode of operation, providing an excitation of the intermediate lens to collimate high energy signal electrons including backscattered electrons to the opening of the on-axis detector; in the first mode of operation, detecting low energy signal electrons including secondary electrons with the on-axis detector; and in the first mode of operation, detecting the backscattered electrons with a second electron detector upstream of the on-axis detector. Also a corresponding charged particle beam apparatus is described.

A deflector for a charged particle beam device is described. And a deflector having an axis and configured to deflect the charged particle beam in a direction perpendicular to the axis, the deflector comprising a plurality of flat coils, the plurality of flat coils comprising two pairs of flat coils, where the two pairs of flat coils are arranged on opposite sides about the axis of the deflector.

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.

The present invention provides an optical beam member for a charged particle-optical device configured to direct a charged particle beam towards a sample location. The optical beam member comprises a first beam aperture and one or more optical radiation sources. The first beam aperture is for passage of the charged particle beam. The one or more optical radiation sources are arranged adjacent the first beam aperture. The optical radiation sources are configured to generate and emit optical radiation beams towards the sample location such that an optical beam spot on the sample associated with the one or more optical radiation sources is substantially coincident with a charged particle beam spot on the sample. The charged particle beam spot is associated with the charged particle beam.

Provided in the present invention are a magnetic resonance guided charged particle beam radiotherapy apparatus and an electromagnetic navigation parameter debugging method for target point coordinates, belonging to the technical field of radiotherapy apparatuses. The present invention comprises a charged particle beam electromagnetic navigation apparatus. The charged particle beam electromagnetic navigation apparatus comprises a multi-stage electromagnetic navigation coil, a charged particle beam sequentially passing through the multi-stage electromagnetic navigation coil to generate a parallel charged particle beam with a direction consistent with the direction of a magnetic resonance main magnetic field; and an MR imaging apparatus, comprising an MR main magnetic field coil upper group and an MR main magnetic field coil lower group, an imaging therapy area being formed therebetween. The electromagnetic navigation parameter debugging method of the present invention comprises constructing a target cost function, optimizing electromagnetic navigation parameters based on a gradient information-free optimization algorithm, and determining and outputting optimal navigation parameters. According to the present invention, the charged particle beam parallel to the MR main magnetic field can be generated, thereby greatly reducing the influence of Lorentz force on the charged particle beam, enabling to reduce the positioning difficulty of the charged particle beam on a tumor target area under MR guidance, and improving the therapeutic accuracy.

The invention provides a charged particle beam deflection electrostatic lens and a charged particle beam deflection method. The charged particle beam deflection electrostatic lens comprises at least one on-axis electrode, an off-axis electrode and a power distribution module, through holes are formed in the on-axis electrode and the off-axis electrode, and charged particle beams pass through the through holes; the off-axis electrode is parallel to the on-axis electrode, the central axis of the off-axis electrode is not coaxial with a preset incident optical axis, and the central axis of the on-axis electrode is coaxial with the preset incident optical axis; the power distribution module is electrically connected with the on-axis electrode, the power distribution module is electrically connected with the off-axis electrode, and the power distribution module is used for configuring different potentials for the on-axis electrode and the off-axis electrode so as to form a non-axisymmetric electric field to enable the charged particle beam to deflect. The problems that in the prior art, the structure is complex, and charged particle beams cannot be deflected and focused at the same time are solved. According to the invention, the charged particle beams are deflected and focused simultaneously by adopting a simple structure.

The present disclosure relates to a system and a non-transitory computer-readable medium for estimating the height of foreign matter, etc. adhering to a sample. In order to achieve the abovementioned purpose, proposed is a system, etc. in which data acquired by a charged particle beam device or features extracted from the data are input to a learning model, which is provided with, in an intermediate layer thereof, a parameter learned using teacher data having data acquired by the charged particle beam device or features extracted from the data as inputs and having the heights or depths of the structures of samples or of foreign matter on the samples as outputs, and height or depth information is output.